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148 条记录 (耗时 0.068 秒)

    Laser system
    62.
    发明申请
    Laser system 审中-公开
    激光系统

    公开(公告)号：US20090296755A1

    公开(公告)日：2009-12-03

    申请号：US11980288

    申请日：2007-10-30

    申请人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    发明人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    IPC分类号： H01S3/10 ,  H01S3/22

    CPC分类号： H01S3/225 ,  G02F1/3534 ,  G02F1/37 ,  G03F7/70583 ,  H01S3/0057 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/08004 ,  H01S3/0835 ,  H01S3/10092 ,  H01S3/1618 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2383

    摘要： A method and apparatus may comprise a laser light source system which may comprise a solid state laser seed beam source providing a seed laser output; a frequency conversion stage converting the seed laser output to a wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; an excimer or molecular fluorine gas discharge laser gain medium amplifying the converted seed laser output to produce a gas discharge laser output at approximately the converted wavelength. The excimer or molecular fluorine laser may be selected from a group comprising XeCl, XeF, KrF, ArF and F2 laser systems. The laser gain medium may comprise a power amplifier. The power amplifier may comprise a single pass amplifier stage, a multiple-pass amplifier stage, a ring power amplification stage or a power oscillator. The ring power amplification stage may comprise a bow-tie configuration or a race track configuration.

    摘要翻译： 方法和装置可以包括激光光源系统，其可以包括提供种子激光输出的固态激光种子光源; 将种子激光输出转换成适合于接种准分子或分子氟气放电激光的波长的变频级; 放大转换的种子激光输出的准分子或分子氟气放电激光增益介质，以产生大致转换波长的气体放电激光输出。 受激准分子或分子氟激光可以选自包括XeCl，XeF，KrF，ArF和F2激光系统的组。 激光增益介质可以包括功率放大器。 功率放大器可以包括单通放大器级，多通道放大级，环形功率放大级或功率振荡器。 环形功率放大级可以包括弓形配置或赛道配置。

    Laser system
    63.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20090067468A1

    公开(公告)日：2009-03-12

    申请号：US11980172

    申请日：2007-10-30

    申请人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    发明人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2383 ,  G03F7/70583 ,  H01S3/0057 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2325

    摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.

    摘要翻译： 方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。

    Gas discharge laser chamber
    67.
    发明授权
    Gas discharge laser chamber 有权
    气体放电激光室

    公开(公告)号：US07995637B2

    公开(公告)日：2011-08-09

    申请号：US12603486

    申请日：2009-10-21

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    IPC分类号： H01S3/22

    CPC分类号： H01S3/036

    摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.

    摘要翻译： 所公开的主题的一个方面描述了气体放电激光室。 气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近 到放电区域的输入侧。 输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准， 由多个沟槽分离的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动的方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距 。

    Laser system
    68.
    发明授权
    Laser system 失效
    激光系统

    公开(公告)号：US07715459B2

    公开(公告)日：2010-05-11

    申请号：US11982152

    申请日：2007-10-31

    申请人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    发明人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2308 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08036 ,  H01S3/225 ,  H01S3/2325 ,  H01S3/2383

    摘要： An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system.

    摘要翻译： 可以包括：非常高的电力线狭窄的光刻激光光源，其可以包括：固态种子激光系统，其可以包括：提供种子间激光输出的种子间激光; 接收所述种子间激光输出并提供放大的种子激光脉冲的光纤放大器，其可以包括：具有在所述DUV范围之外的标称波长的脉冲; 变换器基本上转换为放大器增益介质的波长; 第一和第二气体放电激光放大器增益介质，与种子激光输出的重复频率不同; 一个分束器，为放大器增益介质提供来自种子激光器的输出脉冲; 组合各个放大器增益介质的输出的光束组合器，以提供具有固态种子激光器系统的脉冲重复率的激光输出光脉冲光束。

    Laser system
    70.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号：US07643529B2

    公开(公告)日：2010-01-05

    申请号：US11982103

    申请日：2007-10-31

    申请人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    发明人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

    IPC分类号： H01S3/22

    CPC分类号： G03F7/70341 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

    摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser.

    摘要翻译： 一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自 第一种子激光; 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2 X kHz工作。