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    Micro-Conformal Templates for Nanoimprint Lithography
    2.
    发明申请
    Micro-Conformal Templates for Nanoimprint Lithography 有权
    纳米压印光刻的微型保形模板

    公开(公告)号：US20110183027A1

    公开(公告)日：2011-07-28

    申请号：US13014354

    申请日：2011-01-26

    申请人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    发明人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    IPC分类号： B28B11/08 ,  B29C33/38

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

    摘要翻译： 微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。 背衬层的弹性模量超过纳米图案层的弹性模量。 微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离 由纳米压印光刻模板形成的层小于缺陷的高度。 纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

    Composition for an Etching Mask Comprising a Silicon-Containing Material
    3.
    发明申请
    Composition for an Etching Mask Comprising a Silicon-Containing Material 审中-公开
    用于包含含硅材料的蚀刻掩模的组合物

    公开(公告)号：US20110140306A1

    公开(公告)日：2011-06-16

    申请号：US13029805

    申请日：2011-02-17

    申请人： Frank Y. Xu ,  Michael N. Miller ,  Michael P.C. Watts

    发明人： Frank Y. Xu ,  Michael N. Miller ,  Michael P.C. Watts

    IPC分类号： B29C59/02 ,  C08L83/06 ,  C08K5/101 ,  C08K5/06 ,  C08K5/05 ,  C08K5/103 ,  C08K5/07

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

    摘要翻译： 本发明包括用作下层的蚀刻掩模的含硅材料用组合物。 更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。 为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。 该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模 通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。

    Composition to Reduce Adhesion Between a Conformable Region and a Mold
    4.
    发明申请
    Composition to Reduce Adhesion Between a Conformable Region and a Mold 有权
    降低适形区域和模具之间粘合性的成分

    公开(公告)号：US20090272875A1

    公开(公告)日：2009-11-05

    申请号：US12404024

    申请日：2009-03-13

    申请人： Frank Y. Xu ,  Michael N. Miller

    发明人： Frank Y. Xu ,  Michael N. Miller

    IPC分类号： B28B7/36

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.

    摘要翻译： 压印光刻模具组件包括具有表面的模具，具有表面的基底和设置在模具表面和基底表面之间的可聚合组合物。 可聚合组合物包括本体材料和具有第一端和第二端的非离子表面活性剂。 非离子表面活性剂的第一端对本体材料具有亲和性，非离子表面活性剂的第二端被氟化。

    SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY
    8.
    发明申请
    SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY 审中-公开
    太阳能电池制造NANOIMPRINT LITHOGRAPHY

    公开(公告)号：US20110180127A1

    公开(公告)日：2011-07-28

    申请号：US13016006

    申请日：2011-01-28

    申请人： Fen Wan ,  Shuqiang Yang ,  Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Michael N. Miller ,  Darren D. Donaldson

    发明人： Fen Wan ,  Shuqiang Yang ,  Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Michael N. Miller ,  Darren D. Donaldson

    IPC分类号： H01L31/02 ,  H01L31/0232

    CPC分类号： H01L51/4213 ,  B82Y10/00 ,  H01L51/0017 ,  H01L51/0037 ,  H01L51/0047 ,  H01L51/442 ,  H01L51/447 ,  Y02E10/549

    摘要： Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.

    摘要翻译： 制造太阳能电池堆包括在硅晶片的第一表面上形成纳米图案的聚合物层并蚀刻硅晶片的第一表面以将纳米图案化的聚合物层的图案转移到硅晶片的第一表面。 在硅晶片的第二表面上形成反射电极材料层。 硅晶片的纳米图案化的第一表面经历缓冲氧化物蚀刻。 在缓冲氧化物蚀刻之后，处理硅晶片的纳米图案化的第一表面以降低纳米图案化的第一表面上的水的接触角。 电子给体材料沉积在硅晶片的纳米图案化的第一表面上以形成电子供体层，并且在电子给体层上沉积透明电极材料，以在电子给体层上形成透明电极层。