Abstract:
In a fingerprint recognition apparatus, a first recognition section is formed on a center portion of a transparent substrate and a second recognition section is formed on the transparent substrate adjacent to the first recognition section. The first recognition section recognizes an image pattern from an object making contact with the transparent substrate to generate a first recognition signal and the second recognition section senses a biological signal so as to check whether or not the first recognition signal is obtained from a human being. Accordingly, the fingerprint recognition apparatus may check that whether or not the object having the image pattern is obtained from a human being, thereby recognizing the image pattern with high accuracy and improving reliability thereof.
Abstract:
A panel assembly includes gate wires, data wires, a plurality of pixel electrodes, a liquid crystal layer, and a common electrode. The gate wires include a plurality of gate lines and a plurality of first storage electrode lines parallel to the gate lines. The data wires include a plurality of data lines crossing and insulated from the gate lines and a plurality of second storage electrode lines overlapping the first storage electrode lines and spaced apart from the data lines. The plurality of pixel electrodes are disposed on and insulated from the data wires. The liquid crystal layer is disposed on the pixel electrodes and includes liquid crystal molecules, and the common electrode is disposed on the liquid crystal layer. One of the plurality of first storage electrode lines and the plurality of second storage electrode lines has varying widths.
Abstract:
Provided are a thin film transistor (TFT) substrate and a method for manufacturing the same. The method comprises forming on a substrate a conductive layer, an impurity-doped silicon layer, and an intermediate layer, wherein the intermediate layer comprises intrinsic silicon; patterning the intermediate layer, the impurity-doped silicon layer, and the conductive layer to form a data line, a source electrode, a drain electrode, ohmic contact portions, and intermediate portions, wherein an ohmic contact portion and an intermediate portion are on the source electrode, and an ohmic contact portion and an intermediate portion are on the drain electrode; forming an intrinsic silicon layer on the substrate; and patterning the intrinsic silicon layer to form a semiconductor layer forming channel portion between the source electrode and the drain electrode, and a contact portion on the intermediate portion.
Abstract:
The present invention provides a thin film transistor array panel comprising a substrate; a gate line containing Ag formed on the substrate at a low temperature to prevent agglomeration, a first gate insulating layer formed on the gate line, a second gate insulating layer formed on the first gate insulating layer, a data line perpendicularly intersecting the gate line, and a thin film transistor connected to the gate line and the data line, and a manufacturing method thereof.
Abstract:
The present invention relates to a process for vapor depositing alow dielectric insulating film, and more particularly to a process for vapor deposition of low dielectric insulating film that can significantly improve a vapor deposition speed while maintaining properties of the low dielectric insulating film, thereby solving parasitic capacitance problems to realize a high aperture ratio structure, and can reduce a process time by using silane gas when vapor depositing an insulating film by a CVD or PECVD method to form a protection film for a semiconductor device.
Abstract:
The present invention relates to a process for vapor depositing a low dielectric insulating film, a thin film transistor using the same, and a preparation method thereof, and more particularly to a process for vapor deposition of lowdielectric insulating film that can significantly improve a vapor deposition speed while maintaining properties of the low dielectric insulating film, thereby solving parasitic capacitance problems to realize a high aperture ratio structure, and can reduce a process time by using silane gas when vapor depositing an insulating film by a CVD or PECVD method to form a protection film for a semiconductor device. The present invention also relates to a thin film transistor using the process and preparation method thereof.
Abstract:
A touch sensitive display device utilizing infrared ray sensing transistors. The transistors are configured, and comprise specified materials, to allow them to be formed with fewer photolithography processes, reducing cost and manufacturing time.
Abstract:
Provided are a photo sensor, a display device including the same, and a driving method thereof. The photo sensor includes: an amplifying element including an input terminal coupled to a scan line for receiving a scan signal, an output terminal configured to output a sensing signal, and a control terminal connected to a first node; a sensing capacitor connected with the first node; a photosensitive sensing element including a control terminal connected with a terminal of a first control signal, an output terminal connected with the first node, and an input terminal; and a reset element connected with the output terminal of the amplifying element and resetting the output terminal of the amplifying element to second voltage according to a reset control signal.
Abstract:
A photosensor includes a sensing switching element, a sensing element, and a reset switching element. The sensing switching element includes an output terminal connected to a sensing signal line, a control terminal connected to a first gate line, and an input terminal connected to the first node. The sensing element includes an output terminal connected to a first node, a control terminal connected a second gate line disposed next to the first gate line, and an input terminal connected to a source voltage line transmitting a source voltage. The sensing element senses light. The reset switching element includes an output terminal connected to the first node, a control terminal connected to the second gate line, and an input terminal connected to a driving voltage line transmitting a driving voltage.
Abstract:
A manufacturing method of a liquid crystal display includes: forming an etch target layer including a conductive material on a first substrate; forming a first mask layer on the etch target layer; forming a block copolymer coating layer including a plurality of polymers on the first mask layer; processing the block copolymer coating layer to form a block copolymer pattern layer including first and second polymer blocks; removing one of the first or second polymer blocks to form a second mask pattern layer; etching the first mask layer by using the second mask pattern layer as an etching mask to form a first mask pattern layer; and etching the etch target layer by using the first mask pattern layer as an etching mask to form a first electrode. The first electrode includes a plurality of the first minute patterns extending in a predetermined direction and having a polarization function.