Cathode unit and sputtering apparatus provided with the same
    1.
    发明授权
    Cathode unit and sputtering apparatus provided with the same 有权
    阴极单元和溅射装置

    公开(公告)号:US08470145B2

    公开(公告)日:2013-06-25

    申请号:US12991777

    申请日:2009-06-23

    IPC分类号: C23C14/35

    摘要: There is provided an inexpensive cathode unit which is simple in construction and is capable of forming a film at good coating characteristics relative to each of micropores of high aspect ratio throughout an entire surface of a substrate. There is also provided a sputtering apparatus provided with the cathode unit. The cathode unit of this invention has a holder formed with one or more recessed portions on one surface thereof. Inside the recessed portions there are mounted bottomed cylindrical target members from the bottom side thereof. Into a space inside each of the target members there are built magnetic field generating means for generating magnetic fields.

    摘要翻译: 提供了廉价的阴极单元,其结构简单,并且能够在基板的整个表面上相对于高纵横比的每个微孔形成具有良好涂层特性的膜。 还提供了设置有阴极单元的溅射装置。 本发明的阴极单元具有在其一个表面上形成有一个或多个凹部的保持件。 在凹部内部,从其底侧安装有底圆筒形目标构件。 在每个目标构件内部的空间内,存在用于产生磁场的磁场产生装置。

    CATHODE UNIT AND SPUTTERING APPARATUS PROVIDED WITH THE SAME
    2.
    发明申请
    CATHODE UNIT AND SPUTTERING APPARATUS PROVIDED WITH THE SAME 有权
    CATHODE单元和提供的设备

    公开(公告)号:US20110056829A1

    公开(公告)日:2011-03-10

    申请号:US12991777

    申请日:2009-06-23

    IPC分类号: C23C14/34

    摘要: There is provided an inexpensive cathode unit which is simple in construction and is capable of forming a film at good coating characteristics relative to each of micropores of high aspect ratio throughout an entire surface of a substrate. There is also provided a sputtering apparatus provided with the cathode unit. The cathode unit of this invention has a holder formed with one or more recessed portions on one surface thereof. Inside the recessed portions there are mounted bottomed cylindrical target members from the bottom side thereof. Into a space inside each of the target members there are built magnetic field generating means for generating magnetic fields.

    摘要翻译: 提供了廉价的阴极单元,其结构简单,并且能够在基板的整个表面上相对于高纵横比的每个微孔形成具有良好涂层特性的膜。 还提供了设置有阴极单元的溅射装置。 本发明的阴极单元具有在其一个表面上形成有一个或多个凹部的保持件。 在凹部内部,从其底侧安装有底圆筒形目标构件。 在每个目标构件内部的空间内,存在用于产生磁场的磁场产生装置。

    SPUTTERING APPARATUS AND SPUTTERING METHOD
    3.
    发明申请
    SPUTTERING APPARATUS AND SPUTTERING METHOD 审中-公开
    溅射装置和喷射方法

    公开(公告)号:US20110048927A1

    公开(公告)日:2011-03-03

    申请号:US12991800

    申请日:2009-06-23

    IPC分类号: C23C14/35

    摘要: An inexpensive sputtering apparatus of simple construction is provided in which a film can be formed with good coating characteristics relative to each of micropores of high aspect ratio. The sputtering apparatus has: a target lying opposite to a substrate W which is disposed inside a vacuum chamber; a magnet assembly which generates a tunnel-shaped magnetic field in front of a sputtering surface of the target; a gas introduction means which introduces a sputtering gas into the vacuum chamber; and a sputtering power supply which charges negative potential to the target. There are provided magnetic field generating means to generate a vertical magnetic field of such a nature that vertical lines of magnetic force M pass through a sputtering surface and through an entire surface of the substrate at a predetermined distance from one another.

    摘要翻译: 提供一种简单结构的廉价的溅射装置,其中相对于每个高纵横比的微孔,可以形成具有良好涂层特性的膜。 溅射装置具有:设置在真空室内的与基板W相对的靶; 磁体组件,其在目标的溅射表面的前方产生隧道状磁场; 气体引入装置,其将溅射气体引入真空室; 以及向目标物体负电荷的溅射电源。 提供了用于产生垂直磁场的磁场产生装置,其特征在于磁力M的垂直线通过溅射表面并穿过基板的整个表面彼此预定的距离。

    Sputtering apparatus
    4.
    发明授权
    Sputtering apparatus 有权
    溅射装置

    公开(公告)号:US08377269B2

    公开(公告)日:2013-02-19

    申请号:US12991961

    申请日:2009-06-04

    IPC分类号: C23C14/35

    摘要: There is provided an inexpensive sputtering apparatus in which self-sputtering can be stably performed by accelerating the ionization of the atoms scattered from a target. The sputtering apparatus has: a target which is disposed inside a vacuum chamber so as to lie opposite to the substrate W to be processed; a magnet assembly which forms a magnetic field in front of the sputtering surface of the target; and a DC power supply which charges the target with a negative DC potential. A first coil is disposed in a central portion of a rear surface of the sputtering surface of the target. The first coil is electrically connected between the first power supply and the output to the target. When a negative potential is charged to the target by the sputtering power supply, the electric power is charged to the first coil, whereby a magnetic field is generated in front of the sputtering surface.

    摘要翻译: 提供了一种廉价的溅射装置,其中通过加速从靶分散的原子的电离可以稳定地进行自溅射。 溅射装置具有:设置在真空室内的靶,以与待加工的基板W相对; 在靶的溅射表面前面形成磁场的磁体组件; 以及对具有负DC电位的目标进行充电的DC电源。 第一线圈设置在靶的溅射表面的后表面的中心部分中。 第一线圈电连接到第一电源和与目标的输出之间。 当通过溅射电源将负电位充电到目标电极时,电力被充电到第一线圈,由此在溅射表面的前面产生磁场。

    SPUTTERING APPARATUS
    5.
    发明申请
    SPUTTERING APPARATUS 有权
    溅射装置

    公开(公告)号:US20110062019A1

    公开(公告)日:2011-03-17

    申请号:US12991961

    申请日:2009-06-04

    IPC分类号: C23C14/35

    摘要: There is provided an inexpensive sputtering apparatus in which self-sputtering can be stably performed by accelerating the ionization of the atoms scattered from a target. The sputtering apparatus has: a target which is disposed inside a vacuum chamber so as to lie opposite to the substrate W to be processed; a magnet assembly which forms a magnetic field in front of the sputtering surface of the target; and a DC power supply which charges the target with a negative DC potential. A first coil is disposed in a central portion of a rear surface of the sputtering surface of the target. The first coil is electrically connected between the first power supply and the output to the target. When a negative potential is charged to the target by the sputtering power supply, the electric power is charged to the first coil, whereby a magnetic field is generated in front of the sputtering surface.

    摘要翻译: 提供了一种廉价的溅射装置,其中通过加速从靶分散的原子的电离可以稳定地进行自溅射。 溅射装置具有:设置在真空室内的靶,以与待加工的基板W相对; 在靶的溅射表面前面形成磁场的磁体组件; 以及对具有负DC电位的目标进行充电的DC电源。 第一线圈设置在靶的溅射表面的后表面的中心部分中。 第一线圈电连接到第一电源和与目标的输出之间。 当通过溅射电源将负电位充电到目标电极时,电力被充电到第一线圈,由此在溅射表面的前面产生磁场。

    Sputtering apparatus and film manufacturing method
    6.
    发明授权
    Sputtering apparatus and film manufacturing method 有权
    溅射装置和膜制造方法

    公开(公告)号:US06706155B2

    公开(公告)日:2004-03-16

    申请号:US09939715

    申请日:2001-08-28

    IPC分类号: C23C1434

    CPC分类号: H01J37/3438 H01J37/3405

    摘要: In order to form a thin film having a high aspect ratio, a space between a target within a vacuum chamber and a substrate table is enclosed by an anode electrode and earth electrodes. The anode electrode is positioned on the side of the target, and a positive voltage is applied. The earth electrodes are positioned on the side of the substrate table and are connected to earth potential. A trajectory of sputtering particles curved in the direction of flying off by the anode electrode is corrected and is made incident in a perpendicular manner to a surface of the substrate on the substrate table. The amount of sputtering particles incident to the surface of the substrate can therefore be increased and made perpendicularly incident; and a thin film of a high aspect ratio can be formed.

    摘要翻译: 为了形成高纵横比的薄膜,真空室内的靶与衬底台之间的空间被阳极电极和接地电极包围。 阳极位于靶的侧面,施加正电压。 接地电极位于衬底台的侧面并与地电位连接。 对由阳极电极飞出的方向进行弯曲的溅射粒子的轨迹进行校正,并使其垂直于衬底台上的衬底的表面入射。 因此,能够使入射到基板表面的溅射粒子的量增加并垂直入射; 并且可以形成高纵横比的薄膜。

    Information processing apparatus, information processing method, and program
    7.
    发明授权
    Information processing apparatus, information processing method, and program 有权
    信息处理装置,信息处理方法和程序

    公开(公告)号:US08886012B2

    公开(公告)日:2014-11-11

    申请号:US12416299

    申请日:2009-04-01

    摘要: An information processing apparatus includes: a detecting section that detects feature information of at least one AV stream; a recording section that records the AV streams, clip information defining attributes including the detected feature information, and playback-segment data specifying at least one playback segment to a storage medium in accordance with a predetermined data-recording format, the playback-segment data being obtained by setting a playback start point and a playback end point with respect to the AV streams; a playback-segment setting section that sets the playback segments with respect to the AV streams on the basis of detection time point of the feature information; and a data generating section that generates the playback-segment data specifying the playback segments set by the playback-segment setting section.

    摘要翻译: 一种信息处理设备,包括:检测部分,其检测至少一个AV流的特征信息; 记录部件,根据预定的数据记录格式,将包括检测到的特征信息的AV流,定义属性的剪辑信息和指定至少一个重放段的回放段数据记录到存储介质,记录部分数据是 通过设置关于AV流的重放开始点和重放结束点来获得; 回放段设定部,其基于特征信息的检测时间点,对AV流设定回放段; 以及数据生成部,其生成指定由再现段设定部设定的再现段的回放段数据。

    Apparatus, method, and computer program for processing information
    8.
    发明授权
    Apparatus, method, and computer program for processing information 失效
    用于处理信息的装置,方法和计算机程序

    公开(公告)号:US08639098B2

    公开(公告)日:2014-01-28

    申请号:US11821530

    申请日:2007-06-21

    IPC分类号: H04N5/92

    摘要: An information processing apparatus includes a controller for controlling data recording to an information recording medium. The controller updates a command storage file storing a command set in response to AV stream data to be recorded on the information recording medium and an index file storing index information and then records the updated command storage file and the updated index file on the information recording medium, the command storage file and the index file being updated and recorded in response to a determination that a predetermined update timing different from the timings of the recording of the AV stream data onto the information recording medium and the editing of the recorded AV stream data is reached.

    摘要翻译: 一种信息处理装置,包括用于控制对信息记录介质的数据记录的控制器。 控制器更新存储响应于要记录在信息记录介质上的AV流数据而设置的命令的命令存储文件和存储索引信息的索引文件,然后将更新的命令存储文件和更新的索引文件记录在信息记录介质上 响应于与将AV流数据记录到信息记录介质上的定时不同的预定更新定时和记录的AV流数据的编辑,确定更新和记录命令存储文件和索引文件 到达。

    Editing device, editing method and editing program, and data processing device, data processing method and data processing program
    9.
    发明授权
    Editing device, editing method and editing program, and data processing device, data processing method and data processing program 失效
    编辑装置,编辑方法和编辑程序,数据处理装置,数据处理方法和数据处理程序

    公开(公告)号:US08554055B2

    公开(公告)日:2013-10-08

    申请号:US12057054

    申请日:2008-03-27

    IPC分类号: H04N5/782

    摘要: An editing device dubs stream data stored in a second recording medium. A recording unit records the specified range of stream data in a stream file in the first recording medium, based on management information recorded in the second recording medium. A stream information file in which a stream file and stream information are stored, and a playback list file in which playback section data and mark information indicating the playback point-in-time information can be stored, are recorded as management information. A management information is generated based on the relation between the specified range and the playback section data and stream information corresponding to the specified range.

    摘要翻译: 编辑装置对存储在第二记录介质中的流数据进行复制。 记录单元基于记录在第二记录介质中的管理信息,将流数据的指定范围记录在第一记录介质中的流文件中。 记录有流文件和流信息的流信息文件以及可以存储指示回放时刻信息的回放部分数据和标记信息的回放列表文件被记录为管理信息。 基于指定范围与回放部分数据之间的关系以及对应于指定范围的流信息生成管理信息。