公开(公告)号：US07160392B2

公开(公告)日：2007-01-09

申请号：US10688384

申请日：2003-10-17

申请人： Quanyuan Shang ,  William R. Harshbarger ,  Robert L. Greene ,  Ichiro Shimizu

发明人： Quanyuan Shang ,  William R. Harshbarger ,  Robert L. Greene ,  Ichiro Shimizu

IPC分类号： H01L21/027 ,  C23C16/00

CPC分类号： H01L21/68742 ,  C23C16/458

摘要： A substrate support assembly and method for dechucking a substrate is provided. In one embodiment, a support assembly includes a substrate support having a support surface, a first set of lift pins and one or more other lift pins movably disposed through the substrate support. The first set of lift pins and the one or more lift pins project from the support surface when the pins are in an actuated position. When in the actuated position, the first set of lift pins project a longer distance from the support surface than the one or more other lift pins. In another aspect of the invention, a method for dechucking a substrate from a substrate support is provided. In one embodiment, the method includes the steps of projecting a first set of lift pins a first distance above a surface of a substrate support, and projecting a second set of lift pins a second distance above the surface of the substrate support that is less than the first distance.

摘要翻译： 提供了一种用于对基板进行脱扣的基板支撑组件和方法。 在一个实施例中，支撑组件包括具有支撑表面的基板支撑件，第一组提升销和可移动地设置穿过基板支撑件的一个或多个其他提升销。 当销处于致动位置时，第一组提升销和一个或多个提升销从支撑表面突出。 当处于致动位置时，第一组提升销与支撑表面比一个或多个其他提升销突出较长的距离。 在本发明的另一方面，提供了一种用于从基板支撑件去除基板的方法。 在一个实施例中，该方法包括以下步骤：将第一组提升销投影在衬底支撑件的表面之上的第一距离处，并且将第二组提升销投影在衬底支撑件的表面上方的第二距离处，该第二组提升销小于 第一个距离。

公开(公告)号：US20060109296A1

公开(公告)日：2006-05-25

申请号：US11238632

申请日：2005-09-29

申请人： Bassam Shamoun ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John White

发明人： Bassam Shamoun ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John White

IPC分类号： B41J2/015

CPC分类号： B41J3/407 ,  B41J2/04505 ,  B41J2/04541 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/0459 ,  B41J2/04593 ,  B41J2/125 ,  B41J3/543 ,  B41J25/003 ,  B41J25/005 ,  B41J29/15 ,  B41J29/393

摘要： The invention provides methods, systems, and drivers for controlling an inkjet printing system. The driver may include logic including a processor, memory coupled to the logic, and a fire pulse generator circuit coupled to the logic. The fire pulse generator includes a connector to facilitate coupling the driver to a print head. The logic is adapted to receive an image and to convert the image to an image data file. The image data file is adapted to be used by the driver to trigger the print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction. Numerous other aspects are disclosed.

摘要翻译： 本发明提供了用于控制喷墨打印系统的方法，系统和驱动程序。 驱动器可以包括逻辑，其包括处理器，耦合到逻辑的存储器和耦合到逻辑的触发脉冲发生器电路。 火灾脉冲发生器包括一个连接器以便于驱动器与打印头的连接。 该逻辑适于接收图像并将图像转换为图像数据文件。 图像数据文件适于由驱动器使用，以在基板沿着打印方向移动时触发打印头将墨水沉积在基板上的像素孔中。 公开了许多其他方面。

公开(公告)号：US20060092436A1

公开(公告)日：2006-05-04

申请号：US11061148

申请日：2005-02-18

申请人： John White ,  Fan Sze ,  Quanyuan Shang ,  Shinichi Kurita ,  Hongbin Ji ,  Janusz Jozwiak ,  Inchen Huang ,  Emanuel Beer

发明人： John White ,  Fan Sze ,  Quanyuan Shang ,  Shinichi Kurita ,  Hongbin Ji ,  Janusz Jozwiak ,  Inchen Huang ,  Emanuel Beer

IPC分类号： G06K15/02

CPC分类号： B41J3/407 ,  B41J2/04505 ,  B41J2/04541 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/0459 ,  B41J2/04593 ,  B41J2/125 ,  B41J3/28 ,  B41J3/543 ,  B41J25/001 ,  B41J25/003 ,  B41J25/005 ,  B41J29/15 ,  B41J29/393

摘要： Methods and apparatus are provided wherein data representative of an image is received, the data being indicative of a plurality of theoretical ink jetting drop positions. The data may be converted into an image data file, the image data file being indicative of a plurality of actual physical ink jetting drop positions, each physical ink jetting drop position corresponding to a theoretical ink jetting drop position. A print system may be controlled based on the image data file, wherein the actual physical ink jetting drop positions may each be selected based upon being within a predefined percentage of a print resolution in a printing direction of a corresponding one of the theoretical ink jetting drop positions.

摘要翻译： 提供了方法和装置，其中接收到表示图像的数据，该数据表示多个理论喷墨滴落位置。 数据可以被转换为图像数据文件，图像数据文件指示多个实际物理喷墨滴落位置，每个物理喷墨滴下位置对应于理论喷墨滴落位置。 可以基于图像数据文件来控制打印系统，其中可以基于理论喷墨滴的相应一个的打印方向上的打印分辨率的预定百分比内的每一个来选择实际物理喷墨落下位置 职位

公开(公告)号：US20060092207A1

公开(公告)日：2006-05-04

申请号：US11061120

申请日：2005-02-18

申请人： Bassam Shamoun ,  Janusz Jozwiak ,  Quanyuan Shang ,  Hongbin Ji

发明人： Bassam Shamoun ,  Janusz Jozwiak ,  Quanyuan Shang ,  Hongbin Ji

IPC分类号： B41J29/38

CPC分类号： B41J2/2128 ,  B41J2/04541 ,  B41J2/0456 ,  B41J2/04581 ,  B41J2/04591 ,  B41J2/04593 ,  B41J2202/09 ,  G02F1/133516 ,  H04N1/4015

摘要： The present invention provides methods and apparatus for controlling the quantity of fluid output (e.g., drop size) by individual nozzles of a print head to a very high precision at a frequency equal to the frequency at which fluid is normally dispensed. This is achieved by mapping fluid quantity control information into the data that represents the image to be printed. Data representative of an image is received and converted into pixel data. In at least one embodiment, the pixel data includes pixels represented by N bits, and the N bits may represent a drop size for the pixel and a union of the N bits may represent a nozzle status. A print head may be controlled based on the pixel data, and the print head may include nozzles that are each adapted to deposit at least one drop size quantity of a fluid on a substrate.

摘要翻译： 本发明提供了用于以等于通常分配流体的频率的频率将打印头的各个喷嘴的流体输出量（例如，液滴尺寸）控制到非常高的精度的方法和装置。 这通过将流体量控制信息映射到表示要打印的图像的数据来实现。 接收表示图像的数据并将其转换为像素数据。 在至少一个实施例中，像素数据包括由N位表示的像素，并且N位可以表示像素的液滴大小，并且N位的并集可以表示喷嘴状态。 可以基于像素数据来控制打印头，并且打印头可以包括各自适于在衬底上沉积至少一个液滴量的流体的喷嘴。

公开(公告)号：US20060071957A1

公开(公告)日：2006-04-06

申请号：US11123502

申请日：2005-05-04

申请人： Quanyuan Shang ,  Stephen McPherson

发明人： Quanyuan Shang ,  Stephen McPherson

IPC分类号： B41J2/09

CPC分类号： B41J2/12 ,  B41J29/393

摘要： The embodiments of the present invention describe an apparatus and a method of visualizing droplets dispensed from an inkjet printing system. A droplet visualization system is integrated with the inkjet printing system and is capable of measuring the sizes and the speeds of dispensed inkjet droplets and capturing the trajectories of the dispensed inkjet droplets. The measured information regarding the sizes, the speeds and trajectories of the droplets is feedback to the inkjet printing system to monitor and to control the dispense operation of the inkjet printing system. Due to this feedback control, the uniformities of the sizes, the speeds and the trajectories can be monitored and be improved.

摘要翻译： 本发明的实施例描述了一种可视化从喷墨打印系统分配的液滴的装置和方法。 液滴可视化系统与喷墨打印系统集成，并且能够测量分配的喷墨液滴的尺寸和速度并捕获分配的喷墨液滴的轨迹。 关于液滴的尺寸，速度和轨迹的测量信息被反馈到喷墨打印系统以监视和控制喷墨打印系统的分配操作。 由于这种反馈控制，可以监测和改进尺寸，速度和轨迹的均匀性。

公开(公告)号：US20050272273A1

公开(公告)日：2005-12-08

申请号：US11136662

申请日：2005-05-24

申请人： Quanyuan Shang ,  Robert Robertson ,  Kam Law ,  James Gardner

发明人： Quanyuan Shang ,  Robert Robertson ,  Kam Law ,  James Gardner

IPC分类号： C23C14/50 ,  C23C16/00 ,  C23C16/458 ,  H01L21/00 ,  H01L21/26 ,  H01L21/31 ,  H01L21/324 ,  H01L21/42 ,  H01L21/469 ,  H01L21/477 ,  H01L21/683 ,  H02N13/00

CPC分类号： C23C16/4583 ,  C23C14/50 ,  C23C16/458 ,  C23C16/4586 ,  H01L21/67069 ,  H01L21/6831 ,  H02N13/00 ,  Y10T279/23

摘要： An apparatus and method for holding a substrate on a support layer in a processing chamber. The method includes the steps of positioning the substrate a predetermined distance from the support layer, introducing a plasma in the processing chamber, lowering the substrate to a point where the substrate engages the support layer, and maintaining the plasma for a predetermined time. The apparatus is directed to a susceptor system for a processing chamber in which a substrate is electrostatically held essentially flat. The apparatus includes a substrate support and a support layer composed of a dielectric material disposed on the substrate support. At least one lift pin is used for supporting the substrate relative to the support layer. Means are provided for moving each lift pin relative to the support layer. Means are also provided for producing a plasma within the processing chamber.

公开(公告)号：US06960263B2

公开(公告)日：2005-11-01

申请号：US10136249

申请日：2002-04-25

申请人： Sakae Tanaka ,  Qunhua Wang ,  Sanjay Yadav ,  Quanyuan Shang ,  William R. Harshbarger

发明人： Sakae Tanaka ,  Qunhua Wang ,  Sanjay Yadav ,  Quanyuan Shang ,  William R. Harshbarger

IPC分类号： C23C16/04 ,  C23C16/458 ,  H01L21/205 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： C23C16/042 ,  C23C16/4585 ,  C23C16/4586

摘要： A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom engagement surface; and a cross beam disposed between at least two edges of the frame, the cross beam having a top surface and a bottom engagement surface, the engagement surface of the cross beam configured to be flush with the engagement surface of the lip; wherein one or more of the engagement surfaces are configured to cover metal interconnect bonding areas on a carrier disposed below the frame. The shadow frame is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications used to make active matrix liquid crystal displays (AMLCDs) and solar cells.

摘要翻译： 一种用于半导体制造设备的阴影框架和框架系统，包括具有四个边缘的矩形框架，所述边缘形成具有顶部表面和底部接合表面的内部唇部; 以及设置在所述框架的至少两个边缘之间的横梁，所述横梁具有顶表面和底部接合表面，所述横梁的接合表面被配置为与所述唇缘的接合表面齐平; 其中所述接合表面中的一个或多个构造成覆盖设置在所述框架下方的载体上的金属互连结合区域。 阴影框架在用于制造有源矩阵液晶显示器（AMLCD）和太阳能电池的等离子体增强化学气相沉积（PECVD）应用中特别有用。

公开(公告)号：US20050150459A1

公开(公告)日：2005-07-14

申请号：US11010956

申请日：2004-12-13

申请人： Quanyuan Shang ,  Robert Greene ,  Li Hou

发明人： Quanyuan Shang ,  Robert Greene ,  Li Hou

IPC分类号： C23C16/458 ,  C23C16/46 ,  H01J37/32 ,  C23C16/00

CPC分类号： C23C16/46 ,  C23C16/4581 ,  H01J2237/0206 ,  H01J2237/20

摘要： Embodiments of the invention generally provides an apparatus and a method for minimizing the deformation of a substrate during PECVD processing. In one aspect, the substrate is supported within a processing region on an insulating layer to provide uniform heating of the substrate.

摘要翻译： 本发明的实施例通常提供一种用于在PECVD处理期间最小化衬底的变形的装置和方法。 在一个方面，衬底被支撑在绝缘层上的处理区域内以提供衬底的均匀加热。

公开(公告)号：US06863077B2

公开(公告)日：2005-03-08

申请号：US10195718

申请日：2002-07-15

申请人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

发明人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

IPC分类号： B08B7/00 ,  B08B9/08 ,  C23C16/44 ,  H01L21/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/304 ,  H01L21/3065 ,  C25F3/00

CPC分类号： H01L21/67063 ,  H01L21/67069

摘要： A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

摘要翻译： 提供了一种用于在室内处理基板并且用于从腔室部件清洗积聚的材料的系统。 该系统包括适于产生反应性气体种类的反应物种发生器，用于从腔室部件化学蚀刻积聚的材料，以及处理室，其具有至少一个具有暴露于反应物质的镜面抛光表面的部件。 优选地，为了对室清洁效率具有最大的影响，镜面抛光表面是诸如气体分配板或背板的部件的表面，和/或是多个较小部件的表面（例如，室壁衬套 ，气体导电线等），以便构成暴露于反应性物质的大部分表面积。 最优选地，反应性物质接触的所有裸铝表面被镜面抛光。

公开(公告)号：US06772827B2

公开(公告)日：2004-08-10

申请号：US09922219

申请日：2001-08-03

申请人： Ernst Keller ,  Quanyuan Shang

发明人： Ernst Keller ,  Quanyuan Shang

IPC分类号： F24H906

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/5096 ,  H01J37/3244 ,  Y10T29/49948

摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and contraction. In another aspect, the side wall provides thermal isolation between the gas distribution plate and other components of the chamber.

摘要翻译： 一种用于等离子体室的气体入口歧管，其具有由包括一个或多个片材的侧壁悬挂的多孔气体分配板。 片材优选提供柔性以缓解由于热膨胀和收缩导致的气体分配板中的应力。 在另一方面，侧壁在气体分配板和腔室的其它部件之间提供热隔离。