公开(公告)号：US06577380B1

公开(公告)日：2003-06-10

申请号：US09621043

申请日：2000-07-21

申请人： Robert S. Sposili ,  Nestor O. Farmiga ,  Kanti Jain

发明人： Robert S. Sposili ,  Nestor O. Farmiga ,  Kanti Jain

IPC分类号： G03B2754

CPC分类号： H01L21/02686 ,  B23K26/06 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0665 ,  B23K2101/40 ,  H01L21/02678 ,  H01L21/2026

摘要： A materials-processing system based on projection irradiation using a pulsed-laser source is disclosed. The salient features include a novel illumination system containing a homogenizer that produces a self-luminous light beam of selected cross-section, spatially uniform intensity, and selected numerical aperture, as well as a novel high-efficiency, energy-recycling exposure system that provides pulse-duration extension. The output of the pulsed-laser source is shaped, optionally attenuated, and homogenized, and the pulse duration is extended by the illumination system, including beam-shaping optics, homogenizer, and optionally a condenser lens or pulse-extender-plate (PEP). The illumination is imaged either onto the mask, which is in turn imaged onto the substrate, or the illumination is imaged onto the substrate directly. The high-fluence irradiation effects a desired physical change in the material, for example melting and solidification as required in the sequential lateral solidification (SLS) process. Concurrently, the substrate and/or mask are translated, in a manner precisely coordinated with the laser pulses, as dictated by the particular process being conducted. The high efficiency of the illumination system, combined with the ability to shape the homogeneous illumination into a variety of shapes, such as a high-aspect-ratio rectangle, for example, and the pulse-duration extension, renders the system uniquely capable of executing various materials-processing operations, such as SLS, post-doping annealing, and ablation in a high-throughput manner.

摘要翻译： 公开了一种基于使用脉冲激光源的投射照射的材料处理系统。 显着的特征包括一种新颖的照明系统，其包含产生选择的横截面，空间均匀强度的自发光光束和选择的数值孔径的均匀器，以及一种新颖的高效能量循环曝光系统，其提供 脉冲持续时间延长。 脉冲激光源的输出被成形，任选地衰减和均化，并且通过照明系统延长脉冲持续时间，包括光束整形光学元件，均化器和任选的聚光透镜或脉冲扩展板（PEP） 。 照明成像到掩模上，掩模又成像到基底上，或者照明被直接成像到基底上。 高通量照射影响材料中所需的物理变化，例如根据顺序横向固化（SLS）工艺所要求的熔融和固化。 同时，根据正在进行的具体过程所指示的方式，以与激光脉冲精确协调的方式平移衬底和/或掩模。 照明系统的高效率以及将均匀照明形成各种形状（例如高纵横比矩形）和脉冲持续时间扩展的能力，使系统独特地执行 各种材料加工操作，如SLS，后掺杂退火和高通量方式的消融。

公开(公告)号：US6142639A

公开(公告)日：2000-11-07

申请号：US404635

申请日：1999-09-23

申请人： Kanti Jain ,  Carl C Kling

发明人： Kanti Jain ,  Carl C Kling

IPC分类号： B60R1/08 ,  G02B5/08

CPC分类号： B60R1/087

摘要： This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position can be assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires. Customizing features include manual and vehicle driver identification controlled override, start-up reset, and glare threshold setting.

摘要翻译： 这种单执行器和凸轮，可远程调节的外部车辆后视镜，通过在高反射率位置和低反射率位置之间切换，为驾驶员提供朝向车辆后方的无眩光观察 视图调整。 外部后视镜仅用单个电动机重新定位，与旋转凸轮一起工作以扫描所有可能的镜子位置。 单电机机构提高了镜面系统的可靠性。 单个电动机通过使用具有用于所有预测视图位置的位置的凸轮，并且对于每个视图具有两个反射率位置来实现反射镜的方向对准和日夜反射率调整。 本发明同样适用于平楔形镜和广角凸楔镜。 由于每个位置是唯一的，所以每个方向/反射率位置可以被分配一组可以为每个车辆驾驶员存储的数字坐标和每个眩光条件，用于初始设置，其可以容易地或甚至自动地调整为如 司机欲望 自定义功能包括手动和车辆驾驶员识别控制超驰，启动重置和眩光阈值设置。

公开(公告)号：US06040552A

公开(公告)日：2000-03-21

申请号：US794217

申请日：1997-01-30

申请人： Kanti Jain ,  Thomas J. Dunn ,  Nestor O. Farmiga ,  Carl Weisbecker ,  Carl C. Kling

发明人： Kanti Jain ,  Thomas J. Dunn ,  Nestor O. Farmiga ,  Carl Weisbecker ,  Carl C. Kling

IPC分类号： B23K26/06 ,  B23K26/067 ,  B23K26/38 ,  H05K3/00 ,  B23K26/00

CPC分类号： B23K26/0676 ,  B23K26/066 ,  B23K26/067 ,  B23K26/384 ,  H05K3/0026 ,  H05K2203/0557 ,  H05K2203/1545 ,  H05K3/0032

摘要： Economical production of laser-drilled high-precision, ultra-miniature multiple-via-hole patterns is accomplished by multiplexing the homogenized, shaped, nearly-collimated output of a high-power excimer laser into a modular set of condenser lens/mask/projection lens beamlines. A substrate delivery subsystem provides a continuous supply of film substrate segments as blanks during production. Functional modularization permits the building and easy retooling of a hard-tooling multiple-beamline system powered by a high-power laser. Vertical modularization permits the building of a single-beamline soft-tooling pilot system, which may be used to demonstrate a production technique, or may be used for short production runs, and which may later be incremented with additional vertical subassemblies for additional beamlines. Multiplexing of the laser output beam into the set of beamlines is accomplished by an illumination module, which may be implemented as a single 100%-reflective fold mirror for a single-beamline pilot system, and can also be implemented as a single-block echelon mirror, or implemented as a multi-beamsplitter set of decreasing-reflectivity mirrors as mirror position approaches the beam source. The resulting product is a film blank with a via-pattern of precise micro-vias, useful as an aerosol nozzle or filter.

摘要翻译： 激光钻孔的高精度，超微型多通孔图案的经济生产通过将大功率准分子激光器的均匀化，成形，几乎准直的输出复合成模块化的聚光透镜/掩模/投影组合来实现 透镜光束。 基板输送子系统在生产期间提供作为空白的薄膜基底段的连续供应。 功能模块化允许建立并容易地重新组装由大功率激光器供电的硬工具多光束线系统。 垂直模块化允许构建单束线软工具导引系统，其可用于演示生产技术，或者可用于短生产运行，并且随后可以通过用于附加束线的附加垂直子组件来增加。 将激光输出光束复用到光束集合中由照明模块实现，照明模块可被实现为用于单光束导引系统的单个100％反射折叠反射镜，并且还可以被实现为单块梯形图 反射镜或实现为多分束器组的减少反射镜，因为镜位置接近光束源。 所得产品是具有精确微通孔的通孔图案的薄膜坯料，可用作气溶胶喷嘴或过滤器。

公开(公告)号：US5897986A

公开(公告)日：1999-04-27

申请号：US864160

申请日：1997-05-28

申请人： Thomas J. Dunn ,  Nestor O. Farmiga ,  Kanti Jain

发明人： Thomas J. Dunn ,  Nestor O. Farmiga ,  Kanti Jain

IPC分类号： G03F7/20 ,  G03F7/22

CPC分类号： G03F7/707 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70716 ,  G03F7/70791

摘要： A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially. In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool. This allows the use of a mask whose size is determined by the size of each substrate module, and the use of a scanning stage whose required range of travel is determined by the size of the substrate module, and not by the size of the entire substrate. This eliminates the size limitation of the substrate from dependence on the range of travel of the stage, and permits the repetitive use of a small mask or series of small masks to produce a composite multi-module pattern on the substrate.

摘要翻译： 用于微电子制造的大幅面衬底图案化系统利用衬底对接固定器来实现衬底台和衬底之间的相对运动。 这使得能够将已经被划分成不同模块的大格式衬底曝光，其中每个模块包含从掩模转印的整个图案。 该投影系统能够使用其行程范围小于基板的尺寸并使用面积小于基板尺寸的掩模的大型多模块基板的图案化。 这通过重新定位衬底以顺序地暴露每个模块来实现。 为了重新定位衬底，其位置通过衬底对接固定件保持固定在空间中，而光刻系统的可移动平台被重新定位以将衬底的不同模块定位在光刻工具的图像场中。 这允许使用尺寸由每个基板模块的尺寸确定的掩模，并且使用其所需行程范围由基板模块的尺寸确定的扫描台，而不是由整个基板的尺寸 。 这消除了基板的尺寸限制依赖于载物台的行进范围，并且允许重复使用小掩模或一系列小掩模以在基底上产生复合多模块图案。

公开(公告)号：US5565987A

公开(公告)日：1996-10-15

申请号：US410422

申请日：1995-03-23

申请人： Kanti Jain ,  Subhash Chandra ,  Carl C. Kling

发明人： Kanti Jain ,  Subhash Chandra ,  Carl C. Kling

IPC分类号： G01B7/34 ,  G01B9/02

CPC分类号： G01B7/34

摘要： This invention describes a surface profilometry system which measures the surface topography of a sample on a sub-nanometer scale. The surface profile is determined through measurement of the change in distance between two mirrors of a multi-pass resonant cavity that is referenced to a frequency stabilized laser source. The contact stylus is in contact with the sample as it is translated along the plane to be measured. As the stylus traverses the sample, it is vertically deflected and transfers the motion directly to one of the mirrors of a multi-pass resonant cavity. The cavity is referenced to a frequency stabilized laser source that is synchronized with the resonant modes of the multi-pass cavity. Very small sub-nanometer deviations of the cavity can be detected by monitoring the laser beam incident on the multi-pass cavity. There are two embodiments by which the cavity length changes can be measured. The first embodiment involves adding variable frequency sidebands onto the stabilized laser through the use of an optical modulator. As the resonant cavity changes length due to the motion of the stylus, the modulation frequency is varied so that the sideband is kept on resonance with the cavity mode. The second embodiment involves monitoring the direct output of the stabilized laser beam after reflection from the resonant cavity. A position actuator adjusts the length of the cavity to maintain the resonance condition between the cavity mode and the stabilized laser beam.

摘要翻译： 本发明描述了一种表面轮廓测量系统，其测量亚纳米级样品的表面形貌。 通过测量参考频率稳定的激光源的多通道谐振腔的两个反射镜之间的距离变化来确定表面轮廓。 接触笔与样品接触，因为它沿待测平面平移。 当触针穿过样本时，它被垂直偏转，并将运动直接传递到多通道谐振腔的一个反射镜。 空腔参考与多通腔的谐振模式同步的频率稳定的激光源。 可以通过监测入射在多通腔上的激光束来检测腔的非常小的亚纳米偏差。 可以测量腔长度变化的两个实施例。 第一实施例涉及通过使用光学调制器将可变频率边带添加到稳定的激光器上。 由于谐振腔由于触针的运动而改变长度，所以调制频率变化，使得边带保持与腔模共振。 第二实施例涉及监测来自谐振腔的反射之后的稳定的激光束的直接输出。 位置致动器调节空腔的长度以保持腔模式和稳定的激光束之间的谐振状态。

公开(公告)号：US5285236A

公开(公告)日：1994-02-08

申请号：US954662

申请日：1992-09-30

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： G03F7/20 ,  G03B27/53

CPC分类号： G03F7/70358

摘要： This projection imaging system has large-area exposure capability, high exposure throughput, and high resolution, and comprises: (a) a stage for holding in fixed juxtaposition a mask and a substrate, and capable of scanning in one dimension, and when not scanning in that dimension, capable of moving laterally in a direction perpendicular to the scan direction so as to position itself for another scan, the stage exposing the full substrate by breaking up the substrate area into parallel strips, and exposing each strip by scanning the length of the strip across a fixed illumination region; (b) an illumination system having an effective source plane of a predetermined shape, and capable of illuminating on the mask a region of the above predetermined shape; (c) a projection assembly having an object-to-image magnification ratio of unity, having means to render the image in the same orientation as the object, and having an image field of the above predetermined shape and of an area smaller than the substrate area; and (d) provision for additive illumination in overlap regions of areas exposed by adjacent scans such that the effect of the exposure dose delivered in the overlap regions is seamless and the effect of the exposure dose delivered across the entire substrate is uniform.

摘要翻译： 该投影成像系统具有大面积曝光能力，高曝光量和高分辨率，并且包括：（a）用于保持固定并置掩模和基板的台，并且能够在一个维度上扫描，并且当不扫描时 在该尺寸中，能够在垂直于扫描方向的方向上横向运动，以便将其自身定位于另一次扫描，该阶段通过将基板区域分解成平行条来曝光整个基板，并且通过扫描长度 穿过固定照明区域的条带; （b）照明系统，其具有预定形状的有效源平面，并且能够在所述掩模上照射上述预定形状的区域; （c）具有物体与图像的放大比率为一的投影组件，具有将图像呈现与物体相同取向的装置，并具有上述预定形状的图像场和小于该基板的面积 区; 和（d）在相邻扫描暴露的区域的重叠区域中规定添加照明，使得在重叠区域中传递的曝光剂量的效果是无缝的，并且在整个基底上传递的曝光剂量的影响是均匀的。

公开(公告)号：US20130003032A1

公开(公告)日：2013-01-03

申请号：US13135290

申请日：2011-06-30

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： G03B27/54 ,  H01S3/22 ,  H01S3/10

CPC分类号： H01S3/10 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/2251 ,  H01S3/2308 ,  H01S3/2383

摘要： Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.

摘要翻译： 公开了用于以比可用的准分子激光器更高的重复率产生激光辐射脉冲的方法和系统，其使用多个激光单元的多个电子触发器并且以连续的延迟来布置不同触发的定时，每个延迟是间隔的一小部分 在单个激光单元的两个连续脉冲之间。 公开了使用这种高重复率激光器来暴露纳米尺度图案的方法和系统。

公开(公告)号：US20120307352A1

公开(公告)日：2012-12-06

申请号：US13153601

申请日：2011-06-06

申请人： Kanti Jain ,  Linus Jang

发明人： Kanti Jain ,  Linus Jang

IPC分类号： G02B27/44

CPC分类号： E06B9/24 ,  E06B2009/2417 ,  G02B27/4277 ,  G02B27/4294

摘要： Energy-efficient windows incorporating spectrally selective optical elements capable of providing desirable optical characteristics (transmission, reflection, refraction or diffraction) for different wavelengths are disclosed herein. More specifically, energy-efficient windows incorporating suitably designed diffraction gratings to optimize the efficiency of the utilization of different spectral components of the solar radiation are disclosed.

摘要翻译： 本文公开了能够提供能够提供用于不同波长的期望光学特性（透射，反射，折射或衍射）的光谱选择性光学元件的节能窗口。 更具体地，公开了包括适当设计的衍射光栅的能量效率窗口以优化太阳辐射的不同光谱分量的利用效率。

公开(公告)号：US07795559B2

公开(公告)日：2010-09-14

申请号：US11977879

申请日：2007-10-26

申请人： Leszek Wojcik ,  Diwakar Kedlaya ,  Kanti Jain ,  Sivarama Krishna Kuchibhotla ,  Arun Paneerselvam

发明人： Leszek Wojcik ,  Diwakar Kedlaya ,  Kanti Jain ,  Sivarama Krishna Kuchibhotla ,  Arun Paneerselvam

IPC分类号： B23K26/00

CPC分类号： B23K26/16 ,  B23K26/0622 ,  B23K26/1476 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/50

摘要： A turbulence-controlled vacuum debris removal subsystem safely exhausts particles ejected during photoablation. Nested interconnected chambers provide diminishing sweeping gas partial pressure and diminishing turbulence, ejecting particles from the ablation beam path between pulses, without compromising continuing particle conductance. Removal rate (debris generation rate) depends on conductance and particle sizes. The chambers interconnect through metering holes which enable optimization of partial pressure differentials. Controlled flow accomplishes debris removal, reducing turbulence of the mixture of debris and sweeping gases. A preferred embodiment uses a nest of concentric chambers, providing a clear light path. Another preferred embodiment uses orifices on chamber faces for removal and forming an envelope of gas around the processing region for dynamically containing the ejected particulate matter from the ablation site to the exhaust.

摘要翻译： 湍流控制的真空碎屑去除子系统可以安全地排除在光烧制期间喷射的颗粒。 嵌套互连室提供减少的清扫气体分压和减少湍流，在脉冲之间从消融光束路径喷射颗粒，而不损害持续的颗粒电导。 去除率（碎片产生率）取决于电导和粒度。 这些室通过计量孔相互连接，可以优化分压差。 受控流动完成碎屑清除，减少碎屑和扫气混合物的湍流。 一个优选实施例使用同心腔室，提供清晰的光路。 另一个优选实施例在腔室表面上使用孔口用于移除并在处理区域周围形成气体包络，用于动态地将从排出部位排出的颗粒物质包含到排气口中。

公开(公告)号：US07670727B2

公开(公告)日：2010-03-02

申请号：US11512954

申请日：2006-08-30

申请人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

发明人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

IPC分类号： G03F1/00 ,  G03B27/54

CPC分类号： G03F7/703 ,  G03B27/58

摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。