公开(公告)号：US07215419B2

公开(公告)日：2007-05-08

申请号：US11364709

申请日：2006-02-28

申请人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

发明人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/274 ,  G01N21/278 ,  G01N21/93

摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

公开(公告)号：US20060248495A1

公开(公告)日：2006-11-02

申请号：US11203505

申请日：2005-08-13

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said photolithographic mask function to reduce the figure of demerit.

公开(公告)号：US20060082792A1

公开(公告)日：2006-04-20

申请号：US11295304

申请日：2005-12-06

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G01B11/14

CPC分类号： G03F7/70633 ,  G01B11/0616 ,  G01N21/211 ,  G01N21/956

摘要： An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes an optical arrangement for increasing the amount of scattered light being monitored in comparison to the amount of specularly reflected light being monitored.

摘要翻译： 公开了一种光学测量系统，其被配置为最小化镜面反射光的测量并且主要测量散射光。 该系统类似于现有技术的光束轮廓测量，但是包括用于增加被监视的散射光量与被监视的镜面反射光量相比较的光学装置。

公开(公告)号：US20060073686A1

公开(公告)日：2006-04-06

申请号：US10971350

申请日：2004-10-22

申请人： Franz Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

发明人： Franz Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

IPC分类号： H01L21/22

CPC分类号： G03B27/72 ,  G03F7/70441 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

摘要： First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of a set of features is determined, and a value of a parameter of an optical proximity correction model is determined. An alignment feature can be used to align a measurement tool. In yet another embodiment, pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.

公开(公告)号：US20050273753A1

公开(公告)日：2005-12-08

申请号：US10861170

申请日：2004-06-04

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G03F7/20 ,  G06F17/50 ,  G21K5/10

CPC分类号： G03F7/70433 ,  G03F7/70425 ,  G03F7/705 ,  G06F17/50 ,  G06F2217/12 ,  Y02P90/265

摘要： Computational models of a patterning process are described. Any one of these computational models can be implemented as computer-readable program code embodied in computer-readable media. The embodiments described herein explain techniques that can be used to adjust parameters of these models according to measurements, as well as how predictions made from these models can be used to correct lithography data. Corrected lithography data can be used to manufacture a device, such as an integrated circuit.

摘要翻译： 描述了图案化过程的计算模型。 这些计算模型中的任何一个可以被实现为体现在计算机可读介质中的计算机可读程序代码。 这里描述的实施例解释了可以用于根据测量来调整这些模型的参数的技术，以及如何使用这些模型做出的预测来校正光刻数据。 校正的光刻数据可用于制造诸如集成电路的器件。

公开(公告)号：US20050174575A1

公开(公告)日：2005-08-11

申请号：US11105099

申请日：2005-04-13

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

IPC分类号： G01N21/21 ,  G01N21/25 ,  G01N21/47 ,  G01N21/956

CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

公开(公告)号：US06909507B2

公开(公告)日：2005-06-21

申请号：US10857223

申请日：2004-05-28

申请人： Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

发明人： Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

IPC分类号： G01N21/21 ,  G01N21/25 ,  G01N21/47 ,  G01N21/956 ,  G01J4/00

CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

摘要翻译： 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中，其中晶片可以以任意取向提供。

公开(公告)号：US06870617B2

公开(公告)日：2005-03-22

申请号：US10796322

申请日：2004-03-09

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

IPC分类号： G01J3/08 ,  G01J3/42 ,  G01N21/55

CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/08 ,  G01J3/42 ,  G01N21/55

摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

摘要翻译： 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。 因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

公开(公告)号：US06819426B2

公开(公告)日：2004-11-16

申请号：US10074561

申请日：2002-02-12

申请人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

发明人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

IPC分类号： G01B1100

CPC分类号： G03F7/70633 ,  H01L22/34 ,  H01L2223/54453

摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

摘要翻译： 使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。 光学仪器照亮目标区域的全部或部分，并测量光学响应。 仪器可以测量作为波长，极角入射角，入射方位角和/或照明和检测光的偏振的函数的透射率，反射率和/或椭偏参数。 包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的​​处理器来确定 '衍射场 模型参数也可能考虑到制造的不对称性。 该计算可以包括从处理器可访问的数据库插入预先计算的条目。 迭代比较计算和测量的响应，改变模型参数以最小化差异。

公开(公告)号：US06781371B2

公开(公告)日：2004-08-24

申请号：US10064994

申请日：2002-09-06

申请人： Reza Taherian ,  Boqin Sun ,  Abdurrahman Sezginer

发明人： Reza Taherian ,  Boqin Sun ,  Abdurrahman Sezginer

IPC分类号： G01V300

CPC分类号： G01N24/081 ,  G01V3/32

摘要： A high vertical resolution antenna design is provided for use in an NMR measurement apparatus. Multiple coils are situated along the length of a magnet. A primary coil is energized to cause an oscillating magnetic field in a portion of earth formation surrounding a borehole. A secondary coil having smaller dimensions than the primary coil is operated to receive spin echoes from a depth of investigation associated with the secondary coil. A distance sufficient to minimize electrical coupling separates the coils. The separation distance can be reduced by selecting a secondary coil with orthogonal polarization to the primary coil. Alternatively, a cross coil configuration can be implemented where the orthogonal secondary coil at least partially overlaps the primary coil, thereby reducing the overall length necessary for the polarizing magnet.

摘要翻译： 提供了用于NMR测量装置的高垂直分辨率天线设计。 多个线圈沿着磁体的长度设置。 初级线圈被通电以在围绕钻孔的地层的一部分中产生振荡磁场。 操作具有小于初级线圈的尺寸的次级线圈以从与次级线圈相关联的调查深度接收自旋回波。 足以使电耦合最小化的距离分离线圈。 可以通过选择具有与初级线圈的正交极化的次级线圈来减小间隔距离。 或者，可以实现交叉线圈配置，其中正交次级线圈至少部分地与初级线圈重叠，从而减小极化磁体所需的总长度。