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    GLASS-LIKE POLYMERIC ANTIREFLECTIVE FILMS COATED WITH SILICA NANOPARTICLES, METHODS OF MAKING AND LIGHT ABSORBING DEVICES USING SAME
    1.
    发明申请
    GLASS-LIKE POLYMERIC ANTIREFLECTIVE FILMS COATED WITH SILICA NANOPARTICLES, METHODS OF MAKING AND LIGHT ABSORBING DEVICES USING SAME 审中-公开
    用二氧化硅纳米粒子涂覆的玻璃状聚合物抗反射膜，使用相同的制造方法和光吸收装置

    公开(公告)号：US20130258483A1

    公开(公告)日：2013-10-03

    申请号：US13990172

    申请日：2011-12-13

    申请人： Todd G. Pett ,  Timothy J. Hebrink ,  Robin E. Wright ,  Moses M. David ,  Donald J. McClure ,  Naiyong Jing ,  Mark A. Strobel

    发明人： Todd G. Pett ,  Timothy J. Hebrink ,  Robin E. Wright ,  Moses M. David ,  Donald J. McClure ,  Naiyong Jing ,  Mark A. Strobel

    IPC分类号： G02B1/11

    CPC分类号： G02B1/118 ,  G02B1/111 ,  G02B5/003 ,  G02B5/045

    摘要： A transparent anti-reflective structured film comprising a structured film substrate having a structured face, with anti-reflective structures defining a structured surface. The structured face is anti-reflective to light, with at least a substantial portion of the structured surface comprising a glass-like surface. At least the anti-reflective structures comprise a cross-linked silicone elastomeric material, and the glass-like surface comprises an SiO2 stoichiometry. The glass-like surface is coated with a coating of at least one layer of agglomerates of silica nanoparticles, with the agglomerates comprising a three-dimensional porous network of silica nanoparticles, and the silica nanoparticles being bonded to adjacent silica nanoparticles. A light energy absorbing device comprising the transparent anti-reflective structured film disposed so as to be between a source of light energy and a light energy receiving face of a light absorber, when light energy is being absorbed by the light absorber.

    摘要翻译： 一种透明的抗反射结构膜，其包括具有结构化面的结构化膜基底，其具有限定结构化表面的抗反射结构。 结构化面对光进行抗反射，至少大部分结构化表面包括玻璃状表面。 至少抗反射结构包含交联的有机硅弹性体材料，并且玻璃状表面包括SiO 2化学计量。 玻璃状表面涂覆有至少一层二氧化硅纳米颗粒附聚物的涂层，附聚物包含二氧化硅纳米颗粒的三维多孔网络，并且二氧化硅纳米颗粒结合到相邻的二氧化硅纳米颗粒。 一种光能吸收装置，其特征在于，在所述光吸收体吸收光能的同时，所述光能吸收装置具有设置在光能源与光吸收体的光能接收面之间的透明抗反射结构膜。

    METHODS FOR PRODUCING AN AT LEAST PARTIALLY CURED LAYER
    5.
    发明申请
    METHODS FOR PRODUCING AN AT LEAST PARTIALLY CURED LAYER 审中-公开
    用于生产最小部分固化层的方法

    公开(公告)号：US20130059105A1

    公开(公告)日：2013-03-07

    申请号：US13590260

    申请日：2012-08-21

    申请人： Robin E. Wright ,  Margaux B. Mitera ,  Richard L. Walter ,  Jayshree Seth ,  Janet A. Venne

    发明人： Robin E. Wright ,  Margaux B. Mitera ,  Richard L. Walter ,  Jayshree Seth ,  Janet A. Venne

    IPC分类号： B05D3/06 ,  C09J7/02

    CPC分类号： C09D133/14 ,  B05D3/065 ,  B05D5/08 ,  B05D2252/00 ,  C08G77/20 ,  C09D183/06 ,  C09J7/401 ,  C09J2205/31 ,  C09J2483/005 ,  D21H19/10 ,  D21H25/08 ,  Y10T428/1476

    摘要： Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).

    摘要翻译： 用于通过将包含（甲基）丙烯酸酯官能化硅氧烷的层施加在基材的表面上并在基本惰性气氛中用具有峰强度的短波长多色紫外光源照射该层来制造至少部分固化的层的方法 在约160纳米至约240纳米的波长处至少部分地固化该层。 任选地，该层处于大于25℃的固化温度。在一些实施方案中，该层具有约0.1微米至约1微米的厚度。 在某些实施方案中，该层基本上不含光引发剂和/或有机溶剂。 在一些具体实施方案中，用短波长多色紫外光源照射该层，在包含不超过50ppm氧气的惰性气氛中进行。 基本上固化的层可以是脱模层或低粘合性尺寸（LAB）。

    Microstructured antimicrobial film
    7.
    发明授权
    Microstructured antimicrobial film 有权
    微结构抗菌膜

    公开(公告)号：US08318282B2

    公开(公告)日：2012-11-27

    申请号：US12746792

    申请日：2008-12-08

    申请人： Caroline M. Ylitalo ,  Paul D. Graham ,  Linda K. M. Olson ,  Narina Y. Stepanova ,  Robin E. Wright

    发明人： Caroline M. Ylitalo ,  Paul D. Graham ,  Linda K. M. Olson ,  Narina Y. Stepanova ,  Robin E. Wright

    IPC分类号： B32B3/30 ,  B32B43/00

    CPC分类号： C08F290/06 ,  A01N25/34 ,  B33Y80/00 ,  C08F2/48 ,  C08F290/061 ,  C08F290/062 ,  C08F299/00 ,  Y10T156/1168 ,  Y10T428/15 ,  Y10T428/16 ,  Y10T428/24 ,  Y10T428/24479 ,  Y10T428/2462

    摘要： A microstructured antimicrobial film, an antimicrobial film assembly, a method of protecting a surface from microbial contamination, and a method of making a microstructured antimicrobial film. The microstructured antimicrobial film can include a substrate having a first side that includes a first major surface, a plurality of microstructured wells defined in the first side of the substrate, and an antimicrobial material positioned within at least some of the plurality of wells. Each of the plurality of wells can be at least partially defined by a base that is spaced a distance from the first major surface of the substrate. The antimicrobial material can be positioned, such that an upper surface of the antimicrobial material is spaced a distance from the first major surface of the substrate. The antimicrobial film assembly can include a roll or a stack of microstructured antimicrobial films.

    摘要翻译： 微结构化抗微生物膜，抗微生物膜组合物，保护表面免受微生物污染的方法以及制备微结构抗微生物膜的方法。 微结构化抗微生物膜可以包括具有包括第一主表面的第一侧的基底，在基底的第一侧限定的多个微结构的孔以及位于多个孔中的至少一些孔内的抗微生物材料。 多个孔中的每一个可以至少部分地由与衬底的第一主表面间隔一定距离的基部限定。 抗微生物材料可以被定位，使得抗微生物材料的上表面与衬底的第一主表面间隔开一定距离。 抗微生物膜组件可以包括一个或多个微结构化的抗微生物膜的卷。