Fluorine-containing polymerisable monomer and polymer prepared by using same
    71.
    发明申请
    Fluorine-containing polymerisable monomer and polymer prepared by using same 有权
    含氟可聚合单体和使用它制备的聚合物

    公开(公告)号:US20060252897A1

    公开(公告)日:2006-11-09

    申请号:US11485422

    申请日:2006-07-13

    IPC分类号: C08F220/22

    摘要: The present invention relates to a polymerizable monomer represented by the general formula (1), wherein R1 is a hydrogen atom, a halogen atom, a hydrocarbon group or a fluorine-containing alkyl group; R2 is a straight-chain or branched alkyl group, a cyclic alkyl group, an aromatic group, or a substituent having at least two of these groups, the R2 being optionally partially fluorinated; R3 is a hydrogen atom, a hydrocarbon group that is optionally branched, a fluorine-containing alkyl group, or a cyclic group having an aromatic or alicyclic structure, the R3 optionally containing a bond of an oxygen atom or carbonyl group; and n is an integer of 1-2.

    摘要翻译: 本发明涉及由通式(1)表示的可聚合单体,其中R 1是氢原子,卤素原子,烃基或含氟烷基; R 2是直链或支链烷基,环状烷基,芳族基团或具有这些基团中的至少两个的取代基,R 2是 任选部分氟化; R 3是氢原子,任选支链的烃基,含氟烷基或具有芳族或脂环结构的环状基团,R 3, 任选地含有氧原子或羰基的键; n为1-2的整数。

    Process for producing acrylic ester compound
    72.
    发明申请
    Process for producing acrylic ester compound 有权
    制备丙烯酸酯化合物的方法

    公开(公告)号:US20050171375A1

    公开(公告)日:2005-08-04

    申请号:US10995334

    申请日:2004-11-24

    CPC分类号: C07C67/14 C07C69/653

    摘要: A process for producing an acrylic ester compound includes reacting in the presence of alkene an alcohol represented by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a straight-chain or branched hydrocarbon group, a fluorine-containing alkyl group, or an aromatic or aliphatic ring and optionally contains oxygen, sulfur or a carbonyl bond, with an acid halide represented by the formula (2), wherein R2 represents a hydrogen atom, a halogen atom, a hydrocarbon group, or a fluorine-containing alkyl group, and X represents a halogen atom.

    摘要翻译: 丙烯酸酯化合物的制造方法包括在烯烃存在下使式(1)表示的醇反应,其中R 1表示氢原子,氟原子,直链或支链 烃基,含氟烷基或芳族或脂族环,并且任选地含有氧,硫或羰基键,与式(2)表示的酰基卤,其中R 2表示 氢原子,卤素原子,烃基或含氟烷基,X表示卤素原子。

    Process for producing acrylic ester compound
    73.
    发明授权
    Process for producing acrylic ester compound 有权
    制备丙烯酸酯化合物的方法

    公开(公告)号:US07173147B2

    公开(公告)日:2007-02-06

    申请号:US10995334

    申请日:2004-11-24

    IPC分类号: C07C233/00

    CPC分类号: C07C67/14 C07C69/653

    摘要: A process for producing an acrylic ester compound includes reacting in the presence of alkene an alcohol represented by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a straight-chain or branched hydrocarbon group, a fluorine-containing alkyl group, or an aromatic or aliphatic ring and optionally contains oxygen, sulfur or a carbonyl bond, with an acid halide represented by the formula (2), wherein R2 represents a hydrogen atom, a halogen atom, a hydrocarbon group, or a fluorine-containing alkyl group, and X represents a halogen atom.

    摘要翻译: 丙烯酸酯化合物的制造方法包括在烯烃存在下使式(1)表示的醇反应,其中R 1表示氢原子,氟原子,直链或支链 烃基,含氟烷基或芳族或脂族环,并且任选地含有氧,硫或羰基键,与式(2)表示的酰基卤,其中R 2表示 氢原子,卤素原子,烃基或含氟烷基,X表示卤素原子。

    Fluorine-containing acrylate monomers
    74.
    发明授权
    Fluorine-containing acrylate monomers 有权
    含氟丙烯酸酯单体

    公开(公告)号:US06784312B2

    公开(公告)日:2004-08-31

    申请号:US10198044

    申请日:2002-07-19

    IPC分类号: C07C6952

    摘要: The present invention relates to a polymerizable monomer represented by the general formula (1), wherein R1 is a hydrogen atom, a halogen atom, a hydrocarbon group or a fluorine-containing alkyl group; R2 is a straight-chain or branched alkyl group, a cyclic alkyl group, an aromatic group, or a substituent having at least two of these groups, the R2 being optionally partially fluorinated; R3 is a hydrogen atom, a hydrocarbon group that is optionally branched, a fluorine-containing alkyl group, or a cyclic group having an aromatic or alicyclic structure, the R3 optionally containing a bond of an oxygen atom or carbonyl group; and n is an integer of 1-2.

    摘要翻译: 本发明涉及由通式(1)表示的可聚合单体,其中R 1是氢原子,卤素原子,烃基或含氟烷基; R 2是直链或支链烷基,环状烷基,芳族基团或具有这些基团中至少两个的取代基,R 2任选地被部分氟化; R 3是氢原子,任选支链的烃基,含氟烷基或具有芳族或脂环结构的环状基团,R 3任选地含有氧原子或羰基的键 组; n为1-2的整数。

    Clothing image analysis apparatus, method, and integrated circuit for image event evaluation
    76.
    发明授权
    Clothing image analysis apparatus, method, and integrated circuit for image event evaluation 有权
    服装图像分析装置,图像事件评估方法和集成电路

    公开(公告)号:US09141856B2

    公开(公告)日:2015-09-22

    申请号:US13814813

    申请日:2012-07-05

    申请人: Kazuhiko Maeda

    发明人: Kazuhiko Maeda

    IPC分类号: G06K9/00 G06F17/30

    摘要: In an image evaluation apparatus, a clothing recognition unit performs, for each person appearing in each of images included in an image group generated by an image group generation unit, recognition of clothing that the person is wearing. An image event evaluation unit, according to types of clothing recognized by the clothing recognition unit and a frequency of appearance of each type of clothing in the images in the image group, collectively evaluates the images included in the image group.

    摘要翻译: 在图像评价装置中,服装识别单元对于由图像组生成单元生成的图像组中包含的每个图像中的每个人执行对该人穿着的服装的识别。 图像事件评估单元根据由服装识别单元识别的服装的类型和图像组中的图像中的各种服装的出现次数,共同评估包括在图像组中的图像。

    Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
    77.
    发明授权
    Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions 有权
    含氟化合物及其聚合物可用于抗反射膜材料和抗蚀剂组合物

    公开(公告)号:US08691491B2

    公开(公告)日:2014-04-08

    申请号:US13094281

    申请日:2011-04-26

    IPC分类号: G03F7/004

    摘要: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.

    摘要翻译: 由式1表示的含氟化合物,其中R 1为甲基或三氟甲基,R 2和R 3各自独立地为氢原子或含有(a)具有直链,支链或环的烃基的基团 形成并具有1-25的碳原子数或(b)芳族烃基,所述基团任选地含有氟原子,氧原子和羰基键中的至少一个,l是0-2的整数, m和n各自独立地为1-5的整数,以满足m + n≦̸ 6的表达式,并且当R 1,R 2和R 3中的至少一个为多个时,R 1,R 2和 R3可以彼此相同或不同。

    Top Coating Composition
    79.
    发明申请
    Top Coating Composition 有权
    顶涂层组成

    公开(公告)号:US20120040294A1

    公开(公告)日:2012-02-16

    申请号:US13264285

    申请日:2010-04-20

    IPC分类号: G03F7/20 C08K5/05 C09D135/02

    CPC分类号: C08F20/22 G03F7/11 G03F7/2041

    摘要: Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

    摘要翻译: 公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物,该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物,其特征在于含有具有由以下通式(1)表示的重复单元的含氟聚合物 )。 该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中,R1表示氢原子,氟原子,甲基或三氟甲基,R2表示热不稳定保护基,R3表示氟原子或含氟烷基,W表示二价连接基。

    Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent
    80.
    发明申请
    Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent 有权
    新型磺酸盐及其衍生物,光酸发生剂和抗光材料和图案形成方法使用光酸发生剂

    公开(公告)号:US20100304303A1

    公开(公告)日:2010-12-02

    申请号:US12740780

    申请日:2008-10-31

    IPC分类号: G03F7/004 C07C271/24 G03F7/20

    摘要: Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

    摘要翻译: 公开了具有由以下通式(A)表示的结构的氟化磺酸盐或含氟磺酸基化合物。 在该式中,n表示1〜10的整数, R表示取代或未取代的C1-C20直链,支链或环状烷基,取代或未取代的C1-C20直链,支链或环状烯基,取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度,不关于人体积累,可产生酸( 光酸),并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。