公开(公告)号：US20130068969A1

公开(公告)日：2013-03-21

申请号：US13619837

申请日：2012-09-14

Applicant: Doug Childers

Inventor： Doug Childers

IPC: G21K5/00

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US20130003167A1

公开(公告)日：2013-01-03

申请号：US13635851

申请日：2011-03-16

Applicant: Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

Inventor： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

IPC: G02B7/195 ,  G02B5/08

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

公开(公告)号：US08338809B2

公开(公告)日：2012-12-25

申请号：US13164745

申请日：2011-06-20

Applicant: Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

Inventor： Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

IPC: G01N21/33 ,  B01J19/08 ,  B29C35/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.

Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面，并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。

公开(公告)号：US07965456B2

公开(公告)日：2011-06-21

申请号：US12241640

申请日：2008-09-30

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: G02B7/02

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

Abstract translation: 光学部件包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个 光学元件以热传导方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。 附加地或替代地，提供了一种控制光学元件的至少一部分的温度的温度控制装置。

公开(公告)号：US20090103063A1

公开(公告)日：2009-04-23

申请号：US12253099

申请日：2008-10-16

Applicant: Jin Nishikawa

Inventor： Jin Nishikawa

IPC: G03B27/52 ,  G03B27/32

CPC classification number: G02B7/008 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: An optical member cooling apparatus for cooling an optical member such as a mirror. The optical member cooling apparatus includes a cooling member fixed to the rear surface of the mirror by an engagement mechanisms. The rear surface of the mirror and the contact surface of the cooling mirror have a high flatness. A locking portion including a groove and an extended portion is formed in the rear surface of the mirror. A shaft of the engagement mechanism is hooked to the extended portion of the locking portion. The engagement member is urged toward the cooling member by a spring.

Abstract translation: 一种用于冷却诸如反射镜的光学构件的光学构件冷却装置。 光学构件冷却装置包括通过接合机构固定到反射镜的后表面的冷却构件。 反射镜的后表面和冷却镜的接触表面具有高的平坦度。 包括凹槽和延伸部分的锁定部分形成在反射镜的后表面中。 接合机构的轴钩在锁定部分的延伸部分上。 接合构件通过弹簧被推向冷却构件。

公开(公告)号：US07449704B2

公开(公告)日：2008-11-11

申请号：US11647024

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.

Abstract translation: EUV光源装置及其制造方法，其包括：产生EUV等离子体的等离子体产生室; 具有在EUV等离子体中产生的EUV光照射的反射部的EUV集光体; 具有由与EUV集光反射部相同的材料构成的反射部的目标样品; 用于检测在EUV等离子体中产生的EUV光的第一EUV检测器; 以及用于检测从目标样品反射的EUV光的第二EUV检测器。

公开(公告)号：US07388220B2

公开(公告)日：2008-06-17

申请号：US11646938

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site.

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源，其包括适于递送移动等离子体引发靶的目标传送系统和具有EUV光收集光学器件的EUV光收集光学器件， 定义所需等离子体起始位点的焦点。

公开(公告)号：US07349063B2

公开(公告)日：2008-03-25

申请号：US10647376

申请日：2003-08-26

Applicant: Yoshikazu Miyajima

Inventor： Yoshikazu Miyajima

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G02B7/195

CPC classification number: G21K1/06 ,  G02B7/1815 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

Abstract translation: 用于通过反射引导曝光来进行曝光处理的曝光装置的反射光学系统的反射镜装置具有反射面，以反射曝光光的反射镜和设置在远离位置的辐射冷却用辐射板 从镜子的外表面。 辐射板被设置成确保入射到反射镜的反射表面上并从其反射的曝光光的通过区域。 此外，通过冷却流经冷却管的液体对各个辐射板进行温度控制。 因此，可以抑制在曝光装置的反射光学系统中使用的反射镜的温度升高，并且可以保持镜面反射面的表面形状的精度。

公开(公告)号：US07329014B2

公开(公告)日：2008-02-12

申请号：US11402391

申请日：2006-04-11

Applicant: Istvan Balogh ,  Kai Gaebel

Inventor： Istvan Balogh ,  Kai Gaebel

IPC: G02B5/08

CPC classification number: G03F7/70175 ,  B82Y10/00 ,  G03F7/70166 ,  G21K1/062 ,  G21K2201/065

Abstract: The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface. Heat of transient temperature spikes which occur in pulsed operation for plasma generation at the mirror surface and which temporarily exceed the temperature average by a multiple is quickly dissipated.

Abstract translation: 本发明涉及一种基于等离子体的短波长辐射的集光镜。 本发明的目的是找到一种用于管理用于聚焦由等离子体产生的短波长辐射的聚光镜的温度的新型可能性，其允许在光学活性反射镜表面和恒温器系统之间产生有效的热连接而无需 与空间要求有关的缺点或收集镜的高精度制造。 根据本发明，满足本发明的目的在于，收集器反射镜具有固体，旋转对称的基板，其包括具有大于50W / mK的高热导率的材料，并且其中用于冷却和温度管理的通道被并入 衬底，使得传热介质可以直接流过并快速稳定光学镜面的温度。 在脉冲操作中发生的瞬态温度峰值的热量，其在镜面处等离子体产生并且临时超过温度平均值的倍数被快速消散。

公开(公告)号：US20070158594A1

公开(公告)日：2007-07-12

申请号：US11617163

申请日：2006-12-28

Applicant: Takahiro SHIRAI ,  Kyohei SEKI

Inventor： Takahiro SHIRAI ,  Kyohei SEKI

IPC: G01J3/10

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G21K2201/065 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics 3a. Between them an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with laser . Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

Abstract translation: 具有腔室的EUV辐射源装置，其被分为放电空间和设置有EUV收集器光学器件3a的收集器反射镜空间。 在它们之间提供了具有被冷却的开口的孔部件。 旋转第一放电电极和第二放电电极。 用激光照射Sn或Li。 在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照 曝光工具的光学系统。 存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。 放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。