公开(公告)号：US06772029B2

公开(公告)日：2004-08-03

申请号：US10181293

申请日：2002-07-16

申请人： Yoichi Kobayashi ,  Yasumasa Hiroo ,  Tsuyoshi Ohashi

发明人： Yoichi Kobayashi ,  Yasumasa Hiroo ,  Tsuyoshi Ohashi

IPC分类号： G06F1760

CPC分类号： G06Q50/04 ,  G06Q10/04 ,  G06Q10/06 ,  H01L21/67276 ,  Y02P90/30 ,  Y10S414/135 ,  Y10S438/907 ,  Y10S438/908

摘要： The present invention provides a substrate transfer controlling apparatus which can easily maximize the throughput of a substrate processing apparatus such as a semiconductor fabrication apparatus, and can satisfy a demand for immediacy of actions of a transfer device. The substrate transfer controlling apparatus comprises an input device (12) for inputting times required for actions of transfer devices (1a through 1c) and times required to process substrates in processing devices (3a through 9d), and a schedule calculator (21) for calculating execution times of actions of the transfer devices (1a through 1c) for allowing the time when a final one of the substrates to be processed is fully processed and returned from the substrate processing apparatus to be earliest, based on a predetermined conditional formula including, as parameters, the inputted times. The substrate transfer controlling apparatus further comprises an action commander (24) for instructing the corresponding transfer devices to perform the actions at the calculated execution times of the actions of the transfer devices (1a through 1c).

摘要翻译： 本发明提供一种能够容易地使半导体制造装置等基板处理装置的生产能力最大化的基板转印控制装置，能够满足对转印装置的动作的即时性的要求。 基板传送控制装置包括：输入装置（12），用于输入传送装置（1a至1c）的动作所需的时间和处理装置（3a至9d）中处理基板所需的时间;以及计算计算器（21），用于计算 基于规定的条件式，将从基板处理装置开始最后处理的基板的处理时间最短的传送装置（1a〜1c）的动作的执行时间作为 参数，输入时间。 基板传送控制装置还包括动作指令器（24），用于指示相应的传送装置在计算出的传送装置（1a至1c）的动作的执行时间执行动作。

公开(公告)号：US06739683B2

公开(公告)日：2004-05-25

申请号：US09968075

申请日：2001-10-01

申请人： Masaki Shimomura ,  Hiroshi Asawa ,  Masahiro Isono ,  Yoichi Kobayashi ,  Koji Hashiuchi ,  Hiroyuki Tajima ,  Kenjiro Ishihara

发明人： Masaki Shimomura ,  Hiroshi Asawa ,  Masahiro Isono ,  Yoichi Kobayashi ,  Koji Hashiuchi ,  Hiroyuki Tajima ,  Kenjiro Ishihara

IPC分类号： B41J25308

CPC分类号： B41J25/3082 ,  B41J19/145 ,  B41J25/308 ,  B41J25/312

摘要： An ink jet recording apparatus includes a paper gap switching portion for switching paper gaps by moving a recording head, a pressing-force adjustment portion for applying a pressure to a following roller and releasing the pressure from the following roller so as to adjust a pressing force applied to a recording medium, and an operation member for controlling a driving operation of the paper gap switching portion and a driving operation for the pressing-force adjustment portion.

摘要翻译： 一种喷墨记录装置，包括用于通过移动记录头来切换纸间隙的纸间隙切换部分，用于向后续辊施加压力并释放来自后续辊的压力的按压力调节部分，以便调节压力 以及用于控制纸间隙切换部分的驱动操作的操作构件和用于按压力调节部分的驱动操作的操作构件。

公开(公告)号：US4957860A

公开(公告)日：1990-09-18

申请号：US112068

申请日：1987-10-26

申请人： Tatsuhiko Kan ,  Yoichi Kobayashi

发明人： Tatsuhiko Kan ,  Yoichi Kobayashi

IPC分类号： C12P19/00 ,  C12N1/38 ,  C12P19/14 ,  C12R1/01

CPC分类号： C12P19/14 ,  Y10S435/911 ,  Y10S435/913 ,  Y10S435/918

摘要： The present invention provides a method of producing oligosaccharides by the reaction between lactose and .beta.-galactosidase from aspergillus oryzae in which an concentration of lactose in an enzyme reaction mixture is between 50 and 90% (w/v) and a reaction temperature is within the range of 55.degree. C. to the temperature at which the .beta.-galactosidase in the reaction mixture is inactivated. This invention therefore makes it possible to obtain the sugar mixture containing high-purity oligosaccharides, small amounts of unreacted lactose and by produced monosaccharides.

摘要翻译： 本发明提供了通过乳糖和来自米曲霉的β-半乳糖苷酶之间的反应制备寡糖的方法，其中酶反应混合物中的乳糖浓度为50-90％（w / v），反应温度在 范围为55℃至反应混合物中β-半乳糖苷酶失活的温度。 因此，本发明使得可以获得含有高纯度寡糖，少量未反应的乳糖和产生的单糖的糖混合物。

公开(公告)号：US4895801A

公开(公告)日：1990-01-23

申请号：US103416

申请日：1987-10-01

申请人： Tatsuhiko Kan ,  Tsuneo Terashima ,  Yoichi Kobayashi

发明人： Tatsuhiko Kan ,  Tsuneo Terashima ,  Yoichi Kobayashi

IPC分类号： C12N1/38 ,  C12P19/00 ,  C12P19/14 ,  C12R1/69

CPC分类号： C12P19/14 ,  Y10S435/918

摘要： A method for producing oligosaccharides which are represented by the general formula Gal-(Gal)n-Glc (where Gal is a galactose residue, Glc is a glucose residue, and n is an integer from 1 to 4) which is characterized in that lactose or a lactose-containing substance is treated with at least two kinds of .beta.-galactosidases which are produced by different microorganisms. The present invention provides a method of producing oligosaccharides to obtain sweet saccharide mixture which provide sweetness and add oligosaccharides to food and drinks, with a lower increase in calories than that of conventional additives.

摘要翻译： 用于制备由通式Gal-（Gal）n-Glc（其中Gal是半乳糖残基，Glc是葡萄糖残基，n是1至4的整数）表示的寡糖的方法，其特征在于，乳糖 或含有乳糖的物质用至少两种由不同微生物产生的β-半乳糖苷酶处理。 本发明提供一种生产低聚糖以获得甜味糖混合物的方法，其提供甜味并向食品和饮料中添加寡糖，卡路里的热量增加比常规添加剂的增加更低。

公开(公告)号：US09401293B2

公开(公告)日：2016-07-26

申请号：US13330881

申请日：2011-12-20

申请人： Itsuki Kobata ,  Yoichi Kobayashi ,  Katsutoshi Ono ,  Masaki Kinoshita ,  Toshifumi Kimba

发明人： Itsuki Kobata ,  Yoichi Kobayashi ,  Katsutoshi Ono ,  Masaki Kinoshita ,  Toshifumi Kimba

IPC分类号： B24B49/12 ,  B24B37/10 ,  B24B37/30 ,  B24B37/013 ,  H01L21/67 ,  H01L21/687 ,  B24B37/04 ,  B24B37/005

CPC分类号： B24B37/26 ,  B24B37/005 ,  B24B37/013 ,  B24B37/04 ,  B24B37/042 ,  B24B37/10 ,  B24B49/12 ,  H01L21/31053 ,  H01L21/67075 ,  H01L21/67092 ,  H01L21/67253 ,  H01L21/68721 ,  H01L22/26

摘要： A polishing apparatus for polishing a substrate includes a polishing table holding a polishing pad, a top ring configured to press the substrate against the polishing pad, and first and second optical heads each configured to apply the light to the substrate and to receive reflected light from the substrate. The polishing apparatus also includes spectroscopes each configured to measure at each wavelength an intensity of the reflected light received, and a processor configured to produce a spectrum indicating a relationship between intensity and wavelength of the reflected light. The first optical head is arranged so as to face a center of the substrate, and the second optical head is arranged so as to face a peripheral portion of the substrate.

摘要翻译： 用于抛光基板的抛光装置包括：保持抛光垫的抛光台，被配置为将基板压靠在抛光垫上的顶环;以及第一和第二光学头，每个被配置为将光施加到基板并且接收来自 底物。 抛光装置还包括分别被配置成在每个波长处测量接收到的反射光的强度，以及处理器，被配置为产生指示反射光的强度和波长之间的关系的光谱。 第一光学头被布置为面对基板的中心，并且第二光学头被布置成面对基板的周边部分。

公开(公告)号：US08820913B2

公开(公告)日：2014-09-02

申请号：US13409481

申请日：2012-03-01

申请人： Takashi Koase ,  Yoichi Kobayashi ,  Tsuneyuki Sasaki ,  Masako Fukuda

发明人： Takashi Koase ,  Yoichi Kobayashi ,  Tsuneyuki Sasaki ,  Masako Fukuda

IPC分类号： B41J2/01 ,  B41J11/00

CPC分类号： B41J11/002

摘要： There is provided a liquid ejection apparatus in which convection generated by a convection generation unit does not give an influence on an irradiation unit, ink can be heated and dried sufficiently, and bleeding can be suppressed from occurring. The liquid ejection apparatus includes a head unit which has a nozzle for ejecting liquid onto a recording medium, a carriage which makes the head unit relatively scan the recording medium, an infrared ray irradiation unit which is provided at a vertically upper side of the carriage in a scanning direction of the carriage and irradiates the recording medium with infrared rays, a convection generation unit which is provided at a vertically upper side of the carriage in the scanning direction of the carriage and generates convection on the recording medium, and a separation wall which is provided between the infrared ray irradiation unit and the convection generation unit.

摘要翻译： 提供了一种液体喷射装置，其中由对流产生单元产生的对流对照射单元不产生影响，可以充分地加热和干燥油墨，并且可以抑制出血。 液体喷射装置包括：头单元，其具有用于将液体喷射到记录介质上的喷嘴;使头单元相对地扫描记录介质的滑架;设置在滑架的垂直上侧的红外线照射单元 滑架的扫描方向并且用红外线照射记录介质;对流产生单元，其设置在托架的垂直上方沿托架的扫描方向并在记录介质上产生对流;以及分隔壁， 设置在红外线照射单元和对流发生单元之间。

公开(公告)号：US08655472B2

公开(公告)日：2014-02-18

申请号：US13004208

申请日：2011-01-11

申请人： Ryuya Koizumi ,  Kunio Oishi ,  Yoichi Kobayashi

发明人： Ryuya Koizumi ,  Kunio Oishi ,  Yoichi Kobayashi

IPC分类号： G06F19/00 ,  G06Q10/06

CPC分类号： G06Q10/06 ,  G05B19/41865 ,  G05B2219/45031 ,  H01L21/67253 ,  H01L21/67276 ,  Y02P90/20

摘要： A scheduler generates not only normal substrate transferring schedules for substrates newly supplied to a substrate processing apparatus, but also substrate transferring schedules for keeping a high production quantity in the event of a failure. The scheduler is used in a substrate processing apparatus including a plurality of substrate processing sections for processing substrates, a transfer device for transferring the substrates, and a controller for controlling the substrate processing units to process the substrates and controlling the transfer device to transfer the substrates. The scheduler is incorporated in the controller for calculating a substrate transferring schedule and has a function to successively calculate substrate transferring schedules for substrates which are newly supplied to the substrate processing apparatus, and, in the event of a fault occurring in the substrate processing apparatus, to recalculate the substrate transferring schedules with an initial state represented by a state including the fault.

摘要翻译： 调度器不仅产生新提供给基板处理装置的基板的正常的基板转印时间表，而且生成在发生故障的情况下保持高生产量的基板转印时间表。 调度器用于包括用于处理衬底的多个衬底处理部分，用于转移衬底的转移装置和用于控制衬底处理单元以处理衬底并控制转移装置以转移衬底的衬底处理装置 。 调度器被结合在控制器中用于计算衬底传送时间表，并且具有连续地计算新提供给衬底处理设备的衬底的衬底传送时间表的功能，并且在衬底处理设备中发生故障的情况下， 重新计算由包括故障的状态表示的初始状态的基板传送调度。

公开(公告)号：US08388408B2

公开(公告)日：2013-03-05

申请号：US12461533

申请日：2009-08-14

申请人： Yoichi Kobayashi ,  Noburu Shimizu ,  Shinrou Ohta

发明人： Yoichi Kobayashi ,  Noburu Shimizu ,  Shinrou Ohta

IPC分类号： B24B49/00 ,  B24B51/00

CPC分类号： B24B49/12 ,  B24B37/013

摘要： A method of producing a diagram for use in selecting wavelengths of light in optical polishing end point detection is provided. The method includes polishing a surface of a substrate having a film by a polishing pad; applying light to the surface of the substrate and receiving reflected light from the substrate during the polishing of the substrate; calculating relative reflectances of the reflected light at respective wavelengths; determining wavelengths of the reflected light which indicate a local maximum point and a local minimum point of the relative reflectances which vary with a polishing time; identifying a point of time when the wavelengths, indicating the local maximum point and the local minimum point, are determined; and plotting coordinates, specified by the wavelengths and the point of time corresponding to the wavelengths, onto a coordinate system having coordinate axes indicating wavelength of the light and polishing time.

摘要翻译： 提供了一种制造用于选择光学抛光终点检测中的光的波长的图的方法。 该方法包括通过抛光垫抛光具有膜的基板的表面; 在基板的研磨过程中将光施加到基板的表面并接收来自基板的反射光; 计算各波长的反射光的相对反射率; 确定反射光的波长，其指示随抛光时间变化的相对反射率的局部最大点和局部最小点; 识别指示表示局部最大点和局部最小点的波长的时间点; 并且将由波长相对应的波长和时间点指定的坐标绘制到具有指示光的波长和抛光时间的坐标轴的坐标系上。

公开(公告)号：US08096189B2

公开(公告)日：2012-01-17

申请号：US12419656

申请日：2009-04-07

申请人： Daiji Uehara ,  Yoichi Kobayashi

发明人： Daiji Uehara ,  Yoichi Kobayashi

IPC分类号： G01L9/12

CPC分类号： G01L9/0073 ,  Y10T156/1052

摘要： A physical quantity sensor includes two substrates and a movable electrode that is disposed between the two substrates and is bonded to the two substrates. In the physical quantity sensor, the movable electrode has an elastically deformable diaphragm and one of the two substrates is an electrode substrate having a detection electrode on a detection surface opposite to the diaphragm to detect capacitance between the diaphragm and the detection electrode. In the physical quantity sensor, in a range between a room temperature and a bonding temperature when the two substrates and the movable electrode are bonded, coefficients of thermal expansion of the two substrates are smaller than that of the movable electrode and in a temperature range where the physical quantity sensor is used, a coefficient of thermal expansion of the movable electrode is between a first and second substrates.

摘要翻译： 物理量传感器包括两个基板和设置在两个基板之间并结合到两个基板上的可动电极。 在物理量传感器中，可动电极具有可弹性变形的膜片，并且两个基板中的一个基板是在与膜片相对的检测表面上具有检测电极的电极基板，以检测隔膜和检测电极之间的电容。 在物理量传感器中，当两个基板和可动电极接合时，在室温和接合温度之间的范围内，两个基板的热膨胀系数小于可动电极的热膨胀系数，在温度范围 使用物理量传感器，可动电极的热膨胀系数在第一和第二基板之间。

公开(公告)号：US08078419B2

公开(公告)日：2011-12-13

申请号：US12285604

申请日：2008-10-09

申请人： Yoichi Kobayashi ,  Taro Takahashi ,  Yasumasa Hiroo ,  Akihiko Ogawa ,  Shinrou Ohta

发明人： Yoichi Kobayashi ,  Taro Takahashi ,  Yasumasa Hiroo ,  Akihiko Ogawa ,  Shinrou Ohta

IPC分类号： G06F19/00 ,  B24B49/00 ,  G01B7/06 ,  G01B5/02 ,  G01R19/00 ,  G01C17/38

CPC分类号： G01B7/105 ,  B24B37/042 ,  B24B49/105

摘要： A method monitors a change in film thickness during polishing using an eddy current sensor. This method includes acquiring an output signal of the eddy current sensor as a correction signal value during water-polishing of a substrate, during dressing of the polishing pad, or during replacement of the polishing pad, calculating a correcting amount from a difference between the correction signal value and a predetermined correction reference value, calculating an actual measurement signal value by subtracting the correction amount from the output signal of the eddy current sensor when polishing a substrate having a conductive film, and monitoring a change in thickness of the conductive film during polishing by monitoring a change in the actual measurement signal value.

摘要翻译： 一种方法使用涡流传感器监测抛光过程中膜厚度的变化。 该方法包括在修整抛光垫期间或在更换抛光垫期间获取涡流传感器的输出信号作为衬底的水抛光期间的校正信号值，或者在抛光垫的更换期间，从校正之间的差计算校正量 信号值和预定的校正基准值，通过在研磨具有导电膜的基板时从涡电流传感器的输出信号中减去校正量，并且在抛光期间监测导电膜的厚度变化来计算实际测量信号值 通过监视实际测量信号值的变化。