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104 条记录 (耗时 0.028 秒)

    ELECTRON BEAM INSPECTION APPARATUS AND ELECTRON BEAM INSPECTION METHOD
    72.
    发明申请
    ELECTRON BEAM INSPECTION APPARATUS AND ELECTRON BEAM INSPECTION METHOD 审中-公开

    公开(公告)号：US20190277782A1

    公开(公告)日：2019-09-12

    申请号：US16292466

    申请日：2019-03-05

    申请人： NuFlare Technology, Inc.

    发明人： Hideo TSUCHIYA ,  Masataka Shiratsuchi ,  Ryoichi Hirano ,  Hideaki Hashimoto ,  Riki Ogawa

    IPC分类号： G01N23/2251 ,  G01N23/2206

    摘要： An electron beam inspection apparatus includes an acquisition processing circuitry to acquire surface material information presenting a surface material of the substrate and a value of an acceleration voltage of an electron beam; a sequence determination processing circuitry to determine a scan sequence of a plurality of stripe regions on the basis of the surface material of the substrate and the value of the acceleration voltage, the plurality of stripe regions obtained by virtually dividing an inspection region of the substrate in a stripe shape; a secondary electron image acquisition mechanism including a detector for detecting a secondary electron and configured to scan the plurality of stripe regions of the substrate according to a determined scan sequence and to acquire a secondary electron image of the substrate; and a comparison processing circuitry to compare the secondary electron image with a corresponding reference image.

    Macrotexture map visualizing texture heterogeneity in polycrystalline parts
    73.
    发明授权
    Macrotexture map visualizing texture heterogeneity in polycrystalline parts 有权

    公开(公告)号：US10371650B2

    公开(公告)日：2019-08-06

    申请号：US15273128

    申请日：2016-09-22

    申请人： Dongsheng Li

    发明人： Dongsheng Li

    IPC分类号： G01N23/203 ,  G06T11/20 ,  G06T11/00 ,  G06K9/62 ,  G01N23/2206

    摘要： This invention provides a method, system, and computer program to visualize texture (crystal orientation distribution) heterogeneity in polycrystalline aggregate part in large length scale. This is a critical representation step for microstructure characterization, useful in effective behavior simulation, risk analysis and hotspot identification. In contrast to orientation image map where each color component represents a crystal orientation, each color in this macrotexture map represents a set of texture. Different color represent different texture and similar texture shall have similar color. This method will provide a critical tool in evaluating texture heterogeneity of components, leading to a first-hand understanding of property heterogeneity and anisotropy. For an experienced user, these maps serve the same purpose in identifying high risk locations in the investigated component as medical imaging maps do for diagnosis purpose. This method will also serve as a starting point in mesoscale simulation with meshing sensitivity based on the texture heterogeneity. It will provide a bridge between texture characterization and behavior simulation of component with texture heterogeneity. This method will also offer a linkage between crystal plasticity simulation in small length scale and finite element/difference simulation in large length scale.

    Method and Apparatus for Discriminating Resin
    74.
    发明申请
    Method and Apparatus for Discriminating Resin 审中-公开

    公开(公告)号：US20190227009A1

    公开(公告)日：2019-07-25

    申请号：US15877942

    申请日：2018-01-23

    申请人： Shimadzu Corporation

    发明人： Hiroaki FURUKAWA

    IPC分类号： G01N23/2206 ,  G01N23/223

    摘要： A resin discriminating apparatus includes an X-ray tube which emits X-rays, an X-ray detector which detects X-rays emitted from a sample irradiated with X-rays, a data processing section which creates a spectrum on the basis of a detection signal obtained by the X-ray detector, a peak extraction section which extracts a spectral line due to Compton scattering and a spectral line due to Rayleigh scattering derived from a target element of the X-ray tube on the spectrum, and obtains a peak intensity, and a discrimination section which calculates a scattering intensity ratio which is a ratio of the Rayleigh scattering intensity to the Compton scattering intensity and discriminates the type of resin contained in the sample from the scattering intensity ratio.

    CHARGED PARTICLE DETECTOR
    78.
    发明公开
    CHARGED PARTICLE DETECTOR 审中-公开

    公开(公告)号：US20240280517A1

    公开(公告)日：2024-08-22

    申请号：US18569504

    申请日：2022-06-28

    申请人： ASML NETHERLANDS B.V.

    发明人： Albertus Victor Gerardus MANGNUS

    IPC分类号： G01N23/2206 ,  G01N23/203 ,  G01N23/2251

    CPC分类号： G01N23/2206 ,  G01N23/203 ,  G01N23/2251

    摘要： A detector for use in a charged particle device for an assessment apparatus to detect charged particles from a sample, wherein the detector includes: a backscatter detector component set to a backscatter bias electric potential and configured to detect higher energy charged particles; and a secondary detector component set to a secondary bias electric potential and configured to detect lower energy charged particles, wherein there is a potential difference between the backscatter bias electric potential and the secondary bias electric potential.