Sputtering apparatus and film manufacturing method
    81.
    发明授权
    Sputtering apparatus and film manufacturing method 有权
    溅射装置和膜制造方法

    公开(公告)号:US06706155B2

    公开(公告)日:2004-03-16

    申请号:US09939715

    申请日:2001-08-28

    IPC分类号: C23C1434

    CPC分类号: H01J37/3438 H01J37/3405

    摘要: In order to form a thin film having a high aspect ratio, a space between a target within a vacuum chamber and a substrate table is enclosed by an anode electrode and earth electrodes. The anode electrode is positioned on the side of the target, and a positive voltage is applied. The earth electrodes are positioned on the side of the substrate table and are connected to earth potential. A trajectory of sputtering particles curved in the direction of flying off by the anode electrode is corrected and is made incident in a perpendicular manner to a surface of the substrate on the substrate table. The amount of sputtering particles incident to the surface of the substrate can therefore be increased and made perpendicularly incident; and a thin film of a high aspect ratio can be formed.

    摘要翻译: 为了形成高纵横比的薄膜,真空室内的靶与衬底台之间的空间被阳极电极和接地电极包围。 阳极位于靶的侧面,施加正电压。 接地电极位于衬底台的侧面并与地电位连接。 对由阳极电极飞出的方向进行弯曲的溅射粒子的轨迹进行校正,并使其垂直于衬底台上的衬底的表面入射。 因此,能够使入射到基板表面的溅射粒子的量增加并垂直入射; 并且可以形成高纵横比的薄膜。

    Computing-device management device, computing-device management method, and computing-device management program
    82.
    发明授权
    Computing-device management device, computing-device management method, and computing-device management program 有权
    计算设备管理设备,计算设备管理方法和计算设备管理程序

    公开(公告)号:US08909763B2

    公开(公告)日:2014-12-09

    申请号:US13076893

    申请日:2011-03-31

    IPC分类号: G06F15/173 G06F9/50

    CPC分类号: G06F9/5083 G06F2209/5019

    摘要: A computing-device management device includes a future load prediction unit that calculates a load prediction value based on load information of the computing device informed by the computing device and determines whether the load prediction value exceeds a predetermined threshold value. A software allocation unit detects, as a target computing device to be in an overloaded state in future, the computing device determined by the future load prediction unit to have the load prediction value exceeding the predetermined threshold value and determines which computing device is to be an allocation destination of at least one software component operating in the target computing device based on a CPU load, a used memory volume, and a data communication volume of the computing device. An informing unit informs the target computing device and the allocation-destination computing device of information of the allocated software component.

    摘要翻译: 计算装置管理装置包括:未来负荷预测部,其根据计算装置通知的计算装置的负载信息,计算负荷预测值,判定负荷预测值是否超过规定的阈值。 软件分配单元将未来负荷预测单元确定的计算设备作为目标计算设备处于过载状态,以使负载预测值超过预定阈值,并确定哪个计算设备将成为 基于所述计算设备的CPU负载,所使用的存储器卷和数据通信量,在所述目标计算设备中操作的至少一个软件组件的分配目的地。 通知单元向目标计算设备和分配目的地计算设备通知所分配的软件组件的信息。

    Cathode unit and sputtering apparatus provided with the same
    83.
    发明授权
    Cathode unit and sputtering apparatus provided with the same 有权
    阴极单元和溅射装置

    公开(公告)号:US08470145B2

    公开(公告)日:2013-06-25

    申请号:US12991777

    申请日:2009-06-23

    IPC分类号: C23C14/35

    摘要: There is provided an inexpensive cathode unit which is simple in construction and is capable of forming a film at good coating characteristics relative to each of micropores of high aspect ratio throughout an entire surface of a substrate. There is also provided a sputtering apparatus provided with the cathode unit. The cathode unit of this invention has a holder formed with one or more recessed portions on one surface thereof. Inside the recessed portions there are mounted bottomed cylindrical target members from the bottom side thereof. Into a space inside each of the target members there are built magnetic field generating means for generating magnetic fields.

    摘要翻译: 提供了廉价的阴极单元,其结构简单,并且能够在基板的整个表面上相对于高纵横比的每个微孔形成具有良好涂层特性的膜。 还提供了设置有阴极单元的溅射装置。 本发明的阴极单元具有在其一个表面上形成有一个或多个凹部的保持件。 在凹部内部,从其底侧安装有底圆筒形目标构件。 在每个目标构件内部的空间内,存在用于产生磁场的磁场产生装置。

    Method of managing substrate
    84.
    发明授权
    Method of managing substrate 有权
    管理基板的方法

    公开(公告)号:US08389411B2

    公开(公告)日:2013-03-05

    申请号:US13119985

    申请日:2009-10-05

    IPC分类号: H01L21/311

    CPC分类号: H01L21/6831 H01L21/67253

    摘要: The electrostatic chuck is made up of: a chuck main body having electrodes; a chuck plate of a dielectric material and having a rib portion with which a peripheral edge portion of the substrate is capable of coming into surface contact, and a plurality of supporting portions which are vertically disposed at a predetermined distance from one another in an inner space enclosed by the rib portion; and a gas introduction means for introducing a predetermined gas into the inner space. When the substrate is held by the electrostatic chuck which is arranged to attract the substrate by the chuck plate and to form a gas atmosphere by supplying a predetermined gas into the inner space, a current value is monitored by causing an AC current to flow in a capacitance of the chuck plate through an AC power supply, a gas flow amount is monitored by causing the gas to flow through the gas introduction means, and a substrate state is managed based on a variation in at least one of the current value and the gas flow amount to prevent damages to the substrate.

    摘要翻译: 静电卡盘由具有电极的卡盘主体构成; 介电材料的卡盘板,具有能够与基板的周缘部进行表面接触的肋部,以及在内部空间中彼此以规定距离垂直配置的多个支撑部 由肋部包围; 以及用于将预定气体引入内部空间的气体引入装置。 当基板被设置成通过卡盘板吸引基板的静电卡盘保持并且通过将预定的气体供应到内部空间来形成气体气氛时,通过使AC电流在 通过交流电源对卡盘板的电容进行监测,通过使气体流过气体引入装置来监测气体流量,并且基于电流值和气体中的至少一个的变化来管理基板状态 流量以防止损坏基板。

    CATHODE UNIT AND SPUTTERING APPARATUS PROVIDED WITH THE SAME
    85.
    发明申请
    CATHODE UNIT AND SPUTTERING APPARATUS PROVIDED WITH THE SAME 有权
    CATHODE单元和提供的设备

    公开(公告)号:US20110056829A1

    公开(公告)日:2011-03-10

    申请号:US12991777

    申请日:2009-06-23

    IPC分类号: C23C14/34

    摘要: There is provided an inexpensive cathode unit which is simple in construction and is capable of forming a film at good coating characteristics relative to each of micropores of high aspect ratio throughout an entire surface of a substrate. There is also provided a sputtering apparatus provided with the cathode unit. The cathode unit of this invention has a holder formed with one or more recessed portions on one surface thereof. Inside the recessed portions there are mounted bottomed cylindrical target members from the bottom side thereof. Into a space inside each of the target members there are built magnetic field generating means for generating magnetic fields.

    摘要翻译: 提供了廉价的阴极单元,其结构简单,并且能够在基板的整个表面上相对于高纵横比的每个微孔形成具有良好涂层特性的膜。 还提供了设置有阴极单元的溅射装置。 本发明的阴极单元具有在其一个表面上形成有一个或多个凹部的保持件。 在凹部内部,从其底侧安装有底圆筒形目标构件。 在每个目标构件内部的空间内,存在用于产生磁场的磁场产生装置。

    Video signal processing apparatus and video signal processing method
    88.
    发明授权
    Video signal processing apparatus and video signal processing method 失效
    视频信号处理装置和视频信号处理方法

    公开(公告)号:US06507615B1

    公开(公告)日:2003-01-14

    申请号:US09301497

    申请日:1999-04-28

    IPC分类号: H04N712

    摘要: A video signal processing apparatus and a video signal processing method can switch resolution effectively and efficiently. The video signals coming from an imaging apparatus is converted into digital signals by an A/D converter 2 an compressed by a compressor 3. The compressed video signals are written into a recording medium 5 by means of a write device 4. The compressor 3 encodes the video signals for each group of pictures comprising a plurality of pictures and the camera compression control unit 6 controls the compressor 3 so as encode the pictures of a first group of pictures and those of a second group of pictures arranged temporally adjacent to the first group of pictures, while maintaining the number of pictures of two temporally adjacent groups of pictures that contain a resolution change point of video signals to a constant value, and change the resolution of the pictures of the two groups of pictures.

    摘要翻译: 视频信号处理装置和视频信号处理方法可以有效且高效地切换分辨率。 来自成像装置的视频信号由压缩机3压缩的A / D转换器2转换为数字信号。压缩的视频信号通过写装置4被写入记录介质5.压缩器3编码 包括多个图像的每组图像的视频信号和照相机压缩控制单元6控制压缩器3,以编码第一组图像的图像和在时间上与第一组布置的第二组图像的图像 的图像,同时将包含视频信号的分辨率变化点的两个时间上相邻的图像组的图像的数量保持为恒定值,并且改变两组图像的图像的分辨率。