摘要:
A disclosed semiconductor device includes a gate insulation film formed on a silicon substrate and a metal gate electrode formed in the gate insulation film, wherein the gate insulation film includes a first insulation film, a second insulation film that is formed on the first insulation film and has a greater dielectric constant than the first insulation film, and a third insulation film formed on the second insulation film.
摘要:
A semiconductor device includes a structure of a gate electrode/a high-k dielectric insulating film containing aluminum and having a dielectric constant greater than that of a silicon oxide film/the silicon oxide film/a silicon substrate, and is provided with a diffusion layer formed by diffusing an aluminum atom or an aluminum ion to the silicon oxide film or an interface between the silicon oxide film and the silicon substrate by a heat treatment. A laminated film or a mixed film of hafnium oxide and aluminum oxide having a ratio of hafnium and aluminum ranging from about 2:8 to 8:2 is used as the high-k dielectric film. The heat treatment is performed at any temperature from about 500 to 1000° C. for any period of time from about 1 to 100 seconds.
摘要:
The invention is plasma display panel (1) with a plurality of pairs of display electrodes (6) and dielectric layers (8) disposed on front glass substrate (3), and it is intended to realize plasma display panel (1), wherein the stress at a surface where dielectric layer (8) of front glass substrate (3) is not disposed is a compressive stress ranging from 0.8 MPa to 2.4 MPa, the glass substrate is sufficient in strength, and the panel is almost free from breakage.
摘要:
There is provided a method for modifying a high-k dielectric thin film provided on the surface of an object using a metal organic compound material. The method includes a preparation process for providing the object with the high-k dielectric thin film formed on the surface thereof, and a modification process for applying UV rays to the highly dielectric thin film in an inert gas atmosphere while maintaining the object at a predetermined temperature to modify the high-k dielectric thin film. According to the above constitution, the carbon component can be eliminated from the high-k dielectric thin film, and the whole material can be thermally shrunk to improve the density, whereby the occurrence of defects can be prevented and the film density can be improved to enhance the specific permittivity and thus to provide a high level of electric properties.
摘要:
A semiconductor device includes a structure of a gate electrode/a high-k dielectric insulating film containing aluminum and having a dielectric constant greater than that of a silicon oxide film/the silicon oxide film/a silicon substrate, and is provided with a diffusion layer formed by diffusing an aluminum atom or an aluminum ion to the silicon oxide film or an interface between the silicon oxide film and the silicon substrate by a heat treatment. A laminated film or a mixed film of hafnium oxide and aluminum oxide having a ratio of hafnium and aluminum ranging from about 2:8 to 8:2 is used as the high-k dielectric film. The heat treatment is performed at any temperature from about 500 to 1000° C. for any period of time from about 1 to 100 seconds.
摘要:
Security technology for information devices such as cellular phones, personal computers, and the like, and more specifically a technique capable of restricting use of or removing restrictions on the use of information devices with a low-cost configuration. A key system includes a key device and a cellular phone capable of being locked or released from the lock by the key device. An LED of the key device and an LED of the cellular phone are capable of sending data therebetween, and key information is sent from the LED to the LED. The cellular phone is locked or released from the lock based on the key information received by the LED.
摘要:
When aging is performed by applying aging voltage to a data electrode, a scan electrode, and a sustain electrode via respective inductors (301, 401, 302, 402, 303, 403) coupled to the electrodes, frequency of a ringing waveform included in an aging voltage waveform applied to the data electrode is set in a range of ½ to 2 times frequency of a ringing waveform included in an aging voltage waveform applied to the scan electrode. With the method above, the time required for aging is significantly shortened, and the aging with high efficiency in electric power is realized. Instead of using inductors (301, 302, 303) including a coil, controlling the length of lead wires (401, 402, 403) can also obtain desired inductance.
摘要:
A plasma display panel capable of realizing improvement in the characteristics thereof, such as lower discharge voltage, more stable discharge, higher luminance, higher efficiency, and longer life. Before a step of sealing the periphery of substrates, impurity gas containing CO2, H2O and CH4 is other then inert gas is adsorbed by phosphor layers. The impurity gas is released into discharge gas and while the panel is lit. This method can realize improvement in characteristics, such as lower discharge voltage, higher luminance, higher efficiency, and longer life.
摘要:
An object of the present invention is to provide electron emission devices having improved electron convergence.To this end, an electron emission device of the present invention is such that a cathode electrode, an insulating layer, and a gate electrode are layered on a substrate in an order; an electron emission layer is in a first hole on the substrate penetrating from the gate electrode through the cathode electrode; an upper surface of the electron emission layer is between an upper surface of the substrate and a boundary between the cathode electrode and the insulating layer; at least one of a side surface and a lower surface except for a central area of the electron emission layer contacts the cathode electrode.By such an electron emission device, electrons are emitted mainly from the peripheral area of the electron emission layer. Accordingly, the electron convergence is improved.
摘要:
A plasma display panel capable of realizing improvement in the characteristics thereof, such as lower discharge voltage, more stable discharge, higher luminance, higher efficiency, and longer life. During a step of sealing the periphery of substrates or before this sealing step, impurity gas other then inert gas is adsorbed by phosphor layers. The impurity gas is released into discharge gas and the impurity is added to the discharge gas in a controlled manner while the panel is lit. This method can realize improvement in characteristics, such as lower discharge voltage, higher luminance, higher efficiency, and longer life.