公开(公告)号：US08312738B2

公开(公告)日：2012-11-20

申请号：US12518866

申请日：2007-11-20

申请人： Vikram Singh ,  Edward J. Grave ,  Paul Scott Northrop ,  Narasimhan Sundaram

发明人： Vikram Singh ,  Edward J. Grave ,  Paul Scott Northrop ,  Narasimhan Sundaram

IPC分类号： F25J3/00

CPC分类号： B01D3/166 ,  B01D3/14 ,  B01D3/141 ,  F25J3/0209 ,  F25J3/0233 ,  F25J3/0238 ,  F25J3/0266 ,  F25J2200/02 ,  F25J2200/50 ,  F25J2200/74 ,  F25J2200/96 ,  F25J2205/20 ,  F25J2205/40 ,  F25J2205/60 ,  F25J2205/80 ,  F25J2220/66 ,  F25J2240/40 ,  F25J2270/12 ,  F25J2280/40 ,  Y02C10/12

摘要： The present invention relates to methods and apparatuses for the operation of a distillation tower containing a controlled freezing zone and at least one distillation section. The process and tower design are utilized for the additional recovery of hydrocarbons from an acid gas. In this process, a separation process is utilized in which a multi-component feedstream is introduced into an apparatus that operates under solids forming conditions for at least one of the feedstream components. The freezable component, although typically CO2, H2S, or another acid gas, can be any component that has the potential for forming solids in the separation system. A dividing wall is added to at least a portion of the lower distillation section of the apparatus to effect the separation of at least some fraction of the hydrocarbons in that portion of the tower.

摘要翻译： 本发明涉及用于操作含有受控冷冻区和至少一个蒸馏段的蒸馏塔的方法和设备。 工艺和塔架设计用于从酸性气体中再次回收碳氢化合物。 在该方法中，使用分离方法，其中将多组分进料流引入到在至少一种进料流组分的固体形成条件下操作的装置中。 可冷冻组分虽然通常为CO 2，H 2 S或另一种酸性气体，但可以是在分离系统中具有形成固体的潜力的任何组分。 将分隔壁加入到装置的低级蒸馏段的至少一部分中以在塔的该部分中分离至少一部分烃。

公开(公告)号：US20090129777A1

公开(公告)日：2009-05-21

申请号：US11942225

申请日：2007-11-19

申请人： Vikram Singh

发明人： Vikram Singh

IPC分类号： H04B10/20

CPC分类号： H04L43/0852

摘要： The present invention provides distance-proof N-pass Auto Negotiation systems and methods for Gigabit Ethernet. The present invention distance proofs Auto Negotiation. No matter the distance between two nodes configured according to the systems and methods of the present invention, the link at either end of the two nodes will only come up once each end has negotiated, resolved its link partner's capabilities, and received a similar success signal from the remote node.

摘要翻译： 本发明提供了用于千兆以太网的距离保护N-pass自动协商系统和方法。 本发明距离证明自动谈判。 无论根据本发明的系统和方法配置的两个节点之间的距离，两个节点的任一端的链路只有在每个端点协商后才会出现，解决了其链路伙伴的能力，并且接收到类似的成功信号 从远程节点。

公开(公告)号：US20090104719A1

公开(公告)日：2009-04-23

申请号：US11877312

申请日：2007-10-23

申请人： Atul Gupta ,  Timothy Miller ,  Harold M. Persing ,  Daniel Distaso ,  Vikram Singh

发明人： Atul Gupta ,  Timothy Miller ,  Harold M. Persing ,  Daniel Distaso ,  Vikram Singh

IPC分类号： H01L21/66

CPC分类号： H01L22/20 ,  H01L22/12

摘要： A method of in-situ monitoring of a plasma doping process includes generating a plasma comprising dopant ions in a chamber proximate to a platen supporting a substrate. A platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. A dose of ions attracted to the substrate is measured. At least one sensor measurement is performed to determine the condition of the plasma chamber. In addition, at least one plasma process parameter is modified in response to the measured dose and in response to the at least one sensor measurement.

摘要翻译： 等离子体掺杂过程的原位监测方法包括在靠近支撑衬底的压板的腔室中产生包含掺杂剂离子的等离子体。 压板被具有负电位的偏压电压波形偏置，其将等离子体中的离子吸引到用于等离子体掺杂的衬底。 测量吸附到基底的一定剂量的离子。 执行至少一个传感器测量以确定等离子体室的状态。 此外，至少一个等离子体处理参数响应于测量的剂量并且响应于至少一个传感器测量而被修改。

公开(公告)号：US20060289799A1

公开(公告)日：2006-12-28

申请号：US11376522

申请日：2006-03-15

申请人： Ziwei Fang ,  Richard Appel ,  Vincent Deno ,  Vikram Singh ,  Harold Persing

发明人： Ziwei Fang ,  Richard Appel ,  Vincent Deno ,  Vikram Singh ,  Harold Persing

IPC分类号： H01J37/08

CPC分类号： H01J37/32412 ,  H01J37/3171 ,  H01J37/3299 ,  H01J2237/31705

摘要： A method and apparatus are directed to providing a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that shallow and abrupt junctions in vertical and lateral directions are realized that are critical to device scaling in plasma doping systems.

公开(公告)号：US20050287307A1

公开(公告)日：2005-12-29

申请号：US10874944

申请日：2004-06-23

申请人： Vikram Singh ,  Harold Persing ,  Timothy Miller ,  Atul Gupta ,  Ziwei Fang

发明人： Vikram Singh ,  Harold Persing ,  Timothy Miller ,  Atul Gupta ,  Ziwei Fang

IPC分类号： C03C15/00 ,  C23C14/00 ,  H01L21/223

CPC分类号： H01L21/2236 ,  H01J37/32412

摘要： A method for ion implantation of a substrate includes forming a plasma from at least one implant material comprising at least one implant species, implanting the at least one implant species into a surface of the substrate, and directing at least one surface-modifying species at the surface to reduce a surface damage associated with the plasma. An apparatus for ion implantation is configured to implement this method.

摘要翻译： 用于离子植入衬底的方法包括从至少一种植入材料形成等离子体，所述至少一种植入材料包括至少一种植入物种，将所述至少一种植入物种植入所述基质的表面，以及将所述至少一种表面改性物质 表面以减少与等离子体相关的表面损伤。 用于离子注入的装置被配置为实现该方法。

公开(公告)号：US20050205211A1

公开(公告)日：2005-09-22

申请号：US10805966

申请日：2004-03-22

申请人： Vikram Singh ,  Timothy Miller ,  Paul Murphy ,  Harold Persing ,  Jay Scheuer ,  Donna Smatlak ,  Edmund Winder ,  Robert Bettencourt

发明人： Vikram Singh ,  Timothy Miller ,  Paul Murphy ,  Harold Persing ,  Jay Scheuer ,  Donna Smatlak ,  Edmund Winder ,  Robert Bettencourt

IPC分类号： H01J37/32 ,  C23F1/00

CPC分类号： H01J37/32412

摘要： A plasma immersion ion implant apparatus and method, and a plasma chamber, each configured to provide a uniform ion flux and to dissipate the effects of secondary electrons are disclosed. The invention includes a plasma chamber including a dielectric tophat configuration and a conductive top section that may be liquid cooled. In addition, the invention provides a radio frequency (RF) antenna configuration including an active antenna that is coupled to an RF source and a parasitic antenna that is not directly coupled to any RF source, but may be grounded. The RF antenna allows for tuning of the RF coupling.

摘要翻译： 公开了一种等离子体浸没离子注入装置和方法以及等离子体室，每个等离子体室被配置成提供均匀的离子通量并消散二次电子的作用。 本发明包括一个等离子体室，该等离子体室包括一个电介质构造和一个可以被液体冷却的导电顶部。 此外，本发明提供了一种射频（RF）天线配置，其包括耦合到RF源的有源天线和不直接耦合到任何RF源但可以接地的寄生天线。 RF天线允许调谐RF耦合。

公开(公告)号：US06596654B1

公开(公告)日：2003-07-22

申请号：US09996619

申请日：2001-11-28

申请人： Atiye Bayman ,  Md Sazzadur Rahman ,  Weijie Zhang ,  Bart van Schravendijk ,  Vishal Gauri ,  George D. Papasoulitotis ,  Vikram Singh

发明人： Atiye Bayman ,  Md Sazzadur Rahman ,  Weijie Zhang ,  Bart van Schravendijk ,  Vishal Gauri ,  George D. Papasoulitotis ,  Vikram Singh

IPC分类号： H01L2131

CPC分类号： H01L21/02129 ,  C23C16/045 ,  C23C16/402 ,  H01J2237/3327 ,  H01L21/02131 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/3144 ,  H01L21/3145 ,  H01L21/31608 ,  H01L21/31625 ,  H01L21/31629 ,  H01L21/76224

摘要： Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.

摘要翻译： 使用化学气相沉积方法来填充高纵横比（通常至少3:1），窄宽度（通常为1.5微米或更小甚至0.15微米以下）间隙，空隙或弱点的发生率显着降低。 该沉积工艺涉及在含等离子体CVD反应器的反应混合物中使用氢作为工艺气体。 工艺气体还包括电介质形成前体分子，例如硅和含氧分子。

公开(公告)号：US09266035B2

公开(公告)日：2016-02-23

申请号：US13950870

申请日：2013-07-25

申请人： Vikram Singh ,  Brian D. Albert ,  Berne K. Stober

发明人： Vikram Singh ,  Brian D. Albert ,  Berne K. Stober

IPC分类号： B01D3/00 ,  B01D3/06 ,  B01J4/00 ,  B01F3/04 ,  B01D3/30

CPC分类号： B01D3/008 ,  B01D3/06 ,  B01D3/30 ,  B01F3/04 ,  B01J4/00

摘要： A feed device for a distillation tower has an annular, open-bottomed channel located around the periphery of the feed zone of the tower with an inner wall spaced from the inner curved wall of the tower and a top covering the channel to confer a generally inverted-U shape to the cross section of the channel. One or more tangential feed inlets are provided to admit a heated, mixed phase feed to the tower and direct the feed into and along the channel. One or more vapor scoops are provided for each feed inlet with the scoop(s) located on the inner wall of the channel at a sufficient distance along the channel from the inlet to permit cyclonic separation of vapor and liquid before the vapor in the feed from the inlet enters the scoop(s) and passes through a vapor exit port into the central core of the tower.

摘要翻译： 用于蒸馏塔的进料装置具有环形的开口底部通道，其围绕塔的进料区的周边设置有内壁，该内壁与塔的内弯曲壁间隔开，顶部覆盖通道以赋予通常倒置的 -U形状到通道的横截面。 提供一个或多个切向进料入口以允许加热的混合相进料到塔中并将进料引导入和沿通道。 为每个进料入口提供一个或多个蒸气勺，其中勺位于通道的内壁上，距离入口的通道足够的距离处，以允许蒸气和液体在进料中的蒸汽之前气旋分离， 入口进入勺子并通过蒸汽出口进入塔的中心核心。

公开(公告)号：US20150128543A1

公开(公告)日：2015-05-14

申请号：US14323231

申请日：2014-07-03

申请人： Robert Piszczek ,  Todd P. Marut ,  Brian D. Albert ,  Vikram Singh ,  Simon Y. Yeung

发明人： Robert Piszczek ,  Todd P. Marut ,  Brian D. Albert ,  Vikram Singh ,  Simon Y. Yeung

IPC分类号： B01D45/08

CPC分类号： B01D45/08 ,  B01D45/04 ,  B01D45/16 ,  B01D50/002 ,  F01M13/04 ,  F01M2013/0433

摘要： Vane type mist eliminator segments are arranged in a plurality of tiers at separate vertically spaced locations in a tower, typically of the upright, cylindrical type, with the eliminator at each tier covering only a portion of the cross section of the tower. The eliminator segment(s) in each tier are laterally displaced in the tower from the adjacent vertically spaced eliminator segments to form a staggered configuration for the segments. Each mist eliminator preferably extends over 50-70% of the cross-sectional area of the tower to leave an open flow passage in the tier; the staggering of the segments and the associated flow passages defines an upward tortuous or zig-zag open flow path for vapors ascending the tower through the open flow passages when the eliminator segment(s) become fouled in use.

摘要翻译： 叶片式除雾器段在塔中的分开的垂直间隔的位置处布置成多个层，通常为直立的圆柱形，每层的消除器仅覆盖塔的横截面的一部分。 每个层中的消除器段在塔中从相邻的垂直间隔的消除器段横向移位，以形成用于段的交错构造。 每个除雾器优选地延伸超过塔的横截面面积的50-70％以在层中留下开放的流动通道; 段和相关联的流动通道的交错限定了当消除器段在使用中被弄脏时，向上弯曲或向上弯曲的开口流动路径，用于通过开放流动通道升高塔的蒸气。

公开(公告)号：US20150074527A1

公开(公告)日：2015-03-12

申请号：US14023075

申请日：2013-09-10

申请人： Jonathan Christopher Sevigny ,  Vikram Singh ,  Anthony John Marino ,  Trevor Lai

发明人： Jonathan Christopher Sevigny ,  Vikram Singh ,  Anthony John Marino ,  Trevor Lai

IPC分类号： G06F3/16 ,  G06F3/0481 ,  G06F3/0484

CPC分类号： G06F3/165 ,  G06F3/04817 ,  G06F3/04842 ,  G11B19/025 ,  G11B19/027

摘要： A remote control device is provided for controlling an audio playback device. The remote control device includes an input region that is operable to select from a plurality of entities for providing audio content to the audio playback device, and a display for displaying information associated with the entities for providing audio content. The remote control device is configured to request image files from the audio playback device for display on the display. The image files correspond to the entities for providing audio content.

摘要翻译： 提供了用于控制音频回放装置的遥控装置。 遥控装置包括可操作以从多个实体中选择用于向音频回放装置提供音频内容的输入区域，以及用于显示与用于提供音频内容的实体相关联的信息的显示器。 遥控装置被配置为从音频播放装置请求图像文件以在显示器上显示。 图像文件对应于用于提供音频内容的实体。