公开(公告)号：US20060016990A1

公开(公告)日：2006-01-26

申请号：US11183906

申请日：2005-07-19

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC分类号： H01J37/28 ,  H01J37/256

CPC分类号： H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

摘要翻译： 带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。 该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及 施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储 轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

公开(公告)号：US5266289A

公开(公告)日：1993-11-30

申请号：US612475

申请日：1990-11-14

申请人： Makoto Tsugeno ,  Kenji Tanimoto ,  Masao Kubo

发明人： Makoto Tsugeno ,  Kenji Tanimoto ,  Masao Kubo

IPC分类号： C01B33/10 ,  C01B33/18 ,  C01B33/12

CPC分类号： C01B33/103 ,  C01B33/186 ,  C01P2004/61 ,  C01P2006/12 ,  C01P2006/22 ,  C01P2006/80

摘要： A process for producing a high-purity silica, which comprises the steps of reacting a crude silica with ammonium fluoride, acid ammonium fluoride or a mixture thereof in an aqueous medium to produce ammonium silicofluoride, separating the ammonium silicofluoride from an unreacted silica and impurities by the means of a solid/liquid separation, and reacting the thus-obtained ammonium silicofluoride with ammonia in an aqueous medium. This process is a low cost process, and enables to control properties of silica.

公开(公告)号：US3985819A

公开(公告)日：1976-10-12

申请号：US513188

申请日：1974-10-08

申请人： Katsumi Kobayashi ,  Iwao Dohgane ,  Hiromichi Okabe ,  Kenji Tanimoto

发明人： Katsumi Kobayashi ,  Iwao Dohgane ,  Hiromichi Okabe ,  Kenji Tanimoto

IPC分类号： C07C2/68 ,  C07C2/70 ,  C07C3/56 ,  C07C15/24

CPC分类号： C07C2/68 ,  C07C2/70 ,  C07C2527/11 ,  C07C2527/126

摘要： A process for producing alkylnaphthalenes by alkylating naphthalene with an olefin having 2 to 4 carbon atoms, which comprises (1) introducing the olefin into a solution of crude naphthalene containing thianaphthene as an impurity in a solvent having a boiling point sufficiently different from the boiling point of the naphthalene and alkylnaphthalenes produced that the solvent is separable by distillation in the presence of (i) an aluminum chloride complex consisting of (a) aluminum chloride, (b) hydrogen chloride and (c) an alkylated benzene or naphthalene, or (ii) a solid aluminum chloride which is dissolved into the reaction solution by adding gaseous hydrogen chloride simultaneously with or prior to the introducing of the olefin, (2) aging the reaction solution, and (3) recovering the resulting alkylnaphthalenes, whereby alkylnaphthalenes, containing as monoalkylnaphthalenes a predominant amount of a .beta.-monoalkylnaphthalene, are obtained in a high yield.

摘要翻译： 通过用具有2〜4个碳原子的烯烃烷基化萘来制造烷基萘的方法，其包括：（1）将烯烃作为杂质引入到具有与沸点充分不同的沸点的溶剂中作为杂质， 的萘和烷基萘产生溶剂在（i）由（a）氯化铝，（b）氯化氢和（c）烷基化的苯或萘组成的氯化铝络合物存在下蒸馏分离，或（ii） ）固体氯化铝，其通过在引入烯烃的同时或之前加入气态氯化氢而溶解到反应溶液中，（2）使反应溶液老化，和（3）回收所得的烷基萘，由此烷基萘含有 以高产率获得主要量的β-单烷基萘的单烷基萘。

公开(公告)号：US3953521A

公开(公告)日：1976-04-27

申请号：US590930

申请日：1975-06-27

申请人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

发明人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

IPC分类号： C07C409/12 ,  C07C179/06

CPC分类号： C07C409/12 ,  C07C407/00 ,  C07C407/003

摘要： Meta-and/or paradiisopropylbenzene dihydroperoxides are continuously produced by oxidizing meta-and/or paradiisopropylbenzenes in liquid phase through contact with oxygen or a gas containing oxygen, while keeping the concentration of meta-and/or paradiisopropylbenzene monohydroperoxides of the oxidation product solution in a range of 20 to 40% by weight.

摘要翻译： 通过在与氧气或含氧气体接触的情况下液相氧化间位和/或对二异丙基苯，同时将氧化产物溶液的间 - 和/或对二甲基异丙基苯单氢过氧化物的浓度保持在一定范围内，从而连续制备元和/或对二异丙基苯二氢过氧化物 范围为20〜40重量％。

公开(公告)号：US3950431A

公开(公告)日：1976-04-13

申请号：US399248

申请日：1973-09-20

申请人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

发明人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

IPC分类号： C07C409/12 ,  B01D11/04 ,  C07C67/00 ,  C07C407/00 ,  C07C179/02

CPC分类号： C07C45/80 ,  B01D11/0488 ,  C07C407/00 ,  C07C407/003

摘要： Impurities, that is, by-products, in an oxidation product solution obtained by oxidation of diisopropylbenzene by molecular oxygen or in the oxidation product solution freed from diisopropylbenzene dihydroperoxide, are removed by extracting the by-products such as carbinols, ketones and styrenes from the solution with a mixture of an aqueous alkaline solution and at least one of alcohols having 1 to 3 carbon atoms such as methanol, ethanol, and isopropanol, as an extracting reagent at a temperature of 20.degree. to 80.degree.C.

摘要翻译： 通过用分子氧氧化二异丙基苯或通过从二异丙基苯二氢过氧化物中除去的氧化产物溶液获得的氧化产物溶液中的杂质，即副产物，通过从副产物溶液中提取副产物，例如甲醇，酮和苯乙烯 溶液与碱性水溶液和至少一种具有1至3个碳原子的醇的混合物如甲醇，乙醇和异丙醇作为萃取剂，在20至80℃的温度下进行。

公开(公告)号：US3932528A

公开(公告)日：1976-01-13

申请号：US391873

申请日：1973-08-27

申请人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

发明人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

IPC分类号： C07C409/12 ,  C07C67/00 ,  C07C407/00 ,  C07C179/02

CPC分类号： C07C407/006 ,  C07C407/003

摘要： Dihydroperoxides of dialkylaromatic hydrocarbons are separated in high yield from an aqueous alkaline solutions of hydroperoxides containing the dihydroperoxides by adding 0.01 to 1 % by weight of a compound having a nitrogen base, such as ammonia and aromatic amines, to the solution, based on the weight of the solution, thereby stabilizing the dihydroperoxides in the solution, and separating the dihydroperoxides therefrom by extraction.

摘要翻译： 基于重量，通过向溶液中加入0.01至1重量％的具有氮碱的化合物（例如氨和芳族胺），将二烷基芳烃的二氢​​过氧化物以高产率与含有二氢过氧化物的氢过氧化物的碱性水溶液分离。 的溶液，从而稳定溶液中的二氢过氧化物，并通过萃取从其中分离二氢过氧化物。

公开(公告)号：US08536540B2

公开(公告)日：2013-09-17

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US20120126118A1

公开(公告)日：2012-05-24

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26 ,  H01J37/20

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US07765817B2

公开(公告)日：2010-08-03

申请号：US11631859

申请日：2005-11-21

申请人： Masaaki Takegami ,  Satoru Sakae ,  Kenji Tanimoto

发明人： Masaaki Takegami ,  Satoru Sakae ,  Kenji Tanimoto

IPC分类号： F25B49/00

CPC分类号： F25B41/046 ,  F25B1/10 ,  F25B13/00 ,  F25B49/005 ,  F25B2313/0292 ,  F25B2400/0751 ,  F25B2400/22 ,  F25B2500/26 ,  F25B2600/021 ,  F25B2600/23 ,  F25B2700/1933 ,  Y02B30/741

摘要： In a refrigeration system, a first non-inverter compressor (2B) backs up one of an inverter compressor (2A) and a second non-inverter compressor (2C) by switching of a third four-way selector valve (3C). The refrigeration system includes: a suction pressure detection section (81) for detecting the suction pressure of the first non-inverter compressor (2B) after the issue of a switching command to the third four-way selector valve (3C); a command holding section (82) for, when the detected pressure of the suction pressure detection section (81) becomes lower than a predetermined value, determining that the third four-way selector valve (3C) has malfunctioned and holding the switching command; and a compressor standby section (83) for, upon the command holding section (82) holding the switching command, stopping the first non-inverter compressor (2B) and putting it into standby for a predetermined time.

摘要翻译： 在制冷系统中，通过切换第三四通换向阀（3C），第一非变频压缩机（2B）备用逆变器压缩机（2A）和第二非变频压缩机（2C）中的一个。 该制冷系统包括：在向第三四通换向阀（3C）发出切换指令之后，检测第一非变换器压缩机（2B）的吸入压力的吸入压力检测部（81） 指示保持部（82），当所述吸入压力检测部（81）的检测压力变得低于预定值时，确定所述第三四通换向阀（3C）发生故障并保持所述切换命令; 和压缩机待机部分（83），用于在保持切换命令的命令保持部分（82）上停止第一非逆变器压缩机（2B）并将其置于预定时间待机状态。

公开(公告)号：US07534155B2

公开(公告)日：2009-05-19

申请号：US10589819

申请日：2006-01-11

申请人： Hiroyuki Yonehara ,  Masanori Suzuki ,  Makoto Morita ,  Daisuke Adachi ,  Yasuyuki Akata ,  Kenji Tanimoto

发明人： Hiroyuki Yonehara ,  Masanori Suzuki ,  Makoto Morita ,  Daisuke Adachi ,  Yasuyuki Akata ,  Kenji Tanimoto

IPC分类号： H01J9/00

CPC分类号： H01J9/241

摘要： A method of manufacturing display panels includes forming a material layer on a substrate, and baking the material layer formed on substrate which is placed on a supporting bed. The supporting bed is formed of a first supporting bed and a second supporting bed placed on the first supporting bed. A difference in thermal expansion coefficient between the second supporting bed and the substrate is smaller than a difference in thermal expansion coefficient between the first supporting bed and the substrate, and the substrate is placed on the second supporting bed such that the substrate is positioned entirely within the perimeter of the second supporting bed during the baking and heating. This structure allows reduction of scratches on a surface of the substrate.

摘要翻译： 制造显示面板的方法包括在基板上形成材料层，并烘焙形成在放置在支撑床上的基板上的材料层。 支撑床由放置在第一支撑床上的第一支撑床和第二支撑床形成。 第二支撑床和基板之间的热膨胀系数的差异小于第一支撑床和基板之间的热膨胀系数差，并且将基板放置在第二支撑床上，使得基板完全位于 在烘烤和加热期间第二支撑床的周边。 这种结构允许减少基板表面上的划痕。