摘要:
In a plane emission device comprising a transparent substrate, a light scattering layer formed on a surface of the transparent substrate, and a luminescent body of organic or inorganic material which is formed on a surface of the light scattering layer and emits light by light or electric energy, efficiency to takeout light to outside is improved. The light scattering layer contains binder and two kinds of fillers, and when a refraction index of the binder is assumed as Nb, a refraction index of one of the two kinds of fillers is assumed as Nf1, and a refraction index of the other is assumed as Nf2, a relationship that Nf2>Nb>Nf1 is satisfied. Since the light scattering layer contains two kinds of fillers, disorder occurs in critical angle when light exits from the light scattering layer to the transparent substrate, incidence rate of light into the transparent substrate rises, and efficiency to takeout the light to outside increases.
摘要:
This invention has an objective of producing the organic solar cell having the long life. The organic solar cell of this invention comprises a first electrode collecting holes, a second electrode collecting electrons, mixing layer interposed between the first electrode and the second electrode and having an electron donating semiconductor and the electron accepting semiconductor, and a first electron transport layer and a second electron transport layer interposed between the mixing layer and the second electrode. With this invention, the adhesiveness in the boundary between the mixing layer and the second electrode is improved. Consequently, it is possible to prevent the mixing layer from accumulating the electrical charge generated by absorbing the light. Therefore, the electrical charge is efficiently moved to the second electrode and the long life is achieved.
摘要:
An optical drive includes: an optical pickup; a preprocessing circuit which processes an optical signal detected by the optical pickup; nonvolatile memory having stored therein relation information which represents the relation of a signal balance with respect to a signal difference between a TE signal and an FE signal at the time of a predetermined operation of the optical pickup; and a central processing circuit which performs focus control of the optical pickup. The preprocessing circuit generates the signal balance of the optical pickup. The preprocessing circuit also obtains the FE signal and the TE signal with respect to the optical disc. The central processing circuit derives a phase difference and an amplitude difference from the signal balance and the relation information, and calculates, based on the differences and the TE signal, a FE signal suitable for the predetermined operation.
摘要:
An optical modulator, including: a substrate; an optical waveguide embedded in the substrate; a traveling wave electrode mounted on the substrate and having a traveling wave applied thereon so that a light wave is modulated by the traveling wave with an electro-optic effect. The traveling wave electrode includes a center electrode and ground electrodes; in which the optical waveguide has a plurality of interaction optical waveguides that form a Mach-Zehnder optical waveguide that modulates the light wave in a phase modulation manner when the traveling wave is applied to the traveling wave electrode, the interaction optical waveguides form a region where respective widths of the interaction optical waveguides are different from each other, and the center electrode and the ground electrodes are positioned such that interaction efficiencies between the high frequency electric signal and the light wave guided in the respective interaction optical waveguides are substantially equal to each other.
摘要:
A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.
摘要:
A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.
摘要:
A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.
摘要:
An exposure method includes preparing a photomask having first and second main openings by which corresponding patterns are to be formed in a photo resist and first and second assist openings by which no corresponding patterns are to be formed in the photo resist, preparing an illumination having first and second light emitting areas, and irradiating the photo resist with illumination light from the illumination via the photomask, the first light emitting area and the second light emitting area being symmetric with respect to a center of the illumination, the first light emitting area and the second light emitting area containing a first point and a second point, respectively, the first point and the second point being symmetric with respect to the center of the illumination, the first point and the second point being symmetric with respect to a straight line extending through the center of the illumination.
摘要:
A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.
摘要:
A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.