Process for depositing a carbon-rich coating on a moving substrate
    63.
    发明授权
    Process for depositing a carbon-rich coating on a moving substrate 失效
    在运动基板上沉积富碳涂层的方法

    公开(公告)号:US5888594A

    公开(公告)日:1999-03-30

    申请号:US744227

    申请日:1996-11-05

    CPC分类号: C23C16/26 C23C16/545

    摘要: A process and apparatus for deposition of a carbon-rich coating onto a moving substrate is provided. The process and apparatus involve the creation of an electric field surrounding a rotatable electrode in a carbon-containing gaseous environment. This results in carbon-rich plasma formation, wherein the electrode is negatively biased with respect to the electrode which results in ion acceleration from the plasma toward the electrode. Ion bombardment continuously occurs on a substrate in contact with the electrode producing a continuous carbon-rich coating over the length of the substrate.

    摘要翻译: 提供了一种用于将富碳涂层沉积到移动的衬底上的工艺和设备。 该方法和装置涉及在含碳气体环境中产生围绕可旋转电极的电场。 这导致富含碳的等离子体形成,其中电极相对于电极被负偏压,这导致从等离子体向电极的离子加速。 离子轰击连续发生在与电极接触的基底上,在基底的长度上产生连续的富碳涂层。

    Nanostructured articles
    66.
    发明授权
    Nanostructured articles 有权
    纳米结构文章

    公开(公告)号:US09435924B2

    公开(公告)日:2016-09-06

    申请号:US14003923

    申请日:2012-03-05

    摘要: Articles comprising a substrate and a first layer on a major surface thereof, wherein the first layer has a first random, nanostructured surface, and wherein the first layer has an average thickness up to 0.5 micrometer. Embodiments of the articles are useful, for example, for display applications (e.g., liquid crystal displays (LCD), light emitting diode (LED) displays, or plasma displays); light extraction; electromagnetic interference (EMI) shielding, ophthalmic lenses; face shielding lenses or films; window films; antireflection for construction applications; and, construction applications or traffic signs.

    摘要翻译: 包括基材和在其主表面上的第一层的制品,其中所述第一层具有第一无规纳米结构化表面,并且其中所述第一层具有高达0.5微米的平均厚度。 文章的实施例例如用于显示应用(例如,液晶显示器(LCD),发光二极管(LED)显示器或等离子体显示器))是有用的; 光提取; 电磁干扰(EMI)屏蔽,眼科镜片; 面罩屏蔽镜片或胶片; 窗膜; 施工应用抗反射; 以及建筑施工或交通标志。

    Abrasive article having a plurality of precisely-shaped abrasive composites
    68.
    发明授权
    Abrasive article having a plurality of precisely-shaped abrasive composites 有权
    研磨制品具有多个精确成形的磨料复合材料

    公开(公告)号:US08685124B2

    公开(公告)日:2014-04-01

    申请号:US13162780

    申请日:2011-06-17

    IPC分类号: B24D3/02 C09C1/68 C09K3/14

    CPC分类号: B24D11/001

    摘要: A method of making an abrasive article including the steps of treating a plurality of cavities in a contacting surface of a production tool by plasma deposition of a thin film thereby forming a plurality of plasma treated cavities. Filling the plurality of plasma treated cavities in the production tool with an abrasive slurry, and at least partially curing the abrasive slurry while residing in the plurality of cavities.

    摘要翻译: 一种制造磨料制品的方法,包括以下步骤:通过等离子体沉积薄膜来处理生产工具的接触表面中的多个空腔,从而形成多个等离子体处理的空腔。 用研磨浆料在生产工具中填充多个等离子体处理的空腔,并且在驻留在多个空腔中时至少部分固化磨料浆料。

    Method of making a nanostructure
    69.
    发明授权
    Method of making a nanostructure 有权
    制造纳米结构的方法

    公开(公告)号:US08634146B2

    公开(公告)日:2014-01-21

    申请号:US13636146

    申请日:2011-04-22

    IPC分类号: G02B3/08 C23C14/28

    摘要: A method of making a nanostructure is provided that includes applying a thin, random discontinuous masking layer (105) to a major surface (103) of a substrate (101) by plasma chemical vapor deposition. The substrate (101) can be a polymer, an inorganic material, an alloy, or a solid solution. The masking layer (105) can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyls, metal isopropoxides, metal acetylacetonates, and metal halides. Portions (107) of the substrate (101) not protected by the masking layer (105) are then etched away by reactive ion etching to make the nanostructures.

    摘要翻译: 提供一种制备纳米结构的方法,其包括通过等离子体化学气相沉积将薄的随机不连续掩模层(105)施加到衬底(101)的主表面(103)。 基板(101)可以是聚合物,无机材料,合金或固溶体。 掩模层(105)可以包括使用包含选自有机硅化合物,金属烷基,金属异丙氧基化物,金属乙酰丙酮化物和金属卤化物的化合物的反应气体的等离子体化学气相沉积的反应产物。 然后通过反应离子蚀刻将未被掩模层(105)保护的衬底(101)的部分(107)蚀刻掉以制成纳米结构。