公开(公告)号：US20060103908A1

公开(公告)日：2006-05-18

申请号：US10986076

申请日：2004-11-12

Applicant: Erik Loopstra ,  Stephen Roux

Inventor： Erik Loopstra ,  Stephen Roux

IPC: G02B26/00

CPC classification number: G02B27/0977 ,  G02B7/1827 ,  G02B27/0905 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70291

Abstract: An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

公开(公告)号：US20060087639A1

公开(公告)日：2006-04-27

申请号：US11299787

申请日：2005-12-13

Applicant: Santiago Puerto ,  Erik Loopstra ,  Andrew Massar ,  Duane Kish ,  Abdullah Alikhan ,  Woodrow Olson ,  Jonathan Feroce

Inventor： Santiago Puerto ,  Erik Loopstra ,  Andrew Massar ,  Duane Kish ,  Abdullah Alikhan ,  Woodrow Olson ,  Jonathan Feroce

IPC: G03B27/62

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  G03F9/7011 ,  H01L21/67353 ,  H01L21/67359 ,  Y10S414/135

Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract translation: 使用系统和方法来保护面罩免受空气传播的颗粒污染。 它们包括提供固定在两部分覆盖物中的掩模版。 两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。 盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。 在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

公开(公告)号：US20050179877A1

公开(公告)日：2005-08-18

申请号：US10961369

申请日：2004-10-12

Applicant: Johannes Catharinus Hubertus Mulkens ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Erik Loopstra ,  Bob Streefkerk

Inventor： Johannes Catharinus Hubertus Mulkens ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Erik Loopstra ,  Bob Streefkerk

IPC: G02B3/14 ,  G02B21/33 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70891 ,  G02B3/14 ,  G02B21/33 ,  G03F7/70341

Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.

Abstract translation: 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。

公开(公告)号：US20050175776A1

公开(公告)日：2005-08-11

申请号：US10986178

申请日：2004-11-12

Applicant: Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

Inventor： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Abstract translation: 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20050128445A1

公开(公告)日：2005-06-16

申请号：US10961395

申请日：2004-10-12

Applicant: Christiaan Hoogendam ,  Erik Loopstra ,  Bob Streefkerk ,  Bernard Gellrich ,  Andreas Wurmbrand

Inventor： Christiaan Hoogendam ,  Erik Loopstra ,  Bob Streefkerk ,  Bernard Gellrich ,  Andreas Wurmbrand

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70341

Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

Abstract translation: 将液体供应到光刻设备的投影系统和基板之间的空间。 朝向真空入口的气体流阻止湿气逸出到光刻设备的其它部分。 这可能有助于保护光刻设备的复杂部分免受潮湿气体的损坏。

公开(公告)号：US20050110973A1

公开(公告)日：2005-05-26

申请号：US10719683

申请日：2003-11-24

Applicant: Bob Streefkerk ,  Johannes Baselmans ,  Paul Graupner ,  Jan Haisma ,  Nicodemus Hattu ,  Christiaan Hoogendam ,  Erik Loopstra ,  Johannes Hubertus Mulkens ,  Bernard Gellrich

Inventor： Bob Streefkerk ,  Johannes Baselmans ,  Paul Graupner ,  Jan Haisma ,  Nicodemus Hattu ,  Christiaan Hoogendam ,  Erik Loopstra ,  Johannes Hubertus Mulkens ,  Bernard Gellrich

IPC: G03F7/20 ,  G03B27/58

CPC classification number: G03F7/70341 ,  G03F7/7095

Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

Abstract translation: 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑件由石英制成。

公开(公告)号：US20050099616A1

公开(公告)日：2005-05-12

申请号：US10864805

申请日：2004-06-10

Applicant: Erik Loopstra ,  Robert-Han Schmidt

Inventor： Erik Loopstra ,  Robert-Han Schmidt

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G03B27/62

CPC classification number: G03F7/70766 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/709

Abstract: A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.

Abstract translation: 提出了一种能够在光刻设备中工作的可移动平台系统。 可移动平台系统包括基座，可相对于基座移动的平台，可相对于基座移动的平衡块，其构造成补偿由平台的运动产生的力;以及驱动机构，其构造成移动 平台和平衡质量相对于基座。 所述驱动机构包括至少一个皮带传动装置，其连接所述平台和所述平衡块，使得当所述平台沿着一个方向移动时，所述平衡块沿至少部分相反的方向移动，并且驱动装置构造成机械地接合所述平衡 质量或平台直接驱动平台或平衡块。

公开(公告)号：US20050088638A1

公开(公告)日：2005-04-28

申请号：US10975429

申请日：2004-10-29

Applicant: Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

Inventor： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC: G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

公开(公告)号：US20050088635A1

公开(公告)日：2005-04-28

申请号：US10946344

申请日：2004-09-22

Applicant: Christiaan Hoogendam ,  Erik Theodorus Bijlaart ,  Erik Loopstra ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

Inventor： Christiaan Hoogendam ,  Erik Theodorus Bijlaart ,  Erik Loopstra ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70341

Abstract: A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.

Abstract translation: 公开了一种光刻投影装置，其中至少部分地将液体限制在投影系统和基板之间的空间的液体限制系统通过止动器限制其在装置的光轴方向上的运动。

公开(公告)号：US20050061626A1

公开(公告)日：2005-03-24

申请号：US10855962

申请日：2004-05-28

Applicant: Sven Hol ,  Johan Compter ,  Erik Loopstra ,  Patricia Vreugdewater

Inventor： Sven Hol ,  Johan Compter ,  Erik Loopstra ,  Patricia Vreugdewater

IPC: H01L21/027 ,  H02K7/09 ,  H02K41/025 ,  H02N15/02 ,  H02P25/06 ,  G03F7/20

CPC classification number: H02K7/09 ,  H02K41/025 ,  H02K2201/18 ,  H02N15/02 ,  Y10S414/135

Abstract: A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.

Abstract translation: 一种位移设备，包括可在第一和第二不同方向上相对于彼此移位的第一部分和第二部分。 该设备适用于光刻设备中，用于相对于投影光束定位掩模保持器并且相对于图案化的光束定位晶片衬底台。 第一部分包括第一和第二线圈系统，其中交流电由电源提供。 第二部分包括导电台板，该导电台板设置在向线圈系统供电时引起磁场的区域。 线圈系统和压板相对于彼此布置，使得当电流通过线圈时，在压板中感应的磁场引起压板和线圈在第一和第二不同方向上的位移。