公开(公告)号：US20160128172A1

公开(公告)日：2016-05-05

申请号：US14992506

申请日：2016-01-11

Applicant: GIGAPHOTON INC

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H05G2/00 ,  H01S3/11 ,  H01S3/23 ,  H01S3/223 ,  H01S3/16

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20160066401A1

公开(公告)日：2016-03-03

申请号：US14937332

申请日：2015-11-10

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Takashi SAITO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/2006 ,  G03F7/70033 ,  H05G2/006

Abstract: There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.

Abstract translation: 提供了一种极紫外光发生系统。 所述极紫外光发生系统可以包括：激光装置，被配置为在其内产生EUV光的室内提供脉冲激光; 设置在所述脉冲激光的光路上的光学快门; 以及控制器，其被配置为基于从外部单元提供的生成信号来打开或关闭所述光学快门，所述生成信号指示所述EUV光的产生。

公开(公告)号：US20150380893A1

公开(公告)日：2015-12-31

申请号：US14852120

申请日：2015-09-11

Applicant: Gigaphoton Inc.

Inventor： Takashi MATSUNAGA ,  Takahito KUMAZAKI ,  Keisuke ISHIDA ,  Osamu WAKABAYASHI

IPC: H01S3/137 ,  H01S3/104 ,  H01S3/225

CPC classification number: H01S3/137 ,  H01S3/104 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/139 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser device (100) may include: a laser resonator (20, 30) configured to output pulsed laser light (L); an actuator (35, 36, 37) configured to change wavelength of the pulsed laser light; and a controller (110) configured to receive data of target wavelength for a plurality of pulses of the pulsed laser light before the pulsed laser light is output, and to control the actuator, based on the data of the target wavelength for the plurality of pulses, such that the wavelength of the pulsed laser light approaches the data of the target wavelength.

Abstract translation: 激光装置（100）可以包括：激光谐振器（20,30），被配置为输出脉冲激光（L）; 被配置为改变脉冲激光的波长的致动器（35,36,37）; 以及控制器（110），被配置为在脉冲激光输出之前接收脉冲激光的多个脉冲的目标波长的数据，并且基于多个脉冲的目标波长的数据来控制致动器 使得脉冲激光的波长接近目标波长的数据。

公开(公告)号：US20150264792A1

公开(公告)日：2015-09-17

申请号：US14724636

申请日：2015-05-28

Applicant: GIGAPHOTON INC.

Inventor： Toru SUZUKI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G02B27/14 ,  H01S3/00

CPC classification number: H05G2/008 ,  G02B17/0892 ,  G02B27/0068 ,  G02B27/108 ,  G02B27/141 ,  H01S3/005 ,  H01S3/2391 ,  H05G2/003

Abstract: A laser beam controlling device may include: a guide laser device; a guide laser beam wavefront adjuster provided in a beam path of the guide laser beam outputted from the guide laser device; a beam combiner configured to adjust travel directions of a laser beam outputted from a laser system and the guide laser beam outputted from the guide laser beam wavefront adjuster to coincide with each other, a both beam wavefront adjuster provided in a beam path of both the laser beam and the guide laser beam outputted from the beam combiner, a beam monitor provided in a beam path of both the laser beam and the guide laser beam outputted from the both beam wavefront adjuster, and a controller configured to control the guide laser beam wavefront adjuster and the both beam wavefront adjuster based on detection results at the beam monitor with respect to both the laser beam and the guide laser beam.

Abstract translation: 激光束控制装置可以包括：导向激光装置; 引导激光束波前调整器，设置在从引导激光装置输出的引导激光束的光束路径中; 配置为调整从激光系统输出的激光束的行进方向和从引导激光束波前调整器输出的引导激光束彼此重合的光束组合器，设置在两个激光束的光束路径中的两个光束波前调整器 从束组合器输出的光束和引导激光束，设置在从两光束波前调整器输出的激光束和引导激光束的光束路径中的光束监视器，以及控制器，被配置为控制引导激光束波前调整器 以及基于在激光束和引导激光束两者的光束监视器处的检测结果的两个光束波前调整器。

公开(公告)号：US20150102239A1

公开(公告)日：2015-04-16

申请号：US14578141

申请日：2014-12-19

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya YANAGIDA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005

Abstract: The extreme ultraviolet light generation system may be configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light. The system may include a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam; a target supply device configured to supply the target to a predetermined region in the chamber; a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is to be irradiated, the first pulse laser beam having pulse duration less than 1 ns; and a second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is to be further irradiated.

Abstract translation: 远紫外线发生系统可以被配置为用第一脉冲激光束和第二脉冲激光束照射目标物，以将靶转化成等离子体，从而产生极紫外光。 该系统可以包括具有配置成引入第一脉冲激光束和第二脉冲激光束的至少一个孔的腔室; 目标供给装置，被配置为将所述目标物供给到所述室中的预定区域; 第一激光装置，被配置为输出要照射所述室中的靶的所述第一脉冲激光束，所述脉冲持续时间小于1ns的所述第一脉冲激光束; 以及第二激光装置，被配置为输出要被进一步照射已经被第一脉冲激光束照射的靶的第二脉冲激光束。

公开(公告)号：US20150083939A1

公开(公告)日：2015-03-26

申请号：US14555963

申请日：2014-11-28

Applicant: GIGAPHOTON INC.

Inventor： Yoshifumi UENO ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/005

Abstract: An extreme ultraviolet light generation device may be configured to generate extreme ultraviolet light by irradiating a target with a laser beam to turn the target into plasma. The extreme ultraviolet light generation device may comprise: a chamber provided with at least one through-hole; an optical system configured to introduce the laser beam into a predetermined region in the chamber through the at least one through-hole; and a target supply device configured to supply a powder target as the target to the predetermined region.

Abstract translation: 极紫外线发生装置可以被配置为通过用激光束照射目标物将靶转化成等离子体而产生极紫外光。 所述极紫外光发生装置可以包括：设置有至少一个通孔的室; 光学系统，被配置为通过所述至少一个通孔将所述激光束引入所述腔室中的预定区域; 以及目标供给装置，被配置为将粉末靶作为目标供给到所述预定区域。

公开(公告)号：US20140105238A1

公开(公告)日：2014-04-17

申请号：US14049383

申请日：2013-10-09

Applicant: Gigaphoton Inc.

Inventor： Akihiko KUROSU ,  Junichi FUJIMOTO ,  Yosuke ISHIZUKA ,  Takashi MATSUNAGA ,  Osamu WAKABAYASHI

IPC: H01S3/036 ,  H01S3/041

CPC classification number: H01S3/036 ,  F16C32/047 ,  H01S3/02 ,  H01S3/041 ,  H01S3/223 ,  H01S3/2232 ,  H01S3/2258

Abstract: A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.

Abstract translation: 放电泵浦气体激光装置可以包括激光室，设置在激光室中的一对放电电极，具有磁性轴承的风扇设置在激光室中并且能够使激光室中的气体循环， 被配置为容纳激光室的壳体，以及与磁性轴承电连接的磁性轴承控制器，其能够控制磁性轴承，并且与激光室分开设置在壳体中。

公开(公告)号：US20130146682A1

公开(公告)日：2013-06-13

申请号：US13655320

申请日：2012-10-18

Applicant: GIGAPHOTON INC.

Inventor： Takanobu ISHIHARA ,  Osamu WAKABAYASHI ,  Toshiyuki HIRASHITA

IPC: B05B1/14

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device may include a reservoir configured to store a target material, the reservoir having a first channel through which the target material passes, a nozzle plate having a second channel through which the target material passes after passing through the first channel, and a filter having a first surface and a second surface and provided between the reservoir and the nozzle plate such that the first surface and the reservoir are face-sealed and the second surface and the nozzle plate are face-sealed, the filter having a plurality of through-holes through which the target material passes.

Abstract translation: 目标供应装置可以包括被配置为存储目标材料的储存器，储存器具有目标材料通过的第一通道，具有目标材料在通过第一通道之后通过的第二通道的喷嘴板，以及 过滤器具有第一表面和第二表面，并且设置在储存器和喷嘴板之间，使得第一表面和储存器被面密封，并且第二表面和喷嘴板被面密封，过滤器具有多个通孔 目标材料通过的孔。

公开(公告)号：US20240429679A1

公开(公告)日：2024-12-26

申请号：US18827321

申请日：2024-09-06

Applicant: Gigaphoton Inc.

Inventor： Seiji NOGIWA ,  Osamu WAKABAYASHI

IPC: H01S5/0625 ,  H01S5/00 ,  H01S5/06 ,  H01S5/125

Abstract: A laser apparatus includes a first wavelength variable semiconductor laser that outputs first continuous-wave laser light; a first amplifier that pulses and amplifies the first laser light and outputs first pulse laser light; a wavelength conversion system that converts a wavelength of the first pulse laser light and outputs second pulse laser light; an excimer amplifier that amplifies the second pulse laser light and outputs third pulse laser light; a monitor module that measures a wavelength of the third pulse laser light; and a processor that periodically changes a target wavelength of the third pulse laser light and controls a current for changing the wavelength of the laser light from the first semiconductor laser such that the wavelength of the third pulse laser light becomes the target wavelength based on a measured value of the wavelength of the third pulse laser light output at the same target wavelength.

公开(公告)号：US20230187286A1

公开(公告)日：2023-06-15

申请号：US18165288

申请日：2023-02-06

Applicant: Gigaphoton Inc.

Inventor： Toshihiro OGA ,  Koichi FUJII ,  Osamu WAKABAYASHI

IPC: H01L21/66 ,  H01L21/268

CPC classification number: H01L22/12 ,  H01L21/268

Abstract: An electronic device manufacturing method according to an aspect of the present disclosure includes determining magnification in a scanning width direction based on a pattern formed in a scanning field of a wafer; measuring a wafer height at points in the scanning field and determining an average value of the wafer height in the scanning width direction; determining a wavelength range of a pulse laser beam in which an allowable CD value is obtained in a case of a focus position based on the average value of the wafer height; determining a first wavelength of the pulse laser beam at which the determined magnification is obtained and determining a target wavelength based on the wavelength range and the first wavelength; outputting a pulse laser beam controlled to have the target wavelength for each pulse; and performing exposure of the scanning field of the wafer to the pulse laser beam.