Neural Network Classifier Using Array Of Four-Gate Non-volatile Memory Cells

    公开(公告)号:US20190237142A1

    公开(公告)日:2019-08-01

    申请号:US16382034

    申请日:2019-04-11

    Abstract: A neural network device with synapses having memory cells each having a floating gate and a first gate over first and second portions of a channel region, and second and third gates over the floating gate and over the source region. First lines each electrically connect the first gates in one of the memory cell rows, second lines each electrically connect the second gates in one of the memory cell rows, third lines each electrically connect the third gates in one of the memory cell rows, fourth lines each electrically connect the source regions in one of the memory cell rows, and fifth lines each electrically connect the drain regions in one of the memory cell columns. The synapses receive a first plurality of inputs as electrical voltages on the first, second or third lines, and provide a first plurality of outputs as electrical currents on the fifth lines.

    Array Of Non-volatile Memory Cells With ROM Cells
    80.
    发明申请
    Array Of Non-volatile Memory Cells With ROM Cells 有权
    具有ROM单元的非易失性存储单元阵列

    公开(公告)号:US20160254269A1

    公开(公告)日:2016-09-01

    申请号:US14639063

    申请日:2015-03-04

    Abstract: A memory device that includes a plurality of ROM cells each having spaced apart source and drain regions formed in a substrate with a channel region therebetween, a first gate disposed over and insulated from a first portion of the channel region, a second gate disposed over and insulated from a second portion of the channel region, and a conductive line extending over the plurality of ROM cells. The conductive line is electrically coupled to the drain regions of a first subgroup of the ROM cells, and is not electrically coupled to the drain regions of a second subgroup of the ROM cells. Alternately, a first subgroup of the ROM cells each includes a higher voltage threshold implant region in the channel region, whereas a second subgroup of the ROM cells each lack any higher voltage threshold implant region in the channel region.

    Abstract translation: 一种存储器件,其包括多个ROM单元,每个ROM单元具有形成在衬底中的间隔开的源极和漏极区域,其间具有沟道区域,设置在沟道区域的第一部分上方并与沟道区域的第一部分绝缘的第一栅极, 与沟道区的第二部分绝缘,以及在多个ROM单元上延伸的导电线。 导电线电耦合到ROM单元的第一子组的漏极区域,并且不电耦合到ROM单元的第二子组的漏极区域。 或者,ROM单元的第一子组各自包括沟道区域中的较高电压阈值注入区域,而ROM单元的第二子组每个在沟道区域中都缺少任何较高电压阈值注入区域。

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