公开(公告)号：US20080050851A1

公开(公告)日：2008-02-28

申请号：US11840043

申请日：2007-08-16

申请人： Koichiro Tanaka ,  Yasuyuki ARAI

发明人： Koichiro Tanaka ,  Yasuyuki ARAI

IPC分类号： H01L21/441

CPC分类号： H01L27/124 ,  H01L21/76802 ,  H01L27/1288 ,  H01L27/3276 ,  H01L51/5284 ,  H01L2924/0002 ,  H05B33/10 ,  H01L2924/00

摘要： A light-absorbing layer is selectively formed over an insulating surface, an insulating layer is formed over the insulating surface and the light-absorbing layer, the insulating surface, the light-absorbing layer, and the insulating layer are irradiated with laser light to selectively remove only the insulating layer above the light-absorbing layer in an irradiated region of the insulating layer so that an opening reaching the light-absorbing layer is formed in the insulating layer, and a conductive film is formed in the opening so as to be in contact with the light-absorbing layer. By forming the conductive film in the opening so as to be in contact with the exposed light-absorbing layer, the conductive film can be electrically connected to the light-absorbing layer with the insulating layer interposed therebetween.

摘要翻译： 在绝缘表面上选择性地形成光吸收层，在绝缘表面上形成绝缘层，并且用激光照射光吸收层，绝缘表面，光吸收层和绝缘层以选择性地 在绝缘层的照射区域中仅去除光吸收层上方的绝缘层，使得在绝缘层中形成到达光吸收层的开口，并且在开口中形成导电膜以便处于 与光吸收层接触。 通过在开口中形成导电膜以与露出的光吸收层接触，导电膜可以与介于其间的绝缘层与光吸收层电连接。

公开(公告)号：US20080013170A1

公开(公告)日：2008-01-17

申请号：US11822783

申请日：2007-07-10

申请人： Koichiro Tanaka

发明人： Koichiro Tanaka

IPC分类号： G02B11/02

CPC分类号： B23K26/0665 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0853 ,  B23K2101/40 ,  C30B1/023 ,  C30B1/04 ,  C30B13/24 ,  C30B28/08 ,  C30B29/06 ,  G02B27/0955

摘要： The present invention provides a laser irradiation apparatus and a laser irradiation method which can reduce displacement of entrance point of laser light into a diffractive optical element, when laser light enters the diffractive optical element through a beam expander optical system. When the scale of laser light emitted from a laser oscillator is enlarged through a beam expander optical system including two lenses, and the laser light enters the diffractive optical element, the emission point of the laser light and the first and second lenses are arranged such that the positions of the emission point of the laser light and the second lens are conjugate to each other by the first lens.

摘要翻译： 本发明提供了当激光通过光束扩展器光学系统进入衍射光学元件时，可以减少激光入射点到衍射光学元件中的位移的激光照射装置和激光照射方法。 当通过包括两个透镜的光束扩展器光学系统来扩大从激光振荡器发射的激光的尺度，并且激光进入衍射光学元件时，激光的发射点和第一和第二透镜被布置成使得 激光和第二透镜的发射点的位置通过第一透镜彼此共轭。

公开(公告)号：US20070291873A1

公开(公告)日：2007-12-20

申请号：US10597153

申请日：2005-01-11

申请人： Noriaki Saito ,  Koichiro Tanaka ,  Mitsuru Tanabe

发明人： Noriaki Saito ,  Koichiro Tanaka ,  Mitsuru Tanabe

IPC分类号： H04L27/36

CPC分类号： H03F1/0227 ,  H03F1/02 ,  H03F3/24 ,  H03F2200/372 ,  H03G3/004 ,  H03G3/3042 ,  H03G3/3052 ,  H04B1/04 ,  H04B2001/045 ,  H04L27/361 ,  H04L27/366 ,  H04W52/52

摘要： A transmitter apparatus that exhibits a high efficiency and that can provide a wide variable output control width. An operation of saturation mode is performed in the vicinity of the maximum transmission power. A large-power amplifier (12) is caused, by increasing and then fixing the input level thereof, to operate in a saturation state, while the amplitude component of a modulation signal in a range corresponding to an output power control level is inputted to an R-input terminal (33) to amplitude modulate the power supply voltage (VDD) of a power supply terminal (25), thereby performing a polar coordinate modulation of a high efficiency. An operation of linear mode is performed for a smaller transmission power. The large-power amplifier (12) is caused, by reducing the input level thereof, to perform a linear operation, while the power supply voltage (VDD) of the power supply terminal (25) is varied in accordance with the output power control level, thereby performing a transmission power control.

摘要翻译： 一种展现出高效率且能够提供宽的可变输出控制宽度的发射机设备。 在最大发送功率附近进行饱和模式的动作。 大功率放大器（12）通过增加并固定其输入电平而工作在饱和状态，同时将与输出功率控制电平对应的范围内的调制信号的幅度分量输入到 R输入端子（33）对电源端子（25）的电源电压（VDD）进行幅度调制，从而高效率地进行极坐标调制。 对于更小的发送功率执行线性模式的操作。 大功率放大器（12）通过降低其输入电平来进行线性操作，同时电源端子（25）的电源电压（VDD）根据输出功率控制电平而变化 从而进行发送功率控制。

公开(公告)号：US07304005B2

公开(公告)日：2007-12-04

申请号：US10799626

申请日：2004-03-15

申请人： Shunpei Yamazaki ,  Koichiro Tanaka

发明人： Shunpei Yamazaki ,  Koichiro Tanaka

IPC分类号： H01L21/00

CPC分类号： B23K26/0608 ,  B23K26/0604 ,  B23K26/073

摘要： A second laser light of a continuous wave oscillation is irradiated to a region melted by a first laser light of a pulsed oscillation having a harmonic. Specifically, the first laser light has a wavelength not longer than that of visible light (830 nm, preferably not more than 780 nm). The absorption coefficient of the second laser light to a semiconductor film considerably increases because the semiconductor film is melted by the first laser light, and therefore the second laser light becomes easy to be absorbed in the semiconductor film.

摘要翻译： 将连续波振荡的第二激光照射到由具有谐波的脉冲振荡的第一激光熔化的区域中。 具体而言，第一激光的波长不比可见光的波长（830nm，优选为780nm以下）。 由于半导体膜被第一激光熔化，因此第二激光对半导体膜的吸收系数显着增加，因此第二激光容易被半导体膜吸收。

公开(公告)号：US07303980B2

公开(公告)日：2007-12-04

申请号：US10273755

申请日：2002-10-18

申请人： Shunpei Yamazaki ,  Naoto Kusumoto ,  Koichiro Tanaka

发明人： Shunpei Yamazaki ,  Naoto Kusumoto ,  Koichiro Tanaka

IPC分类号： H01L21/00

CPC分类号： H01L21/02686 ,  B23K26/073 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/66757 ,  H01L29/78675

摘要： A linear pulse laser beam to be applied to an illumination surface is so formed as to have, at the focus, an energy profile in the width direction which satisfies inequalities 0.5L1≦L2≦L1 and 0.5L1≦L3≦L1 where assuming that a maximum energy is 1, L1 is a beam width of two points having an energy of 0.95 and L1+L2+L3 is a beam width of two points having an energy of 0.70, L2 and L3 occupying two peripheral portions of the beam width. According to another aspect of the invention, a compound-eye-like fly-eye lens for expanding a pulse laser beam in a sectional manner is provided upstream of a cylindrical lens for converging the laser beam into a linear beam.

摘要翻译： 施加到照明表面的线性脉冲激光束被形成为在焦点处具有宽度方向上的能量分布，其满足不等式0.5L 1 <= L 2 <= L 1和0.5L 1 < L 3 <= L 1其中，假定最大能量为1，L 1是具有0.95的能量的两点的波束宽度，L 1+ L 2+ L 3是具有0.70的能量的两点的波束宽度 ，L 2和L 3占据梁宽度的两个周边部分。 根据本发明的另一方面，在用于将激光束会聚到线性光束的柱面透镜的上游设置用于以分段方式扩展脉冲激光束的复眼型飞眼透镜。

公开(公告)号：US20070259623A1

公开(公告)日：2007-11-08

申请号：US11628039

申请日：2005-06-03

申请人： Koichiro Tanaka ,  Tomohiro Kimura ,  Naganori Shirakata ,  Shuya Hosokawa

发明人： Koichiro Tanaka ,  Tomohiro Kimura ,  Naganori Shirakata ,  Shuya Hosokawa

IPC分类号： H04B1/00 ,  H04B15/00

CPC分类号： H04B7/0854 ,  H04B17/345

摘要： A radio communication device that, even if it is interfered by a radio transmission station other than a radio transmission station with which it intends to communicate, estimates a signal transmitted from the intended radio transmission station by taking into account the influence of the interference, by obtaining an estimator of “s” that denotes a column vector representing a signal transmitted from the radio transmission station, in accordance with a following expression: s=RssHH(HRssHH+Ruu)−1r, where “Rss” denotes a covariance matrix of the column vector “s”, “r” denotes a column vector representing the signal received by the signal receiving unit, “H” denotes a matrix being the numerical sequence calculated by the first calculating unit, “Ruu” denotes a covariance matrix being the numerical sequence calculated by the second calculating unit, “H” denotes a complex conjugate transposition, and “−1” denotes an inverse matrix.

摘要翻译： 一种无线电通信装置，即使是由与其打算进行通信的无线电发送站以外的无线电发送站的干扰，也可以通过考虑干扰的影响来估计从预期的无线电发送站发送的信号，由 根据以下表达式获得表示表示从无线电发送站发送的信号的列向量的“s”的估计器：s = RssH H（H s H H H H + Ruu） ^{-1，其中“Rss”表示列向量“s”的协方差矩阵，“r”表示表示由信号接收单元接收的信号的列向量“H” 表示由第一计算单元计算的数字序列的矩阵，“Ruu”表示由第二计算单元计算的数字序列的协方差矩阵，“H”表示复共轭转置，“ -1 “表示逆矩阵。}

公开(公告)号：US20070212826A1

公开(公告)日：2007-09-13

申请号：US11749250

申请日：2007-05-16

申请人： Shunpei Yamazaki ,  Koichiro Tanaka

发明人： Shunpei Yamazaki ,  Koichiro Tanaka

IPC分类号： H01L21/84

CPC分类号： H01L21/02675 ,  B23K26/0738 ,  B23K26/08 ,  B23K26/082 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285 ,  H01L27/1296

摘要： A display device is manufactured by forming a semiconductor film over a substrate and irradiating the film with laser light. The laser light is generated from an oscillator, passes through an attenuator that includes a filter, and passes through an optical system after passing through the attenuator. A first region of the semiconductor film is irradiated with the laser light passed through the optical system such that one point of the first region of the semiconductor film is irradiated with at least two shots. A second region of the semiconductor film is also irradiated with the laser light passed through the optical system such that one point of the second region of the semiconductor film is irradiated with at least two shots. The first region and the second region have a portion at which they overlap, and the semiconductor film is etched into semiconductor layers for transistors in areas outside the portion.

摘要翻译： 通过在基板上形成半导体膜并用激光照射薄膜来制造显示装置。 激光从振荡器产生，通过包括滤波器的衰减器，并且在穿过衰减器之后通过光学系统。 用通过光学系统的激光照射半导体膜的第一区域，使得半导体膜的第一区域的一个点被照射至少两个照射。 半导体膜的第二区域也被穿过光学系统的激光照射，使得半导体膜的第二区域的一个点被照射至少两个镜头。 第一区域和第二区域具有它们重叠的部分，并且半导体膜被蚀刻到用于该部分外部的区域中的晶体管的半导体层。

公开(公告)号：US07253032B2

公开(公告)日：2007-08-07

申请号：US10125529

申请日：2002-04-19

申请人： Shunpei Yamazaki ,  Koichiro Tanaka

发明人： Shunpei Yamazaki ,  Koichiro Tanaka

IPC分类号： H01L21/00

CPC分类号： H01L21/02686 ,  B23K26/034 ,  B23K26/123 ,  B23K26/1435 ,  B23K26/1436 ,  B23K26/147 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/3226 ,  H01L29/66757 ,  Y10S438/935

摘要： First laser light is irradiated (energy density of 400 to 500 mj/cm2) to a semiconductor film 102 in an atmosphere containing oxygen in order to obtain a semiconductor film 102b having large depressions and projections on the surface. Then, an oxidized film 105a formed by the irradiation of the first laser light is removed. After that, an inert gas with an oxygen density of 10 ppm or below is blown thereto, and, at the same time, second laser light is irradiated thereto (the energy density is higher than that of the irradiation of the first laser light). Thus, the surface of the semiconductor film 102b is flattened, and a semiconductor film 102c having fewer depressions and projections on the surface can be obtained.

摘要翻译： 为了得到在氧气中含有大的凹凸的半导体膜102b，将第一激光照射到能量密度为400〜500mj / cm 2的半导体膜102中 表面。 然后，去除通过照射第一激光形成的氧化膜105a。 之后，吹入氧浓度为10ppm以下的惰性气体，同时照射第二激光（能量密度高于第一激光的照射能量密度）。 因此，半导体膜102b的表面被平坦化，并且可以获得在表面上具有较少凹凸的半导体膜102c。

公开(公告)号：US20070178672A1

公开(公告)日：2007-08-02

申请号：US10584729

申请日：2005-10-18

申请人： Koichiro Tanaka ,  Yoshiaki Yamamoto

发明人： Koichiro Tanaka ,  Yoshiaki Yamamoto

IPC分类号： H01L21/20 ,  H01L21/36

CPC分类号： H01L21/02683 ,  B23K26/0736 ,  B23K26/0738 ,  B23K26/0853 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02686 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1255 ,  H01L27/1266 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/78621 ,  H01L29/78648 ,  Y10T117/1076

摘要： In conducting laser annealing using a CW laser or a quasi-CW laser, productivity is not high as compared with an excimer laser and thus, it is necessary to further enhance productivity. According to the present invention, a fundamental wave is used without putting laser light into a non linear optical element, and laser annealing is conducted by irradiating a semiconductor thin film with pulsed laser light having a high repetition rate. A laser oscillator having a high output power can be used for laser annealing, since a non linear optical element is not used and thus light is not converted to a harmonic. Therefore, the width of a region having large grain crystals that is formed by scanning once can be increased, and thus the productivity can be enhanced dramatically.

摘要翻译： 在使用CW激光或准CW激光进行激光退火时，与准分子激光相比，生产率不高，因此有必要进一步提高生产率。 根据本发明，使用基波而不将激光投射到非线性光学元件中，并且通过用具有高重复率的脉冲激光照射半导体薄膜来进行激光退火。 具有高输出功率的激光振荡器可用于激光退火，因为不使用非线性光学元件，因此光不转换成谐波。 因此，可以增加通过扫描一次形成的具有大晶粒的区域的宽度，从而可以显着提高生产率。

公开(公告)号：US07245802B2

公开(公告)日：2007-07-17

申请号：US10885635

申请日：2004-07-08

申请人： Koichiro Tanaka

发明人： Koichiro Tanaka

IPC分类号： G02B6/26 ,  G02B6/00

CPC分类号： G03F7/70075 ,  B23K26/0604 ,  B23K26/067 ,  B23K26/0732 ,  B23K2101/40 ,  G02B6/4206 ,  G02B27/0927 ,  G02B27/0994 ,  H01S3/005

摘要： A cylindrical lens array cannot be manufactured so that each cylindrical lens has the same radius of curvature and the same accuracy in the surface. Therefore, when the laser annealing is performed using the cylindrical lens array, the beam spots divided by the cylindrical lens array cannot be superposed completely in the same surface. As a result, there is a region where the energy is attenuated in the edge portion of the rectangular beam to be formed, and therefore the intensity distribution of the laser beam becomes inhomogeneous. In the present invention, the cylindrical lens array is used in combination with the optical waveguide. After dividing the laser beam in a predetermined direction by the cylindrical lens array, the divided beams are combined, and then the laser beam is incident into the optical waveguide that acts upon the same direction as the predetermined direction. This can correct the variation in the intensity of the laser beam due to the processing inaccuracy of the cylindrical lens array.

摘要翻译： 不能制造柱面透镜阵列，使得每个柱面透镜在曲面上具有相同的曲率半径和相同的精度。 因此，当使用柱面透镜阵列执行激光退火时，由柱面透镜阵列分割的光束斑点不能完全重叠在相同的表面中。 结果，存在在要形成的矩形梁的边缘部分中能量衰减的区域，因此激光束的强度分布变得不均匀。 在本发明中，柱面透镜阵列与光波导组合使用。 在通过柱面透镜阵列在预定方向上分割激光束之后，将分割的光束组合，然后激光束入射到沿与预定方向相同的方向作用的光波导中。 这可以校正由于柱面透镜阵列的处理不准确而导致的激光束强度的变化。