公开(公告)号：US07531863B2

公开(公告)日：2009-05-12

申请号：US11270615

申请日：2005-11-10

申请人： Yoshihisa Nagano ,  Yasuhiro Uemoto

发明人： Yoshihisa Nagano ,  Yasuhiro Uemoto

IPC分类号： H01L27/108

CPC分类号： H01L27/10894 ,  H01L27/10852 ,  H01L27/11507 ,  H01L27/11509 ,  H01L28/55

摘要： A protective insulating film is deposited over first and second field-effect transistors formed on a semiconductor substrate. A capacitor composed of a capacitor lower electrode, a capacitor insulating film composed of an insulating metal oxide film, and a capacitor upper electrode is formed on the protective insulating film. A first contact plug formed in the protective insulating film provides a direct connection between the capacitor lower electrode and an impurity diffusion layer of the first field-effect transistor. A second contact plug formed in the protective insulating film provides a direct connection between the capacitor upper electrode and an impurity diffusion layer of the second field-effect transistor.

公开(公告)号：US07456707B2

公开(公告)日：2008-11-25

申请号：US11194460

申请日：2005-08-02

申请人： Naohiro Tsurumi ,  Kazuhiro Yahata ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka ,  Daisuke Ueda ,  Atsuhiko Kanda

发明人： Naohiro Tsurumi ,  Kazuhiro Yahata ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka ,  Daisuke Ueda ,  Atsuhiko Kanda

IPC分类号： H03H9/54

CPC分类号： H03H9/173 ,  H03H3/04 ,  H03H9/172 ,  H03H9/564 ,  H03H2003/021

摘要： An acoustic resonator includes: a substrate; a resonator film which is supported above the main surface of the substrate and includes a piezoelectric film and a pair of a top electrode and a bottom electrode which are formed on part of the top surface and part of the bottom surface of the piezoelectric film, respectively, to face each other via the piezoelectric film; and a support which is formed on the main surface of the substrate to support the resonator film from below. A resonance cavity is provided in part of a region between the substrate and the resonator film below at least a portion of part of the resonator film where the top electrode and the bottom electrode coincide with each other and an isolation cavity is provided in other part of said region where the support and the resonance cavity do not exist.

摘要翻译： 声谐振器包括：基板; 一种谐振膜，其被支撑在基板的主表面上方，分别包括压电膜和一对顶电极和底电极，它们分别形成在压电膜的顶表面和底表面的一部分上 通过压电膜相互面对; 以及形成在基板的主表面上以从下方支撑谐振膜的支撑体。 谐振腔被设置在基板和谐振器膜之间的区域的一部分的下方，在谐振膜的至少一部分之上，其中顶部电极和底部电极彼此重合，并且在另一部分中设置隔离腔 所述区域不存在支撑和谐振腔。

公开(公告)号：US20080079023A1

公开(公告)日：2008-04-03

申请号：US11890480

申请日：2007-08-07

申请人： Masahiro Hikita ,  Tetsuzo Ueda ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

发明人： Masahiro Hikita ,  Tetsuzo Ueda ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

IPC分类号： H01L21/337 ,  H01L21/335

CPC分类号： H01L29/7786 ,  H01L29/1066 ,  H01L29/2003 ,  H01L29/4175 ,  H01L29/432 ,  H01L29/66462

摘要： A nitride semiconductor device includes: a substrate; a first nitride semiconductor layer formed over the substrate; a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a larger band gap energy than the first nitride semiconductor layer; a third nitride semiconductor layer formed on the second nitride semiconductor layer and including a p-type nitride semiconductor with at least a single-layer structure; a gate electrode formed on the third nitride semiconductor layer; and a source electrode and a drain electrode formed in regions located on both sides of the gate electrode, respectively. The third nitride semiconductor layer has a thickness greater in a portion below the gate electrode than in a portion below the side of the gate electrode.

摘要翻译： 氮化物半导体器件包括：衬底; 形成在所述基板上的第一氮化物半导体层; 形成在所述第一氮化物半导体层上并且具有比所述第一氮化物半导体层更大的带隙能量的第二氮化物半导体层; 形成在所述第二氮化物半导体层上并且包括具有至少单层结构的p型氮化物半导体的第三氮化物半导体层; 形成在所述第三氮化物半导体层上的栅电极; 以及分别形成在位于栅电极两侧的区域中的源电极和漏电极。 所述第三氮化物半导体层的厚度比所述栅极电极侧的部分的厚度大。

公开(公告)号：US07291872B2

公开(公告)日：2007-11-06

申请号：US11193417

申请日：2005-08-01

申请人： Masahiro Hikita ,  Hiroaki Ueno ,  Yutaka Hirose ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

发明人： Masahiro Hikita ,  Hiroaki Ueno ,  Yutaka Hirose ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

IPC分类号： H01L31/00

CPC分类号： H01L29/7787 ,  H01L29/2003 ,  H01L29/402 ,  H01L29/4175

摘要： In the structure of a semiconductor device of the present invention, a first source electrode is connected to a conductive substrate through a via hole, and a second source electrode is formed. Thus, even if a high reverse voltage is applied between a gate electrode and a drain electrode, electric field concentration likely to occur at an edge of the gate electrode closer to the drain electrode can be effectively dispersed or relaxed. Moreover, the conductive substrate is used as a substrate for forming element formation layers, so that a via hole penetrating the substrate to reach the backside thereof does not have to be formed in the conductive substrate. Thus, with the strength necessary for the conductive substrate maintained, the first source electrode can be electrically connected to a backside electrode.

摘要翻译： 在本发明的半导体器件的结构中，第一源极通过通孔与导电性基板连接，形成第二源电极。 因此，即使在栅电极和漏电极之间施加高的反向电压，也可以有效地分散或放松更靠近漏电极的栅电极的边缘处可能发生的电场集中。 此外，导电性基板用作形成元件形成层的基板，从而不必在导电性基板上形成贯穿基板到达其背面的通路孔。 因此，由于保持导电基板所需的强度，第一源电极可以电连接到背面电极。

公开(公告)号：US20070235768A1

公开(公告)日：2007-10-11

申请号：US11730422

申请日：2007-04-02

申请人： Kazushi Nakazawa ,  Hiroaki Ueno ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

发明人： Kazushi Nakazawa ,  Hiroaki Ueno ,  Manabu Yanagihara ,  Yasuhiro Uemoto ,  Tsuyoshi Tanaka

IPC分类号： H01L27/10

CPC分类号： H01L29/872 ,  H01L29/2003 ,  H01L29/66212

摘要： A semiconductor device includes: a semiconductor layer made of a group-III nitride semiconductor and having a first surface and a second surface opposed to the first surface; a Schottky electrode formed on the first surface of the semiconductor layer; and an ohmic electrode electrically connected to the second surface of the semiconductor layer. The semiconductor layer has, in at least the upper portion thereof, highly-resistive regions selectively formed to have a high resistance.

摘要翻译： 半导体器件包括：由III族氮化物半导体制成并具有与第一表面相对的第一表面和第二表面的半导体层; 形成在半导体层的第一表面上的肖特基电极; 以及与半导体层的第二表面电连接的欧姆电极。 半导体层至少在其上部具有选择性地形成为具有高电阻的高电阻区域。

公开(公告)号：US07247891B2

公开(公告)日：2007-07-24

申请号：US10970026

申请日：2004-10-22

申请人： Atsuhiko Kanda ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto ,  Yutaka Hirose ,  Tomohiro Murata

发明人： Atsuhiko Kanda ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto ,  Yutaka Hirose ,  Tomohiro Murata

IPC分类号： H01L29/739

CPC分类号： H01L29/7787 ,  H01L27/14609 ,  H01L27/1463 ,  H01L27/14636 ,  H01L27/14656 ,  H01L29/2003 ,  H01L29/66462

摘要： A semiconductor device has a first nitride semiconductor layer, a second nitride semiconductor layer formed on the first nitride semiconductor layer and having such a composition as to generate a 2-dimensional electron gas layer in the upper portion of the first nitride semiconductor layer, and an electrode having an ohmic property and formed selectively on the second nitride semiconductor layer. The second nitride semiconductor layer includes a contact area having at least one inclined portion with a bottom or wall surface thereof being inclined toward the upper surface of the first nitride semiconductor layer and defining a depressed cross-sectional configuration. The electrode is formed on the contact area.

摘要翻译： 半导体器件具有第一氮化物半导体层，形成在第一氮化物半导体层上的第二氮化物半导体层，并具有在第一氮化物半导体层的上部产生二维电子气层的组成， 电极，其选择性地形成在第二氮化物半导体层上。 第二氮化物半导体层包括具有至少一个倾斜部分的接触区域，其底部或壁表面朝向第一氮化物半导体层的上表面倾斜并且限定凹陷的横截面构型。 电极形成在接触区域上。

公开(公告)号：US20060289894A1

公开(公告)日：2006-12-28

申请号：US11455631

申请日：2006-06-20

申请人： Tomohiro Murata ,  Yutaka Hirose ,  Yoshito Ikeda ,  Tsuyoshi Tanaka ,  Kaoru Inoue ,  Daisuke Ueda ,  Yasuhiro Uemoto

发明人： Tomohiro Murata ,  Yutaka Hirose ,  Yoshito Ikeda ,  Tsuyoshi Tanaka ,  Kaoru Inoue ,  Daisuke Ueda ,  Yasuhiro Uemoto

IPC分类号： H01L31/00

CPC分类号： H01L29/7787 ,  H01L21/02425 ,  H01L21/02458 ,  H01L21/0254 ,  H01L29/2003 ,  H01L29/4175 ,  H01L29/41766

摘要： A semiconductor device has: a buffer layer formed on a conductive substrate and made of AlxGa1−xN with a high resistance; an element-forming layer formed on the buffer layer, having a channel layer, and made of undoped GaN and N-type AlyGa1−N; and a source electrode, a drain electrode and a gate electrode which are selectively formed on the element-forming layer. The source electrode is filled in a through hole provided in the buffer layer and the element-forming layer, and is thus electrically connected to the conductive substrate.

摘要翻译： 半导体器件具有：形成在导电衬底上并具有高电阻的Al x Ga 1-x N的缓冲层; 形成在缓冲层上的元件形成层，具有沟道层，并由未掺杂的GaN和N型Al x Ga 1 -N构成; 以及选择性地形成在元件形成层上的源电极，漏电极和栅电极。 源电极被填充在设置在缓冲层和元件形成层中的通孔中，因此电连接到导电基板。

公开(公告)号：US20050093098A1

公开(公告)日：2005-05-05

申请号：US10971098

申请日：2004-10-25

申请人： Yutaka Hirose ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto

发明人： Yutaka Hirose ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto

IPC分类号： C30B25/02 ,  C30B29/40 ,  H01L21/285 ,  H01L29/20 ,  H01L29/45 ,  H01L29/80 ,  H01L33/32 ,  H01L33/40 ,  C30B1/00 ,  H01L21/20 ,  H01L21/28 ,  H01L21/3205 ,  H01L21/36 ,  H01L31/0304

CPC分类号： H01L21/28575 ,  C30B25/02 ,  C30B29/40 ,  H01L29/2003 ,  H01L29/452 ,  H01L29/802 ,  H01L33/32 ,  H01L33/40

摘要： A semiconductor device of the present invention comprises a Group III-V nitride semiconductor layer of gallium nitride or the like having n-type conductivity and at least one ohmic electrode formed on the Group III-V nitride semiconductor layer of gallium nitride or the like having n-type conductivity. The ohmic electrode is formed of a conductive material containing a metal boride.

摘要翻译： 本发明的半导体器件包括具有n型导电性的氮化镓等的III-V族氮化物半导体层和形成在氮化镓等的III-V族氮化物半导体层上的至少一个欧姆电极， n型电导率。 欧姆电极由含有金属硼化物的导电材料形成。

公开(公告)号：US20050087763A1

公开(公告)日：2005-04-28

申请号：US10970026

申请日：2004-10-22

申请人： Atsuhiko Kanda ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto ,  Yutaka Hirose ,  Tomohiro Murata

发明人： Atsuhiko Kanda ,  Tsuyoshi Tanaka ,  Yasuhiro Uemoto ,  Yutaka Hirose ,  Tomohiro Murata

IPC分类号： H01L21/331 ,  H01L21/335 ,  H01L21/338 ,  H01L27/146 ,  H01L29/20 ,  H01L29/737 ,  H01L29/778 ,  H01L29/812 ,  H01L31/0328 ,  H01S5/042 ,  H01S5/323 ,  H01S5/343

CPC分类号： H01L29/7787 ,  H01L27/14609 ,  H01L27/1463 ,  H01L27/14636 ,  H01L27/14656 ,  H01L29/2003 ,  H01L29/66462

摘要： A semiconductor device has a first nitride semiconductor layer, a second nitride semiconductor layer formed on the first nitride semiconductor layer and having such a composition as to generate a 2-dimensional electron gas layer in the upper portion of the first nitride semiconductor layer, and an electrode having an ohmic property and formed selectively on the second nitride semiconductor layer. The second nitride semiconductor layer includes a contact area having at least one inclined portion with a bottom or wall surface thereof being inclined toward the upper surface of the first nitride semiconductor layer and defining a depressed cross-sectional configuration. The electrode is formed on the contact area.

摘要翻译： 半导体器件具有第一氮化物半导体层，形成在第一氮化物半导体层上的第二氮化物半导体层，并具有在第一氮化物半导体层的上部产生二维电子气层的组成， 电极，其选择性地形成在第二氮化物半导体层上。 第二氮化物半导体层包括具有至少一个倾斜部分的接触区域，其底部或壁表面朝向第一氮化物半导体层的上表面倾斜并且限定凹陷的横截面构型。 电极形成在接触区域上。

公开(公告)号：US06441420B1

公开(公告)日：2002-08-27

申请号：US09576971

申请日：2000-05-24

申请人： Yoshihisa Nagano ,  Yasuhiro Uemoto

发明人： Yoshihisa Nagano ,  Yasuhiro Uemoto

IPC分类号： H01L2994

CPC分类号： H01L27/10894 ,  H01L27/10852 ,  H01L27/11507 ,  H01L27/11509 ,  H01L28/55

摘要： A protective insulating film is deposited over first and second field-effect transistors formed on a semiconductor substrate. A capacitor composed of a capacitor lower electrode, a capacitor insulating film composed of an insulating metal oxide film, and a capacitor upper electrode is formed on the protective insulating film. A first contact plug formed in the protective insulating film provides a direct connection between the capacitor lower electrode and an impurity diffusion layer of the first field-effect transistor. A second contact plug formed in the protective insulating film provides a direct connection between the capacitor upper electrode and an impurity diffusion layer of the second field-effect transistor.