公开(公告)号：US08901521B2

公开(公告)日：2014-12-02

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03F7/20 ,  H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US20130287968A1

公开(公告)日：2013-10-31

申请号：US13926625

申请日：2013-06-25

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H05H1/24

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission.

摘要翻译： 用于产生辐射的方法包括：将燃料供应到放电空间，在燃料中产生放电以形成等离子体，并且通过控制等离子体的辐射发射来减小由等离子体限定的体积。 所述还原包括向所述等离子体供给包括Ga，In，Bi，Pb或Al中的至少一种的物质以控制所述辐射发射。

公开(公告)号：US08431916B2

公开(公告)日：2013-04-30

申请号：US12611269

申请日：2009-11-03

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

IPC分类号： H05G2/00

CPC分类号： G03F7/70108 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a collector arranged to collect EUV radiation emitted by the plasma. The optics are arranged such that in use the fuel vaporizing and exciting radiation is incident upon more than one side of the fuel droplet at the interaction point.

摘要翻译： 被配置为产生EUV辐射的源包括燃料液滴发生器，其构造成将燃料液滴输送到相互作用点，光学构造成将燃料蒸发和激发辐射输送到相互作用点以产生等离子体;以及收集器，其被布置成收集EUV辐射 由等离子体发射。 光学系统布置成使得在使用中，燃料蒸发和激发的辐射入射在相互作用点处的燃料液滴的多于一侧。

公开(公告)号：US08416391B2

公开(公告)日：2013-04-09

申请号：US12809427

申请日：2008-12-19

申请人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

发明人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC分类号： G03B27/54 ,  G21G4/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.

摘要翻译： 辐射源被配置成产生辐射。 辐射源包括第一电极和第二电极，其被配置为在使用期间产生放电以从等离子体燃料产生辐射发射等离子体。 辐射源还包括配置成将等离子体燃料供应到与第一电极和第二电极相关联的燃料释放区域的燃料供应，以及燃料释放装置，其被配置为引起由燃料供应源供应的燃料的释放 燃油释放区。 燃料释放区域与第一电极和第二电极间隔开。

公开(公告)号：US20130010363A1

公开(公告)日：2013-01-10

申请号：US13617705

申请日：2012-09-14

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B27/42

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

摘要翻译： 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔径的直径大于20μm。

公开(公告)号：US20130010275A1

公开(公告)日：2013-01-10

申请号：US13634179

申请日：2011-02-03

申请人： Viacheslav Medvedev ,  Vadim Yevgenyevich Banine ,  Vladimir Mihailovitch Krivtsun ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

发明人： Viacheslav Medvedev ,  Vadim Yevgenyevich Banine ,  Vladimir Mihailovitch Krivtsun ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

IPC分类号： G02B5/28 ,  G03B27/72

CPC分类号： G03F7/70575 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061

摘要： A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.

摘要翻译： 反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。 在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射 从反射器的表面反射以破坏性的方式干扰从反射器内反射的第二波长的辐射。

公开(公告)号：US08345223B2

公开(公告)日：2013-01-01

申请号：US12919741

申请日：2009-02-24

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B27/14

CPC分类号： G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

摘要翻译： 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US08232537B2

公开(公告)日：2012-07-31

申请号：US12540542

申请日：2009-08-13

申请人： Hendrikus Gijsbertus Schimmel ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

发明人： Hendrikus Gijsbertus Schimmel ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

IPC分类号： H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/003

摘要： A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards a second focus. A contamination barrier is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime.

摘要翻译： 用于产生极紫外辐射或用于高分辨率光刻的辐射源包括等离子体形成位置，其中燃料通过辐射束接触以形成等离子体产生的EUV辐射。 镜像收集器收集并反射在第一焦点处产生的EUV辐射朝向第二焦点。 定位污染屏障，污染屏障的周边不会堵塞在第二焦点处由反射镜对着的立体角的50％以上，使得由集光镜反射的EUV辐射不会通过污染物过度衰减 屏障。 污染屏障用于从等离子体中捕获诸如离子，原子，分子或纳米液体的燃料，以防止它们沉积到收集器反射镜上，从而减少镜的有效寿命。

公开(公告)号：US20120182537A1

公开(公告)日：2012-07-19

申请号：US13497735

申请日：2010-08-02

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G03B27/32 ,  G02B5/20

CPC分类号： G03F7/70575 ,  G02B5/201 ,  G02B5/208

摘要： A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

摘要翻译： 光谱纯度滤光器，特别是在用于投影光束的EUV辐射的光刻设备中使用的光谱纯度滤光器包括衬底中的多个孔。 孔由具有倾斜到基底正面的法线侧面的壁限定。

公开(公告)号：US20120140196A1

公开(公告)日：2012-06-07

申请号：US13365758

申请日：2012-02-03

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： B08B3/00 ,  G03B27/54

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。