公开(公告)号：US08252505B2

公开(公告)日：2012-08-28

申请号：US12371876

申请日：2009-02-16

申请人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

发明人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

IPC分类号： G03F7/004 ,  C07D493/08 ,  C07D495/08

CPC分类号： C07D493/08 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0397

摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z−  (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.

摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸 [化学式1] A + Z-（b1-2）其中A +表示有机阳离子，由式（b1-2）表示的化合物组成的发生剂（B1） Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成 酯键直接键合到环结构上，另一个基团包括阴离子部分。

公开(公告)号：US08068957B2

公开(公告)日：2011-11-29

申请号：US12069051

申请日：2008-02-07

申请人： Hiroaki Shimizu

发明人： Hiroaki Shimizu

IPC分类号： B60R22/00

CPC分类号： B60R1/00 ,  B60R2300/105 ,  B60R2300/301 ,  B60R2300/404 ,  B60R2300/70 ,  B60R2300/806 ,  B62D15/027

摘要： A vehicular backing operation assist apparatus is coupled with a movement direction demand unit for demanding a forward or backward movement of the vehicle and a change detection unit for detecting a change of a state of the vehicle taking place in association with a start-up of the vehicle. A reverse departure, which is a backing operation for exiting a parking state, is determined to be performed if a transit period from when the change of the state is detected to when the backward movement is demanded, is within a predetermined period. A reverse parking, which is a backing operation for entering a parking state, is performed, if the transit period is greater than or equal to the predetermined period. An assist control unit then provides an assist item for a backing operation relative to either the reverse departure or the reverse parking, which is determined to be performed.

摘要翻译： 车辆背衬操作辅助装置与用于要求车辆的向前或向后移动的移动方向要求单元联接，以及变化检测单元，用于检测与起动的车辆的状态的变化， 车辆。 如果从检测到状态的改变到需要向后移动的过渡时间在预定时间段内，则确定作为退出停车状态的后退操作的反向离开。 如果过渡期间大于或等于预定周期，则执行作为进入停车状态的后退操作的倒车停车。 然后，辅助控制单元提供相对于被确定要执行的反向离开或倒车停放的后台操作的辅助项目。

公开(公告)号：US20110241645A1

公开(公告)日：2011-10-06

申请号：US13040225

申请日：2011-03-03

申请人： Hiroaki Shimizu ,  Susumu Hoshino

发明人： Hiroaki Shimizu ,  Susumu Hoshino

IPC分类号： G05F3/02

CPC分类号： H01S5/0427 ,  H03K17/04123 ,  H03K17/122

摘要： A current source circuit has a voltage application terminal that is applied with a prescribed voltage; an output terminal that outputs the current; a first MOS transistor of which a source is connected to the voltage application terminal; a second MOS transistor of which a source is connected to a drain of the first MOS transistor and a drain is connected to the output terminal; a third MOS transistor of which a source is connected to the voltage application terminal; a fourth MOS transistor of which a source is connected to a drain of the third MOS transistor and a drain is connected to the output terminal. The current source circuit, in a state where the bias voltage is applied to the first input terminal such that the predetermined current flows into the first and fourth MOS transistors, controls turning ON/OFF of the second MOS transistor and the third MOS transistor so as to synchronize according to the switch voltage applied to the second input terminal.

摘要翻译： 电流源电路具有施加规定电压的施加电压端子; 输出电流的输出端子; 源极连接到电压施加端子的第一MOS晶体管; 源极连接到第一MOS晶体管的漏极并且漏极连接到输出端子的第二MOS晶体管; 第三MOS晶体管，其源极连接到电压施加端子; 第四MOS晶体管，其源极连接到第三MOS晶体管的漏极，漏极连接到输出端子。 电流源电路在将偏置电压施加到第一输入端子使得预定电流流入第一和第四MOS晶体管的状态下，控制第二MOS晶体管和第三MOS晶体管的导通/截止，以便 根据施加到第二输入端子的开关电压进行同步。

公开(公告)号：US07919651B2

公开(公告)日：2011-04-05

申请号：US12536779

申请日：2009-08-06

申请人： Daiju Shiono ,  Takahiro Dazai ,  Hiroaki Shimizu

发明人： Daiju Shiono ,  Takahiro Dazai ,  Hiroaki Shimizu

IPC分类号： C07C69/73 ,  C07C69/66

CPC分类号： G03F7/0397 ,  C07C69/73 ,  C07C2603/74 ,  C07D307/77 ,  C07D307/93 ,  C07D493/20 ,  C08F220/28 ,  Y10S430/106 ,  Y10S430/111

摘要： A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.

摘要翻译： 由下述通式（I）表示的化合物; 和具有如下所示的通式（a0-1）表示的结构单元（a0）的高分子化合物：其中R1表示氢原子，低级烷基或卤代低级烷基; A表示可以具有取代基的2个以上碳原子的二价烃基; B表示可以具有取代基的1个以上碳原子的二价烃基; R2代表酸解离，溶解抑制基团。

公开(公告)号：US20100233626A1

公开(公告)日：2010-09-16

申请号：US12721291

申请日：2010-03-10

申请人： Hiroaki Shimizu ,  Hideto Nito ,  Junichi Tsuchiya ,  Takahiro Dazai

发明人： Hiroaki Shimizu ,  Hideto Nito ,  Junichi Tsuchiya ,  Takahiro Dazai

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.

摘要翻译： 一种正性抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）（R表示氢原子，1〜5个碳原子的烷基或卤代烷基1 至5个碳原子，R 2表示二价连接基团，R 3表示在其环骨架中含有-SO 2 - 的环状基团）和衍生自含有酸解离，溶解抑制基团的酸的丙烯酸酯的结构单元（a1） - 发酵剂组分（B）和含有碱解离基团的结构单元的含氟聚合物（F1）。

公开(公告)号：US20100233623A1

公开(公告)日：2010-09-16

申请号：US12717785

申请日：2010-03-04

申请人： Tsuyoshi Kurosawa ,  Hiroaki Shimizu

发明人： Tsuyoshi Kurosawa ,  Hiroaki Shimizu

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0397

摘要： A positive resist composition including: a polymeric compound (A1) having a structural unit (a0) that contains a “cyclic group containing —SO2—” on the side chain terminal, and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group; an acid generator component (B); and a fluorine-containing resin component having a structural unit (f1) represented by general formula (f1-0): wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Q0 represents a single bond or a divalent linking group having a fluorine atom; and RX0 represents an acid dissociable, dissolution inhibiting group-containing group which may contain a fluorine atom, with the provision that at least one fluorine atom is contained in formula (f1-0).

摘要翻译： 一种正性抗蚀剂组合物，包括：具有在侧链末端含有“-SO 2 - ”的环状基团的结构单元（a0）的高分子化合物（A1）和来自含有 酸解离，溶解抑制组; 酸产生剂组分（B）; 和具有由通式（f1-0）表示的结构单元（f1））的含氟树脂组分：其中R表示氢原子，1至5个碳原子的烷基或1至5个碳的卤代烷基 原子 Q0表示单键或具有氟原子的二价连接基团; 并且RX0表示可含有氟原子的含酸解离性，溶解抑制基团的基团，其规定式（f1-0）中至少含有一个氟原子。

公开(公告)号：US07776510B2

公开(公告)日：2010-08-17

申请号：US12135680

申请日：2008-06-09

申请人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

发明人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C381/12

CPC分类号： C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

摘要翻译： 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成 与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。

公开(公告)号：US07741009B2

公开(公告)日：2010-06-22

申请号：US12174804

申请日：2008-07-17

申请人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

发明人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/126

摘要： A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below: wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X2 represents an acid dissociable, dissolution inhibiting group; and Y2 represents an alkylene group or a divalent aliphatic cyclic group; and R2—O—Y1—SO3−A+  (b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and A+ represents a cation.

摘要翻译： 一种正型抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并具有如下所示的由通式（a1-0-2）表示的结构单元（a1）的树脂组分（A） 发生器组分（B），其在暴露时产生酸，并且包括由以下所示的通式（b1-12）表示的化合物组成的酸产生剂（B1）：其中R表示氢原子，低级烷基或卤代低级烷基 组; X2表示酸解离，溶解抑制基团; 并且Y2表示亚烷基或二价脂族环基; 和R2-O-Y1-SO3-A +（b1-12）其中R2表示一价芳族有机基团; Y1表示可被氟原子取代的1〜4个碳原子的亚烷基; 而A +代表阳离子。

公开(公告)号：US20100015552A1

公开(公告)日：2010-01-21

申请号：US12499610

申请日：2009-07-08

申请人： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

发明人： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0045 ,  C07C309/09 ,  C07C309/10 ,  C07C309/17 ,  C07C311/48 ,  C07C311/51 ,  C07C317/04 ,  C07C317/10 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D307/92 ,  C07D307/94 ,  C07D493/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122

摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.

摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A） 以及在暴露时产生酸的酸发生剂组分（B），其中所述酸发生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“ R 9“各自独立地表示芳基或烷基，其中R 7”至R 9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个 “表示具有下述通式（I）表示的基团的取代芳基作为取代基; X-表示阴离子; Rf表示氟化烷基。

公开(公告)号：US20090252380A1

公开(公告)日：2009-10-08

申请号：US12413659

申请日：2009-03-30

申请人： Hiroaki Shimizu

发明人： Hiroaki Shimizu

IPC分类号： G06K9/00

CPC分类号： G08G1/163

摘要： A moving object trajectory estimating device has: a surrounding information acquisition part that acquires information on surroundings of a moving object; a trajectory estimating part that specifies another moving object around the moving object based on the acquired surrounding information and estimates a trajectory of the specified moving object; and a recognition information acquisition part that acquires recognition information on a recognizable area of the specified moving object, and the trajectory estimating part estimates a trajectory of the specified moving object, based on the acquired recognition information of the specified moving object.

摘要翻译： 移动物体轨迹估计装置具有：周边信息获取部，其获取关于移动物体的周围的信息; 轨迹估计部，其基于所获取的周围信息来指定所述移动物体周围的另一移动物体，并且估计所述指定的移动物体的轨迹; 以及识别信息获取部，其获取所述指定移动体的识别区域的识别信息，并且所述轨迹估计部基于所获取的所述指定移动体的识别信息来估计所述指定移动体的轨迹。