公开(公告)号：US20150241366A1

公开(公告)日：2015-08-27

申请号：US14187832

申请日：2014-02-24

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang ,  Paul Ulrich Pennartz

IPC: G01N23/201 ,  G21K1/04

CPC classification number: G01N23/201 ,  G21K1/02 ,  G21K1/025 ,  G21K1/04 ,  G21K2201/062

Abstract: An assembly for Kratky collimator is provided. The assembly may be used for a small angle x-ray camera or system requiring such filtering. The assembly may include a first block with a first working surface and a second block with a second working surface. The first and second blocks may be aligned with the first working surface pointing an opposite direction of the second working surface and the first working surface being aligned in a common plane with the second working surface. In some implementations, the first block may comprise a crystal material. In some implementations, an extension may of the first block may be configured position a beamstop.

Abstract translation: 提供了Kratky准直器的组件。 组件可用于需要这种过滤的小角度X射线摄像机或系统。 组件可以包括具有第一工作表面的第一块和具有第二工作表面的第二块。 第一和第二块可以与第一工作表面对准，其指向第二工作表面的相反方向，并且第一工作表面与第二工作表面在公共平面中对准。 在一些实施方案中，第一块可以包括晶体材料。 在一些实施方案中，第一块的延伸部可以被配置为定位梁挡。

公开(公告)号：US09080944B2

公开(公告)日：2015-07-14

申请号：US13735509

申请日：2013-01-07

Applicant: Bruker AXS, Inc.

Inventor： Jonathan Giencke

IPC: G01N23/207 ,  G01N23/201

CPC classification number: G01N23/207 ,  G01N23/201 ,  G01N2223/501 ,  G01N2223/61 ,  G01N2223/6116

Abstract: An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.

Abstract translation: 用于检查结晶样品的表面的装置使用位置敏感检测器进行平面内掠入射衍射。 x射线源照射样品的延伸区域，并且对于具有适当晶格取向的晶体部分，产生细长的衍射信号。 然后可以改变样品和x射线束的相对位置以照射样品的不同区域，使得衍射信号对应于这些其它区域。 通过扫描整个样品，可以产生样品表面的空间分布。 该系统可用于在样品表面上定位晶体边界，缺陷或衰减材料的存在。

公开(公告)号：US20150110249A1

公开(公告)日：2015-04-23

申请号：US14515322

申请日：2014-10-15

Applicant: KLA-Tencor Corporation

Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov ,  Ady Levy ,  Guorong V. Zhuang ,  John J. Hench

IPC: G01N23/201 ,  G01N33/00

CPC classification number: G01N23/201 ,  G01N2033/0095

Abstract: Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.

Abstract translation: 公开了用于执行小角度X射线散射测量的装置和方法。 该系统包括用于产生X射线的X射线源和照明光学器件，用于收集并折射所产生的X射线的一部分朝着半导体样本上的特定聚焦点以多个入射光束的形式反射或折射 多个不同的入射角（AOI）。 该系统还包括传感器，用于响应于在不同AOI处的样品上的入射光束而从样品收集输出的X射线束，以及控制器，被配置为控制X射线源和照明光学器件的接收和接收 输出x射线束并从这样的输出x射线产生图像。

公开(公告)号：US20140264046A1

公开(公告)日：2014-09-18

申请号：US13833346

申请日：2013-03-15

Applicant: BRUKER AXS, INC.

Inventor： Roger D. Durst ,  Peter Laggner ,  Sergei A. Medved ,  Bruce L. Becker

IPC: G01T1/16 ,  G01T1/24

CPC classification number: G01T1/1606 ,  G01N23/201 ,  G01N2223/054 ,  G01T1/24 ,  H01L31/085 ,  Y10T29/4913

Abstract: A detector for a small-angle x-ray diffraction system uses curved readout strips shaped to correspond to the expected intensity distribution of x-rays scattered by the system. This expected intensity distribution may be a series of concentric circles, and each of the strips has a shape that approximates a section of an annulus. The strips may be positioned on a substrate such that a center of curvature of the curved strips is located along an edge of a readout region within which the strips are located or, alternatively, at a geometric center of the readout region. The detector may have a signal readout system that uses a delay line or, alternatively, a multichannel readout system. The detector may make use of electron generation via interaction of the diffracted x-ray beam with a gas in a gas chamber, or through interaction of the diffracted beam with a semiconductor material.

Abstract translation: 用于小角度X射线衍射系统的检测器使用弯曲的读出条，其形状对应于由系统散射的x射线的预期强度分布。 该预期的强度分布可以是一系列同心圆，并且每个条具有近似于环的一部分的形状。 条带可以定位在基板上，使得弯曲条带的曲率中心沿着条带所在的读出区域的边缘或者替代地位于读出区域的几何中心处。 检测器可以具有使用延迟线或者替代地，多通道读出系统的信号读出系统。 检测器可以通过衍射X射线束与气室中的气体的相互作用或通过衍射光束与半导体材料的相互作用来利用电子产生。

公开(公告)号：US20140067316A1

公开(公告)日：2014-03-06

申请号：US13752490

申请日：2013-01-29

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yasuhiko ISHIBASHI

IPC: G01N23/201 ,  G06F17/00

CPC classification number: G01N23/201 ,  G01N2223/6116 ,  G06F17/00

Abstract: In accordance with an embodiment, a measuring apparatus includes a stage, an electromagnetic wave applying unit, a detector, a monitor, a detector location adjusting unit, and a measuring unit. The stage supports a substrate comprising a periodic structure on a main surface thereof. The electromagnetic wave applying unit generates electromagnetic waves and applies the electromagnetic waves to the substrate. The detector detects the intensity of the electromagnetic waves scattered or reflected by the substrate with the use of two-dimensionally arranged detection elements, and then outputs a signal. The monitor processes the signal from the detector to acquire a first scatter profile, and measure a positional deviation of the detector in accordance with the first scatter profile. The detector location adjusting unit corrects the positional deviation of the detector in accordance with the measured positional deviation. The measuring unit calculates a surface shape of the periodic structure.

Abstract translation: 根据实施例，测量装置包括台，电磁波施加单元，检测器，监视器，检测器位置调整单元和测量单元。 该载物台在其主表面上支撑包含周期性结构的基底。 电磁波施加单元产生电磁波并将电磁波施加到基板。 检测器利用二维排列的检测元件检测由基板散射或反射的电磁波的强度，然后输出信号。 监视器处理来自检测器的信号以获取第一散射分布，并且根据第一散射分布测量检测器的位置偏差。 检测器位置调整单元根据所测量的位置偏差校正检测器的位置偏差。 测量单元计算周期结构的表面形状。

公开(公告)号：US20140044238A1

公开(公告)日：2014-02-13

申请号：US14057564

申请日：2013-10-18

Applicant: American Science and Engineering, Inc.

Inventor： Richard Mastronardi ,  Dean Fleury ,  Jeffrey R. Schubert ,  Joseph DiMare ,  Richard Schueller ,  Alexander Chalmers

IPC: G01V5/00

CPC classification number: G01V5/0008 ,  G01N23/20083 ,  G01N23/201 ,  G01N23/203 ,  G01V5/0016 ,  G01V5/0025

Abstract: An apparatus and method for inspecting personnel or their effects. A first and second carriage each carries a source for producing a beam of penetrating radiation incident on a given subject. A positioner provides for relative motion of each beam vis-à-vis the subject in a motion, the vertical component of which is one-way. A detector receives radiation produced by at least one of the sources after the radiation interacts with the subject.

Abstract translation: 用于检查人员或其影响的装置和方法。 第一和第二托架每个都带有用于产生入射在给定主体上的穿透辐射束的源。 定位器提供每个光束相对于被摄体在运动中的相对运动，其垂直分量是单向的。 在辐射与受试者相互作用之后，检测器接收由至少一个源产生的辐射。

公开(公告)号：US08644453B2

公开(公告)日：2014-02-04

申请号：US12919485

申请日：2009-02-25

Applicant: Edward James Morton

Inventor： Edward James Morton

IPC: G01N23/20

CPC classification number: G01N23/201 ,  G01V5/0041

Abstract: The present application discloses methods and systems for scanning an object. The scanning system provides a first detector region having a thickness of at least 2 mm and a second detector region having a thickness of at least 5 mm. The second detector region is arranged to receive radiation that has passed through the first detector region. The method includes irradiating the object with radiation having a peak energy of a least 1 MeV, and detecting the first profile radiation after it has interacted with or passed through the object in order to provide information relating to the object.

Abstract translation: 本申请公开了用于扫描对象的方法和系统。 扫描系统提供厚度至少为2mm的第一检测器区域和厚度至少为5mm的第二检测器区域。 第二检测器区域被布置成接收已经通过第一检测器区域的辐射。 该方法包括用具有至少1MeV的峰值能量的辐射照射物体，以及在其与物体相互作用或通过物体之后检测第一轮廓辐射，以便提供与物体有关的信息。

公开(公告)号：US20130329858A1

公开(公告)日：2013-12-12

申请号：US13912338

申请日：2013-06-07

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N2223/308

Abstract: A system for analyzing a sample is provided. The system includes a beam selection device for selecting between a one-dimensional operation mode for providing a one-dimensional x-ray beam to the sample and a two-dimensional operation mode for providing a two-dimensional x-ray beam to the sample.

Abstract translation: 提供了一种用于分析样品的系统。 该系统包括用于在用于向样本提供一维x射线束的一维操作模式和用于向样本提供二维X射线束的二维操作模式之间进行选择的束选择装置。

公开(公告)号：US20130208850A1

公开(公告)日：2013-08-15

申请号：US13766239

申请日：2013-02-13

Applicant: L-3 Communications Security and Detection Systems, Inc.

Inventor： Michael H. Schmitt

IPC: G01N23/20

CPC classification number: G01N23/201 ,  G01N23/20 ,  G01N23/203 ,  G01N2223/051 ,  G01N2223/054

Abstract: Radiation is directed at an object, and radiation scattered by the object is sensed. An angular distribution of scatter in the sensed scattered radiation relative to a path of the radiation directed at the object is determined, and the angular distribution is evaluated. One or more atomic numbers, or effective atomic numbers, of materials composing the object is determined based on evaluating the angular distribution.

公开(公告)号：US20130110421A1

公开(公告)日：2013-05-02

申请号：US13696157

申请日：2011-05-06

Applicant: Kay Lederer

Inventor： Kay Lederer

IPC: G01R31/28 ,  G06F15/00 ,  G01N23/201

CPC classification number: G01R31/28 ,  G01N1/286 ,  G01N23/201 ,  G06F15/00 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L22/12 ,  H01L22/24

Abstract: Performing an analysis of an electronic device sample by measuring a property at a plurality of points of said electronic device sample, and in advance of said analysis subjecting said plurality of points to at least one treatment that increases the difference in said property between at least two elements of said electronic device sample.

Abstract translation: 通过测量所述电子设备样本的多个点处的属性来进行对电子设备样本的分析，并且在所述分析之前，对所述多个点进行至少一个处理，所述处理增加所述属性的差异至少在两个 所述电子设备样品的元件。