摘要:
Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner.
摘要:
An integrated actuator meniscus mirror includes an optical substrate having a mirror surface on one side and a support structure on the other for controllably altering the shape of the mirror surface without a reaction mass.
摘要:
A fluid pressure support mechanism has a container in which fluid pressure is applied and fluid tubes are connected to the fluid pressure support mechanisms and to a fluid pressure control unit in such a way as to make all the fluid pressure support mechanisms communicate with each other, then a fluid pressure control unit applies the fluid pressure to the containers in the respective fluid pressure support mechanisms via the fluid tubes and controls the fluid pressure, and an electrically attractive actuator translates a mirror in an axial direction with one degree of freedom for translation by attracting force produced by a driven member and an electromagnet.
摘要:
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要:
An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.
摘要:
An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.
摘要:
The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element.
摘要:
The invention relates to a bimorph optical device comprising a deformable optical element and active elements made of piezoelectric ceramic provided with electrodes, said elements being controlled in pairs and in opposition so as to produce a compression movement for a first element of a pair and an extension movement for the second element of a pair, the device being characterized in that the optical element (1) presents an optically active first main surface (6) and a second main surface (7) opposite to the first main surface, together with at least first and second opposite lateral faces (2, 3), and in that the ceramic active elements comprise at least two pairs of bars (21, 22; 31, 32) of piezoelectric ceramic placed facing each other on said first and second lateral faces (2, 3), each pair comprising two bars (21, 22; 31, 32) placed on one of the first and second lateral faces (2, 3) on either side of a middle surface of the optical element (1) that constitutes the neutral axis thereof.
摘要:
As the concentration of electromagnetic radiation, especially solar radiation, can be utilized for constructive purposes it becomes desirable to concentrate the radiation in an economical manner. An essentially fixed concentrating reflector whose shape is generated by gravity's effect on flexible members provides an efficient means to collect and concentrate radiation. Historically in optical science aberrations are to be avoided or eliminated, however this device utilizes the aberration of astigmatism. By taking advantage of the astigmatic foci created by obliquely incident radiation falling upon a substantially sphere-like primary, a comparatively large fixed concentrator can be constructed inexpensively. The resulting tangential and sagittal astigmatic foci are linear. The length of the astigmatic foci can be a substantial portion of the diameter of the concentrator, especially at times of lower solar elevation. A toric shaped deformation of the reflective surface reduces the size of the chosen astigmatic focus to yield higher concentration. In the ideal the astigmatic focus is reduced to a point. A receiver located at the reduced astigmatic focus utilizes the concentrated radiation.
摘要:
A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.