公开(公告)号：US20100000855A1

公开(公告)日：2010-01-07

申请号：US12084842

申请日：2006-11-22

申请人： Shinya Nakamura ,  Tadashi Morita ,  Naoki Morimoto

发明人： Shinya Nakamura ,  Tadashi Morita ,  Naoki Morimoto

IPC分类号： C23C14/34

CPC分类号： C23C14/541 ,  C23C14/225 ,  C23C14/34 ,  C23C14/505 ,  H01L21/67103 ,  H01L21/68792 ,  H01L43/12

摘要： Provided is a film forming apparatus and a film forming method that are capable of enhancing film property uniformity and improving productivity. A film forming apparatus (1) according to the present invention includes substrate temperature adjustment means (heat source 10) for adjusting substrate temperature, and film formation is performed such that sputtered particles are incident on a substrate W on a rotary substrate support table (3) from an oblique direction. By thus retaining the substrate temperature constant in film formation, it is possible to reduce temperature unevenness on the substrate in film formation and to uniformize in-plane film property. Accordingly, the film property, including film thickness, crystallinity, and component composition ratio of a film formation layer can be made uniform, and it becomes possible to manufacture, with high productivity, a resistance change device having stable device characteristics with variations in device characteristics, including in-plane resistance and magnetoresistance effect, suppressed, for example.

摘要翻译： 提供能够提高膜特性均匀性和提高生产率的成膜装置和成膜方法。 根据本发明的成膜装置（1）包括用于调节基板温度的基板温度调节装置（热源10），并且进行成膜，使得溅射的颗粒入射到旋转基板支撑台（3）上的基板W上 ）。 通过在成膜中保持基板温度恒定，可以降低成膜时的基板上的温度不均匀性，并使面内膜特性均匀化。 因此，可以使成膜层的膜厚，结晶度和成分组成比等的膜性能均匀，能够以高的生产率制造具有设备特性变化稳定的电阻变化元件 包括面内电阻和磁阻效应，例如被抑制。

公开(公告)号：US20090136210A1

公开(公告)日：2009-05-28

申请号：US12066762

申请日：2006-07-19

申请人： Naoki Morimoto

发明人： Naoki Morimoto

IPC分类号： H04N5/00

CPC分类号： G11B27/034 ,  G11B27/28 ,  G11B27/322 ,  H04N5/772 ,  H04N9/8205 ,  H04N21/8455 ,  H04N21/8456

摘要： When setting of marking on recording data is performed, the marking is automatically performed at a suitable position corresponding to a status during image capturing. While recording of captured images is being performed, a status of a zoom operation, a moving pattern of a camera, and a feature value of video/audio signals are monitored, and a time point at which a predetermined change has occurred regarding this monitored state is detected. A predetermined data position based on this detected time point is then set as a marking position. Setting information of the marking position is stored in a structure of management information, and is stored in a storage section together with the recording data.

摘要翻译： 当执行记录数据上的标记设置时，在与图像捕获期间的状态对应的适当位置处自动执行标记。 在执行拍摄图像的记录的同时，监视缩放操作的状态，相机的移动图案和视频/音频信号的特征值，并且监视关于该监视状态的预定变化的时间点 被检测到。 然后将基于该检测到的时间点的预定数据位置设置为标记位置。 标记位置的设置信息以管理信息的结构存储，并与记录数据一起存储在存储部分中。

公开(公告)号：US07372795B2

公开(公告)日：2008-05-13

申请号：US10765160

申请日：2004-01-28

申请人： Haruo Yoshida ,  Naoki Morimoto ,  Masaharu Murakami ,  Hiroshi Jinno

发明人： Haruo Yoshida ,  Naoki Morimoto ,  Masaharu Murakami ,  Hiroshi Jinno

IPC分类号： G11B7/00

CPC分类号： G11B20/10 ,  G11B27/329 ,  G11B2220/20 ,  G11B2220/2525

摘要： Before each content file is recorded first to a recording medium, a flag indicating a recording state of a content file is generated corresponding to a physical area where an index file can be continuously recorded. An index file is generated which associates attribute information with the generated flag added thereto with real data of each content file, and the generated index file is recorded to the recording medium. Since fragmentation of the physical area where the index file is recorded is restrained to a minimum level, a high-speed reading operation is realized.

摘要翻译： 在将每个内容文件首先记录到记录介质之前，根据能够连续记录索引文件的物理区域生成表示内容文件的记录状态的标志。 生成索引文件，其将属性信息与添加到其中的生成的标记相关联，并且生成的索引文件被记录到记录介质。 由于将索引文件记录的物理区域的碎片限制在最小水平，因此实现高速读取操作。

公开(公告)号：US06853770B2

公开(公告)日：2005-02-08

申请号：US10250339

申请日：2001-12-25

申请人： Frank Xiaofan Zhu ,  Shigeki Nagasaka ,  Naoki Morimoto ,  Kenichi Nakama

发明人： Frank Xiaofan Zhu ,  Shigeki Nagasaka ,  Naoki Morimoto ,  Kenichi Nakama

IPC分类号： G02B6/42 ,  G02B5/18 ,  G02B6/34 ,  H01J14/02

CPC分类号： G02B6/4215 ,  G02B6/2931 ,  G02B6/3512 ,  G02B6/4225 ,  G02B6/4227

摘要： The present invention relates to a method of aligning and assembling an optical demultiplexer module having an input fiber, a collimator lens, a diffraction grating, and a photodetector array, and a mechanism for automatically aligning such an optical demultiplexer module. The method comprises the steps of preparing a submodule A including the input fiber and the photodetector array and a submodule B including the diffraction grating and the collimator lens, preparing an alignment jig for allowing the submodules A, B to move independently of each other, fixing the submodules A, B to the adjustment jig, and applying light from the input fiber and moving the submodule B with respect to the submodule A for maximizing a light output from a photodetector.

摘要翻译： 本发明涉及一种对准和组装具有输入光纤，准直透镜，衍射光栅和光电检测器阵列的光解复用器模块的方法，以及用于自动对准这种光解复用器模块的机构。 该方法包括以下步骤：制备包括输入光纤和光电检测器阵列的子模块A和包括衍射光栅和准直透镜的子模块B，准备对准夹具以使子模块A，B彼此独立地移动，固定 子模块A，B到调整夹具，并且从输入光纤施加光并使子模块B相对于子模块A移动，以使从光电检测器输出的光最大化。

公开(公告)号：US08834685B2

公开(公告)日：2014-09-16

申请号：US13130589

申请日：2009-12-08

申请人： Naoki Morimoto ,  Junichi Hamaguchi

发明人： Naoki Morimoto ,  Junichi Hamaguchi

IPC分类号： C23C14/35 ,  H01J37/34 ,  C23C14/04 ,  H01L21/285 ,  C23C14/34

CPC分类号： H01J37/3405 ,  C23C14/046 ,  C23C14/3407 ,  C23C14/351 ,  C23C14/358 ,  H01J37/3447 ,  H01J37/3452 ,  H01J37/3458 ,  H01L21/2855

摘要： The sputtering apparatus has: a vacuum chamber in which a substrate is disposed; a cathode unit which is disposed inside the vacuum chamber so as to lie opposite to the substrate. The cathode unit has mounted a bottomed cylindrical target material from a bottom side thereof into at least one recessed portion formed in one surface of a holder, and has assembled therein a magnetic field generator for generating a magnetic field in an inside space of the target material. The sputtering apparatus further has: an anode shield to which a positive electric potential is applied; a gas introduction device for introducing a sputtering gas into the vacuum chamber; a power supply for activating power to the cathode unit; a vertical magnetic field generator including coils disposed along a wall surface of the vacuum chamber about a reference axis connecting the cathode unit and the substrate, and a power supply; and a controller for switching on or off the introduction of the sputtering gas from the gas introduction device.

摘要翻译： 溅射装置具有：设置基板的真空室; 阴极单元，设置在真空室内，以与基板相对。 阴极单元从其底侧将底部圆柱形目标材料安装到形成在保持器的一个表面中的至少一个凹部中，并且组装有用于在目标材料的内部空间中产生磁场的磁场发生器 。 该溅射装置还具有：施加正电位的阳极护罩; 气体引入装置，用于将溅射气体引入真空室; 用于激活对所述阴极单元的电力的电源; 垂直磁场发生器，包括围绕连接阴极单元和基板的参考轴线，以及电源沿着真空室的壁面布置的线圈; 以及用于接通或关闭从气体导入装置引入溅射气体的控制器。

公开(公告)号：US08702913B2

公开(公告)日：2014-04-22

申请号：US12681464

申请日：2008-09-29

申请人： Kenichi Imakita ,  Tadashi Morita ,  Hiroki Yamamoto ,  Naoki Morimoto ,  Ayao Nabeya ,  Shinya Nakamura

发明人： Kenichi Imakita ,  Tadashi Morita ,  Hiroki Yamamoto ,  Naoki Morimoto ,  Ayao Nabeya ,  Shinya Nakamura

IPC分类号： C23C14/34

CPC分类号： C23C14/3407 ,  C23C14/352 ,  H01J37/34 ,  H01J37/347 ,  H01L43/12

摘要： A film formation apparatus and film formation method that improve film thickness uniformity. A rotation mechanism holds a target having a sputtered surface in a state inclined relative to a surface of a substrate. The rotation mechanism rotatably supports the target about an axis extending along a normal of the sputtered surface. The target supported by the rotation mechanism is sputtered to form a thin film on the surface of the substrate. When forming the thin film, the rotation mechanism maintains the rotational angle of the target.

摘要翻译： 一种提高膜厚均匀性的成膜装置和成膜方法。 旋转机构将具有溅射表面的靶保持在相对于基板的表面倾斜的状态。 旋转机构围绕沿着溅射表面的法线延伸的轴线可旋转地支撑目标。 由旋转机构支撑的目标被溅射以在基板的表面上形成薄膜。 当形成薄膜时，旋转机构保持目标的旋转角度。

公开(公告)号：US08357265B2

公开(公告)日：2013-01-22

申请号：US12269438

申请日：2008-11-12

申请人： Kouji Sogabe ,  Naoki Morimoto ,  Masahiko Ishida

发明人： Kouji Sogabe ,  Naoki Morimoto ,  Masahiko Ishida

IPC分类号： H01L21/00 ,  C23C16/00

CPC分类号： C23C16/4586 ,  C23C16/4405 ,  H01J37/32862 ,  Y10T279/23

摘要： To provide a technique which cleans an attracting face of a mechanism for electrostatically attracting an object to be processed inside a vacuum processing apparatus and keeps its attracting force constant. The method of the present invention is for cleaning an attracting face of a hot plate which holds the object to be processed inside a vacuum processing chamber through electrostatic attraction. The invention method includes a step of cleaning the attracting face of the hot plate by applying a high-frequency electric power of 13.56 MHz to a metallic base arranged under and near the hot plate in a state in which a cleaning gas is introduced into the vacuum processing chamber.

摘要翻译： 提供一种清洁真空处理装置内静电吸附被处理物的机构的吸引面并保持其吸引力恒定的技术。 本发明的方法是通过静电吸引来清洁在真空处理室内保持待处理物体的热板的吸附面。 本发明的方法包括以下步骤：在将清洁气体引入真空的状态下，将13.56MHz的高频电力施加到布置在热板下方和附近的金属基底上，来清洁热板的吸附面 处理室。

公开(公告)号：US20130003250A1

公开(公告)日：2013-01-03

申请号：US13634316

申请日：2011-03-16

申请人： Naoki Morimoto ,  Masahiko Ishida

发明人： Naoki Morimoto ,  Masahiko Ishida

IPC分类号： H01L21/687

CPC分类号： H01L21/6831

摘要： A substrate holding device for clamping a substrate in a processing chamber in which plasma processing is carried out includes a chuck main body having positive and negative electrodes and, a chuck plate having a rib portion capable of bringing the peripheral edge portion of the substrate into surface contact therewith and multiple support portions provided upright and arranged at predetermined intervals in an internal space surrounded by the rib portion, a DC power supply for applying a DC voltage between the two electrodes, an AC power supply for passing an alternating current through the capacitance of the chuck plate, and first measuring means for measuring the alternating current passing through the capacitance of the chuck plate, and further includes removing means for removing an AC component superimposed on the alternating current from a plasma produced in the processing chamber during plasma processing.

摘要翻译： 用于在执行等离子体处理的处理室中夹持基板的基板保持装置包括具有正极和负极的卡盘主体，以及具有能够使基板的周边部分成为表面的肋部的卡盘板 与其直接连接并且设置在由肋部包围的内部空间中的直立设置的多个支撑部，用于在两个电极之间施加直流电压的直流电源，用于使交流电流通过电容的交流电源 卡盘板和用于测量通过卡盘板电容的交流电流的第一测量装置，还包括用于从等离子体处理期间由处理室中产生的等离子体移除叠加在交流电上的交流分量的去除装置。

公开(公告)号：US20120118725A1

公开(公告)日：2012-05-17

申请号：US13321605

申请日：2010-05-20

申请人： Naoki Morimoto ,  Junichi Hamaguchi ,  Kazumasa Horita ,  Naoki Takeda

发明人： Naoki Morimoto ,  Junichi Hamaguchi ,  Kazumasa Horita ,  Naoki Takeda

IPC分类号： C23C14/35

CPC分类号： H01L21/2855 ,  C23C14/351 ,  H01J37/3402 ,  H01J37/3405 ,  H01J37/342 ,  H01L21/76843

摘要： A film forming method of forming a coating on a surface of an object to be processed includes disposing a target forming a base material of the coating and the object to be processed in a chamber so as to face each other, and generating a magnetic field through which a vertical line of magnetic force locally passes from a sputter surface of the target toward a surface to be film formed of the object to be processed at predetermined intervals; generating plasma in a space between the target and the object to be processed by introducing a sputter gas into the chamber, controlling a gas pressure in the chamber to a range of 0.3 Pa to 10.0 Pa, and applying a negative DC voltage to the target; and inducing and depositing the sputter particles on the object to be processed and forming the coating, while controlling flying direction of the sputter particles generated by sputtering the target.

摘要翻译： 在待处理物体的表面上形成涂层的成膜方法包括：将形成所述涂层的基材和待处理物体的对象设置在室内以使其彼此面对，并产生磁场通过 其中垂直的磁力线从靶的溅射表面局部地以预定间隔从待处理物体形成的待形成的膜的表面; 通过将溅射气体引入到室内，在靶和被处理物之间的空间中产生等离子体，将室内的气体压力控制在0.3Pa〜10.0Pa的范围内，向目标施加负的直流电压; 并且通过溅射目标而产生溅射粒子的飞行方向，同时将溅射粒子诱导并沉积在被处理物上并形成涂层。

公开(公告)号：US20110062019A1

公开(公告)日：2011-03-17

申请号：US12991961

申请日：2009-06-04

申请人： Naoki Morimoto ,  Tomoyasu Kondo ,  Hideto Nagashima ,  Daisuke Mori ,  Akifumi Sano

发明人： Naoki Morimoto ,  Tomoyasu Kondo ,  Hideto Nagashima ,  Daisuke Mori ,  Akifumi Sano

IPC分类号： C23C14/35

CPC分类号： C23C14/35 ,  C23C14/3457 ,  C23C14/358 ,  H01J37/32633 ,  H01J37/3266 ,  H01J37/3408 ,  H01J37/3458 ,  H01L21/2855

摘要： There is provided an inexpensive sputtering apparatus in which self-sputtering can be stably performed by accelerating the ionization of the atoms scattered from a target. The sputtering apparatus has: a target which is disposed inside a vacuum chamber so as to lie opposite to the substrate W to be processed; a magnet assembly which forms a magnetic field in front of the sputtering surface of the target; and a DC power supply which charges the target with a negative DC potential. A first coil is disposed in a central portion of a rear surface of the sputtering surface of the target. The first coil is electrically connected between the first power supply and the output to the target. When a negative potential is charged to the target by the sputtering power supply, the electric power is charged to the first coil, whereby a magnetic field is generated in front of the sputtering surface.

摘要翻译： 提供了一种廉价的溅射装置，其中通过加速从靶分散的原子的电离可以稳定地进行自溅射。 溅射装置具有：设置在真空室内的靶，以与待加工的基板W相对; 在靶的溅射表面前面形成磁场的磁体组件; 以及对具有负DC电位的目标进行充电的DC电源。 第一线圈设置在靶的溅射表面的后表面的中心部分中。 第一线圈电连接到第一电源和与目标的输出之间。 当通过溅射电源将负电位充电到目标电极时，电力被充电到第一线圈，由此在溅射表面的前面产生磁场。