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137 条记录 (耗时 0.034 秒)

    Abs through aggressive stitching
    82.
    发明申请
    Abs through aggressive stitching 失效
    通过积极的缝合

    公开(公告)号：US20070268628A1

    公开(公告)日：2007-11-22

    申请号：US11881350

    申请日：2007-07-26

    申请人： Cherng-Chyi Han ,  Mao-Min Chen ,  Laurie Lauchlan ,  Lei Zhang

    发明人： Cherng-Chyi Han ,  Mao-Min Chen ,  Laurie Lauchlan ,  Lei Zhang

    IPC分类号： G11B5/147

    CPC分类号： G11B5/33 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/4906 ,  Y10T29/49062 ,  Y10T29/49064

    摘要： Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electro-plated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.

    摘要翻译： 积极（即紧公差）缝合为磁性写入头提供了几个优点，但是在极修整期间以一些损失为代价。 通过用一层电镀材料代替在修整期间用于保护缝合极的氧化铝填料层已经克服了这个问题。 由于与沉积电镀方法相关的优越的台阶覆盖，因此可以进行极细修剪，而不会在缝合极被修剪时引入应力。

    Process of making CD uniformity in high track density recording head
    83.
    发明授权
    Process of making CD uniformity in high track density recording head 失效
    在高轨道密度记录头中制作CD均匀性的过程

    公开(公告)号：US07293344B2

    公开(公告)日：2007-11-13

    申请号：US10886888

    申请日：2004-07-08

    申请人： Cherng-Chyi Han ,  Laurie Lauchlan ,  Xiaomin Liu

    发明人： Cherng-Chyi Han ,  Laurie Lauchlan ,  Xiaomin Liu

    IPC分类号： G11B5/127 ,  B44C1/22

    CPC分类号： G11B5/3163 ,  G11B5/1272 ,  G11B5/3116 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044

    摘要： A process for achieving tighter reader and writer track width control is disclosed. The write gap layer is used as the plating seed on which the upper pole is electro-formed. This allows the write gap layer to then be deposited through a precisely controllable process such as sputtering. Since less material needs to be removed during pole trimming, a thinner layer of photoresist may be used, resulting in improved dimensional control.

    摘要翻译： 公开了一种实现更严格的读写器磁道宽度控制的过程。 写间隙层用作上电极电镀的电镀种子。 这允许写间隙层然后通过诸如溅射的精确控制的工艺进行沉积。 由于在极修整期间需要去除较少的材料，因此可以使用更薄的光致抗蚀剂层，从而改善尺寸控制。

    Method to make a perpendicular magnetic recording head with a side write shield
    84.
    发明申请
    Method to make a perpendicular magnetic recording head with a side write shield 有权
    制作具有侧面写入屏蔽层的垂直磁记录头的方法

    公开(公告)号：US20070177301A1

    公开(公告)日：2007-08-02

    申请号：US11345892

    申请日：2006-02-02

    申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

    发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3163 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.

    摘要翻译： 垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。 侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。 在NiFe的屏蔽层上形成的Ta，Ru / Ta，TaN或Ti的掩蔽层，并使用CH 3 3 OH，CO或NH 3的RIE气体或它们的 组合，产生所需的结果。 蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。 然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。 然后在侧屏和极上方形成上屏蔽。

    Ultra thin seed layer for CPP or TMR structure
    85.
    发明申请
    Ultra thin seed layer for CPP or TMR structure 有权
    用于CPP或TMR结构的超薄种子层

    公开(公告)号：US20070146928A1

    公开(公告)日：2007-06-28

    申请号：US11317598

    申请日：2005-12-23

    申请人： Kunliang Zhang ,  Hui-Chuan Wang ,  Tong Zhao ,  Yu-Hsia Chen ,  Min Li ,  Cherng-Chyi Han

    发明人： Kunliang Zhang ,  Hui-Chuan Wang ,  Tong Zhao ,  Yu-Hsia Chen ,  Min Li ,  Cherng-Chyi Han

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3906 ,  B82Y25/00 ,  G01R33/093 ,  Y10T29/49021

    摘要： Improved magnetic devices have been fabricated by replacing the conventional seed layer (typically Ta) with a bilayer of Ru on Ta. Although both Ru and Ta layers are ultra thin (between 5 and 20 Angstroms), good exchange bias between the seed and the AFM layer (IrMn about 70 Angstroms thick) is retained. This arrangement facilitates minimum shield-to-shield spacing and gives excellent performance in CPP, CCP-CPP, or TMR configurations.

    摘要翻译： 已经通过用Ta上的Ru的双层代替常规种子层（通常为Ta）来制造改进的磁性器件。 虽然Ru和Ta层都是超薄的（5到20埃之间），但保留种子和AFM层之间良好的交换偏差（约为70埃的IrMn）。 这种安排有助于最小的屏蔽间隔，并在CPP，CCP-CPP或TMR配置中提供出色的性能。

    Process of manufacturing a perpendicular magnetic pole structure
    86.
    发明授权
    Process of manufacturing a perpendicular magnetic pole structure 有权
    制造垂直磁极结构的工艺

    公开(公告)号：US07120989B2

    公开(公告)日：2006-10-17

    申请号：US10781168

    申请日：2004-02-18

    申请人： Danning Yang ,  Cherng-Chyi Han

    发明人： Danning Yang ,  Cherng-Chyi Han

    IPC分类号： G11B5/127 ,  B05D1/32 ,  B44C1/22

    CPC分类号： G11B5/1278 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： For PMR (Perpendicular Magnetic Recording) design, one of the major technology problems is the use of CMP to fabricate the pole structure. If the device is under-polished there is a danger of leaving behind a magnetic shorting layer while if it is over-polished there may be damage to the main pole. This problem has been overcome by surrounding the main pole, write gap, stitched write head pillar with a layer of CMP etch stop material which, using optical inspection alone, allows CMP (performed under a first set of conditions) to be terminated just as the stitched write head gets exposed. This is followed by a second CMP step (performed under a second set of conditions) for further fine trimming of the stitched head, as needed.

    摘要翻译： 对于PMR（垂直磁记录）设计，主要的技术问题之一是使用CMP制造极结构。 如果设备磨光不良，则会有留下磁性短路层的危险，而如果超磨光，则可能会损坏主极。 通过使用CMP蚀刻停止材料层围绕主极，写入间隙，缝合写头柱来克服这个问题，其使用光学检查单独允许CMP（在第一组条件下执行）被终止，就像 拼接写头被曝光。 接下来是第二CMP步骤（在第二组条件下执行），以根据需要进一步精细修剪缝合的头部。

    Self-aligned trimmed pole
    88.
    发明申请
    Self-aligned trimmed pole 失效
    自对准修边杆

    公开(公告)号：US20050168871A1

    公开(公告)日：2005-08-04

    申请号：US11091160

    申请日：2005-03-28

    申请人： Cherng-Chyi Han ,  Mao-Min Chen ,  Fenglin Liu

    发明人： Cherng-Chyi Han ,  Mao-Min Chen ,  Fenglin Liu

    IPC分类号： G11B5/31 ,  G11B5/147

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/23 ,  G11B5/3163

    摘要： A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.

    摘要翻译： 一种用于形成用于磁性写入头的修整的上极片的方法，所述极片在写间隙层上方和下方具有均匀的宽度。 使用离子束蚀刻将极片修剪到最终宽度的现有技术方法由于氧化铝写入间隙填充材料的耐蚀刻性质而产生具有厚度差异的极片。 本方法使用NiCr，NiFeCr或Ru作为写入间隙填充材料，其蚀刻速率基本上等于形成极片的其它层的蚀刻速率，并且具有高度耐腐蚀性。