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    Functional patterning material for imprint lithography processes
    81.
    发明授权
    Functional patterning material for imprint lithography processes 失效
    用于压印光刻工艺的功能图案材料

    公开(公告)号：US06936194B2

    公开(公告)日：2005-08-30

    申请号：US10235314

    申请日：2002-09-05

    申请人： Michael P. C. Watts

    发明人： Michael P. C. Watts

    IPC分类号： G02B6/12 ,  G02B6/138 ,  G03F7/00 ,  B29D11/00

    CPC分类号： G03F7/0002 ,  B29L2011/0016 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/138 ,  G02B2006/12147

    摘要： The present invention provides a method for forming an optical coupling device on a substrate by disposing a material onto the substrate that is polymerizable in response to actinic radiation. A stack of the material is formed by contacting the material with a template having a stepped-recess formed therein. The material is then solidified into an optically transparent body with a surface having a plurality of steps by subjecting the stack to actinic radiation. To that end, the material may comprise an acrylate component selected from a set of acrylates consisting essentially of ethylene dio diacrylate, t-butyl acrylate, bisphenol A diacrylate, acrylate terminated polysiloxane, polydifluoromethylene diacrylate, perfluoropolyether diacrylates and chlorofluorodiacrylates. Alternatively, the material may include a silylated component selected from a group consisting essentially of (3-acryloxypropyltristrimethylsiloxy) silane.

    摘要翻译： 本发明提供一种在基板上形成光耦合装置的方法，该方法是将材料设置在基于光化辐射可聚合的基板上。 通过使材料与其中形成有阶梯形凹部的模板接触来形成材料的堆叠。 然后将该材料固化成光学透明体，其表面具有多个步骤，通过使叠层经受光化辐射。 为此，该材料可以包括丙烯酸酯组分，其选自基本上由二丙烯酸二乙酯，丙烯酸叔丁酯，双酚A二丙烯酸酯，丙烯酸酯封端的聚硅氧烷，聚二氟亚甲基二丙烯酸酯，全氟聚醚二丙烯酸酯和氯氟代二丙烯酸酯组成的一组丙烯酸酯。 或者，材料可以包括选自基本上由（3-丙烯酰氧基丙基三甲基甲硅烷氧基）硅烷组成的组的甲硅烷基化组分。

    Method of reducing pattern distortions during imprint lithography processes
    83.
    发明授权
    Method of reducing pattern distortions during imprint lithography processes 有权
    在压印光刻过程中减少图案失真的方法

    公开(公告)号：US06929762B2

    公开(公告)日：2005-08-16

    申请号：US10293223

    申请日：2002-11-13

    申请人： Daniel I. Rubin

    发明人： Daniel I. Rubin

    IPC分类号： B29C59/00 ,  B29C59/02 ,  G03F7/00 ,  B29C33/40 ,  B29C35/08 ,  B29C43/02

    CPC分类号： B82Y10/00 ,  B29C59/002 ,  B29C59/022 ,  B29C2059/023 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention is directed to a method of reducing distortions in a pattern disposed on a layer of a substrate, defining a recorded pattern, employing a mold having the pattern recorded therein, defining an original pattern. The method includes, defining a region on the layer in which to produce the recorded pattern. Relative extenuative variations between the substrate and the mold are created to ensure that the original pattern defines an area coextensive with the region. Thereafter, the recorded pattern is formed in the region. The relative extenuative variations are created by heating or cooling of the substrate so that the region defines an area that is slightly smaller/larger than the area of the original pattern. Then compression/tensile forces are applied to the mold to provide the recorded pattern with an area coextensive with the area of the region.

    摘要翻译： 本发明涉及一种减少设置在基材层上的图案中的变形的方法，该图案限定了记录图案，采用其中记录有图案的模具，限定原始图案。 该方法包括：定义在其上产生记录图案的层上的区域。 创建基材和模具之间的相对的简单变化，以确保原始图案定义与该区域共同延伸的区域。 此后，在该区域中形成记录图案。 通过加热或冷却衬底来产生相对的简化变化，使得该区域限定比原始图案的面积稍小或更大的区域。 然后将压缩/拉伸力施加到模具以向记录图案提供与该区域的区域共同延伸的区域。

    Positive tone bi-layer imprint lithography method
    88.
    发明申请
    Positive tone bi-layer imprint lithography method 有权
    正音双层压印光刻法

    公开(公告)号：US20040188381A1

    公开(公告)日：2004-09-30

    申请号：US10396615

    申请日：2003-03-25

    申请人： Molecular Imprints, Inc.

    发明人： Sidlgata V. Sreenivasan

    IPC分类号： B44C001/22

    CPC分类号： B81C1/0046 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/76802

    摘要： The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.

    摘要翻译： 本发明提供一种通过在衬底上形成具有突起和凹陷的图案化层来形成特征为产生多层结构的衬底的方法。 形成在图案层上的是保形层，多层结构具有背离衬底的表冠表面。 去除多层结构的部分以暴露与突起叠加的衬底的区域，同时在与凹部重叠的冠表面的区域中形成硬掩模。

    Planarization composition and method of patterning a substrate using the same
    89.
    发明申请
    Planarization composition and method of patterning a substrate using the same 审中-公开
    平面化组成和使用其构图的衬底的方法

    公开(公告)号：US20040112862A1

    公开(公告)日：2004-06-17

    申请号：US10318319

    申请日：2002-12-12

    申请人： MOLECULAR IMPRINTS, INC.

    发明人： C. Grant Willson ,  Britain J. Smith ,  Nicholas A. Stacey

    IPC分类号： C23F001/00

    CPC分类号： B29C43/003 ,  B29C2043/025 ,  B81C99/0085 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0955

    摘要： The present invention includes a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. To that end, in one embodiment of the present invention the composition includes a non-silicon-containing acrylate component, and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps. The initiator component is responsive to radiation to initiate a free radical reaction and cause the non-silicon containing acrylate component to polymerize and cross-link. One embodiment of the non-silicon-containing acrylate component includes ethylene glycol diacrylate. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.

    摘要翻译： 本发明包括通过在将组合物暴露于辐射时从组合物形成交联聚合物而在组合物上形成图案的组合物和方法。 为此，在本发明的一个实施方案中，组合物包含非含硅丙烯酸酯组分和与所述非含硅丙烯酸酯组合的引发剂组分，以提供不大于5cps的粘度。 引发剂组分响应辐射以引发自由基反应，并使非含硅丙烯酸酯组分聚合和交联。 非含硅丙烯酸酯组分的一个实施方案包括乙二醇二丙烯酸酯。 该方法包括沉积作为平坦化层的组合物。 此后，沉积要记录图案的可聚合材料层。