公开(公告)号：US09269545B2

公开(公告)日：2016-02-23

申请号：US12595273

申请日：2008-03-11

Applicant: Joerg Vetter

Inventor： Joerg Vetter

IPC: C23C14/34 ,  H01J37/32 ,  H01J37/305

CPC classification number: H01J37/3266 ,  H01J37/3053 ,  H01J37/32055 ,  H01J37/32669 ,  H01J2237/3132

Abstract: The invention relates to a vacuum arc source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporization material (31) as a cathode (32) for the production of an arc discharge on an vaporization surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporization surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporization surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporization surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporization chamber (10) with an arc vaporization source (1).

Abstract translation: 本发明涉及一种真空电弧源（1），其包括环形磁场源（2）和阴极体（3），其中蒸发材料（31）作为阴极（32）用于产生电弧放电 阴极（32）的汽化表面（33）。 在这种布置中，阴极体（3）通过阴极基体（34）在第一轴向方向上沿轴向限定，并且在第二轴向方向上由汽化表面（33）限定，并且环状磁性（2）为 与蒸发表面（33）的表面法线（300）平行或反平行偏振地排列。 根据本发明，在阴极基座（34）的前面以可预定的第二间隔（A2）在远离蒸发表面（33）的一侧设置磁场增强环（4）。 本发明还涉及具有电弧蒸发源（1）的电弧蒸发室（10）。

公开(公告)号：US09068918B2

公开(公告)日：2015-06-30

申请号：US13678765

申请日：2012-11-16

Applicant: SKYWORKS SOLUTIONS, INC.

Inventor： Kezia Cheng

IPC: G01R27/08 ,  G01N27/00 ,  H01J37/304 ,  H01J37/305 ,  H01L21/02

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: Disclosed herein are systems and methods for in-situ measurement of impurities on metal slugs utilized in electron-beam metal evaporation/deposition systems, and for increasing the production yield of a semiconductor manufacturing processes utilizing electron-beam metal evaporation/deposition systems. A voltage and/or a current level on an electrode disposed in a deposition chamber of an electron-beam metal evaporation/deposition system is monitored and used to measure contamination of the metal slug. Should the voltage or current reach a certain level, the deposition is completed and the system is inspected for contamination.

Abstract translation: 本文公开了用于在电子束金属蒸发/沉积系统中使用的金属块上的杂质原位测量的系统和方法，以及利用电子束金属蒸发/沉积系统提高半导体制造工艺的产量。 监测设置在电子束金属蒸发/沉积系统的沉积室中的电极上的电压和/或电流水平，以用于测量金属屑的污染。 如果电压或电流达到一定水平，则完成沉积并检查系统是否有污染。

公开(公告)号：US08926807B2

公开(公告)日：2015-01-06

申请号：US13016053

申请日：2011-01-28

Applicant: Yuji Kajihara

Inventor： Yuji Kajihara

IPC: C23C14/34 ,  C23C14/54 ,  C23C14/50

CPC classification number: C23C14/54 ,  C23C14/50 ,  C23C14/505 ,  H01J2237/2007 ,  H01J2237/3132

Abstract: To uniformly perform processing such as deposition on a processing object such as a large, heavy substrate for optics, the large, heavy substrate for optics is accurately, reliably attached to a holder. A vacuum processing apparatus which processes a processing object in a vacuum vessel includes a susceptor which has a surface having concavity and convexity, that is opposite to its surface on which the processing object is mounted, and movably holds the processing object, a holder which has a surface having concavity and convexity which mesh with those of the susceptor, a driving mechanism which holds the holder to be movable to a first state or a second state, and a control means for moving the susceptor while the holder is held in the first state to mesh the surface, having the concavity and convexity, of the susceptor with the surface, having the concavity and convexity, of the holder and thereby connect the susceptor and the holder to each other, moving the holder, to which the susceptor is connected, to the second state and processing the processing object, and moving the holder to the first state again and moving the susceptor so that the surface, having the concavity and convexity, of the susceptor is separated from the surface, having the concavity and convexity, of the holder.

Abstract translation: 为了均匀地进行诸如沉积在诸如用于光学器件的大的重的基底的处理对象上的处理，用于光学的大的重的基底被准确地可靠地附接到保持器。 处理真空容器中的处理对象的真空处理装置包括具有凹凸面的基座，其与安装有加工对象的表面相反，并且可移动地保持加工对象，具有 具有与所述基座的孔相啮合的凹凸面的表面，保持所述保持件能够移动到第一状态或第二状态的驱动机构，以及用于在所述保持器保持在所述第一状态下使所述基座移动的控制单元 使具有凹部和凹凸的基座的表面具有凹凸的表面，从而将基座和支架彼此连接，使基座与基座相连接的支架移动， 到第二状态并处理处理对象，并且再次将保持器移动到第一状态并移动基座，使得具有凹凸的表面 将基座从保持器的凹凸表面分离出来。

公开(公告)号：US08826856B2

公开(公告)日：2014-09-09

申请号：US13058557

申请日：2009-08-17

Applicant: Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

Inventor： Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

IPC: C23C16/00 ,  C23C16/50 ,  C23C14/22 ,  C23C14/10 ,  C23C14/08

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/10 ,  C23C14/221 ,  C23C14/225 ,  H01J2237/0041 ,  H01J2237/3132

Abstract: An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum vessel (10). A dome shaped holder (12) is disposed within the vacuum vessel (10) and holds the substrates (14). A drive rotates the dome shaped holder (12). A vapor depositing source (34) is disposed oppositely to the substrates (14). An ion source (38) irradiates ions to the substrates (14). A neutralizer (40) irradiates electrons to the substrates (14). The ion source (38) is disposed at an angle between an axis, along which ions are irradiated from the ion source (38), and a line perpendicular to a surface of each of the substrates (14). The angle is between 8° inclusive and 40° inclusive. A ratio of a distance in a vertical direction between (i) a center of rotational axis of the dome shaped holder (12), and (ii) a center of the ion source (38), relative to a diameter of the dome shaped holder (12), is between 0.5 inclusive and 1.2 inclusive.

Abstract translation: 光学薄膜蒸镀装置和方法能够通过将气相沉积物质蒸镀在真空容器（10）内的基板（14）上来制造光学薄膜。 圆顶形保持器（12）设置在真空容器（10）内并保持基板（14）。 驱动器旋转圆顶形保持器（12）。 气相沉积源（34）与衬底（14）相对设置。 离子源（38）将离子照射到衬底（14）上。 中和器（40）将电子照射到衬底（14）上。 离子源（38）以垂直于每个基板（14）的表面的线与离子源（38）照射的轴线之间成角度地设置。 角度介于8°至40°之间。 （i）圆顶状保持器（12）的旋转轴的中心与（ii）离子源（38）的中心之间的垂直方向上的距离相对于圆顶状保持器的直径的比例 （12），介于0.5和0.5之间。

公开(公告)号：US20110193576A1

公开(公告)日：2011-08-11

申请号：US12831855

申请日：2010-07-07

Applicant: Kezia Cheng

Inventor： Kezia Cheng

IPC: G01R27/08

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: Disclosed herein are systems and methods for in-situ measurement of impurities on metal slugs utilized in electron-beam metal evaporation/deposition systems, and for increasing the production yield of a semiconductor manufacturing processes utilizing electron-beam metal evaporation/deposition systems. A voltage and/or a current level on an electrode disposed in a deposition chamber of an electron-beam metal evaporation/deposition system is monitored and used to measure contamination of the metal slug. Should the voltage or current reach a certain level, to the deposition is completed and the system is inspected for contamination.

Abstract translation: 本文公开了用于在电子束金属蒸发/沉积系统中使用的金属块上的杂质的原位测量的系统和方法，以及利用电子束金属蒸发/沉积系统提高半导体制造工艺的生产产量。 监测设置在电子束金属蒸发/沉积系统的沉积室中的电极上的电压和/或电流水平，以用于测量金属屑的污染。 如果电压或电流达到一定水平，完成沉积并检查系统是否有污染。

公开(公告)号：US20110120858A1

公开(公告)日：2011-05-26

申请号：US13016053

申请日：2011-01-28

Applicant: Yuji Kajihara

Inventor： Yuji Kajihara

IPC: C23C14/54 ,  C23C14/34 ,  C23C14/50

CPC classification number: C23C14/54 ,  C23C14/50 ,  C23C14/505 ,  H01J2237/2007 ,  H01J2237/3132

Abstract: To uniformly perform processing such as deposition on a processing object such as a large, heavy substrate for optics, the large, heavy substrate for optics is accurately, reliably attached to a holder. A vacuum processing apparatus which processes a processing object in a vacuum vessel includes a susceptor which has a surface having concavity and convexity, that is opposite to its surface on which the processing object is mounted, and movably holds the processing object, a holder which has a surface having concavity and convexity which mesh with those of the susceptor, a driving mechanism which holds the holder to be movable to a first state or a second state, and a control means for moving the susceptor while the holder is held in the first state to mesh the surface, having the concavity and convexity, of the susceptor with the surface, having the concavity and convexity, of the holder and thereby connect the susceptor and the holder to each other, moving the holder, to which the susceptor is connected, to the second state and processing the processing object, and moving the holder to the first state again and moving the susceptor so that the surface, having the concavity and convexity, of the susceptor is separated from the surface, having the concavity and convexity, of the holder.

Abstract translation: 为了均匀地进行诸如沉积在诸如用于光学器件的大的重的基底的处理对象上的处理，用于光学的大的重的基底被准确地可靠地附接到保持器。 处理真空容器中的处理对象的真空处理装置包括具有凹凸面的基座，其与安装有加工对象的表面相反，并且可移动地保持加工对象，具有 具有与所述基座的孔相啮合的凹凸面的表面，保持所述保持件能够移动到第一状态或第二状态的驱动机构，以及用于在所述保持器保持在所述第一状态下使所述基座移动的控制单元 使具有凹部和凹凸的基座的表面具有凹凸的表面，从而将基座和支架彼此连接，使基座与基座相连接的支架移动， 到第二状态并处理处理对象，并且再次将保持器移动到第一状态并移动基座，使得具有凹凸的表面 将基座从保持器的凹凸表面分离出来。

公开(公告)号：US20110101245A1

公开(公告)日：2011-05-05

申请号：US12736643

申请日：2009-04-15

Applicant: Qiu-Hong Hu

Inventor： Qiu-Hong Hu

IPC: G21G5/00 ,  C23C16/448

CPC classification number: C23C14/30 ,  C30B23/066 ,  H01J1/304 ,  H01J37/065 ,  H01J37/073 ,  H01J37/1472 ,  H01J37/3053 ,  H01J2201/30496 ,  H01J2237/06341 ,  H01J2237/30472 ,  H01J2237/3132

Abstract: The present invention relates to an evaporation system comprising a vacuum chamber, a crucible for receiving an evaporation material, a substrate holder for receiving a substrate, and an electron beam source for heating the evaporation material to be deposited on the substrate, wherein the electron beam source together with the crucible and the substrate holder are arranged inside of the vacuum chamber, the electron beam source is a field emission electron beam source, and the evaporation system further comprises a control unit for controlling the direction of electrons emitted by the field emission electron beam source such that the emitted electrons heat the evaporation material such that it evaporates.

Abstract translation: 本发明涉及一种蒸发系统，包括真空室，用于接收蒸发材料的坩埚，用于接收基板的基板保持器和用于加热待沉积在基板上的蒸发材料的电子束源，其中电子束 源极与坩埚和衬底保持器一起布置在真空室的内部，电子束源是场发射电子束源，并且蒸发系统还包括用于控制由场致发射电子发射的电子的方向的控制单元 使得发射的电子加热蒸发材料使其蒸发。

公开(公告)号：US20100213055A1

公开(公告)日：2010-08-26

申请号：US12595273

申请日：2008-03-11

Applicant: Jörg Vetter

Inventor： Jörg Vetter

IPC: C23C14/32

CPC classification number: H01J37/3266 ,  H01J37/3053 ,  H01J37/32055 ,  H01J37/32669 ,  H01J2237/3132

Abstract: The invention relates to a vacuum arc vaporisation source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporisation material (31) as a cathode (32) for the production of an arc discharge on an vaporisation surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporisation surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporisation surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporisation surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporisation chamber (10) with an arc vaporisation source (1).

Abstract translation: 本发明涉及一种真空电弧气化源（1），其包括环形磁场源（2）和阴极体（3），其中气化材料（31）作为阴极（32）用于产生电弧放电 在阴极（32）的汽化表面（33）上。 在这种布置中，阴极体（3）在第一轴向方向上通过阴极基体（34）沿轴向方向限定，并且在第二轴向方向上被气化表面（33）限定，并且环状磁体（2）是 与气化表面（33）的表面法线（300）平行或反平行偏振并且同心。 根据本发明，在阴极基座（34）的前方以预定的第二间隔（A2）在远离蒸发表面（33）的一侧设置磁场增强环（4）。 本发明还涉及具有电弧蒸发源（1）的电弧蒸发室（10）。

公开(公告)号：US07479632B1

公开(公告)日：2009-01-20

申请号：US11341154

申请日：2006-01-27

Applicant: Michael Alan Gevelber ,  Adam Scott Brewster ,  Brian Louis Vattiat

Inventor： Michael Alan Gevelber ,  Adam Scott Brewster ,  Brian Louis Vattiat

IPC: H01J37/30

CPC classification number: H01J37/22 ,  H01J37/1475 ,  H01J37/3053 ,  H01J2237/1526 ,  H01J2237/221 ,  H01J2237/2445 ,  H01J2237/2482 ,  H01J2237/30472 ,  H01J2237/3132

Abstract: A method of characterizing an electron beam is described, comprising providing a system including an electron gun having a steering coil. A material having a surface is also provided. An electron beam from said electron gun is directed to said surface. The directing includes providing a first current to the steering coil to direct the electron beam to a first point on the surface and then providing a second current to the steering coil to direct the electron beam to a second point on the surface. An imaging system is mounted for viewing said surface. An image is collected based on light emitted from the surface because of the electron beam directed at the first point and the second point. A light intensity is determined at the first point and at the second point.

Abstract translation: 描述了一种表征电子束的方法，包括提供包括具有转向线圈的电子枪的系统。 还提供了具有表面的材料。 来自所述电子枪的电子束被引导到所述表面。 导向包括向转向线圈提供第一电流以将电子束引导到表面上的第一点，然后向转向线圈提供第二电流以将电子束引导到表面上的第二点。 安装用于观察所述表面的成像系统。 由于电子束指向第一点和第二点，所以基于从表面发射的光收集图像。 在第一点和第二点确定光强度。

公开(公告)号：US20070096620A1

公开(公告)日：2007-05-03

申请号：US11266032

申请日：2005-11-02

Applicant: Viktor Tymashov ,  Oleg Zhdanov ,  Sergiy Ryabenko ,  Andriy Tsepkalov ,  Steven Burns

Inventor： Viktor Tymashov ,  Oleg Zhdanov ,  Sergiy Ryabenko ,  Andriy Tsepkalov ,  Steven Burns

IPC: H01J29/46

CPC classification number: H01J37/3053 ,  H01J3/02 ,  H01J3/027 ,  H01J37/065 ,  H01J2237/06308 ,  H01J2237/14 ,  H01J2237/15 ,  H01J2237/3132

Abstract: An electron gun includes the following: a primary thermionic electron source, a secondary thermionic electron source and a focusing electrode disposed within a first housing that includes one or more reference members adjustably attached to a housing support connected to a first platform; an anode and one or more focusing coils disposed within a second housing comprising one or more insulating members adjustably connected to the first platform; and one or more deflection coils disposed within a third housing connected to the second housing and located opposite said first housing.

Abstract translation: 电子枪包括以下：初级热离子电子源，二次热离子电子源和聚焦电极，其设置在第一壳体内，该第一壳体包括一个或多个可调节地连接到连接到第一平台的壳体支撑件的参考构件; 阳极和设置在第二壳体内的一个或多个聚焦线圈，包括可调节地连接到第一平台的一个或多个绝缘构件; 以及设置在连接到第二壳体并且与第一壳体相对定位的第三壳体内的一个或多个偏转线圈。