Abstract:
Crystal form F of [2S, 4R, 5R, 8R, 9S, 10S, 11R, 12R]-9-[(2,6-dideoxy-3-C-methyl-3-O-methyl-α-L-ribo-hexopyranosyl)oxy]-5-ethyl-4-methoxy-2,4,8,10,12,14-hexamethyl-11-[[3,4,6-trideoxy-3-(isopropylmethylamino)-β-D-xylo-hexopyranosyl]oxy]-6,15-dioxabicyclo[10.2.1]pentadec-14(1)-ene-3,7-dione (E)-2-butenedioic acid salt (2:1) showing strong X-ray diffraction peaks at diffraction angles 2θ=6.6° and 8.5°, Crystal form D anhydrate of said compound showing strong X-ray diffraction peaks at diffraction angles 2θ=7.1°, 13.5° and 14.2°, Crystal form D X-hydrate of said compound showing strong X-ray diffraction peaks at diffraction angles 2θ=7.1° and 14.2° but not showing a strong X-ray diffraction peak at a diffraction angle 2θ=13.5°, Solvate Crystal forms G1, G2 and G3 of said compound characterized by 2-theta angle positions in the powder X-ray diffraction pattern of 5.4°, 10.4°, 10.7° and 12.1°. Crystal form D X-hydrate of said compound has more preferred properties for use as a pharmaceutical material such as higher stability as compared with Crystal form D anhydrate of said compound.
Abstract:
A surface emitting laser includes a lower semiconductor multilayer mirror formed of a plurality of pairs of a high-refractive-index area and a low-refractive-index area; an active layer vertically sandwiched by cladding layers; a current confinement layer of AlzGa1-zAs having an oxide area in a peripheral portion of the current confinement layer, where 0.95≦z≦1; and an upper semiconductor multilayer mirror formed of a plurality of pairs of a high-refractive-index area and a low-refractive-index area. The low-refractive-index area of at least one of the lower semiconductor multilayer mirror and the upper semiconductor multilayer mirror includes an Alz1Ga1-z1As layer with a thickness thinner than that of the current confinement layer, where z≦z1.
Abstract translation:表面发射激光器包括由多对高折射率区域和低折射率区域形成的下半导体多层反射镜; 垂直夹层的有源层; 在电流限制层的外围部分中具有氧化物面积的Al z电流限制层,其中0.95 <= z <= 1; 以及由多对高折射率区域和低折射率区域构成的上半导体多层反射镜。 下半导体多层反射镜和上半导体多层反射镜中的至少一个的低折射率区域包括具有厚度的Al z 1 Ga 1-z 1 As层 薄于当前限制层,其中z <= z1。
Abstract:
A spotting pin contains a probe solution. The spot volume is determined such that the probe solution may not intrude into the neighboring spot area. A spot volume is calculated from a pore ratio of the membrane and the spot volume. The spotting time is determined from the spot volume. An end of the spotting pin is contacted to the spot area of the biochemical analysis unit, and the probe solution is spotted to the membrane which is pressed into the spot area. Then the spotted region becomes extended gradually. When the predetermined spotting time has passed, the spotting pin is upheld. The spot volume of the prove solution becomes uniform, and the mixing of the probe solution is prevented between the neighboring spot areas.
Abstract:
A state of attenuation in total internal reflection is detected by the use of a measuring apparatus having a measuring unit and a reference unit and a measuring system which corrects result of detection by the measuring unit on the basis of result of detection by the reference unit and measures the change of a state of attenuation in total internal reflection on the basis of the corrected result of detection by the measuring unit. The difference in sensitivity between the measuring unit and the reference unit is detected before initiating the measurement of the change of a state of attenuation in total internal reflection, and result of measurement by the measuring system is calibrated on the basis of the difference in sensitivity between the measuring unit and the reference unit.
Abstract:
A photographing system comprising a photographing-method input unit, a temporary exposure time setting unit, and an actual exposure time setting unit. The photographing-method input unit receives input of a photographing method. The temporary exposure time setting unit stores a look-up table in which the kind of photographing method is caused to correspond to a temporary-photographing exposure time that is used to obtain an appropriate actual-photographing exposure time. The temporary exposure time setting unit also obtains the temporary-photographing exposure time in accordance with the kind of input photographing method by making reference to the look-up table and inputs the obtained temporary-photographing exposure time to a camera controller. The actual exposure time setting unit sets an actual-photographing exposure time, based on a temporary-photographing image signal obtained in temporary photographing controlled by the camera controller in accordance with the temporary-photographing exposure time.
Abstract:
A sensor utilizing attenuated total reflection (ATR) is provided with a dielectric block, a thin film layer formed on a surface thereof, a light source for emitting a beam, and an optical system for making the beam enter the dielectric block at various angles of incidence so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer. The sensor is further provided with a photodetection section for detecting the ATR, a differentiation section for differentiating signals output from the light-receiving elements of the photodetection section, in a direction in which the light-receiving elements are juxtaposed, and an adjustment section for optically expanding the width of a dark line, corresponding to the ATR, of the beam which falls on the photodetection section, so that the width of the dark line becomes greater than a pitch between the light-receiving elements.
Abstract:
The thickness of the projector device can be reduced by making the direction of irradiation of a digital micromirror device (DMD) with illuminating light by an illuminating optical system variable depending on whether the projector device is used or not used. As an illuminating optical system is provided rotatably around an optical axis of a projecting optical system, the position of the illuminating optical system can be varied depending on whether the projector device is used or not used, and the overall thickness of the projector device can be thereby reduced.
Abstract:
A blade mechanism includes a driving ring. At least two blades each have a pivot, a driving pin and an opening. The pivot of one blade is placed between the pivot and the driving pin of the other blade. The blades are rotated around the pivots by the driving ring. The opening is formed in the blades so as not to block the rotation of the other blades.
Abstract:
A surface, on which uniform information has been recorded, is two-dimensionally scanned with light beam deflected by a rotating polygon mirror having reflecting surfaces. Light radiated out of the scanned surface is photoelectrically detected, and groups of reference signal components for correcting purposes are thereby obtained, each group corresponding to one reflecting surface. Each time the groups of reference signal components for correcting purposes, which groups correspond to the whole reflecting surfaces, are obtained while the rotating polygon mirror rotates one turn, an averaging process is carried out on these groups of reference signal components for correcting purposes. A group of correction signal components are generated from a group of reference signal components for correcting purposes, which have been obtained from the averaging process. After an image signal is detected from a surface having an image recorded thereon, each group of image signal components of the image signal corresponding to one reflecting surface are corrected with the group of correction signal components. An averaging process is then carried out on the groups of image signal components of the image signal, which correspond to the whole reflecting surfaces and which have thus been corrected.
Abstract:
A process for preparing glycine from glycinonitrile by reacting glycinonitrile with a hydrolase produced by a microorganism, wherein the microorganism is a member of a genus selected from the group consisting of Rhodococcus, Arthrobacter, Caseobacter, Pseudomonas, Enterobacter, Acinetobacter, Alcaliqenes, and Streptomyces. The process involves no by-production, and the microorganism has high hydrolizing activity to convert glycinonitrile to glycine.