公开(公告)号：US07477353B2

公开(公告)日：2009-01-13

申请号：US11174722

申请日：2005-07-06

申请人： Shinichi Ito ,  Tsuyoshi Shibata

发明人： Shinichi Ito ,  Tsuyoshi Shibata

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/32 ,  G03F7/00

CPC分类号： G03F7/70991 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70925

摘要： A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.

摘要翻译： 光刻设备包括：抗蚀剂处理设备，用于执行在基板上施加抗蚀剂的工艺;加热基板上的抗蚀剂膜的工艺;以及在基板上显影抗蚀剂膜的工艺;浸渍曝光设备，包括：投影 光学系统，其将光掩模上的图案的图像投影到抗蚀剂膜上，并且被配置为通过位于投影光学系统和抗蚀剂膜之间的光路上的液体进行曝光，连接到抗蚀剂处理和浸没曝光装置的传送装置 在抗蚀剂处理和浸没曝光装置之间执行基板的传送，以及温度/湿度控制装置，其被配置为基于温度和湿度控制至少一个抗蚀剂处理和输送装置中的温度和湿度， 湿度浸渍曝光设备。

公开(公告)号：US07472582B2

公开(公告)日：2009-01-06

申请号：US11431651

申请日：2006-05-11

申请人： Shinichi Ito ,  Nobuhiro Takano

发明人： Shinichi Ito ,  Nobuhiro Takano

IPC分类号： G01M3/04

CPC分类号： F02M25/0809

摘要： An ECU drives a pump in a first stage at a first pumping capacity. The ECU drives the pump in a second stage after the first stage at a second pumping capacity, which is lower than the first pumping capacity. The second pumping capacity is set such that when at least one leak hole, which forms a predetermined total opening cross sectional area, exists in the purge apparatus, the driving of the pump at the second pumping capacity substantially maintains a predetermined reference pressure in the purge apparatus. The ECU diagnoses whether a leak hole exits in the purge apparatus based on the pressure measured with the pressure sensor in view of the predetermined reference pressure at the time of driving the pump in the second stage at the second pumping capacity.

摘要翻译： ECU以第一泵送能力在第一级驱动泵。 ECU在第一阶段之后的第二阶段中以比第一泵送能力低的第二泵送能力驱动泵。 第二抽吸能力设定成使得当在净化装置中存在至少一个形成预定总开口横截面面积的泄漏孔时，在第二抽水能力下的泵的驱动基本上保持了吹扫中的预定参考压力 仪器。 考虑到在第二阶段以第二泵送能力驱动泵时的预定参考压力，ECU基于在压力传感器测量的压力下，泄漏孔是否泄漏在净化装置中。

公开(公告)号：US20080218715A1

公开(公告)日：2008-09-11

申请号：US12044439

申请日：2008-03-07

申请人： Masayuki HATANO ,  Shinichi Ito

发明人： Masayuki HATANO ,  Shinichi Ito

IPC分类号： G03B27/42

CPC分类号： G03F7/70358 ,  G03F7/70341 ,  G03F7/70425

摘要： An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a projection lens to the substrate, exposes an irradiation area of the substrate covered with the immersion area. An exposure stage is moved in a first direction, thereby exposing a first exposure area of the substrate. The exposure stage is moved in a second direction opposite to the first direction, thereby exposing a second exposure area adjoining the first exposure area. In a state where the second exposure area is held inside the immersion boundary of the immersion area, the exposure stage is moved from the movement end position of the exposure stage in a first exposure moving process to the movement start position of the exposure stage in a second exposure moving process.

摘要翻译： 公开了一种浸没曝光方法，其中，使形成的浸渍区域的相对运动在曝光台上待曝光的基板和投影透镜之间介入到基板的同时，使被覆盖的基板的照射区域曝光 沉浸区域。 曝光阶段沿第一方向移动，从而暴露基板的第一曝光区域。 曝光阶段在与第一方向相反的第二方向上移动，从而暴露与第一曝光区域相邻的第二曝光区域。 在第二曝光区域保持在浸没区域的浸没边界内的状态下，曝光阶段在第一曝光移动处理中从曝光台的移动结束位置移动到曝光台的移动开始位置 第二曝光移动过程。

公开(公告)号：US07423728B2

公开(公告)日：2008-09-09

申请号：US11315000

申请日：2005-12-23

申请人： Kentaro Matsunaga ,  Takuya Kono ,  Shinichi Ito

发明人： Kentaro Matsunaga ,  Takuya Kono ,  Shinichi Ito

IPC分类号： G03B27/54

CPC分类号： G03F7/70341

摘要： There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making large a contact angle to the liquid with at least outer peripheral portion of a main surface of the substrate compared with a contact angle to the liquid with an area adjacent to the outer peripheral portion of the substrate, which area is a part of a surface of a substrate supporting side of a substrate support member supporting the substrate included in the exposure apparatus, and carrying out the exposure process.

摘要翻译： 公开了一种在液体至少部分地填充在待曝光的基板和进行曝光处理的曝光装置的投影光学系统之间进行曝光处理的浸渍曝光方法，包括进行以下处理： 与具有与基板的外周部分相邻的区域的液体的接触角相比，与基板的主表面的至少外周部分形成与液体大的接触角，该区域是表面的一部分 支撑包含在曝光装置中的基板的基板支撑部件的基板支撑侧，进行曝光处理。

公开(公告)号：US07413185B2

公开(公告)日：2008-08-19

申请号：US11132416

申请日：2005-05-19

申请人： Yusuke Mitsuya ,  Shinichi Ito

发明人： Yusuke Mitsuya ,  Shinichi Ito

IPC分类号： B65H3/52

CPC分类号： B65H1/14 ,  B65H1/025 ,  B65H3/0653 ,  B65H3/5246 ,  B65H2511/414 ,  B65H2513/10 ,  B65H2515/30 ,  B65H2557/23 ,  B65H2220/01 ,  B65H2220/02

摘要： A paper sheet takeout apparatus has a memory which has several processing modes, and stores parameters of a supply speed of a supply unit, a pressing force of a delivering roller and a separating force of a separating roller for each processing mode, a setting unit which selects one of several processing modes, and a controller which reads the parameters from the memory in accordance with the processing mode selected by the setting unit and which controls at least one of supply speed of the supply unit, a pressing force of a delivering roller and a separating force of the separating roller, on the basis of the parameters read from the memory.

摘要翻译： 纸张取出装置具有多种处理模式的存储器，并存储用于每种处理模式的供给单元的供给速度，输送辊的按压力和分离辊的分离力的参数，设定单元， 选择若干处理模式之一，以及控制器，其根据由设定单元选择的处理模式从存储器读取参数，并且控制供应单元的供给速度，输送辊的按压力和输送辊的压力中的至少一个， 基于从存储器读取的参数，分离辊的分离力。

公开(公告)号：US07367557B2

公开(公告)日：2008-05-06

申请号：US11170800

申请日：2005-06-30

申请人： Shinichi Ito ,  Naruaki Hiramitsu ,  Yoshihiko Naruoka

发明人： Shinichi Ito ,  Naruaki Hiramitsu ,  Yoshihiko Naruoka

IPC分类号： B65H1/02

CPC分类号： B65H1/025 ,  B65H3/0653 ,  B65H2511/214 ,  B65H2701/1916 ,  B65H2220/02 ,  B65H2220/08

摘要： A sheet material feeding apparatus includes a feed-out device that brings the stacked sheet materials conveyed on a floor belt into contact with a pickup roller and feeds the sheet materials out in a direction crossing the conveying direction of the stacked sheet materials by rotation of the pickup roller, and an inclination correcting device provided in an upstream of the feed-out device in its sheet material feeding direction and including an upper roller located at a position higher than that of the pickup roller, that brings an upper side of the stacked sheet materials conveyed towards the feed-out device into contact with the upper roller to correct the inclination of the stacked sheet materials.

摘要翻译： 片材供给装置包括：送出装置，其将输送在地板带上的层叠片材与拾取辊接触，并将片材沿与叠层片材的输送方向交叉的方向通过 拾取辊和倾斜校正装置，其设置在所述送出装置的片材供给方向的上游，并且包括位于比拾取辊的位置高的位置的上辊，其将堆叠片材的上侧 向送出装置输送的材料与上辊接触以校正堆叠的片材的倾斜度。

公开(公告)号：US20080050677A1

公开(公告)日：2008-02-28

申请号：US11905976

申请日：2007-10-05

申请人： Tomoyuki Takeishi ,  Kenji Kawano ,  Hiroshi Ikegami ,  Shinichi Ito ,  Riichiro Takahashi

发明人： Tomoyuki Takeishi ,  Kenji Kawano ,  Hiroshi Ikegami ,  Shinichi Ito ,  Riichiro Takahashi

IPC分类号： G03C5/00

CPC分类号： H01L23/544 ,  B23K26/066 ,  B23K26/364 ,  B23K26/40 ,  B23K2103/172 ,  G03F7/2026 ,  G03F7/70341 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  G21K5/10 ,  H01J2237/30438 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10S438/949 ,  H01L2924/00

摘要： A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

摘要翻译： 一种处理方法，用于在形成在基板上的膜中选择性地减少或去除待曝光的区域，该方法包括相对地扫描基板上的形状比整个第一区域要暴露的整个第一区域的第一曝光灯 区域，以选择性地去除或减少要暴露的第一区域，并且用第二曝光光将待暴露的整个第一区域暴露在整个第一区域内的整个第二区域，以选择性地暴露待暴露的整个第二区域。

公开(公告)号：US20070221664A1

公开(公告)日：2007-09-27

申请号：US11572356

申请日：2005-10-06

申请人： Shinichi Ito

发明人： Shinichi Ito

IPC分类号： H05B6/12

CPC分类号： H05B6/062 ,  H03K17/962 ,  Y10T307/858

摘要： A touch key detects that an object touches the touch key. The touch key includes an electrode arranged to be touched with the object, an oscillator for outputting a high-frequency voltage and applies the high-frequency voltage to the electrode, a rectifier for rectifying and smoothing the high-frequency voltage output from the oscillator as to output a direct-current (DC) voltage, a reference voltage generator for generating a reference voltage, a subtracter for subtracting the reference voltage from the DC voltage output from the rectifier, a judging unit for detecting a voltage difference between the voltage output from the subtracter before and after changing and for determining that the object touches the electrode when the voltage difference exceeds a predetermined value. This touch key detects that an object touches the electrode with high sensitivity, and enhances the reliability of the judging unit.

摘要翻译： 触摸键检测到物体接触触摸键。 触摸键包括布置成与物体接触的电极，用于输出高频电压并将高频电压施加到电极的振荡器，用于整流和平滑从振荡器输出的高频电压的整流器， 输出直流（DC）电压，用于产生参考电压的参考电压发生器，用于从整流器输出的直流电压中减去参考电压的减法器;判断单元，用于检测从整流器输出的电压之间的电压差; 所述减法器在变化之前和之后，以及当所述电压差超过预定值时确定所述物体接触所述电极。 该触摸键检测到物体以高灵敏度触摸电极，并提高判断单元的可靠性。

公开(公告)号：US20060263726A1

公开(公告)日：2006-11-23

申请号：US11431823

申请日：2006-05-11

申请人： Shinichi Ito ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Yasunobu Onishi

发明人： Shinichi Ito ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Yasunobu Onishi

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/11 ,  Y10S430/162

摘要： A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.

摘要翻译： 图案形成方法包括在被处理膜上形成光致抗蚀剂膜，通过涂布法在光致抗蚀剂膜上形成用于保护光致抗蚀剂膜的浸渍液的保护膜，选择性地进行部分浸渍曝光 通过浸渍液将该光致抗蚀剂膜，浸渍液体供给到光致抗蚀剂膜上，在形成保护膜之后，在进行浸渍曝光前，选择性地除去包含浸渍液的残留物质的残留物质， 通过选择性地去除光致抗蚀剂膜的曝光区域或未曝光区域，去除保护膜，以及形成包括光致抗蚀剂膜的图案。

公开(公告)号：US20060240341A1

公开(公告)日：2006-10-26

申请号：US11472452

申请日：2006-06-22

申请人： Kyoko Izuha ,  Hideki Kanai ,  Soichi Inoue ,  Shingo Kanamitsu ,  Shinichi Ito

发明人： Kyoko Izuha ,  Hideki Kanai ,  Soichi Inoue ,  Shingo Kanamitsu ,  Shinichi Ito

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G03F1/30 ,  G03F1/32 ,  G03F7/70641 ,  G03F7/70683

摘要： Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding area, and a second area including a second surrounding area in which a halftone phase shift film is provided on the transparent substrate and a second opening area surrounded by the second surrounding area, wherein a transparent film is provided in at least a part of the second opening area, the transparent film being configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area.