公开(公告)号：US20170211929A1

公开(公告)日：2017-07-27

申请号：US15329504

申请日：2014-07-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroki KAWADA ,  Katsuhiro SASADA ,  Takenori HIROSE ,  Shou TAKAMI

IPC: G01B11/06 ,  G01B15/02

CPC classification number: G01B11/0608 ,  G01B11/0625 ,  G01B15/02 ,  G01B2210/56

Abstract: A purpose of the present invention is to provide: a pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, in the height direction; and a charged particle beam device. In order to achieve the purpose, this pattern height measurement device comprises a calculation device that finds the dimensions of a sample, in the height direction, on the basis of first reflected light information obtained by dispersing light that is reflected when the sample is irradiated with light. The calculation device: finds second reflected light information on the basis of a formula for the relationship between the value for the dimension in the sample surface direction of a pattern formed upon the sample, obtained by irradiation of a charged particle beam on the sample, the value for the dimension in the height direction of the sample, and reflected light information; compares a second reflected light intensity and the first reflected light information; and outputs, as the dimension in the height direction of the pattern, the value for the dimension in the height direction of the sample in the second reflected light information when the first reflected light information and the second reflected light information fulfil prescribed conditions.

公开(公告)号：US20170097231A1

公开(公告)日：2017-04-06

申请号：US15279862

申请日：2016-09-29

Applicant: Honeywell International Inc.

Inventor： Andrzej Peczalski ,  Fouad Nusseibeh

IPC: G01B15/02 ,  G01S13/88

CPC classification number: G01B15/02 ,  G01S13/88

Abstract: Devices, methods, and systems for monitoring thickness uniformity are described herein. One system includes a transmitter configured to transmit a signal through a portion of a material while the material is moving, an attenuator configured to absorb a first portion of the transmitted signal, a reflector configured to reflect a second portion of the transmitted signal, a receiver configured to receive the reflected signal, and a computing device configured to determine a thickness of the portion of the material based on a time delay between the transmission of the signal and the reception of the reflected signal

公开(公告)号：US09594035B2

公开(公告)日：2017-03-14

申请号：US14691164

申请日：2015-04-20

Applicant: Heath A. Pois ,  Wei Ti Lee

Inventor： Heath A. Pois ,  Wei Ti Lee

IPC: G01N23/22 ,  G01B15/02 ,  G01N23/223 ,  G01N23/227

CPC classification number: G01N23/2206 ,  G01B15/02 ,  G01N23/2208 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G01N2223/6116

Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.

Abstract translation: 描述了使用组合XPS和XRF技术的硅锗厚度和成分测定的系统和方法。 在一个示例中，用于表征硅锗膜的方法包括产生X射线束。 样品位于所述X射线束的通路中。 收集通过用所述X射线束轰击所述样品产生的X射线光电子能谱（XPS）信号。 还收集通过用所述X射线束轰击所述样品而产生的X射线荧光（XRF）信号。 硅锗膜的厚度或组成或两者均由XRF信号或XPS信号或两者确定。

公开(公告)号：US09488601B2

公开(公告)日：2016-11-08

申请号：US14226102

申请日：2014-03-26

Applicant: PaneraTech, Inc.

Inventor： Alexander C. Ruege ,  Yakup Bayram ,  Eric K. Walton

IPC: G01N17/02 ,  G01B7/06 ,  G01N27/61 ,  G01N22/02 ,  G01B15/02 ,  F27D21/00

CPC classification number: G01N22/02 ,  F27D21/0021 ,  G01B15/02 ,  G01N33/388

Abstract: Disclosed is an improved system and method to evaluate the status of a material. The system and method are operative to identify flaws and measure the erosion profile and thickness of different materials, including refractory materials, using electromagnetic waves. The system is designed to reduce a plurality of reflections, associated with the propagation of electromagnetic waves launched into the material under evaluation, by a sufficient extent so as to enable detection of electromagnetic waves of interest reflected from remote discontinuities of the material. Furthermore, the system and method utilize a configuration and signal processing techniques that reduce clutter and enable the isolation of electromagnetic waves of interest. Moreover, the launcher is impedance matched to the material under evaluation, and the feeding mechanism is designed to mitigate multiple reflection effects to further suppress clutter.

Abstract translation: 公开了一种用于评估材料状态的改进的系统和方法。 该系统和方法可用于识别缺陷并使用电磁波测量不同材料（包括耐火材料）的侵蚀特征和厚度。 该系统旨在减少与发射到被评估材料中的电磁波的传播相关联的多个反射足够的程度，以便能够检测从材料的远端不连续性反射的感兴趣的电磁波。 此外，该系统和方法利用减少杂波并使得能够隔离感兴趣的电磁波的配置和信号处理技术。 此外，发射器与正在评估的材料阻抗匹配，并且进给机构被设计为减轻多重反射效应以进一步抑制杂波。

公开(公告)号：US20160258886A1

公开(公告)日：2016-09-08

申请号：US15155056

申请日：2016-05-15

Applicant: Troxler Electronic Laboratories, Inc.

Inventor： Wewage Hiran Linus Dep ,  Robert Ernest Troxler

IPC: G01N23/08 ,  G01N33/38 ,  B65G15/08 ,  G01B15/02

Abstract: A system is provided. The system includes a conveyor apparatus configured for conveying a material and a water content measurement system positioned about the conveyor apparatus for determining water content in the material. A dimension characteristic measurement system for detecting one or more dimension characteristics of the material is provided and a computer device is configured to manipulate data received from the water content measurement system and the dimension characteristic measurement system to determine a water content of the material.

Abstract translation: 提供了一个系统。 该系统包括构造成输送物料的输送装置和围绕输送装置定位的含水量测量系统，用于确定材料中的含水量。 提供了一种用于检测材料的一个或多个维度特征的维度特征测量系统，并且计算机设备被配置为操纵从含水量测量系统和尺寸特征测量系统接收的数据，以确定材料的含水量。

公开(公告)号：US09372078B1

公开(公告)日：2016-06-21

申请号：US14310294

申请日：2014-06-20

Applicant: Western Digital (Fremont), LLC

Inventor： Kurt C. Ruthe ,  Sean P. Leary

IPC: G01B15/02 ,  H01J37/22 ,  G06T7/00

CPC classification number: G01B15/02 ,  G06T5/008 ,  G06T5/20 ,  G06T7/0008 ,  G06T2207/10061 ,  G06T2207/30136 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/28

Abstract: A method and system to detect thickness variation of a subject material are described. In an aspect, tribological wear is assessed for a disk drive memory system at the pole tip region of a magnetic head. Images are obtained of a first region and a second region of a subject material utilizing scanning electron microscopy (SEM). The SEM images are image processed to obtain a differential contrast between the first region and the second region. An image intensity variation is determined between masked SEM images of the first region and the second region by obtaining a surface profiler image of the first region and the second region, and overlaying and calibrating the SEM images with the surface profiler images. In an aspect, image intensity variation is converted to quantified thickness utilizing a fitted relation obtained from the calibration of the surface profiler images with the SEM images.

Abstract translation: 描述了用于检测主题材料的厚度变化的方法和系统。 在一方面，针对在磁头的磁极尖端区域处的磁盘驱动器存储器系统评估摩擦学磨损。 使用扫描电子显微镜（SEM）获得主题材料的第一区域和第二区域的图像。 图像处理SEM图像以获得第一区域和第二区域之间的差分对比度。 通过获得第一区域和第二区域的表面轮廓图像，并用表面轮廓图像重叠和校准SEM图像，在第一区域和第二区域的掩模SEM图像之间确定图像强度变化。 在一个方面，使用从SEM图像的表面轮廓图像的校准获得的拟合关系，将图像强度变化转换成量化厚度。

公开(公告)号：US09360308B2

公开(公告)日：2016-06-07

申请号：US14248673

申请日：2014-04-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byung Hyun Hwang ,  Kwang-Hoon Kim ,  Woongkyu Son ,  Chulgi Song ,  Choonshik Leem

IPC: G01N23/20 ,  G01B15/02

CPC classification number: G01B15/02 ,  G01N23/20

Abstract: A method for analyzing an object includes measuring a first reflectivity of light from a surface and measuring a second reflectivity of light from the object, after the object is formed on the surface. A variation between the first and second reflectivities is calculated, and the variation is transformed by a predetermined transform. A thickness of the object is determined based on the transformed variation.

Abstract translation: 用于分析物体的方法包括在物体形成在表面上之后测量来自表面的光的第一反射率和测量来自物体的光的第二反射率。 计算第一和第二反射率之间的变化，并且通过预定变换来变换变化。 基于变换的变化确定对象的厚度。

公开(公告)号：US09279674B2

公开(公告)日：2016-03-08

申请号：US14376790

申请日：2013-11-19

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Hui Tian

IPC: G01B15/02 ,  G03F7/20 ,  G01Q60/24

CPC classification number: G01B15/02 ,  G01Q60/24 ,  G03F7/20 ,  H01L21/266

Abstract: A method of testing a blocking ability of a photoresist blocking layer for ion implantation, comprising: forming a photoresist blocking layer (S1) on a substrate; measuring a first thickness (S2) of the photoresist blocking layer at an arbitrary position on the substrate, the first thickness being a thickness of the photoresist blocking layer; implanting a predetermined amount of ions (S3) into the photoresist blocking layer; measuring a second thickness (S4) of the photoresist blocking layer at the arbitrary position, the second thickness being a thickness of a hardened portion in the photoresist blocking layer; and determining a blocking ability (S5) of the photoresist blocking layer with the first thickness for ion implantation according to the second thickness. This method does not need to use a testing silicon slice during the process of testing the blocking ability of a photoresist blocking layer for ion implantation, and thus can reduce required costs during the testing process.

Abstract translation: 一种测试用于离子注入的光致抗蚀剂阻挡层的阻挡能力的方法，包括：在基底上形成光刻胶阻挡层（S1）; 测量所述光刻胶阻挡层在所述基板上的任意位置的第一厚度（S2），所述第一厚度为所述光致抗蚀剂阻挡层的厚度; 将预定量的离子（S3）注入到光刻胶阻挡层中; 测量任意位置处的光致抗蚀剂阻挡层的第二厚度（S4），第二厚度是光致抗蚀剂阻挡层中的硬化部分的厚度; 以及根据第二厚度确定具有用于离子注入的第一厚度的光致抗蚀剂阻挡层的阻挡能力（S5）。 在测试用于离子注入的光致抗蚀剂阻挡层的阻挡能力的过程中，该方法不需要使用测试硅片，因此可以在测试过程中降低所需的成本。

公开(公告)号：US09044186B2

公开(公告)日：2015-06-02

申请号：US13917945

申请日：2013-06-14

Applicant: George W. Ma

Inventor： George W. Ma

IPC: G01B15/02 ,  A61B6/00

CPC classification number: A61B6/4042 ,  A61B6/4035 ,  A61B6/461 ,  A61B6/467 ,  A61B6/482 ,  A61B6/487 ,  A61B6/505 ,  A61B6/508 ,  A61B6/542 ,  A61B6/563

Abstract: Devices, tools, systems and methods for X-ray bone density measurement and imaging for radiography, fluoroscopy and related procedures. Portable, efficient peripheral bone density measurement and/or high resolution imaging and/or small field digital radiography of bone and other tissue, including tissue in the peripheral skeletal system, such as the arm, forearm, leg, hand and/or foot.

Abstract translation: X-射线骨密度测量和成像用于放射摄影，荧光透视和相关手术的设备，工具，系统和方法。 骨骼和其他组织的便携式，有效的外周骨密度测量和/或高分辨率成像和/或小型数字射线照相术，包括外周骨骼系统中的组织，例如手臂，前臂，腿，手和/或脚。

公开(公告)号：US20150055756A1

公开(公告)日：2015-02-26

申请号：US14380441

申请日：2013-04-25

Applicant: Nippon Steel & Sumitomo Metal Corporation

Inventor： Makoto Nakazawa

IPC: G01N23/207 ,  G01B15/02

CPC classification number: G01N23/207 ,  C23C2/06 ,  C23C2/28 ,  G01B15/02 ,  G01N2223/605 ,  G01N2223/633

Abstract: A method of measuring a thickness of a Fe—Zn alloy phase included in the Fe—Zn alloy coating of the galvannealed steel sheet includes: an X-ray irradiation process of irradiating the galvannealed steel sheet with the incident X-rays; and an X-ray detection process of detecting the diffracted X-rays obtained in the X-ray irradiation process, derived from a Γ·Γ1 phase, a δ1 phase, and a ζ phase included in the Fe—Zn alloy coating with a crystal lattice spacing d of 1.5 Å or higher.

Abstract translation: 测定合金化热镀锌钢板的Fe-Zn合金涂层中所含的Fe-Zn合金相的厚度的方法包括：对入射的X射线照射合金化热浸镀锌钢板的X射线照射工序; 以及X射线检测处理，其检测从X射线照射处理得到的衍射X射线，衍射自Fe-Zn合金涂层中包含的＆Ggr。·Ggr; 1相，δ1相和ζ相 晶格间距d为1.5或更高。