公开(公告)号：US20080106707A1

公开(公告)日：2008-05-08

申请号：US10588297

申请日：2005-02-03

申请人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

发明人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/7075 ,  G03F7/70891

摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).

摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。

公开(公告)号：US20070247600A1

公开(公告)日：2007-10-25

申请号：US11767425

申请日：2007-06-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US07277220B2

公开(公告)日：2007-10-02

申请号：US11519824

申请日：2006-09-13

申请人： Tomoko Ohtsuki ,  Soichi Owa

发明人： Tomoko Ohtsuki ,  Soichi Owa

IPC分类号： G02F1/37 ,  G02F1/35 ,  H01S3/109

CPC分类号： H01S3/067 ,  G02B6/14 ,  G02B6/32 ,  G02F1/1303 ,  G02F1/35 ,  G02F1/3501 ,  G02F1/353 ,  G02F1/37 ,  G02F2001/3503 ,  G02F2001/354 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/0078 ,  H01S3/0085 ,  H01S3/06716 ,  H01S3/06729 ,  H01S3/06745 ,  H01S3/06758 ,  H01S3/06766 ,  H01S3/094011 ,  H01S3/09415 ,  H01S3/1608 ,  H01S3/23 ,  H01S3/2383

摘要： A laser apparatus including a laser generating portion that generates pulse light having a single wavelength within a range from an infrared band to a visible band. An optical amplifier is optically connected to the laser generating portion, and includes a plurality of fiber optical amplifiers to amplify the pulse light a plurality of times. A wavelength converting portion is optically connected to the optical amplifier, and includes cylindrical lenses and a plurality of non-linear optical crystals to wavelength-convert the amplified pulse light into ultraviolet light. The amplified pulse light is incident on the cylindrical lenses through one of the plurality of non-linear optical crystals and is incident on a different one of the plurality of non-linear optical crystals from the one non-linear optical crystal through the cylindrical lenses.

摘要翻译： 一种激光装置，包括：激光产生部，其产生从红外线到可见光谱带的范围内的单一波长的脉冲光。 光放大器光学地连接到激光产生部分，并且包括多个光纤放大器以多次放大脉冲光。 波长转换部分光学连接到光放大器，并且包括柱面透镜和多个非线性光学晶体，以将放大的脉冲光波长转换成紫外光。 放大的脉冲光通过多个非线性光学晶体中的一个入射到柱面透镜上，并且通过柱面透镜从一个非线性光学晶体入射到多个非线性光学晶体中的不同的一个。

公开(公告)号：US20070064210A1

公开(公告)日：2007-03-22

申请号：US11603078

申请日：2006-11-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US20070024832A1

公开(公告)日：2007-02-01

申请号：US11399595

申请日：2006-04-07

申请人： Soichi Owa

发明人： Soichi Owa

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by any bubble in the liquid. The exposure apparatus includes a liquid supply unit 1 which fills at least a part of the space between the projection optical system and the substrate with a liquid 50, and exposes the substrate by projecting an image of a pattern onto the substrate via the projection optical system. The liquid supply unit 1 includes a degassing unit 21 which suppresses the generation of the bubble in the liquid 50.

摘要翻译： 一种曝光装置，其中在用液体填充投影光学系统和基板之间的空间的同时进行曝光，能够抑制由液体中的任何气泡引起的图案图像的劣化。 曝光装置包括液体供应单元1，其用液体50填充投影光学系统和基板之间的至少一部分空间，并且通过投影光学系统将图案的图像投影到基板上而使基板曝光 。 液体供给单元1包括抑制液体50中的气泡的产生的脱气单元21。

公开(公告)号：US20070008609A1

公开(公告)日：2007-01-11

申请号：US11519824

申请日：2006-09-13

申请人： Tomoko Ohtsuki ,  Soichi Owa

发明人： Tomoko Ohtsuki ,  Soichi Owa

IPC分类号： G02F2/02

CPC分类号： H01S3/067 ,  G02B6/14 ,  G02B6/32 ,  G02F1/1303 ,  G02F1/35 ,  G02F1/3501 ,  G02F1/353 ,  G02F1/37 ,  G02F2001/3503 ,  G02F2001/354 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/0078 ,  H01S3/0085 ,  H01S3/06716 ,  H01S3/06729 ,  H01S3/06745 ,  H01S3/06758 ,  H01S3/06766 ,  H01S3/094011 ,  H01S3/09415 ,  H01S3/1608 ,  H01S3/23 ,  H01S3/2383

摘要： An ultraviolet laser apparatus according to the present invention comprises a laser generating portion having a single-wavelength oscillating laser for generating laser light having a single wavelength falling within a wavelength range from an infrared band to a visible band, an optical amplifier having a fiber optical amplifier for amplifying the laser light generated by the laser generating portion, and a wavelength converting portion for wavelength-converting the amplified laser light into ultraviolet light by using a non-linear optical crystal, whereby ultraviolet light having a single wavelength is generated. Further, an exposure apparatus according to the present invention serves to transfer a pattern image of a mask onto a substrate and comprises a light source including a laser apparatus for emitting a laser light having a single wavelength, a first fiber optical amplifier for amplifying the laser light, a light dividing device for dividing or branching the amplified laser light into plural lights, and second fiber optical amplifiers for amplifying the plural divided or branched lights, respectively; and a transmission optical system for transmitting the laser light emitted from the light source to the exposure apparatus.

摘要翻译： 根据本发明的紫外线激光装置包括具有单波长振荡激光器的激光发生部分，用于产生具有从红外波段到可见波段的波长范围内的单一波长的激光，具有光纤的光放大器 放大器，用于放大由激光产生部分产生的激光;以及波长转换部分，用于通过使用非线性光学晶体将放大的激光波长转换为紫外光，由此产生具有单一波长的紫外光。 此外，根据本发明的曝光装置用于将掩模的图案图像转印到基板上，并且包括包括用于发射具有单一波长的激光的激光装置的光源，用于放大激光的第一光纤放大器 光，用于将放大的激光分割或分支为多个光的分光装置，以及分别用于放大多个分光或分支光的第二光纤放大器; 以及用于将从光源发射的激光发射到曝光装置的透射光学系统。

公开(公告)号：US20060139614A1

公开(公告)日：2006-06-29

申请号：US11297324

申请日：2005-12-09

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

公开(公告)号：US20050219490A1

公开(公告)日：2005-10-06

申请号：US11144827

申请日：2005-06-06

申请人： Soichi Owa

发明人： Soichi Owa

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by any bubble in the liquid. The exposure apparatus includes a liquid supply unite 1 which fills at least a part of the space between the projection optical system and the substrate with a liquid 50, and exposes the substrate by projecting an image of a pattern onto the substrate via the projection optical system. The liquid supply unite 1 includes a degassing unit 21 which suppresses the generation of the bubble in the liquid 50.

摘要翻译： 一种曝光装置，其中在用液体填充投影光学系统和基板之间的空间的同时进行曝光，能够抑制由液体中的任何气泡引起的图案图像的劣化。 曝光装置包括液体供应单元1，其用液体填充投影光学系统和基板之间的至少一部分空间，并且通过投影光学系统将图案的图像投影到基板上而使基板曝光 。 液体供给单元1包括抑制液体50中的气泡的产生的脱气单元21。

公开(公告)号：US06590698B1

公开(公告)日：2003-07-08

申请号：US09538233

申请日：2000-03-30

申请人： Tomoko Ohtsuki ,  Soichi Owa

发明人： Tomoko Ohtsuki ,  Soichi Owa

IPC分类号： G02F1365

CPC分类号： H01S3/067 ,  G02B6/14 ,  G02B6/32 ,  G02F1/1303 ,  G02F1/35 ,  G02F1/3501 ,  G02F1/353 ,  G02F1/37 ,  G02F2001/3503 ,  G02F2001/354 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/0078 ,  H01S3/0085 ,  H01S3/06716 ,  H01S3/06729 ,  H01S3/06745 ,  H01S3/06758 ,  H01S3/06766 ,  H01S3/094011 ,  H01S3/09415 ,  H01S3/1608 ,  H01S3/23 ,  H01S3/2383

摘要： An ultraviolet laser apparatus has a laser generating single-wavelength light between infrared and visible, a fiber optical amplifier for amplifying the laser light, and a converting portion converting the amplified laser light into single-wavelength ultraviolet light, using a non-linear optical crystal. An exposure apparatus transfers a pattern image of a mask onto a substrate and has light source including a laser apparatus for emitting laser light having a single wavelength, a first fiber optical amplifier for amplifying the laser light, a light dividing device for dividing or branching the amplified laser light into plural lights, and second fiber optical amplifiers for amplifying the plural divided or branched lights, respectively; and a transmission optical system for transmitting the laser light emitted from the light source to the exposure apparatus.

摘要翻译： 紫外线激光装置具有在红外线和可见光之间产生单波长光的激光，用于放大激光的光纤放大器和使用非线性光学晶体将放大的激光转换为单波长紫外光的转换部分 。 曝光装置将掩模的图案图像转印到基板上，并且具有包括用于发射具有单一波长的激光的激光装置的光源，用于放大激光的第一光纤放大器，用于分割或分支的分光装置 放大的激光成多个光，第二光纤放大器分别放大多个分支或分支的光; 以及用于将从光源发射的激光发射到曝光装置的透射光学系统。

公开(公告)号：US06291145B1

公开(公告)日：2001-09-18

申请号：US09038683

申请日：1998-03-09

申请人： Tadayosi Kokubo ,  Kazuya Okamoto ,  Hiroshi Ooki ,  Masato Shibuya ,  Soichi Owa

发明人： Tadayosi Kokubo ,  Kazuya Okamoto ,  Hiroshi Ooki ,  Masato Shibuya ,  Soichi Owa

IPC分类号： G03F524

CPC分类号： G03F7/70466 ,  G03F7/033 ,  G03F7/038 ,  G03F7/2022

摘要： Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the mth power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator. The multiple exposures can be performed while: (a) changing the exposure intensity distribution on the photosensitive material, or (b) shifting the projected mask pattern and the sensitive substrate relative to each other by a specified amount, or (c) using a different projected mask pattern for each exposure.

摘要翻译： 公开了在这种方法中使用的图像形成方法和感光材料，其形成非常高分辨率的图案。 感光材料包括由自由基触发以进行潜像形成反应的成分。 自由基由照明光的光子产生。 或者，成分由被暴露产生的自由基活化的反应性中间体化合物触发。 感光材料具有根据入射光强度的第m次幂（m> 1）潜影反应密度增加的非线性灵敏度特性。 可以将感光材料施加到敏感基板上以进行曝光。 在存在自由基失活剂的情况下，使用投影的掩模图案来进行敏感基材的多次曝光。 可以执行多次曝光，同时：（a）改变感光材料上的曝光强度分布，或（b）将投影的掩模图案和敏感基板相对于彼此移动指定量，或（c）使用不同的 每次曝光的投影面具图案。