摘要:
According to the invention, the image contrast in electron optics can be improved without causing aberrations that are no longer tolerable by using, for production and correction of the at least one anamorphic image, quadrupole fields before and after this image whose extent in the direction of the optical axis is equal to at least twice their focal length, and wherein at least one of the axial rays, by an appropriate choice of the magnification M of the intermediate image, enters the quadrupole field before the at least one anamorphic image at a slope 1/M such that a length of the anamorphic image is achieved at which any aberrations caused are still within a tolerable range. The invention also relates to devices for implementing this method.
摘要:
Multipole coils (1, 2, 3, 4, 5, 6) for influencing particle beams have at least two coils (1, 2) which concentrically enclose an imaginary axis (10), wherein a winding (7) made from a flexible circuit board (8) is formed by means of conducting paths (9) disposed thereon for each coil (1, 2, 3, 4, 5, 6) and the circuit boards (8) are rolled into at least one circuit board layer (11, 12, 13, 14). Multipole coils of this kind (1, 2, 3, 4, 5, 6) are utilized for aberration correction in particle optics, wherein the windings (7) of the multipole coils (1, 2, 3, 4, 5, 6) form windows (16) whose width in the peripheral direction is chosen in such a fashion that no secondary interfering fields occur and whose length in the axial direction corresponds at least to its width.
摘要:
A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).
摘要:
A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S′) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic. The quadrupole fields of the two correction pieces are antisymmetrical and a transfer lens system is arranged such that it is symmetrical with respect to the central plane of the corrective between the correction pieces. The transfer lens system has two round lenses and the setting of the transfer lens system takes place so that the two round lenses image the central plane of the two correction pieces anamorphically onto one another, in which the enlargement in one main section is the reciprocal of the enlargement in the other main section and with an octupole field superimposed on the central quadrupole field.
摘要:
A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam path (2) on an optical axis (3). Each correction piece (10, 20) comprises four successive multipole elements (11, 12, 13, 14; 24, 23, 22, 21) disposed symmetrically with respect to a center plane (5) and with the following fields: wherein the first (11; 24) and the fourth (14; 21) multipole elements of the multipole elements (11, 12, 13, 14; 24, 23, 22, 21) are used to generate quadrupole fields (11′, 14′; 24′, 21′) and the second (12; 23) and third (13; 22) are used to generate octupole fields (12′″, 13′″; 23′″,22′″) and quadrupole fields (12′, 13′; 23′,22′), wherein the latter are superposed magnetic (12′, 13′; 23′, 22′) and electric fields (12″, 13″; 23″, 22″), wherein the quadrupole fields (11′, 12′, 13′, 14′; 24′, 23′, 22′, 21′) of all four multipole elements (11, 12, 13, 14; 24, 23, 22,21) are rotated from one to the next through 90°. An astigmatism of third order is corrected by a central multipole element disposed in the center plane and generating an octupole field.
摘要:
The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7′, 8, 8′), wherein the latter are superposed magnetic (7, 8) and electric (7′, 8′) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°. Elimination of errors up to fifth order can be realized with a corrector (10) of this type in that the second (2) and the third (3) multipole elements are designed as twelve-pole elements, and an additional twelve-pole element (13) is inserted between the second (2) and the third (3) multipole element, and is loaded with current and/or voltage, such that an octupole field (14) is generated that is superposed by a twelve-pole field (15).
摘要:
A corrector has a strength of a central hexapole field (ΨHP2) which is selected such that the threefold axial astigmatism (A2) vanishes and the strengths of two equal outer hexapole fields (ΨHP1,3) are selected such that the overall corrector (5) does not have a sixfold axial astigmatism (A5). The length (L) of the central multipole element (2) in relation to the lengths (L′) of the multipole elements (1 and 3) is chosen such that the axial three-lobed aberration of sixth order (D6) vanishes. A separation between the outer multipole elements (1 and 3) and round lenses (7″, 8″) further spaced apart from a symmetry plane (6) of the corrector corresponds to the focal length (f′) of those round lenses (7″, 8″) plus an additional separation (Δz) which is chosen such that the axial three-lobed aberration of fourth order (D4) vanishes for the given lengths L and L′.
摘要:
A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam path (2) on an optical axis (3). Each correction piece (10, 20) comprises four successive multipole elements (11, 12, 13, 14; 24, 23, 22, 21) disposed symmetrically with respect to a center plane (5) and with the following fields: wherein the first (11; 24) and the fourth (14; 21) multipole elements of the multipole elements (11, 12, 13, 14; 24, 23, 22, 21) are used to generate quadrupole fields (11′, 14′; 24′, 21′) and the second (12; 23) and third (13; 22) are used to generate octupole fields (12′″, 13′″;23′″,22′″) and quadrupole fields (12′, 13′; 23′,22′), wherein the latter are superposed magnetic (12′, 13′; 23′, 22′) and electric fields (12″, 13″; 23″, 22″), wherein the quadrupole fields (11′, 12′, 13′, 14′; 24′, 23′, 22′, 21′) of all four multipole elements (11, 12, 13, 14; 24, 23, 22,21) are rotated from one to the next through 90°. An astigmatism of third order is corrected by a central multipole element disposed in the center plane and generating an octupole field.
摘要:
Multipole coils (1, 2, 3, 4, 5, 6) comprise at least two coils (1, 2) which are disposed to concentrically enclose an imaginary axis (10). Multipole coils (1, 2, 3, 4, 5, 6) of this type are designed in such a fashion that effective fields can be generated in the area of an imaginary axis (10) when little installation space is available, and the multipole coils can be reproducibly manufactured with high precision. This is achieved in that, for each coil (1, 2, 3, 4, 5, 6), at least one winding (7) is disposed on a flexible printed circuit board (8) through disposed strip conductors (9), and the printed circuit board (8) is rolled in at least one printed circuit board layer (11, 12, 13, 14).
摘要:
The invention concerns a corrector (9) for chromatic and aperture aberration correction in an electron microscope with six multipoles (1, 2, 3, 4, 5, 6) which are disposed in the optical path (7) one after the other symmetrically with respect to a symmetry plane (8) for generating quadrupole fields (1′, 2′, 3′, 4′, 5′, 6′) and octupole fields, wherein the quadrupole fields (1′, 2′, 3′, 4′, 5′, 6′) of all six multipoles (1, 2, 3, 4, 5, 6) are consecutively rotated through 90° with respect to one another, thereby generating a mirror-symmetrical exchange symmetry of the axial fundamental rays (xα, yβ).In accordance with the invention, the following is provided for correcting azimuthal coma: A double multipole (10) with a multipole element (11) upstream of the symmetry plane (8) and a multipole element (12) downstream of the symmetry plane (8), which generates two octupole fields (11′, 12′) of the same orientation as the quadrupole fields (1′, 2′, 3′, 4′, 5′, 6′) and two further octupole fields (11″, 12″), which have opposite poles and exert a force on the electrons in a direction rotated through 90° with respect to the above-mentioned octupole fields (11′, 12′) in the principal sections (x, y). The six multipoles (1, 2, 3, 4, 5, 6) generate octupole fields (1″, 2″, 3″, 4″, 5″, 6″) with the same orientation, and the adjustment of the poles and of the field strengths of the octupole fields (1″, 2″, 3″, 4″, 5″, 6″, 1″, 12″) is used for the above-mentioned correction.