摘要:
A method is provided for producing a semiconductor device characterized by filling hollows having a high aspect ratio with a semiconductor film doped with impurities as dopants and an undoped semiconductor film, given that the doped polycrystalline Si film produced by thermal decomposition of reactive gases mixed with impurity gases and the undoped polycrystalline Si film produced by thermal decomposition of reactive gases containing no impurity gas have different step coverage characteristics from each other. The method allows uniform distribution of dopants as well as improvement of processing throughput by forming sequentially the two types of semiconductor films in one reaction chamber.
摘要:
An optical disk is provided which comprises two sheets of substrates; or two sheets of substrate and a reinforcing plate or a reinforcing rim; or one sheet of substrate and a reinforcing plate; which are bonded to form an integrated body having a spacer interposed therebetween, said spacer being made of elastomeric foam having a specific gravity of not more than 1.5 and an expansion ratio of not less than 1.5 as the material of the said spacer. This optical disk has a high adaptability of the drive and exhibits a high reliability, i.e. excellent vibration restricting performance, thereby being possible to provide a stable and highly accurate information processing.
摘要:
In a semiconductor IC, a vertical pnp or npn transistor of a uniform characteristic and a high breakdown voltage is made by forming, for example, a p.sup.- -collector region (39) in an n-type epitaxial region, an n-well base region (41) formed in the p.sup.- -collector region (39) and a p-emitter region (42) formed in the n-well base region (41); and furthermore, for example as shown in FIG. 9, p.sup.- -regions (40) and (49) are formed simultaneously with the p.sup.- -collector region (39) and an n-region (53) is formed simultaneously with the n-well base region (41), thereby constituting IIL of superior characteristics and a high resistance device at the same time as forming of the vertical transistor without substantial increase of manufacturing steps; and in the similar way, by combining the p.sup.- -region and n-region formed in the above-mentioned simultaneous steps with other region formed simultaneously with the forming of the vertical transistor, high h.sub.FE transistor, high speed vertical npn transistor, cross-over devices, p-channel and/or n-channel MOS transistors can be formed within limited manufacturing steps.
摘要:
Semiconductor device, such as bipolar transistor, is made by molecular beam epitaxy, wherein a emitter layer (27) and overriding contact regions (28) of polycrystalline silicon are grown continuously on a silicon substrate (23+26) without breaking high vacuum, thus eliminating the adverse interface of natural oxide film under the polycrystalline silicon layer (28) and the adverse donor-acceptor compensation while attaining a well controlled h.sub.FE and enabling a shallow emitter junction.
摘要:
A semiconductor integrated circuit device in which the side surfaces of an emitter of an oxide isolated bipolar transistor are surrounded with insulating compounds or regions so that the capacitance between the emitter and base is lowered and a base is formed by the self-alignment so that the influence of an active base between an external base and the emitter can be made negligible. Thus the base resistance and parasitic capacitance are lowered.
摘要:
An accommodation portion of a solid-state imaging device having a recessed shape in section is so formed in a package such that the center thereof is deviated from the center of the package. A light-receiving element having a light-receiving portion as well as a circuit portion for driving the light-receiving portion that are formed on the same plane, is so disposed in the accommodation portion such that the center of the light-receiving portion is in agreement with the center of the package. The outer diameter of the imaging device can be reduced, and the imaging center can be brought into agreement with the center of the light-receiving portion.
摘要:
An apparatus for driving an index table which includes a first shaft, an index table rotatably mounted on the first shaft having grooves therein forming a Geneva gear and a mechanism for driving the table in rotation including a drive motor, a second shaft driven by the motor, a crank mounted on the second shaft, and a Geneva pin mounted on the crank. The grooves have force bearing walls which include straight portions and sector portions. The Geneva pin is engaged in the grooves in the table to effect stepwise rotation of the table to equispaced, predetermined angular positions. The second shaft and the grooves are spaced from each other such that the distance from the axis of the second shaft to the circumferential surface of the pin is less than the distance from the axis of the shaft to the straight portions of the force bearing walls of the grooves. The sector portions of the force bearing walls of the grooves are recessed such that the distance from the axis of the second shaft to the circumferential surface of the pin is equal to the distance from the axis of the second shaft to the sector portions of the force bearing walls of the grooves. Thus the circumferential surface of the pin transfers from bearing against the walls of the straight portion to bearing against the walls of the recessed sector portion prior to the index table finishing rotation to one of the predetermined angular positions. The index table thereafter completes rotation to the predetermined angular position powered solely by its inertia.
摘要:
A method for forming a thin film of cerium oxide as a blocking layer which constitutes a portion of a photoelectric film of a blocking type image pickup tube is disclosed. A substrate deposition rate in a vacuum deposition process is established in a range between 0.01 to 0.6 A/sec to prevent the deposition of particles which result in black or white spots in a picture image. It is more effective to select a particle size of 5 .mu. or more for the primary particles to be deposited.
摘要:
The evaporation boat comprises superposed upper and lower sheets. The upper sheet includes a upwardly convexed central section and a pair of side sections bent back toward the central section and the lower sheet includes a downwardly convexed central section and a pair of side sections bent inwardly toward the upper sheet. The upper and lower sheets are superposed each other such that the central sections of the upper and lower sheets define a substantially closed chamber for accomodating source material to be evaporated, that slit shaped vapor passages are formed between the upper and lower sheets or the opposite sides of the chamber and that any straight line drawn between any point on the surface of the source material and any point in the passages intersects the inner wall of the upper or lower sheets.