公开(公告)号：US07049585B2

公开(公告)日：2006-05-23

申请号：US09891612

申请日：2001-06-27

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

IPC分类号： H01J37/28

CPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

摘要翻译： 诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像 一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底 用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及 用于在基板2006上显示或存储缺陷位置的控制系统2017。

公开(公告)号：US07176459B2

公开(公告)日：2007-02-13

申请号：US10999124

申请日：2004-11-30

申请人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

发明人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

IPC分类号： H01J37/28 ,  G01N23/225

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/24435

摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

摘要翻译： 提供一种用于以高通量和高S / N比来评估样品的电子束装置。 当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。 通过控制偏转器，一次电子束入射角约为35°以上的入射角。 从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。 检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。 来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。

公开(公告)号：US20090014649A1

公开(公告)日：2009-01-15

申请号：US11909409

申请日：2006-03-22

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

IPC分类号： G01N23/00

CPC分类号： H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2446 ,  H01J2237/28

摘要： Secondary electrons emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator (77), and is deflected again in a perpendicular direction by an aberration correction electrostatic deflector (711) to form a magnified image on the principal plane of an auxiliary lens (712). The secondary electron beam diverged from the auxiliary lens (712) passes through axial chromatic aberration correction lenses (714-717) and images on a principal plane of an auxiliary lens (718) for a magnifying lens (719). The magnified image is formed in a position spaced apart from the optical axis. Therefore, when the secondary electron beam diverged from the auxiliary lens (712) is incident on the axial chromatic aberration correction lenses without any change, large abaxial aberration occurs. To avoid it, the auxiliary lens (712) is used to form the image of an NA aperture (724) in substantially a middle (723) in the light axis direction of the axial chromatic aberration correction lenses (714-717).

摘要翻译： 通过电子束照射从样品（W）发射的二次电子被光束分离器（77）偏转，并通过像差校正静电偏转器（711）在垂直方向上再次偏转，以在主平面上形成放大图像 的辅助透镜（712）。 从辅助透镜（712）发散的二次电子束通过轴向色差校正透镜（714-717）和用于放大透镜（719）的辅助透镜（718）的主平面上的图像。 放大图像形成在与光轴间隔开的位置。 因此，当从辅助透镜（712）发散的二次电子束没有任何变化地入射到轴向色像差校正透镜时，发生大的背轴像差。 为了避免这种情况，辅助透镜（712）用于在轴向色像差校正透镜（714-717）的光轴方向上形成基本上中间（723）中的NA孔径（724）的图像。

公开(公告)号：US20070200569A1

公开(公告)日：2007-08-30

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01R31/305

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

公开(公告)号：US20050199807A1

公开(公告)日：2005-09-15

申请号：US11019111

申请日：2004-12-22

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00 ,  G01R31/305 ,  G21K7/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US07352195B2

公开(公告)日：2008-04-01

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US07212017B2

公开(公告)日：2007-05-01

申请号：US11019111

申请日：2004-12-22

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US20080315095A1

公开(公告)日：2008-12-25

申请号：US12222404

申请日：2008-08-08

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/0635 ,  H01J2237/2817

摘要： An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam.Provided is an electron beam apparatus comprising: an electron beam emitter (32) having an electron gun (30), said electron gun (30) disposed along an optical axis (23) and operable to emit a plurality of off-axis electron beams along a direction defined by a certain angle with respect to the optical axis (23); a plurality of apertures (34) disposed at a location offset from the optical axis (23); and an electromagnetic lens (7) for forming a magnetic field between the electron gun (30) and the apertures (34) to control the plurality of off-axis electron beams emitted from the electron gun (30) so that the plurality of off-axis electron beams passes through the apertures (34).

摘要翻译： 本发明的目的是提供一种电子束装置，其中为每个电子束获得的相对高的电流为一个光轴产生多个电子束，例如四个电子束。 本发明提供一种电子束装置，包括：具有电子枪（30）的电子束发射器（32），所述电子枪（30）沿着光轴（23）设置并且可操作以沿着光轴发射多个离轴电子束 相对于光轴（23）限定一定角度的方向; 设置在偏离光轴（23）的位置处的多个孔（34）; 以及用于在电子枪（30）和孔（34）之间形成磁场的电磁透镜（7），以控制从电子枪（30）发射的多个离轴电子束， 轴电子束通过孔（34）。

公开(公告)号：US20050214958A1

公开(公告)日：2005-09-29

申请号：US11058216

申请日：2005-02-16

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

IPC分类号： G01N23/225 ,  H01J37/28 ,  H01L21/66

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/0635 ,  H01J2237/2817

摘要： An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam. Provided is an electron beam apparatus comprising: an electron beam emitter (32) having an electron gun (30), said electron gun (30) disposed along an optical axis (23) and operable to emit a plurality of off-axis electron beams along a direction defined by a certain angle with respect to the optical axis (23); a plurality of apertures (34) disposed at a location offset from the optical axis (23); and an electromagnetic lens (7) for forming a magnetic field between the electron gun (30) and the apertures (34) to control the plurality of off-axis electron beams emitted from the electron gun (30) so that the plurality of off-axis electron beams passes through the apertures (34).

摘要翻译： 本发明的目的是提供一种电子束装置，其中为每个电子束获得的相对高的电流为一个光轴产生多个电子束，例如四个电子束。 本发明提供一种电子束装置，包括：具有电子枪（30）的电子束发射器（32），所述电子枪（30）沿着光轴（23）设置并且可操作以沿着光轴发射多个离轴电子束 相对于光轴（23）限定一定角度的方向; 设置在偏离光轴（23）的位置处的多个孔（34）; 以及用于在电子枪（30）和孔（34）之间形成磁场的电磁透镜（7），以控制从电子枪（30）发射的多个离轴电子束， 轴电子束通过孔（34）。

公开(公告)号：US07425703B2

公开(公告)日：2008-09-16

申请号：US11058216

申请日：2005-02-16

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/0635 ,  H01J2237/2817

摘要： An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam.Provided is an electron beam apparatus comprising: an electron beam emitter (32) having an electron gun (30), said electron gun (30) disposed along an optical axis (23) and operable to emit a plurality of off-axis electron beams along a direction defined by a certain angle with respect to the optical axis (23); a plurality of apertures (34) disposed at a location offset from the optical axis (23); and an electromagnetic lens (7) for forming a magnetic field between the electron gun (30) and the apertures (34) to control the plurality of off-axis electron beams emitted from the electron gun (30) so that the plurality of off-axis electron beams passes through the apertures (34).

摘要翻译： 本发明的目的是提供一种电子束装置，其中为每个电子束获得的相对高的电流为一个光轴产生多个电子束，例如四个电子束。 本发明提供一种电子束装置，包括：具有电子枪（30）的电子束发射器（32），所述电子枪（30）沿着光轴（23）设置并且可操作以沿着光轴发射多个离轴电子束 相对于光轴（23）限定一定角度的方向; 设置在偏离光轴（23）的位置处的多个孔（34）; 以及用于在电子枪（30）和孔（34）之间形成磁场的电磁透镜（7），以控制从电子枪（30）发射的多个离轴电子束， 轴电子束通过孔（34）。