公开(公告)号：US06336991B1

公开(公告)日：2002-01-08

申请号：US09109178

申请日：1998-07-02

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： C23C1600

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： In a method of holding a substrate and a substrate holding system, the amount of foreign substances on the back surface of the substrate can be decreased, and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.

摘要翻译： 在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物量，并且只有少量的异物从安装台传递到基板。 为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上， 与基板的周边相对应的位置以及与基板的中心对应的位置，以及静电引导装置，用于通过使基板的背面与环状防漏面接触而固定基板，以及接触保持部 。 将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。

公开(公告)号：US06221201B1

公开(公告)日：2001-04-24

申请号：US09108835

申请日：1998-07-02

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H05H100

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： Present invention provides a method of holding substrate and a substrate holding system where the amount of foreign substances on the back surface can be decreased, and a little amount of foreign substances may be transferred from a mounting table to a substrate. The substrate holding system comprises a ring-shaped leakage-proof surface having smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic ttraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

公开(公告)号：US6161867A

公开(公告)日：2000-12-19

申请号：US943622

申请日：1997-10-03

申请人： Naoyuki Tamura

发明人： Naoyuki Tamura

IPC分类号： B60R19/02 ,  B60R19/12 ,  B60R21/00 ,  B60R9/02

CPC分类号： B60R19/02 ,  B60R19/12 ,  B60R2021/002

摘要： A skid bar is mountable on existing front tow hooks of a vehicle, for protecting an engine, transmission and/or engine accessories from severe road conditions. The skid bar includes an elongated lateral member and a pair of end plates fixed to opposing ends of the lateral member. The end plates correspond to and are engageable with the existing tow hooks of the vehicle. The underguard skid bar extends in front of and below an engine/transmission assembly for protecting the same when the vehicle is travelling on a road having severe obstacles such as road bumps or road gutters. Each end plate has a plurality of bolt holes corresponding to tow openings in the existing tow hooks, such that each end plate is securable to the existing tow hooks, by being bolted thereto, through the tow openings in the existing tow hooks. Furthermore, each of the end plates presents a tow opening in a forward portion thereof.

摘要翻译： 一个滑轨可安装在车辆的现有前牵引钩上，用于保护发动机，变速箱和/或发动机附件免受恶劣的道路条件的影响。 防滑杆包括细长的侧向构件和固定到侧向构件的相对端部的一对端板。 端板对应于并且可与车辆的现有牵引钩接合。 防护板滑杆在发动机/变速器组件的前方和下方延伸，以在车辆在具有严重障碍物（例如道路颠簸或道路沟槽）的道路上行驶时对其进行保护。 每个端板具有对应于现有牵引钩中的丝束开口的多个螺栓孔，使得每个端板通过螺栓连接到现有的牵引钩上的丝束开口而可固定到现有的牵引钩上。 此外，每个端板在其前部具有丝束开口。

公开(公告)号：US6048434A

公开(公告)日：2000-04-11

申请号：US670180

申请日：1996-06-20

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H01L21/00 ,  H01L21/68 ,  H01L21/683 ,  C23F1/02 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A substrate holding system is provided for holding a substrate in a substrate etching apparatus by using electrostatic force. An electrical insulating member is also provided having a top surface approximately at the same level as the treated surface of the substrate and having an inner side surface in adjacent relationship with a surface of the substrate forming the periphery of the substrate. The inner side surface of the electrical insulating member faces the periphery of the substrate in substantially parallel relationship with a direction normal to the treated surface of the substrate. A dielectric film is formed on one surface of a metallic member having a flow passage for circulating a coolant to control the temperature of the substrate. An electrically insulating material member is placed on and in contact with a surface of the metallic member. An electrically conductive material member grounded to a standard electric potential is placed on and in contact with a surface of the electrically insulating material member. Three kinds of members are overlaid and fixed to each other in order of the metallic member having the dielectric film, the electrically insulating material member and the standard electric potential member. A coolant hole penetrates from the standard electric potential member side to the coolant flow passage of the metallic member being formed, at least three through holes penetrating the three kinds of members being formed and movable members linked to a substrate transporting mechanism being inserted in the through holes.

摘要翻译： 提供了通过使用静电力将基板保持在基板蚀刻装置中的基板保持系统。 还提供一种电绝缘构件，其具有与基板的处理表面大致相同水平面的顶表面，并且具有与形成基板周边的基板的表面相邻的内侧表面。 电绝缘构件的内侧表面基本上与基板的被处理表面垂直的方向平行。 在具有用于循环冷却剂的流路的金属构件的一个表面上形成电介质膜以控制衬底的温度。 电绝缘材料构件放置在金属构件的表面上并与金属构件的表面接触。 接地到标准电位的导电材料构件放置在电绝缘材料构件的表面上并与电绝缘材料构件的表面接触。 按照具有电介质膜的金属构件，电绝缘材料构件和标准电位构件的顺序将三种构件重叠并固定。 冷却剂孔从标准电位部件侧穿过形成的金属部件的冷却剂流路，至少形成贯通形成有三个部件的3个贯通孔，与基板传送机构连结的可动部件插入贯通孔 孔。

公开(公告)号：US5574247A

公开(公告)日：1996-11-12

申请号：US263323

申请日：1994-06-21

申请人： Eisuke Nishitani ,  Susmu Tsuzuku ,  Natsuyo Chiba ,  Shigeru Kobayashi ,  Naoyuki Tamura ,  Norihiro Uchida

发明人： Eisuke Nishitani ,  Susmu Tsuzuku ,  Natsuyo Chiba ,  Shigeru Kobayashi ,  Naoyuki Tamura ,  Norihiro Uchida

IPC分类号： H01L21/285 ,  C23C16/02 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C23C16/54 ,  H01L21/205 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/45521 ,  C23C16/0245 ,  C23C16/4585 ,  C23C16/481 ,  C23C16/54

摘要： A CVD reactor apparatus includes a substrate clamp for clamping a peripheral edge of the front of a substrate disposed in a CVD reactor and, dividing a space in the reactor into a first space adjacent the front of the substrate and a second space adjacent the backside of the substrate. The apparatus also includes a unit for cooling the surface temperature of an inner wall of the reactor to a temperature equal to or less than a deposition lower limit, and a unit for supplying a CVD gas to the first space adjacent the substrate front and supplying an inert gas to the second space adjacent the substrate backside at different pressures and causing a reaction at only the substrate front, a reaction gas monitor and a substrate temperature monitor.

摘要翻译： CVD反应器装置包括用于夹持设置在CVD反应器中的衬底的前部的周边边缘并将反应器中的空间分成邻近衬底前部的第一空间的衬底夹具和邻近衬底前侧的第二空间 底物。 该装置还包括用于将反应器的内壁的表面温度冷却到等于或小于沉积下限的温度的单元，以及用于将CVD气体供应到邻近基板前部的第一空间并提供 惰性气体在不同压力下靠近衬底背面的第二空间并且仅在衬底前部产生反应，反应气体监测器和衬底温度监测器。

公开(公告)号：US5536359A

公开(公告)日：1996-07-16

申请号：US309409

申请日：1994-09-20

申请人： Hiroki Kawada ,  Kazue Takahashi ,  Manabu Edamura ,  Saburo Kanai ,  Naoyuki Tamura

发明人： Hiroki Kawada ,  Kazue Takahashi ,  Manabu Edamura ,  Saburo Kanai ,  Naoyuki Tamura

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/00

CPC分类号： H01J37/32862 ,  H01J37/32935 ,  H01J37/32972 ,  H01J2237/022

摘要： A semiconductor device manufacturing apparatus and its method, measures the amount or chemical composition of reaction products adhering to or deposited on the inside of a processing chamber of the semiconductor device manufacturing apparatus, without exposing the chamber to the air. External light, such as infrared light, is introduced from a light introducing unit into the processing chamber. A light receiving unit provided outside the processing chamber receives light reflected from a specified location inside the processing chamber or light reflected from an arbitrary location inside the chamber. The received light is then subjected to spectrometry or photometry to judge how badly the chamber is contaminated and to judge the state of the process being carried out.

摘要翻译： 一种半导体器件制造装置及其方法，用于测量粘附或沉积在半导体器件制造装置的处理室内部的反应产物的量或化学组成，而不将该室暴露于空气。 诸如红外光的外部光从光引入单元引入处理室。 设置在处理室外部的光接收单元接收从处理室内的指定位置反射的光或从室内的任意位置反射的光。 然后将接收的光进行光谱测定或光度测定，以判断室被污染的程度如何，并判断正在进行的过程的状态。

公开(公告)号：US5448470A

公开(公告)日：1995-09-05

申请号：US941905

申请日：1992-09-08

申请人： Kouji Nishihata ,  Naoyuki Tamura ,  Shigekazu Kato ,  Atsushi Itou ,  Tsunehiko Tsubone

发明人： Kouji Nishihata ,  Naoyuki Tamura ,  Shigekazu Kato ,  Atsushi Itou ,  Tsunehiko Tsubone

IPC分类号： G05B15/02 ,  G05B19/418 ,  H01L21/677 ,  G06F15/46

CPC分类号： G05B19/4184 ,  G05B19/41845 ,  G05B2219/31361 ,  G05B2219/31362 ,  G05B2219/35291 ,  G05B2219/45026 ,  Y02P90/14 ,  Y02P90/16 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14

摘要： A multiprocessing apparatus has a plurality of process processors connected to a carrier processor and controlled by a control system, wherein there are provided connection information signal generating means for generating a connection information signal expressing information of connection of the plurality of process processors to the carrier processor; switching means for generating a registration information signal expressing information of registration of connection of the plurality of process processors to the carrier processor; and control means for carrying out a control process while logically judging a matching state between the connected process processors and the registered process processors by reference to the connection information and the registration information. Thus, it is possible to provide a multiprocessing apparatus in which the number of process processors to be connected to the carrier processor can be securely increased or decreased.

摘要翻译： 多处理装置具有连接到载波处理器并由控制系统控制的多个处理处理器，其中提供有连接信息信号产生装置，用于产生表示多个处理处理器连接到载波处理器的信息的连接信息信号 ; 切换装置，用于产生表示将多个处理处理器的连接登记到载波处理器的信息的登记信息信号; 以及控制装置，用于通过参考连接信息和注册信息逻辑地判断连接的处理处理器和注册的处理处理器之间的匹配状态来执行控制处理。 因此，可以提供一种可以可靠地增加或减少要连接到载波处理器的处理器的数量的多处理装置。

公开(公告)号：US5320982A

公开(公告)日：1994-06-14

申请号：US724801

申请日：1991-07-02

申请人： Tsunehiko Tsubone ,  Naoyuki Tamura ,  Shigekazu Kato ,  Kouji Nishihata ,  Atsushi Itou

发明人： Tsunehiko Tsubone ,  Naoyuki Tamura ,  Shigekazu Kato ,  Kouji Nishihata ,  Atsushi Itou

IPC分类号： C23C14/50 ,  C23C14/54 ,  C23C16/458 ,  C30B33/00 ,  H01L21/00 ,  H01L21/465

CPC分类号： C23C16/466 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4583 ,  C23C16/4586 ,  C30B33/00 ,  H01L21/67103 ,  H01L21/67109 ,  Y10T279/23

摘要： This invention relates to a vacuum processing method and apparatus. When a sample is plasma-processed under a reduced pressure, a sample bed is cooled by a cooling medium kept at a predetermined temperature lower than an etching temperature, the sample is held on the sample bed, a heat transfer gas is supplied between the back of the sample and the sample installation surface of the sample bed, and the pressure of the heat transfer gas is controlled so as to bring the sample to a predetermined processing temperature. In this way, a sample temperature can be regulated rapidly without increasing the scale of the apparatus.

摘要翻译： 本发明涉及一种真空处理方法和装置。 当样品在减压下进行等离子体处理时，样品床被保持在低于蚀刻温度的预定温度的冷却介质冷却，将样品保持在样品床上，在后面提供传热气体 的样品和样品安装表面，并且控制传热气体的压力以使样品达到预定的处理温度。 以这种方式，可以快速调节样品温度，而不会增加设备的规模。

公开(公告)号：US5036758A

公开(公告)日：1991-08-06

申请号：US306670

申请日：1989-02-06

申请人： Yoshinori Kobayashi ,  Naoyuki Tamura

发明人： Yoshinori Kobayashi ,  Naoyuki Tamura

IPC分类号： B31F1/07 ,  D06C15/02 ,  D06C15/08

CPC分类号： D06C15/08 ,  B31F1/07 ,  D06C15/02 ,  B31F2201/0733 ,  B31F2201/0738 ,  B31F2201/0756 ,  B31F2201/0758

摘要： An emboss roll according to the present invention is capable of assuredly performing an embossing work without any risk of shaving a surface of nonwoven fabrics and forming pin holes when used to emboss nonwoven fabrics for the purpose of prevention of filament shavings to be adhered to products. This emboss roll having an outer surface thereof provided with embossing projections wherein all of the top end corners thereof are cut so as to be a surface. As a result of cutting the top end corners of the embossing projections, nonwoven fabrics can be protected from being cut by the corner portions or forming pin holes during the embossing work.

摘要翻译： 根据本发明的压花辊能够可靠地进行压花加工，而无需刮去非织造织物表面的风险，并且在用于压花非织造织物时形成针孔，以防止将细丝屑粘附到产品上。 该压花辊的外表面设置有压花突起，其中所有顶端的角部被切割为表面。 通过切割压花突起的顶端角部，可以防止非织造织物在压花加工期间被角部切割或形成销孔。

公开(公告)号：US4810556A

公开(公告)日：1989-03-07

申请号：US102431

申请日：1987-09-29

申请人： Yoshinori Kobayashi ,  Naoyuki Tamura ,  Takanobu Sakai ,  Yoshinori Yoshida

发明人： Yoshinori Kobayashi ,  Naoyuki Tamura ,  Takanobu Sakai ,  Yoshinori Yoshida

IPC分类号： D04H3/16 ,  D04H1/04

CPC分类号： D04H3/16 ,  Y10S428/913 ,  Y10T428/24446 ,  Y10T428/27 ,  Y10T442/681

摘要： Disclosed are a very soft polyolefin spunbonded nonwoven fabric and its production method. The polyolefin spunbonded nonwoven fabric according to the present invention is defined as (A) being formed of continuous polyolefin fibers having a fineness of 0.5 to 3 denier, (B) having basic weight between 30 g/m.sup.2 and 15 g/m.sup.2, and (C) having .sqroot.S.sub.MD .times.S.sub.TD of 2.5 g or below, wherein S.sub.MD and S.sub.TD are respectively the softnesses in the machine and transverse directions as measured by a handle-O-meter. The method of producing a strip of very soft polyolefin nonwoven fabric by directing polyolefin continuous fibers in a fixed direction, comprises the steps of: orienting the axes of the continuous fibers in the direction in which the continuous fibers are fed so as to form a web having a warp orientation factor (the maximum tensile strength in the direction in which the continuous fibers are fed, i.e., in a machine direction/the maximum tensile strength in a transverse direction) of 3.0 or above; and then applying wave-like crepes propagated in the machine direction to the web by creping the web.

摘要翻译： 公开了一种非常柔软的聚烯烃纺粘无纺布及其制造方法。 根据本发明的聚烯烃纺粘非织造织物定义为（A）由细度为0.5至3旦尼尔的连续聚烯烃纤维，（B）的碱性重量为30克/米2至15克/米2，和 C）具有2.5g或以下的2ROOT SMDxSTD，其中SMD和STD分别是由手柄O测量仪测量的机器和横向的柔软度。 通过在固定方向上引导聚烯烃连续纤维来生产非常柔软的聚烯烃无纺织物条的方法包括以下步骤：将连续纤维的轴线沿着连续纤维进给的方向取向，以形成网 具有翘曲取向因数（连续纤维进给方向的最大拉伸强度，即机器方向/横向的最大拉伸强度）为3.0以上; 然后通过起皱纸幅将沿机器方向传播的波状褶皱应用于幅材。