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108 条记录 (耗时 0.046 秒)

    ENHANCED DENSIFICATION OF SILICON OXIDE LAYERS
    62.
    发明申请
    ENHANCED DENSIFICATION OF SILICON OXIDE LAYERS 有权
    氧化硅层的增强渗透

    公开(公告)号：US20120009413A1

    公开(公告)日：2012-01-12

    申请号：US13178057

    申请日：2011-07-07

    申请人： Marlon Menezes ,  Frank Y. Xu ,  Fen Wan

    发明人： Marlon Menezes ,  Frank Y. Xu ,  Fen Wan

    IPC分类号： B32B3/26 ,  B28B3/00 ,  B05D3/00 ,  B05D3/12 ,  H01L21/312 ,  B05D5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/3105 ,  Y10T428/249953

    摘要： Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer.

    摘要翻译： 致密化多层基板包括在基板的表面上提供具有第一介电层的基板。 第一介电层包括多个孔。 将水引入第一介电层的孔中以形成含水介电层。 在含水的第一介电层的表面上设置有第二介质层。 第一和第二电介质层在600℃或更低的温度下退火。 在一个实例中，多层衬底是纳米压印光刻模板。 第二电介质层可以具有与热氧化物类似的密度，因此蚀刻速率可能仍然足够多孔以允许氦比热氧化物层更快速地扩散。

    Micro-Conformal Templates for Nanoimprint Lithography
    63.
    发明申请
    Micro-Conformal Templates for Nanoimprint Lithography 有权
    纳米压印光刻的微型保形模板

    公开(公告)号：US20110183027A1

    公开(公告)日：2011-07-28

    申请号：US13014354

    申请日：2011-01-26

    申请人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    发明人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    IPC分类号： B28B11/08 ,  B29C33/38

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

    摘要翻译： 微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。 背衬层的弹性模量超过纳米图案层的弹性模量。 微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离 由纳米压印光刻模板形成的层小于缺陷的高度。 纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

    Composition for an Etching Mask Comprising a Silicon-Containing Material
    64.
    发明申请
    Composition for an Etching Mask Comprising a Silicon-Containing Material 审中-公开
    用于包含含硅材料的蚀刻掩模的组合物

    公开(公告)号：US20110140306A1

    公开(公告)日：2011-06-16

    申请号：US13029805

    申请日：2011-02-17

    申请人： Frank Y. Xu ,  Michael N. Miller ,  Michael P.C. Watts

    发明人： Frank Y. Xu ,  Michael N. Miller ,  Michael P.C. Watts

    IPC分类号： B29C59/02 ,  C08L83/06 ,  C08K5/101 ,  C08K5/06 ,  C08K5/05 ,  C08K5/103 ,  C08K5/07

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

    摘要翻译： 本发明包括用作下层的蚀刻掩模的含硅材料用组合物。 更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。 为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。 该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模 通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。

    Composition to Reduce Adhesion Between a Conformable Region and a Mold
    67.
    发明申请
    Composition to Reduce Adhesion Between a Conformable Region and a Mold 有权
    降低适形区域和模具之间粘合性的成分

    公开(公告)号：US20090272875A1

    公开(公告)日：2009-11-05

    申请号：US12404024

    申请日：2009-03-13

    申请人： Frank Y. Xu ,  Michael N. Miller

    发明人： Frank Y. Xu ,  Michael N. Miller

    IPC分类号： B28B7/36

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.

    摘要翻译： 压印光刻模具组件包括具有表面的模具，具有表面的基底和设置在模具表面和基底表面之间的可聚合组合物。 可聚合组合物包括本体材料和具有第一端和第二端的非离子表面活性剂。 非离子表面活性剂的第一端对本体材料具有亲和性，非离子表面活性剂的第二端被氟化。

    Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces
    69.
    发明申请
    Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces 审中-公开
    提供相邻表面的优先粘附和释放的方法和组合

    公开(公告)号：US20080110557A1

    公开(公告)日：2008-05-15

    申请号：US11560266

    申请日：2006-11-15

    申请人： Frank Y. Xu

    发明人： Frank Y. Xu

    IPC分类号： B32B38/10 ,  B32B37/12 ,  C09J4/02

    CPC分类号： B32B38/06 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention provides a method and composition for providing preferential adhesion and release of adjacent surfaces, that features solidifying a composition to form a solidified layer having first and second opposed sides, with the first side facing a first surface and being adhered thereto with a first adhesive forces and the second side facing the second surface and being adhered thereto with a second adhesive force, with the first and second adhesive forces establishing a predetermined preferential adhesion ratio. Generally, the first surface is covalently bonded to the first side and adhesion between the second side and the second surface occurs through Van der Waal forces. It has been found that the use of a fluorine group for enhancing the release properties (as a priori fluorinated release layer or a fluorinated release agent) is no longer needed for such method and composition. In one embodiment, the composition can be formed from an isobornyl acrylate component; an aliphatic urethane acrylate component; a 1,6-hexanediol diacrylate component; and a 2-hydroxy-2-methyl-1-phenyl-propan-1-one component. The first surface can be formed by polymerizing a compound formed from a multi-functional component that contains functional groups facilitating the formation of covalent bonds with the above mentioned polymerizable composition during an imprinting process, a cross-linking agent component, a catalyst component, and a solvent component. The second surface is usually a patterned or smoothed portion of a quartz mold.

    摘要翻译： 本发明提供了一种用于提供相邻表面的优先粘合和释放的方法和组合物，其特征在于固化组合物以形成具有第一和第二相对侧的固化层，其中第一侧面向第一表面并且用第一 粘合力并且第二面朝向第二表面并且以第二粘合力粘附到其上，第一和第二粘合力确定预定的优先粘合比。 通常，第一表面共价结合到第一侧，并且通过范德华力产生第二侧和第二表面之间的粘合。 已经发现，对于这种方法和组成，不再需要使用用于提高剥离性能的氟基（作为先验氟化脱模层或氟化脱模剂）。 在一个实施方案中，组合物可由丙烯酸异冰片酯组分形成; 脂肪族聚氨酯丙烯酸酯组分; 1,6-己二醇二丙烯酸酯组分; 和2-羟基-2-甲基-1-苯基 - 丙-1-酮组分。 第一表面可以通过聚合由多功能组分形成的化合物形成，所述多官能组分含有促进在压印过程中与上述可聚合组合物共价键形成的官能团，交联剂组分，催化剂组分和 溶剂组分。 第二表面通常是石英模具的图案化或平滑化部分。