公开(公告)号：US20050275822A1

公开(公告)日：2005-12-15

申请号：US10866076

申请日：2004-06-14

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70758 ,  G03F7/70141 ,  G03F7/70258

摘要： A positioning device for positioning an object that includes a first actuator and a connector arranged between the first actuator and the object. The connector includes a resilient member and a second actuator connected in series with the resilient member. The first actuator being constructed and arranged to exert a force in a first direction on the connector and the second actuator is controlled to maintain a distance between the first actuator and the object in the first direction substantially constant.

摘要翻译： 一种用于定位物体的定位装置，包括第一致动器和布置在第一致动器和物体之间的连接器。 连接器包括弹性构件和与弹性构件串联连接的第二致动器。 第一致动器被构造和布置成在连接器上沿第一方向施加力并且第二致动器被控制以在第一方向上保持第一致动器和物体之间的距离基本恒定。

公开(公告)号：US06741331B2

公开(公告)日：2004-05-25

申请号：US10066784

申请日：2002-02-06

申请人： Marcus Emile Joannes Boonman ,  Johannes Catharinus Hubertus Mulkens ,  Hans Butler

发明人： Marcus Emile Joannes Boonman ,  Johannes Catharinus Hubertus Mulkens ,  Hans Butler

IPC分类号： G03B2754

CPC分类号： G03F7/703 ,  G03F7/70258

摘要： In a lithographic apparatus the shape of the focal plane is adjusted using available manipulators in the projection lens system so that it is in closer conformity to the shape of the wafer surface in the exposure area. The control of the focal plane shape can be integrated with the leveling control which determines the height and tilt of the wafer surface.

摘要翻译： 在光刻设备中，使用投影透镜系统中的可用操纵器来调整焦平面的形状，使得其在曝光区域中更接近于晶片表面的形状。 焦平面形状的控制可以与确定晶片表面的高度和倾斜度的调平控制集成。

公开(公告)号：US09715171B2

公开(公告)日：2017-07-25

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02 ,  G03F7/00 ,  F16F15/03 ,  F16F9/53 ,  F16F15/00 ,  F16F15/027 ,  B82Y10/00 ,  B82Y40/00 ,  B29C43/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

公开(公告)号：US09195128B2

公开(公告)日：2015-11-24

申请号：US12730910

申请日：2010-03-24

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/32 ,  G03F9/00

CPC分类号： G03B27/32 ,  G03F9/70 ,  G03F9/7096

摘要： In a lithographic apparatus, a scanning mechanism is coarse compared with precise patterns to be exposed onto a substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to either the substrate table, or to a device that aligns the image, such as a mask table. The oscillation frequency is chosen to compliment a maximum alignment error. The frequency of a radiation pulse is arranged to coincide with the image and the substrate being most accurately aligned. The radiation pulse of the image may be timed to coincide with the alignment without the use of the imparted oscillation.

摘要翻译： 在光刻设备中，与要暴露于基底上的精确图案相比，扫描机构粗糙。 为了确保图像和基板在某个时间点对准，向基板台或对准图像的装置（例如掩模台）施加振荡。 选择振荡频率以补偿最大对准误差。 辐射脉冲的频率被布置成与图像重合，并且衬底被最精确对准。 图像的辐射脉冲可以被定时以与定位一致，而不使用所赋予的振荡。

公开(公告)号：US08619232B2

公开(公告)日：2013-12-31

申请号：US12627118

申请日：2009-11-30

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/54

CPC分类号： F16F15/002 ,  G03F7/709

摘要： A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a controller unit associated with the respective dynamic mode, the controller unit providing for each dynamic mode an output signal on the basis of the respective measurement signal; and providing a control signal to each of the two or more actuators, the control signal for each actuator being based on output signals of one or more controller units.

摘要翻译： 一种用于在两个或多个自由度中阻尼物体的方法，包括测量两个或更多个测量位置中的每一个处的位置量; 从测量位置数量提取每个动态模式的测量信号; 将动态模式的测量信号馈送到与相应动态模式相关联的控制器单元，所述控制器单元基于相应的测量信号为每个动态模式提供输出信号; 并且向所述两个或更多个致动器中的每一个提供控制信号，每个致动器的控制信号基于一个或多个控制器单元的输出信号。

公开(公告)号：US20120300188A1

公开(公告)日：2012-11-29

申请号：US13477748

申请日：2012-05-22

申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

IPC分类号： G03B27/60

CPC分类号： G03F7/70783 ,  G03F7/70758

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

公开(公告)号：US08144310B2

公开(公告)日：2012-03-27

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US08044373B2

公开(公告)日：2011-10-25

申请号：US11812090

申请日：2007-06-14

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/54

CPC分类号： G03F7/709 ,  G03F7/70808

摘要： A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.

摘要翻译： 公开了一种光刻设备，其具有在内部支撑一个或多个透镜元件的投影系统外壳和连接到投影系统外壳的运动阻尼件，所述运动阻尼器构造成以至少一个的本征频率阻止投影系统壳体的运动 一个或多个透镜元件和/或投影系统外壳。

公开(公告)号：US20110170077A1

公开(公告)日：2011-07-14

申请号：US12850472

申请日：2010-08-04

申请人： Joeri LOF ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri LOF ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20110163477A1

公开(公告)日：2011-07-07

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

摘要翻译： 压印光刻设备包括致动器，其构造成使压印模板保持器相对于衬底保持器移位以执行压印处理。 压印模板保持器和/或衬底保持器被支撑在支撑结构上，支撑结构安装到安装到设备的基座上的隔振系统。 隔振系统构造成提供支撑结构相对于底座的隔振。 控制单元构造成在压印过程中控制致动器。 控制单元布置成控制隔振系统的可调节构件，以在至少部分压印过程中调节隔振系统的动态特性，以便减少支撑结构相对于底座的位移，这是由于 在压印过程中施加在支撑结构上的力。