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61.发明授权Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatus 有权优化模型的方法，测量属性的方法，装置制造方法，光谱仪和光刻设备公开(公告)号：US08868387B2
公开(公告)日：2014-10-21
申请号：US12247371
申请日：2008-10-08
IPC分类号： G06F7/50 , G06F17/10 , G06G7/48 , G01J3/00 , G06F17/50 , G01B11/24 , G03F7/20 , G01N21/47 , G01N21/956 , G01N21/25
CPC分类号： G03F7/70625 , G01B11/24 , G01N21/255 , G01N21/47 , G01N21/95607 , G06F17/10 , G06F17/5009
摘要： A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
摘要翻译： 在光谱仪模型中使用的一组参数包括自由参数和固定参数。 设置参数的第一组值，并使用该模型生成第一个频谱。 固定参数中的一个的值被改变并产生第二个频谱。 然后将光谱仪的模型的反相应用于第二光谱以生成参数的一组值，该值与除了一个或多个空闲参数之外的第一组值相同。 如果自由参数明显改变，则固定参数被指定为空闲参数。
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62.发明授权Level sensor arrangement for lithographic apparatus and device manufacturing method 有权用于光刻设备和装置制造方法的液位传感器装置公开(公告)号：US08842293B2
公开(公告)日：2014-09-23
申请号：US12722955
申请日：2010-03-12
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译： 液位传感器装置可用于测量光刻设备中的基板表面的高度。 液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。 光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。
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公开(公告)号：US08497976B2
公开(公告)日：2013-07-30
申请号：US12574231
申请日：2009-10-06
CPC分类号： G03B27/32 , G03F7/70625 , G03F7/70633 , G03F7/7085
摘要： A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.
摘要翻译： 一种用于测量衬底特性的方法和装置。 在基板上存在靶，并且在基板的扫描运动期间进行测量。 基板的扫描运动是线性运动，并且测量包括使用脉冲光源获得目标的反射图像，单个光脉冲的持续时间小于100psec。 光刻设备包括这样的测量设备，并且包括这种测量方法的设备制造方法。
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64.发明授权Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments 有权涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法公开(公告)号：US08351024B2
公开(公告)日：2013-01-08
申请号：US12722924
申请日：2010-03-12
IPC分类号： G03B27/58
CPC分类号： G01B11/0608 , G03F9/7034
摘要： A level sensor configured to determine a height level of a substrate is disclosed. The level sensor includes a projection unit to project a measurement beam having a substantially periodic radiation intensity on the substrate; a detection unit to receive the measurement beam after reflection on the substrate, the detection unit having a detection grating arranged to receive the reflected measurement beam, the detection grating comprising at least one array of three or more segments together having a length substantially equal to a length of a period of the measurement beam projected on the detection grating, and configured to split the reflected measurement beam in three or more reflected measurement beam parts, and three or more detectors each arranged to receive one of the three or more measurement beam parts; and a processing unit to calculate a height level on the basis of the measurement beam parts.
摘要翻译： 公开了一种配置成确定基板的高度水平的液位传感器。 液位传感器包括：投影单元，用于将具有基本上周期性辐射强度的测量光束投射到基板上; 检测单元，用于在所述基板上反射之后接收所述测量光束，所述检测单元具有布置成接收所述反射的测量光束的检测光栅，所述检测光栅包括三个或更多个段的至少一个阵列，所述三个或更多个段的长度基本上等于 投影在检测光栅上的测量光束的周期的长度，并且被配置为将反射的测量光束分成三个或更多个反射的测量光束部分，以及三个或更多个检测器，每个检测器被布置成接收三个或更多个测量光束部分中的一个; 以及处理单元，其基于测量光束部分来计算高度水平。
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公开(公告)号：US20120313295A1
公开(公告)日：2012-12-13
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译： 一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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公开(公告)号：US20120244319A1
公开(公告)日：2012-09-27
申请号：US13513807
申请日：2010-10-01
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , Y10T428/24479
摘要： An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.
摘要翻译： 公开了一种具有特定对准装置的物体，用于将物体和另一物体相对于彼此对准。 对准布置包括基本上规则的格栅形式的第一精细对准标记和位于与第一对准标记相同的区域中的第二粗略对准标记。
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67.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US08120001B2
公开(公告)日：2012-02-21
申请号：US12536580
申请日：2009-08-06
CPC分类号： G02B27/58 , G01N21/4788 , G03F7/70633
摘要： In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control a spot size on a substrate. The field stop may be apodized, e.g., having a transmissivity in the form of a trapezium or a Gaussian shape.
摘要翻译： 在具有照明孔径光阑的散射测量装置中，在中间图像处设置场停止件，以控制衬底上的斑点尺寸。 场挡板可以被变迹，例如具有呈梯形或高斯形状的透射率。
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68.发明申请Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell 有权检验设备和方法，平版印刷设备和平版印刷加工单元公开(公告)号：US20120033193A1
公开(公告)日：2012-02-09
申请号：US13186895
申请日：2011-07-20
申请人： Maurits VAN DER SCHAAR , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
发明人： Maurits VAN DER SCHAAR , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
CPC分类号： G03F7/70633 , G01B2210/56 , G01N21/4788 , G01N21/9501 , G01N21/95607 , G03F7/70616 , G03F9/70
摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.
摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。
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公开(公告)号：US20110229830A1
公开(公告)日：2011-09-22
申请号：US13060390
申请日：2009-09-08
申请人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
发明人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
CPC分类号： G03F7/70633 , G03F7/70625
摘要： The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined.
摘要翻译： 本发明涉及一种检查装置和方法，其包括将测量辐射束投射到基板上的目标上，以便测量从目标反射的辐射，并获得与基板的特性有关的信息。 在本实施例中，作为基板上的聚焦光束的测量点大于目标。 关于从目标反射的辐射的信息被保留，并且关于从目标周围的表面反射的辐射的信息被消除。 这可以通过在靶周围没有反射（或没有镜面反射）表面或通过在靶周围具有已知结构来完成，可以从总反射光束识别和去除信息。 在投影仪的瞳平面中测量反射光束，使得所获得的信息与反射光束的衍射级和轮廓，基底上的结构的临界尺寸或重叠相关。
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70.发明申请Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus 有权覆盖测量装置，平版印刷装置和使用这种覆盖测量装置的装置制造方法公开(公告)号：US20110188020A1
公开(公告)日：2011-08-04
申请号：US13000229
申请日：2009-05-14
CPC分类号： G03F7/70633
摘要： An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.
摘要翻译： 覆盖测量装置具有用于利用偏振光束照射样本的偏振光源和用于捕获被样品散射的光的光学系统。 光学系统包括偏振器，用于透射与偏振光束的偏振方向正交的正交偏振分量。 检测器测量正交偏振分量的强度。 一种与检测器连接的处理单元，并且被布置为使用从正交偏振分量导出的不对称数据来处理用于覆盖测量测量的正交偏振分量。
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