公开(公告)号：US06946416B2

公开(公告)日：2005-09-20

申请号：US10319739

申请日：2002-12-13

Applicant: John E. Maxon ,  Christine E. Heckle

Inventor： John E. Maxon ,  Christine E. Heckle

IPC: G02B1/00 ,  C03B20/00 ,  C03C3/06 ,  G02B6/13

CPC classification number: C03C3/06 ,  C03C2201/32 ,  G02B6/13

Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.

Abstract translation: 当与含有较低含量的铝的熔融石英制品相比时，用激光照射时，熔融二氧化硅制品表现出改善的内部透光性和降低的吸收变化。 当用激光照射时，制品也表现出诱导的传播。 这些制品还表现出改进的离轴折射率均匀性。

公开(公告)号：US06841242B2

公开(公告)日：2005-01-11

申请号：US10481895

申请日：2002-07-03

Applicant: Laurent Molins

Inventor： Laurent Molins

IPC: C03C13/02 ,  C03C3/06 ,  C03C13/00 ,  D01F9/08 ,  D03D15/12 ,  D02G3/00 ,  C08B19/08

CPC classification number: C03C13/00 ,  C03C3/06 ,  C03C2201/32 ,  C03C2201/42 ,  D01F9/08 ,  Y10T428/29 ,  Y10T428/2933

Abstract: The invention relates to a silica yarn and to woven or nonwoven fabrics produced from said yarn, which comprises 30 to 1500 ppm by weight of aluminum and 10 to 200 ppm by weight of titanium in oxidized form, the sum of the mass of the chemical elements different from Si and O being less than 5000 ppm by weight, the following elements being absent or present in a very small quantity: boron, sodium, calcium, potassium and lithium. The fabrics comprising this silica yarn have an excellent high-temperature withstand and thus retain their flexibility for a long time at above 600° C. They are useful especially in uses requiring good high-temperature flexibility, such as for furnace seals.

Abstract translation: 本发明涉及一种二氧化硅丝以及由所述纱线制成的机织或非织造织物，其包含30至1500重量ppm的铝和10至200重量ppm的氧化形式的钛，化学元素的质量之和 不同于Si和O的重量比小于5000ppm，以下元素不存在或以非常少的量存在：硼，钠，钙，钾和锂。 包含该二氧化硅纱线的织物具有优异的耐高温性，因此在600℃以上长时间保持其柔韧性。它们特别适用于要求良好的高温柔韧性的用途，例如炉密封。

公开(公告)号：US20030217569A1

公开(公告)日：2003-11-27

申请号：US10154572

申请日：2002-05-23

Inventor： George H. Sigel JR. ,  Daniel S. Homa

IPC: C03B037/018

CPC classification number: C03B37/01807 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/36 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/22 ,  C03B2207/81 ,  C03B2207/90 ,  C03C13/045 ,  C03C2201/32 ,  C03C2201/36 ,  C03C2201/50 ,  C03C2201/54

Abstract: A preform for a low loss fiber optic cable and method and apparatus for fabricating such a preform is provided. The method includes providing AlCl3 and CVD precursors and locally doping CaCl3. Alkali and/or alkaline earth fluxing agents can be introduced. The alkali and/or alkaline earths are doped along with the aluminum into the silica glass core.

Abstract translation: 提供了一种用于低损耗光纤电缆的预成型件以及用于制造这种预制件的方法和装置。 该方法包括提供AlCl 3和CVD前体并局部掺杂CaCl 3。 可以引入碱和/或碱土助熔剂。 碱和/或碱土金属与铝一起掺入石英玻璃芯中。

公开(公告)号：US20030148194A1

公开(公告)日：2003-08-07

申请号：US10342717

申请日：2003-01-13

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: G03F009/00 ,  G03C005/00 ,  C03B005/26 ,  C03B007/00 ,  B32B009/00 ,  B32B017/06

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US06542690B1

公开(公告)日：2003-04-01

申请号：US09566542

申请日：2000-05-08

Applicant: Adam J. G. Ellison ,  Rostislav R. Khrapko

Inventor： Adam J. G. Ellison ,  Rostislav R. Khrapko

IPC: G02B600

CPC classification number: G02B6/02114 ,  C03B19/1415 ,  C03B19/1423 ,  C03B37/01807 ,  C03B37/0183 ,  C03B2201/20 ,  C03B2201/58 ,  C03B2203/18 ,  C03C3/06 ,  C03C3/076 ,  C03C13/045 ,  C03C13/046 ,  C03C2201/10 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/3417 ,  C03C2201/42 ,  C03C2201/58 ,  C03C2203/40 ,  C03C2203/44 ,  G02B6/02 ,  G02B6/021 ,  G02B6/02138 ,  G02B6/0219

Abstract: The present invention relates to a glass article for use as an optical waveguide fiber and more particularly to an optical waveguide fiber, the core of which is doped with a chalcogenide element to significantly increase the refractive index of the core. The subject of this invention is novel doped silica core compositions wherein a portion of the oxygen in the silica is replaced with either sulfur, selenium or tellurium using plasma enhanced chemical vapor deposition (PECVD). These compositions are designed to have higher refractive indices than silica, low coefficients of expansion, high optical transparency, and appropriate viscosity and softening points to make them ideal candidates for use as optical waveguide fibers.

Abstract translation: 本发明涉及一种用作光波导光纤的玻璃制品，更具体地说，涉及一种光纤光纤，其光纤掺杂有硫属元素元素以显着提高芯的折射率。 本发明的主题是新型掺杂二氧化硅芯组合物，其中使用等离子体增强化学气相沉积（PECVD）将二氧化硅中的氧的一部分用硫，硒或碲代替。 这些组合物被设计为具有比二氧化硅更高的折射率，低膨胀系数，高光学透明度和适当的粘度和软化点，以使其成为用作光波导纤维的理想候选物。

公开(公告)号：US06541168B2

公开(公告)日：2003-04-01

申请号：US09841517

申请日：2001-04-24

Applicant: John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

IPC: G03F900

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US20020134108A1

公开(公告)日：2002-09-26

申请号：US09839795

申请日：2001-04-20

Inventor： Waltraud Werdecker ,  Udo Gertig ,  Johann Leist ,  Helmut Leber

IPC: B32B001/08 ,  C03B019/09

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03B19/095 ,  C03B23/047 ,  C03B23/0496 ,  C03C11/00 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2201/80 ,  C03C2204/06 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

Abstract: A process for manufacture of a component made of opaque synthetic quartz glass, and a quartz glass tube manufactured according to said process. The process comprises (i) providing a starting material in the form of granulated material of highly pure, synthetic SiO2 comprising at least partially porous agglomerates of SiO2 primary particles, the granulated material having a compacted bulk density of no less than 0.8 g/cm3, (ii) filling the granulated material into a mold and converting it to an opaque quartz glass preform through a process of melting, and (iii) reshaping the preform in a heat reshaping process to obtain a component made of opaque quartz glass. A quartz glass tube is made of quartz glass consisting of a granulated material of synthetic SiO2 with a lithium content of no more than 100 wt-ppb, and the wall thickness of said component being in the range of 0.5 mm to 15 mm.

Abstract translation: 一种制造由不透明的合成石英玻璃制成的部件的方法，以及根据所述方法制造的石英玻璃管。 该方法包括（i）提供高纯度合成SiO 2的造粒材料形式的起始材料，其包含SiO 2一次颗粒的至少部分多孔附聚物，所述造粒材料的压实堆积密度不小于0.8g / cm 3， （ii）将造粒材料填充到模具中并通过熔化过程将其转化为不透明的石英玻璃预制件，以及（iii）在热成型工艺中重新成形预成型件以获得由不透明石英玻璃制成的部件。 石英玻璃管由石英玻璃制成，石英玻璃由合成SiO 2的粒状材料组成，锂含量不超过100wt-ppb，所述组分的壁厚在0.5mm至15mm的范围内。

公开(公告)号：US06263704B1

公开(公告)日：2001-07-24

申请号：US09584721

申请日：2000-06-01

Applicant: Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: C03C1900

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法，或通过对其进行磨损损伤的方法 初始石英玻璃的表面通过喷砂。

公开(公告)号：US06235669B1

公开(公告)日：2001-05-22

申请号：US09444177

申请日：1999-11-19

Applicant: Stanley M. Antczak ,  Mohan Rajaram

Inventor： Stanley M. Antczak ,  Mohan Rajaram

IPC: C04B3514

CPC classification number: H01J61/302 ,  C03C3/06 ,  C03C2201/32 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2203/10

Abstract: A synthetic fused silica composition comprising silica and aluminum, wherein said aluminum is generally present in at least 7 parts per million and the composition has a viscosity of at least 1014.5 poise.

Abstract translation: 包含二氧化硅和铝的合成熔融二氧化硅组合物，其中所述铝通常以至少百万分之七的比例存在，并且所述组合物具有至少1014.5泊的粘度。

公开(公告)号：US6093666A

公开(公告)日：2000-07-25

申请号：US85006

申请日：1998-05-28

Applicant: Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: C03B20/00 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C23/002 ,  C03C3/06 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E' center as measured by means of an electron spin resonance analysis is 3.times.10.sup.19 cm.sup.-3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO.sub.2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E' center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法或通过对 初始石英玻璃的表面通过喷砂。