公开(公告)号：US08542275B2

公开(公告)日：2013-09-24

申请号：US12880626

申请日：2010-09-13

Applicant: Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

Inventor： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

IPC: H04N7/18

CPC classification number: G01N23/2255

Abstract: A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.

Abstract translation: 截面处理和观察方法包括：通过使用聚焦离子束的蚀刻处理在样品中形成第一横截面; 通过将聚焦的离子束照射到第一横截面来获得第一横截面的图像信息; 通过对所述第一横截面进行蚀刻处理形成第二横截面; 通过将聚焦离子束照射到包括第二横截面的照射区域来获得第二横截面的图像信息; 从第二横截面的图像信息中显示照射区域的显示区域的一部分的图像信息; 通过将第一横截面的图像信息叠加在正在显示的图像信息上来显示图像信息; 并且在照射区域内移动显示区域。 可以获得显示区域对准的观察图像，同时减少对样品的损伤。

公开(公告)号：US08513627B2

公开(公告)日：2013-08-20

申请号：US12378186

申请日：2009-02-11

Applicant: Masayuki Maruo

Inventor： Masayuki Maruo

IPC: G21K7/00

CPC classification number: H01J37/3056 ,  H01J2237/006

Abstract: An assist gas having a very small amount and a uniform concentration is fed by a charged particle beam apparatus, in which a supply amount of gas is intermittently fed by a massflow controller, and gas is passed through a diffusion mechanism connected to the massflow controller, whereby an assist gas having a very small amount and a uniform concentration.

公开(公告)号：US08495759B2

公开(公告)日：2013-07-23

申请号：US12510794

申请日：2009-07-28

Applicant: Shigeru Wakiyama ,  Hiroyoshi Yamamoto ,  Yoshiteru Shikakura ,  Itaru Kitajima

Inventor： Shigeru Wakiyama ,  Hiroyoshi Yamamoto ,  Yoshiteru Shikakura ,  Itaru Kitajima

IPC: G01Q10/00

CPC classification number: G01Q40/00 ,  G01Q30/06

Abstract: Provided is an aligning method capable of setting a sample observation unit such as an optical microscope to a probe microscope observation position at high precision. A sample having a known structure is used in advance. A surface of the sample and a shape of a cantilever provided with a probe are observed using the sample observation unit such as the optical microscope. A sample observation position and a probe position which are obtained using the sample observation unit are verified, and a relative positional relationship therebetween is recorded. Then, a first mark indicating a position of the cantilever and a second mark which is displayed in conjunction with the first mark and has the relative positional relationship with the first mark are produced to align the sample relative to the second mark.

Abstract translation: 提供了一种能够将诸如光学显微镜的样本观察单元以高精度设置在探针显微镜观察位置的对准方法。 预先使用具有已知结构的样品。 使用诸如光学显微镜的样品观察单元观察样品的表面和设置有探针的悬臂的形状。 验证使用样本观察单元获得的样本观察位置和探针位置，并记录它们之间的相对位置关系。 然后，产生指示悬臂的位置的第一标记和与第一标记一起显示并与第一标记具有相对位置关系的第二标记，以使样本相对于第二标记进行对准。

公开(公告)号：US08306264B2

公开(公告)日：2012-11-06

申请号：US12380432

申请日：2009-02-27

Applicant: Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

Inventor： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

IPC: G06K9/00

CPC classification number: H01J37/28 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/67282 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A section processing apparatus has a mark forming control portion that transmits control information for forming marks on a surface of a sample. Each of the marks has at least two portions intersecting at a converging portion located at a previously determined position of an observation target section of the sample or in the vicinity of the previously determined position. A first focused ion beam apparatus emits a first focused beam for forming each of the marks on the surface of the sample based on the control information transmitted by the mark forming control portion and for processing a section of the sample. The section of the sample is processed by scanning the first focused beam in parallel with the at least two portions of the marks in the direction of the converging portion, while the section of the sample and positions of the marks are observed by a second focused ion beam apparatus, and to finish processing of the section of the sample when the first focused beam reaches the converging portion or a vicinity thereof.

Abstract translation: 区段处理设备具有标记形成控制部分，其在样品的表面上传送用于形成标记的控制信息。 每个标记具有在位于样品的观察目标部分的预先确定的位置处的收敛部分或者在先前确定的位置附近的至少两个部分。 第一聚焦离子束装置基于由标记形成控制部分发送的控制信息和用于处理样品的一部分，发射用于形成样品表面上的每个标记的第一聚焦光束。 通过在收敛部分的方向上与标记的至少两个部分平行地扫描第一聚焦光束，同时样品的部分和标记的位置被第二聚焦离子 并且当第一聚焦光束到达会聚部分或其附近时，完成样品部分的处理。

公开(公告)号：US08274063B2

公开(公告)日：2012-09-25

申请号：US12733091

申请日：2008-08-06

Applicant: Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

Inventor： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC: H01J49/00

CPC classification number: H01J37/08 ,  G01N1/04 ,  G01N1/06 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31745

Abstract: A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

Abstract translation: 复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 每个第二离子具有比第一质量小的第二质量。

公开(公告)号：US08269188B2

公开(公告)日：2012-09-18

申请号：US13135300

申请日：2011-06-30

Applicant: Takashi Ogawa

Inventor： Takashi Ogawa

IPC: H01J3/14 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/12 ,  H01J37/3056 ,  H01J2237/04924 ,  H01J2237/1202 ,  H01J2237/30472 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A charged particle beam apparatus includes an ion beam column having an ion source for generating an ion beam, a first objective lens electrode which forms a first objective lens for focusing the ion beam on a sample, and a second objective lens electrode which is disposed at a position closer to the sample than the first objective lens electrode and forms a second objective lens for focusing an ion beam accelerated with a lower acceleration voltage on the sample.

公开(公告)号：US08111079B2

公开(公告)日：2012-02-07

申请号：US12378181

申请日：2009-02-11

Applicant: Masatoshi Yasutake ,  Takakazu Fukuchi

Inventor： Masatoshi Yasutake ,  Takakazu Fukuchi

IPC: G01R27/08

CPC classification number: G01R27/02

Abstract: A conductivity measuring apparatus includes a probe base having a pair of electrodes disposed on respective opposite surfaces of a portion of the probe base. Observing and grasping probes are supported by the probe base in a cantilever state and are arranged adjancent to and spaced apart from one another by a predetermined distance. The grasping probe has a pair of electrodes disposed on respective opposite surfaces of a portion of the grasping probe confronting the portion of the probe base. A voltage apparatus applies a voltage between the pairs of electrodes on the probe base and the grasping probe to adjust the predetermined distance between the grasping and observing probes. A movement mechanism moves a sample base and the observing and grasping probes relative to each other to bring conductive tips of the observing and grasping probes into contact with respective contact points on a sample supported on the sample base. A measurement apparatus measures a conductivity between the contact points on the sample on the basis of a current flow generated between the conductive tips of the observing and grasping probes.

Abstract translation: 电导率测量装置包括探针基座，其具有设置在探针基座的一部分的相应相对表面上的一对电极。 观察和抓取探针由探针基座以悬臂状态支撑，并且被布置成彼此相邻并间隔预定距离。 抓握探针具有一对电极，该对电极设置在面对探针基部的部分的抓握探针的一部分的相应相对表面上。 电压装置在探针基座上的电极对与抓取探针之间施加电压，以调整把持和观察探针之间的预定距离。 移动机构使样本基座和观察和抓取探针相对于彼此移动，以使观察和抓取探针的导电尖端与支撑在样品基底上的样品上的相应接触点接触。 测量装置基于在观察和抓取探针的导电尖端之间产生的电流来测量样品上的接触点之间的电导率。

公开(公告)号：US08058780B2

公开(公告)日：2011-11-15

申请号：US12378139

申请日：2009-02-11

Applicant: Masato Iyoki

Inventor： Masato Iyoki

IPC: H01L41/04

CPC classification number: H01L41/092 ,  G01Q10/04

Abstract: The cylindrical piezoelectric actuator which comprised a piezoelectric element which provided electrode in each of an inner peripheral face and an outer peripheral face which was cylindrical at least, and drive power supply to drive it. And the outer side electrode of the piezoelectric element covered the substantially circumferential outer face entirety and it was connected to a ground potential, and the electrode in the internal perimeter surface connected to drive power supply.

Abstract translation: 该圆柱形压电致动器包括一个压电元件，该压电元件至少在圆筒形的内周面和外周面中设置电极，驱动电源驱动该压电元件。 并且压电元件的外侧电极覆盖基本圆周的外表面整体，并且其连接到接地电位，并且内周边表面中的电极连接以驱动电源。

公开(公告)号：US07997124B2

公开(公告)日：2011-08-16

申请号：US11879878

申请日：2007-07-19

Applicant: Yoshiteru Shikakura ,  Kazutoshi Watanabe

Inventor： Yoshiteru Shikakura ,  Kazutoshi Watanabe

IPC: G01B5/28

CPC classification number: G01Q30/04 ,  G01Q10/065

Abstract: A scanning probe microscope has a cantilever mounted to undergo oscillation movement over a surface of a sample. The cantilever has a probe on a distal end thereof. A Z-axis controlling amount calculating mechanism calculates a controlling amount for keeping constant an oscillation amount of the cantilever. A Z-axis driving mechanism drives in a Z direction the cantilever or the sample in accordance with the controlling amount from the Z-axis controlling amount calculating mechanism. A driving range limiting device limits a driving range of the Z-axis driving mechanism. A driving range setting device optionally sets the driving range of the Z-axis driving mechanism.

Abstract translation: 扫描探针显微镜具有悬臂安装以在样品的表面上经历振荡运动。 悬臂在其远端具有探针。 Z轴控制量计算机构计算用于保持悬臂的振荡量恒定的控制量。 Z轴驱动机构根据来自Z轴控制量计算机构的控制量沿Z方向驱动悬臂或样本。 驱动范围限制装置限制了Z轴驱动机构的驱动范围。 驱动范围设定装置可选地设定Z轴驱动机构的驱动范围。

公开(公告)号：US07970101B2

公开(公告)日：2011-06-28

申请号：US12544562

申请日：2009-08-20

Applicant: Noriaki Sakai ,  Toshiyuki Takahara ,  Yoshiki Matoba

Inventor： Noriaki Sakai ,  Toshiyuki Takahara ,  Yoshiki Matoba

IPC: G01N23/223 ,  G01N23/203

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and scattered X-ray, an analyzer which analyzes the signal, a sample stage on which the sample is placed, a moving mechanism which moves the sample on the sample stage, the X-ray tube, and the X-ray detector relative to each other, a height measuring mechanism which measures a maximum height of the sample, and a control unit which adjusts the distance between the sample and the X-ray tube and the distance between the sample and the X-ray detector by controlling the moving mechanism on the basis of the measured maximum height of the sample, are included.

Abstract translation: 将X射线照射到样品的照射点的X射线管，检测特征X射线的X射线检测器和从样本发射的散射X射线，并输出包含能量信息的信号 特征X射线和散射X射线，分析信号的分析器，放置样品的样品台，使样品台上的样品移动的移动机构，X射线管和X射线管， 相对于彼此的X射线检测器，测量样品的最大高度的高度测量机构，以及调整样品与X射线管之间的距离以及样品与X射线检测器之间的距离的控制单元， 包括根据测得的样品最大高度来控制移动机构。