摘要:
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要:
An oral cavity cleaning tool for the purpose of sterilization of the inside of oral cavity is provided that carries out efficient sterilization by using effective chlorine that is obtained through electrolysis. The oral cavity cleaning tool comprises a block handle, a head section extending from the block handle, a pair of electrodes provided on the head section and a power source that supplies electric current to the pair of electrodes, wherein the electrodes are put into contact with an oral fluid that contains chloride ions thereby to cause electric current to flow between the electrodes, so that the chloride ions are transformed into effective chlorine.
摘要:
A method of machining a cathode used in an electron gun. The method includes steps of placing an object to be machined, which is a material of the cathode, and a machining electrode in an electrically insulating oil; applying a discharge current to the machining electrode; and machining the object to be machined to have a shape corresponding to the shape of the machining electrode by means of electric discharge machining of the machining electrode. The machining electrode includes a disk, recesses formed on a front surface of the disk, a protrusion provided on a back surface of the disk, and a hole for mounting a lead wire for applying discharge current to the machining electrode. Bumps corresponding to the shape of the recesses of the machining electrode are formed on the object to be machined by means of the electric discharge machining.
摘要:
A personal computer connected to a USB port of a printer through a management table managing writing on an ordinary storage region in FLASH ROM recognizes the ordinary storage region in the FLASH ROM of the printer as a removable drive which is a USB mass storage class device. Accordingly, an execution file of an application program stored in a portion of the ordinary storage region in the FLASH ROM can be read with a usual access from the personal computer, enabling the application program to be executed without being installed. When the application program is executed on the personal computer, periodic accesses are made to the ordinary storage region of the printer, and when an access fails, the application program is terminated.
摘要:
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要:
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要:
An electron beam apparatus having a longer life time of cathode, and allowing a plurality of electron beams to be arranged adequately around an optical axis and five or more electron beams to be formed from a single electron gun. The electron beams emitted from a cathode made of ZrO/W (tungsten zirconium oxide) or a cathode made of carbide of transition metal to the off-optical axis directions may be converged on a sample to scan it. The apparatus includes a plate for reducing a vacuum conductance defined between the electron gun chamber side and the sample side, and apertures are formed through the plate at locations offset from the optical axis allowing for the passage of the electron beams. In order to evaluate a pattern on the sample, the electron beam emitted from the electron gun is incident to the sample surface via an objective lens. The objective lens is composed of a flat electrode having an aperture centered on the optical axis and placed in parallel with the sample surface and an electromagnetic lens including a gap formed in a side facing to the sample. Further, in order to inspect a mask, spacing among a plurality of electron beams after having passed through the mask are extended by a magnifying lens and thus widely spaced electron beams are then converted into optical signal in a scintillator.
摘要:
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.
摘要:
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要:
For programs selected as those whose label is to be created, a list of available templates is displayed on a arrangement processing screen 200 together with contents of EPG information acquired from an EPG information DB. The EPG information is displayed on a left screen 210 and the templates list is displayed on a right screen 220, so that one template desired to be applied is selected on the right screen 220, according to which template, one or a plurality of the EPG information pieces whose label is desired to be created is selected on the left screen 210. Templates 230, 240, 250, and 260 constitute a label set comprised of a plurality of labels, thus enabling creating labels by incorporating information pieces of specified items.