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    EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION
    81.
    发明申请
    EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION 审中-公开
    极端超紫外线辐射源和生产超极紫外线辐射的方法

    公开(公告)号：US20110020752A1

    公开(公告)日：2011-01-27

    申请号：US12810636

    申请日：2008-12-19

    申请人： Yurii Victorovitch Sidelnikov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

    发明人： Yurii Victorovitch Sidelnikov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

    IPC分类号： G03F7/20 ,  H05G2/00 ,  G03B27/54

    CPC分类号： H05G2/003

    摘要： A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.

    摘要翻译： 辐射源被构造和布置成产生极紫外辐射。 辐射源包括腔室，至少部分地容纳在腔室中的第一电极，至少部分地容纳在腔室中的第二电极，以及构造和布置成向腔室提供放电气体的供应源。 第一电极和第二电极被配置为在放电气体中产生放电以形成等离子体，以产生极紫外辐射。 源还包括构造和布置成在靠近放电的位置处提供在约1Pa和约10Pa之间的分压的气体的气体供应。 气体选自氢，氦和氢和氦的混合物。

    IMPRINT LITHOGRAPHY APPARATUS
    82.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110008483A1

    公开(公告)日：2011-01-13

    申请号：US12821806

    申请日：2010-06-23

    申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

    摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

    Anti-reflection coating for an EUV mask
    83.
    发明授权
    Anti-reflection coating for an EUV mask 有权
    防反射涂层用于EUV面罩

    公开(公告)号：US07736820B2

    公开(公告)日：2010-06-15

    申请号：US11418465

    申请日：2006-05-05

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

    IPC分类号： G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

    摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

    摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

    SOURCE MODULE, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    84.
    发明申请
    SOURCE MODULE, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
    源模块，辐射源和平面设备

    公开(公告)号：US20100085547A1

    公开(公告)日：2010-04-08

    申请号：US12566060

    申请日：2009-09-24

    申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    IPC分类号： B41F3/30 ,  A61N5/06

    CPC分类号： H05G2/001 ,  H05G2/003

    摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

    摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

    Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method
    87.
    发明授权
    Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method 失效
    光刻设备，辐射系统，器件制造方法和辐射生成方法

    公开(公告)号：US07629593B2

    公开(公告)日：2009-12-08

    申请号：US11819707

    申请日：2007-06-28

    申请人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

    发明人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

    IPC分类号： G21K5/04

    CPC分类号： G03F7/70916

    摘要： A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

    摘要翻译： 光刻设备包括辐射系统，该辐射系统构造成从辐射源发射的辐射提供辐射束。 辐射系统包括被配置为捕获从辐射源发出的材料的污染物阱。 污染物捕集阱包括布置在辐射束的路径中的污染物接合表面，该辐射束在辐射束在辐射系统中传播期间接收从辐射源发出的材料。 辐射系统还包括液体锡冷却系统，其被构造成用液体锡冷却污染物阱。 该装置包括被配置为调节辐射束的照明系统，构造成支撑配置成在其横截面中赋予辐射束图案的图案形成装置的支撑件，被构造成保持基板的基板台和配置成 以将图案化的辐射束投射到基板的目标部分上。

    Lithographic apparatus and device manufacturing method
    90.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07515245B2

    公开(公告)日：2009-04-07

    申请号：US10942102

    申请日：2004-09-16

    申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

    发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

    IPC分类号： G03B27/32 ,  G03B27/42

    CPC分类号： G03F7/70916

    摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.

    摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收 来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。