公开(公告)号：US08179516B2

公开(公告)日：2012-05-15

申请号：US11548551

申请日：2006-10-11

Applicant: Burn Jeng Lin ,  David Lu

Inventor： Burn Jeng Lin ,  David Lu

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70983 ,  G02B1/105 ,  G02B1/111 ,  G02B1/113 ,  G02B1/115 ,  G02B1/14 ,  G02B13/143 ,  G03F7/70341

Abstract: Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.

Abstract translation: 公开了适用于液浸光刻的物镜和制造这种透镜的方法。 在一个示例中，物镜具有多个透镜元件，其中一个透镜元件包括透明基板和一层保护涂层（PC）。 PC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。

公开(公告)号：US07999910B2

公开(公告)日：2011-08-16

申请号：US11115433

申请日：2005-04-27

Applicant: Chia-Jen Chen ,  Hsin-Chang Lee ,  Sheng-Chi Chin ,  Hung Chang Hsieh ,  Burn Jeng Lin

Inventor： Chia-Jen Chen ,  Hsin-Chang Lee ,  Sheng-Chi Chin ,  Hung Chang Hsieh ,  Burn Jeng Lin

IPC: G03B27/32 ,  G03B27/58 ,  G03D5/00

CPC classification number: G03F7/38

Abstract: The present disclosure provides a system and method for manufacturing a mask for semiconductor processing. In one example, the system includes at least one exposure unit configured to select a recipe for a later baking process in a post treatment unit, a buffer unit coupled to the exposure unit and configured to move the mask substrate from the exposure unit to the post treatment unit without exposing the mask substrate to the environment; and the post treatment unit coupled to the buffer unit and the exposure unit and configured to perform a baking process on the mask substrate using baking parameters associated with the recipe selected by the exposure unit.

Abstract translation: 本公开提供了一种用于制造用于半导体处理的掩模的系统和方法。 在一个示例中，系统包括至少一个曝光单元，其被配置为在后处理单元中选择用于稍后烘焙处理的配方，缓冲单元，其耦合到曝光单元并且被配置为将掩模基板从曝光单元移动到柱 处理单元，而不将掩模基板暴露于环境中; 以及所述后处理单元，其耦合到所述缓冲单元和所述曝光单元，并且被配置为使用与由所述曝光单元选择的所述配方相关联的烘焙参数对所述掩模基板进行烘烤处理。

公开(公告)号：USRE42556E1

公开(公告)日：2011-07-19

申请号：US11292383

申请日：2005-12-01

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: G02B7/02

CPC classification number: G02B7/028 ,  G02B7/04 ,  G03F7/70341

Abstract: An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 the fluid filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.

Abstract translation: 一种用于浸没式光刻的装置，其包括具有前表面的成像透镜，用于支撑晶片的含流体的晶片台，所述晶片载台具有被间隔开并与所述成像透镜的前表面并置的待暴露的顶表面;以及 具有约1.0至约2.0的折射率的流体填充在成像透镜的前表面和晶片的顶表面之间形成的间隙。 可以通过使流体流过形成在成像透镜的前表面和晶片的顶表面之间的间隙来进行浸没式光刻的方法。 可以控制流体的流速和温度，同时通过过滤装置将颗粒污染物过滤掉。

公开(公告)号：US20090180087A1

公开(公告)日：2009-07-16

申请号：US12413194

申请日：2009-03-27

Applicant: Burn Jeng Lin ,  Tsai-Sheng Gau ,  Chun-Kuang Chen ,  Ru-Gun Liu ,  Shinn Sheng Yu ,  Jen Chieh Shih

Inventor： Burn Jeng Lin ,  Tsai-Sheng Gau ,  Chun-Kuang Chen ,  Ru-Gun Liu ,  Shinn Sheng Yu ,  Jen Chieh Shih

IPC: G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808

Abstract: Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.

Abstract translation: 公开了用于浸没式光刻系统的各种密封环装置。 利用密封环布置，浸没式光刻系统可以为晶片卡盘上的晶片加工提供更好的密封效果。

公开(公告)号：US20080311314A1

公开(公告)日：2008-12-18

申请号：US11871360

申请日：2007-10-12

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: C23C14/30 ,  B05B5/025

CPC classification number: G03F7/70991 ,  G03F7/70383 ,  G03F7/70508

Abstract: A method and system for simultaneously processing multiple substrates through an imaging beam process is provided. The system includes a plurality of direct write substrate exposure modules configured to receive a writing instruction from a data processing unit. The system and method of the invention utilizes multiple exposure modules receiving writing instructions from a single common data processing unit.

Abstract translation: 提供了一种通过成像束过程同时处理多个基板的方法和系统。 该系统包括被配置为从数据处理单元接收写入指令的多个直接写入基板曝光模块。 本发明的系统和方法利用从单个公共数据处理单元接收写入指令的多个曝光模块。

公开(公告)号：US07356380B2

公开(公告)日：2008-04-08

申请号：US11027412

申请日：2004-12-30

Applicant: Shing-Sheng Yu ,  Chih-Ming Ke ,  Burn Jeng Lin

Inventor： Shing-Sheng Yu ,  Chih-Ming Ke ,  Burn Jeng Lin

IPC: G06F19/00

CPC classification number: G05D23/24 ,  G05D23/1934

Abstract: A methodology for doing process control by using a heating apparatus comprising heating zones is revealed. First, a target CD (critical dimension) map is assigned. A baseline CD map corresponding to a substrate processed with the heating apparatus at a baseline setting is also obtained. An original CD map corresponding to a substrate processed at an original setting is obtained. For each heating zone, a perturbed CD map corresponding to a substrate processed at a perturbed setting is also obtained. The temperature distribution of the heating apparatus is adjusted according to the error CD map defined by the baseline CD map and the target CD map, basis functions defined by the original CD map and perturbed CD maps, and expansion coefficients expanding the error CD map with basis functions.

Abstract translation: 揭示了通过使用包括加热区域的加热装置进行过程控制的方法。 首先，分配目标CD（关键尺寸）图。 还获得了对应于在加热装置处理的基板在基线设置处的基线CD图。 获得与以原始设置处理的基板对应的原始CD图。 对于每个加热区域，也获得对应于在扰动设置处理的基板的扰动的CD图。 根据由基准CD映射和目标CD映射定义的误差CD映射，由原始CD映射和扰动CD映射定义的基函数以及扩展系数扩展错误CD映射的基础来调节加热设备的温度分布 功能。

公开(公告)号：US20060187440A1

公开(公告)日：2006-08-24

申请号：US11412555

申请日：2006-04-27

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: G03B27/62

CPC classification number: G03F1/62 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  G03F7/70991

Abstract: An apparatus for mounting at least one hard pellicle to a mask which includes an enclosure having an interior cavity, demounting means for removing a protective cover from a mask, mounting means for mounting at least one hard pellicle to the mask and conduit means for pumping a light-transmitting gas into the interior cavity between the hard pellicle and the mask.

Abstract translation: 一种用于将至少一个硬膜安装到掩模上的装置，其包括具有内腔的外壳，用于从掩模移除保护盖的拆卸装置，用于将至少一个硬膜安装到所述掩模的安装装置和用于泵送 透光气体进入硬膜和面罩之间的内腔。

公开(公告)号：US5715064A

公开(公告)日：1998-02-03

申请号：US261630

申请日：1994-06-17

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: G03F7/20 ,  H01L21/027 ,  G01B11/00

CPC classification number: G03F9/7011 ,  G03F7/70716 ,  G03F7/70733

Abstract: A multi-station Step and Repeat Apparatus (Stepper) for imaging semiconductor wafers. The stepper has at least 2 stations, at least one of which is for imaging. The second station may be used for image field characterization, or image defect correction, or for Phase Shift Mask (PSM) loop cutting. Multiple laser beams directed in orthogonal directions provide interferometric monitoring to track wafer locations for wafers on the stepper.

Abstract translation: 用于对半导体晶片进行成像的多工位步进和重复装置（步进）。 步进电机至少有2个电台，其中至少有一个用于成像。 第二站可用于图像场表征或图像缺陷校正，或用于相移掩模（PSM）循环切割。 在正交方向上引导的多个激光束提供干涉测量以跟踪步进器上的晶片的晶片位置。

公开(公告)号：US3971887A

公开(公告)日：1976-07-27

申请号：US575908

申请日：1975-05-09

Applicant: Burn Jeng Lin ,  Yeong Show Lin

Inventor： Burn Jeng Lin ,  Yeong Show Lin

IPC: G11C11/14 ,  G02F1/09 ,  G03H1/04 ,  G09F9/30 ,  G09G3/00 ,  G09G3/02 ,  G09G3/34 ,  G11C13/04 ,  G11C13/06 ,  H04N5/66

CPC classification number: G09G3/34 ,  G02F1/09 ,  G11C13/043

Abstract: A dynamic pattern display and optical data processing system is provided including magnetic bubble devices which may be operated in real-time to produce a multi-tone (gray scale) two dimensional pattern. The display pattern is obtained by directing a light beam, which in certain applications may be linearly polarized, through a plurality of two-dimensional magnetic bubble arrays combined in a stack arrangement. Each magnetic bubble array constitutes a layer which differs in thickness from the other magnetic bubble layers. Each magnetic bubble array is also electronically driven by its own bubble propagating circuit which produces, in most embodiments, a different "local transmissivity" which is determined by whether a bubble or an empty space is propagated to the location. The degree of transmitted intensity is an exponential function of the number of magnetic bubble layers, thus n layers provides 2.sup.n steps of transmitted intensity and a four layer structure provides a sixteen tone gray scale display. The electronic portion of the structure may be driven by signals representing mathematical expressions, patterns, manual inputs and the like to generate holograms, holographic complex filters, three-dimensional television pictures, spatial intensity filters, or ordinary two-dimensional multi-tone television pictures.

Abstract translation: 提供动态图案显示和光学数据处理系统，其包括可以实时操作以产生多色调（灰度）二维图案的磁性气泡装置。 显示图案是通过在堆叠布置中组合的多个二维磁性气泡阵列来引导在某些应用中可以是线偏振的光束而获得的。 每个磁气泡阵列构成厚度与其它磁性气泡层不同的层。 每个磁性气泡阵列也由其自身的气泡传播电路进行电子驱动，在大多数实施例中，其产生不同的“局部透射率”，其由气泡或空白空间传播到该位置来确定。 透射强度的程度是磁泡层数量的指数函数，因此n层提供了传输强度的2n个步长，而四层结构提供了十六色灰度显示。 结构的电子部分可以由表示数学表达式，图案，手动输入等的信号驱动，以产生全息图，全息复合滤波器，三维电视图像，空间强度滤波器或普通的二维多色调电视图像 。

公开(公告)号：US08987689B2

公开(公告)日：2015-03-24

申请号：US13484524

申请日：2012-05-31

Applicant: Cheng-Hung Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen ,  Burn Jeng Lin

Inventor： Cheng-Hung Chen ,  Shih-Chi Wang ,  Jeng-Horng Chen ,  Burn Jeng Lin

IPC: A61N5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31761

Abstract: The present disclosure provides a method of increasing the wafer throughput by an electron beam lithography system. The method includes scanning a wafer using the maximum scan slit width (MSSW) of the electron beam writer. By constraining the integrated circuit (IC) field size to allow the MSSW to cover a complete field, the MSSW is applied to decrease the scan lanes of a wafer and thereby increase the throughput. When scanning the wafer with the MSSW, the next scan lane data can be rearranged and loaded into a memory buffer. Thus, once one scan lane is finished, the next scan lane data in the memory buffer is read for scanning.

Abstract translation: 本公开提供了一种通过电子束光刻系统增加晶片通过量的方法。 该方法包括使用电子束写入器的最大扫描狭缝宽度（MSSW）扫描晶片。 通过限制集成电路（IC）场尺寸以允许MSSW覆盖整个场，MSSW被应用于减小晶片的扫描通道，从而增加吞吐量。 当用MSSW扫描晶片时，可以将下一个扫描通道数据重新排列并加载到存储器缓冲器中。 因此，一旦一个扫描通道完成，读取存储器缓冲器中的下一个扫描通道数据进行扫描。