公开(公告)号：US20090169968A1

公开(公告)日：2009-07-02

申请号：US12300179

申请日：2007-05-22

申请人： Takashi Iseki ,  Yuka Yamada ,  Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hiroyuki Mori ,  Toshio Horie ,  Ken-ichi Suzuki ,  Gaku Kitahara

发明人： Takashi Iseki ,  Yuka Yamada ,  Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hiroyuki Mori ,  Toshio Horie ,  Ken-ichi Suzuki ,  Gaku Kitahara

IPC分类号： H01M2/14 ,  C23C16/44 ,  B32B15/04 ,  B32B9/04 ,  H01M8/02 ,  C09K3/00

CPC分类号： C23C16/26 ,  H01M8/0206 ,  H01M8/0213 ,  H01M8/0228 ,  Y02P70/56 ,  Y10T428/30 ,  Y10T428/31504 ,  Y10T428/31678

摘要： The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.

摘要翻译： 本发明的无定形碳膜是含有碳和氢的无定形碳膜，其中无定形碳膜含有不超过30原子％（不包括0％）的氢，当碳的总量为100时 原子％，具有sp2混合轨道的碳以不小于70原子％且小于100原子％的量存在。 通过控制氢，Csp3等的含量来增加包含Csp2的结构，赋予无定形碳膜的电导率。 该无定形碳膜可以通过使用含有一种或多种气体的反应气体等离子体CVD形成，所述气体选自含有sp2混合轨道的碳的碳环化合物气体和含有sp2混合轨道和硅的碳的杂环化合物气体和/或 氮。 通过在基板的表面上形成非晶碳膜，可以获得导电部件。

公开(公告)号：US07537835B2

公开(公告)日：2009-05-26

申请号：US10488290

申请日：2002-09-25

申请人： Hiroyuki Mori ,  Hideo Tachikawa ,  Masaru Okuyama ,  Mamoru Tohyama ,  Toshihide Ohmori ,  Kazuyuki Nakanishi

发明人： Hiroyuki Mori ,  Hideo Tachikawa ,  Masaru Okuyama ,  Mamoru Tohyama ,  Toshihide Ohmori ,  Kazuyuki Nakanishi

IPC分类号： B32B9/00

CPC分类号： F16C33/12 ,  F16C33/043 ,  F16D69/02 ,  F16D2250/0038 ,  Y10T428/265 ,  Y10T428/30

摘要： Under wet sliding conditions using drivetrain system lubricating oils, a high frictional sliding member exhibiting a high friction coefficient, a favorable μ−v characteristic stably, excellent wear resistance, and low mating-member aggressiveness is provided. The present invention is a wet sliding member comprising: a substrate composed of metal, ceramics, or resin; and an amorphous hard carbon film formed integrally on a surface of the substrate, having a surface, at least a part of which is turned into a sliding surface for sliding under wet conditions, and containing at least either one of Si and N in an amount of from 1 to 50 atomic %.

摘要翻译： 在使用传动系统润滑油的湿滑动条件下，提供了表现出高摩擦系数的高摩擦滑动构件，稳定的良好的μ-v特性，优异的耐磨性和低配合构件侵蚀性。 本发明是一种湿滑动构件，包括：由金属，陶瓷或树脂构成的基底; 以及一体地形成在所述基板的表面上的无定形硬碳膜，所述无定形硬碳膜具有表面，所述表面的至少一部分被变成用于在潮湿条件下滑动的滑动表面，并且包含至少一个Si和N的量， 为1至50原子％。

公开(公告)号：US20090092933A1

公开(公告)日：2009-04-09

申请号：US11868328

申请日：2007-10-05

申请人： Yoshiki Hishiro ,  Scott Sills ,  Hiroyuki Mori ,  Troy Gugel ,  Paul D. Shirley ,  Lijing Gou ,  Adam Olson

发明人： Yoshiki Hishiro ,  Scott Sills ,  Hiroyuki Mori ,  Troy Gugel ,  Paul D. Shirley ,  Lijing Gou ,  Adam Olson

IPC分类号： G03F7/20

CPC分类号： G03F7/2022 ,  G03F7/203

摘要： A method of lithographically patterning a substrate that has photoresist having removal areas and non-removal areas includes first exposing at least the non-removal areas to radiation effective to increase outer surface roughness of the photoresist in the non-removal areas at least post-develop but ineffective to change photoresist solubility in a developer for the photoresist to be cleared from the non-removal areas upon develop with the developer. Second exposing of radiation to the removal areas is conducted to be effective to change photoresist solubility in the developer for the photoresist to be cleared from the removal areas upon develop with the developer. The photoresist is developed with the developer effective to clear photoresist from the removal areas and to leave photoresist in the non-removal areas that has outer surface roughness in the non-removal areas which is greater than that before the first exposing. Other implementations and embodiments are contemplated.

摘要翻译： 光刻图案化具有去除区域和非去除区域的光致抗蚀剂的基板的方法包括首先将至少不去除区域暴露于有效地增加非去除区域中的光致抗蚀剂的外表面粗糙度至少后显影 但是在用显影剂显影时，光致抗蚀剂的显影剂中的光致抗蚀剂溶解度无法改变，以从非去除区域中清除。 进行辐射到去除区域的第二次曝光是有效的，以改变光致抗蚀剂在显影剂中的溶解度，以使光致抗蚀剂在用显影剂显影时从除去区域中清除。 用显影剂显影光致抗蚀剂有效地从去除区域清除光致抗蚀剂，并且在非去除区域中留下光致抗蚀剂，其在非去除区域中的外表面粗糙度大于第一次曝光之前的表面粗糙度。 预期其他实现和实施例。

公开(公告)号：US20080188383A1

公开(公告)日：2008-08-07

申请号：US11720154

申请日：2005-11-24

申请人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

发明人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

IPC分类号： F16C33/20 ,  H05H1/24

CPC分类号： C23C16/26 ,  Y10T428/30

摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

摘要翻译： 当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。 当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp 2 SUB混合轨道的碳构成。 还公开了一种制备无定形碳膜的方法。

公开(公告)号：US07368168B2

公开(公告)日：2008-05-06

申请号：US11115192

申请日：2005-04-27

申请人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

发明人： Hiroyuki Mori ,  Fumio Shimizu ,  Hideo Tachikawa ,  Toshihide Ohmori ,  Hiroshi Moritani ,  Mamoru Tohyama ,  Yoshio Shimura ,  Shigeru Hotta ,  Takashi Iseki

IPC分类号： C23C16/26

CPC分类号： B32B9/00 ,  Y10T428/24479 ,  Y10T428/24628 ,  Y10T428/30

摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.

摘要翻译： 在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。 无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质 ，当整体取为100原子％，表面粗糙度为0.8μm或更小时。 低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

公开(公告)号：US20080018013A1

公开(公告)日：2008-01-24

申请号：US11660512

申请日：2006-03-16

申请人： Hiroyuki Mori ,  Naohiko Mushiake

发明人： Hiroyuki Mori ,  Naohiko Mushiake

IPC分类号： B29C47/00 ,  B29C47/12

CPC分类号： B29C47/30 ,  B29B9/06 ,  B29B9/12 ,  B29C47/0014 ,  B29C47/0016 ,  B29C47/0023 ,  B29C47/06

摘要： In a die assembly, plural pairs of extrusion ports are set up on concentric circles different in diameter. The die assembly is also provided with a core material feeding layer which spreads in such a planar state as to be connected to all core material extruding passageways and a sheath material feeding layer which spreads in such a planar state as to be connected to all sheath material extruding passageways and the core material and the sheath material are fed through the passageways. This constitution makes it possible to set up extrusion ports in arbitrary positions corresponding to the core material feeding layer and the sheath material feeding layer which each spread in a planar state, which enables simultaneous production of more multilayer extrusions while inhibiting the enlargement of the assembly.

摘要翻译： 在模具组件中，多对挤出口设置在直径不同的同心圆上。 模具组件还设置有芯材料供给层，其以这样的平面状态扩展以连接到所有芯材料挤出通道，并且鞘材料供给层在这样的平面状态下展开以连接到所有护套材料 挤出通道和芯材料和护套材料通过通道进料。 该构造使得可以在对应于芯材料供给层和护套材料供给层的任意位置设置各自以平面状态扩展的挤出口，这能够同时制造更多层的挤出物，同时抑制组件的扩大。

公开(公告)号：US20070270527A1

公开(公告)日：2007-11-22

申请号：US10596114

申请日：2004-11-29

申请人： Takeshi Horie ,  Shinichiro Yamada ,  Yuko Fujihira ,  Hiroyuki Mori ,  Tsutomu Noguchi

发明人： Takeshi Horie ,  Shinichiro Yamada ,  Yuko Fujihira ,  Hiroyuki Mori ,  Tsutomu Noguchi

IPC分类号： C08L101/16 ,  C08K3/22 ,  C08K3/24 ,  C08K3/28 ,  C08K3/32 ,  C08K5/16 ,  C08K5/3415 ,  C08K5/49

CPC分类号： C08L1/02 ,  C08K5/49 ,  C08L1/08 ,  C08L1/10 ,  C08L1/16 ,  C08L3/02 ,  C08L3/04 ,  C08L3/06 ,  C08L5/02 ,  C08L5/08 ,  C08L67/04

摘要： Disclosed is a biodegradable resin composition containing at least one biodegradable organic high molecular compound, a flame retardant additive containing a phosphorus-containing compound, and a hydrolysis suppressing agent suppressing the hydrolysis of the at least one biodegradable organic high molecular compound. An aliphatic polyester resin is polylactic acid, polycaprolactone, polyhydroxy lactic acid, polyhydroxy valeric acid, polyethylene succinate, polybutylene succinate, polybutylene adipate, polymalic acid, polyesters synthesized by fermentation, or a copolymer containing at least one of them. A polysaccharide is cellulose, starch, chitin, chitosan, dextrane, a derivative of at least one of them, or a copolymer containing at least one of them.

摘要翻译： 公开了含有至少一种生物可降解有机高分子化合物，含有磷化合物的阻燃添加剂和抑制至少一种生物降解性有机高分子化合物的水解的水解抑制剂的生物降解性树脂组合物。 脂肪族聚酯树脂是聚乳酸，聚己内酯，多羟基乳酸，多羟基戊酸，聚琥珀酸乙烯酯，聚丁二酸丁二醇酯，聚己二酸丁二醇酯，聚丙酸，通过发酵合成的聚酯，或含有至少一种的共聚物。 多糖是纤维素，淀粉，壳多糖，壳聚糖，葡聚糖，它们中的至少一种的衍生物或含有至少一种的共聚物。

公开(公告)号：US20070182281A1

公开(公告)日：2007-08-09

申请号：US11651418

申请日：2007-01-09

申请人： Hiroyuki Mori

发明人： Hiroyuki Mori

IPC分类号： H02N2/00

CPC分类号： H02N2/0025 ,  G02B27/08 ,  H02N2/026 ,  H02N2/028 ,  H02N2/103

摘要： Disclosed herein is an exciting method for an elastic vibration member which may include arranging two support members each formed from an electromechanical energy transducer; supporting the elastic vibration member to the two support members at their front ends; and supplying drive signals having the same frequency and a phase difference to the two support members, circularly or elliptically vibrating the elastic vibration member.

摘要翻译： 这里公开了一种用于弹性振动构件的激励方法，其可以包括布置由机电能量换能器形成的两个支撑构件; 将弹性振动部件支撑在前端的两个支撑部件上; 并向两个支撑构件提供具有相同频率和相位差的驱动信号，使弹性振动构件圆形或椭圆形振动。

公开(公告)号：US20070108009A1

公开(公告)日：2007-05-17

申请号：US11512214

申请日：2006-08-30

申请人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Toshiyuki Saito ,  Hajime Fukami ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

发明人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Toshiyuki Saito ,  Hajime Fukami ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

IPC分类号： F16D27/115 ,  F16D13/74

CPC分类号： F16D13/64 ,  F16D13/648 ,  F16D13/74 ,  F16D27/004 ,  F16D27/115 ,  F16D2027/008 ,  F16D2065/132 ,  F16D2069/004 ,  F16D2200/0008 ,  F16D2200/0039 ,  F16D2200/0052 ,  F16D2300/10

摘要： A drive force transmission device has an outer clutch plate and an inner clutch plate, which are rotatable relative to each other about a common rotational axis. The inner and outer clutch plates become frictionally engaged with each other with lubricant oil provided in between. The outer and inner clutch plates each have a sliding surface. The sliding surfaces face each other. A diamond-like carbon film is formed on the sliding surface of the outer clutch plate. Fine grooves are formed in the sliding surface of the inner clutch plate. The proportion of the sliding area to the sliding surface of the inner clutch plate at the initial stage of use is 55 to 90%.

摘要翻译： 驱动力传递装置具有外离合器片和内离合器片，它们能绕相同的旋转轴线相对于彼此旋转。 内外离合器片之间设置有润滑油，彼此摩擦接合。 外离合板和内离合器板各自具有滑动面。 滑动面相互面对。 在外离合器板的滑动面上形成类金刚石碳膜。 在内离合器板的滑动面上形成微细的槽。 在使用初始阶段，内侧离合器片的滑动面的滑动面积的比例为55〜90％。

公开(公告)号：US20070021089A1

公开(公告)日：2007-01-25

申请号：US11528335

申请日：2006-09-28

申请人： Makoto Terui ,  Noritaka Anzai ,  Hiroyuki Mori

发明人： Makoto Terui ,  Noritaka Anzai ,  Hiroyuki Mori

IPC分类号： H04B1/26

CPC分类号： H01L23/3114 ,  H01L23/5227 ,  H01L23/66 ,  H01L24/10 ,  H01L2223/6688 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05024 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05569 ,  H01L2224/05573 ,  H01L2224/05647 ,  H01L2224/16 ,  H01L2924/01079 ,  H01L2924/09701 ,  H01L2924/15311 ,  H01L2924/19041 ,  H01L2924/3011 ,  H01L2924/00014

摘要： A semiconductor device includes a semiconductor substrate having a main surface, the main surface including a first and second areas formed with a high-frequency circuit element, and a third area located around the first and second areas and formed with a low-frequency circuit element. The semiconductor device also includes a sealing resin which covers the main surface; a plurality of first external terminals which are formed above the third area and which are electrically connected to the high-frequency circuit element, the first external terminals protruding from the surface of the sealing resin. The semiconductor device further includes a plurality of second external terminals which are formed above the third area and which are electrically connected to the low-frequency circuit element, the second external terminals protruding from the surface of the sealing resin.

摘要翻译： 半导体器件包括具有主表面的半导体衬底，主表面包括形成有高频电路元件的第一和第二区域，以及位于第一和第二区域周围的第三区域，并且形成有低频电路元件 。 半导体器件还包括覆盖主表面的密封树脂; 多个第一外部端子，其形成在所述第三区域的上方并与所述高频电路元件电连接，所述第一外部端子从所述密封树脂的表面突出。 半导体器件还包括多个第二外部端子，它们形成在第三区域之上并与低频电路元件电连接，第二外部端子从密封树脂的表面突出。