摘要:
A nonvolatile memory having a cell comprising an N.sup.+ type source region and drain region embedded in a P.sup.- type substrate and surrounded by respective P-pockets. The drain and source P-pockets are formed in two different high-angle boron implantation steps designed to optimize implantation energy and dosage for ensuring scalability of the cell and avoiding impairment of the snap-back voltage. The resulting cell also presents a higher breakdown voltage as compared with known cells.
摘要:
A method for programming a two-level polysilicon EEPROM memory cell, which cell is implemented in MOS technology on a semiconductor substrate and comprises a floating gate transistor and a further control gate overlying the floating gate with a dielectric layer therebetween, provides for the application of a negative voltage to the control gate during the cell write phase. This enables the voltages being applied across the thin tunnel oxide layer to be distributed so as to reduce the maximum amount of energy of the "holes" and improve the oxide reliability. In addition, by controlling the rise speed of the impulse to the drain region during the write phase, and of the impulse to the control gate during the erase phase, the maximum current flowing through the tunnel oxide can be set and the electric field being applied to the tunnel oxide kept constant, thereby the device life span can be extended.
摘要:
This invention provides bicyclic heterocyclic derivatives and their pharmaceutically acceptable salts useful for the treatment of hypertension, urethral and lower urinary tract contractions, and other disorders. The compounds are also useful for binding .alpha..sub.1 -adrenergic and 5HT.sub.1A serotonergic receptors, in vitro or in vivo.
摘要:
A device for the rapid fastening and unfastening of a tubular filtering fabric, comprises:a) a bearing structure (1, 1', 1") able to support filtering fabric (7) in the form of the desired tubular section;b) a fastening sleeve (2, 2') placed at each end of the tubular filtering fabric (7) and working with an outside ring (3, 3') and an inserted annular seal (5, 5') to allow tight anchoring of each of the ends of the tubular filtering fabric; andc) a fastening head (4, 4') placed at each end of the filtering fabric (7) and working with the fastening sleeve (2, 2') to press the ring (3, 3') tight in a stable manner against the sleeve (2, 2').
摘要:
A reference cell for reading EEPROM memory devices, capable of discharging any charges present in its own floating gate without varying the geometry of the cell with respect to that of the associated memory cells and without requiring specific manufacturing steps. For this purpose, a switch element, for example a diode, is provided between the floating gate and the substrate of the device and discharges any charges present in the floating gate toward the substrate during the cell idle state in the absence of read signals.
摘要:
Compounds of formula I ##STR1## wherein R.sub.1 is a cyano, nitro, benzoyl, acetyl, amido or alkoxycarbonyl group;R.sub.2 is substituted aryl- or heterocyclic residue;R.sub.3 is alkoxycarbonyl group;R.sub.4 and R.sub.5, being the same or different, are hydrogen, alkyl, aryl or heterocyclic groups;Y is oxygen, sulphur or substituted or unsubstituted nitrogen atom, that can be a part of a heterocyclic ring;n is 0, 1 or 2R6 and R.sub.10, that can be the same or different, are: hydrogen; C.sub.1 -C.sub.6 -alkyl optionally substituted by hydroxy, amino, monoalkyl and dialkylamino, C.sub.1 -C.sub.6 -alkoxy, C.sub.1 -C.sub.6 -alkoxycarbonyl, C.sub.1 -C.sub.3 -carbonyloxy, aryl, heteroaryl and cycloalkyl; a C.sub.1 -C.sub.12 -alkanoyl, aroyl or heteroaryl group optionally substituted by halogen, nitro, amino monoalkylamino, dialkylamino, hydroxy, C.sub.1 -C.sub.6 -alkoxy, C.sub.1 -C.sub.6 -alkoxycarbonyl, C.sub.1 -C.sub.6 -alkylthio, C.sub.1 -C.sub.3 -carbonyloxy, aryl, heteroaryl, cycloalkyl groups.These compounds are useful in therapy as cardiovascular agents.
摘要:
The process provides for obtaining in the areas intended for the formation of the transistors windows in the intermediate oxide layer between the two silicon layers and, before final etching of the two silicon layers and the intermediate oxide, application of a mask formed in such a manner as to superimpose on the second silicon layer in the transistor areas coverings wider than the corresponding windows of the intermediate oxide layer.