公开(公告)号：US06949751B2

公开(公告)日：2005-09-27

申请号：US10478752

申请日：2002-07-24

Applicant: Heiko Müller

Inventor： Heiko Müller

IPC: G03F7/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/317 ,  H01L21/027 ,  H01J49/42

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/153 ,  H01J37/3174

Abstract: A slit lens arrangement for particle beams, and particularly for the projection of a mask onto a workpiece, includes a combined lens, having a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, so that the optical axis of the quadrupole lens may be displaced in a parallel manner and which may have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. Two combined lenses are provided with functionally identical elements arranged such that the optical axes of both lenses lie coaxial to each other, defining the mid-axis of the total system and in which the beam path is telescopic throughout the entire slit lens arrangement. The optical axis of the image is given by the optical axis of the quadrupole. Further, the diffraction plane, or aperture plane, for the total system lies between both combined lenses and fixes a point on the mid-axis, relative to which the combined lenses are arranged, so that the above are anti-symmetric to each other and simultaneously fill the condition that the separation of the first and the second combined lenses from the diffraction plane and the assembly and/or the fields of functionally identical elements in the combined lenses is in a ratio which corresponds to the image scale, preferably, reduction ratio. The shifts of the optical axes of the quadrupole lenses of both combined lenses occur in diametrically opposed directions, such that the size of the shifts are in a ratio to each other which corresponds to the image scale, preferably, the reduction ratio.

Abstract translation: 用于粒子束的狭缝透镜装置，特别是用于将掩模投射到工件上的狭缝透镜装置包括具有柱面透镜和四极透镜的组合透镜，其光轴彼此平行延伸，使得光轴 的四极透镜可以以平行的方式移位，并且可以在极靴之间或者在电极之间具有彼此具有相同空间关系的间隙形开口。 因此，两个透镜相对于彼此布置，四极透镜的聚焦发生在其中气泡透镜未被聚焦的平面中，并且四极透镜的散焦发生在柱面透镜聚焦的平面中。 两个组合透镜设置有功能相同的元件，其布置成使得两个透镜的光轴彼此同轴，限定整个系统的中轴线，并且其中光束路径在整个狭缝透镜装置中可伸缩。 图像的光轴由四极杆的光轴给出。 此外，用于整个系统的衍射平面或孔径平面位于两个组合透镜之间，并且固定中心轴上相对于组合透镜布置的点，使得上述对应于彼此反对称，并且 同时填充第一和第二组合透镜与衍射平面以及组合透镜中的组件和/或功能相同元件的场分离的比例对应于图像尺度，优选地为减小比率 。 两个组合透镜的四极透镜的光轴的偏移沿径向相反的方向发生，使得偏移的大小彼此相对于图像比例的比例，优选的是减小比。

公开(公告)号：US07800076B2

公开(公告)日：2010-09-21

申请号：US12297306

申请日：2007-03-31

Applicant: Stephan Uhlemann ,  Harald Rose ,  Heiko Müller

Inventor： Stephan Uhlemann ,  Harald Rose ,  Heiko Müller

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes. The orientation of the hexapole field pairs is rotated with respect to the orientation defined by the hexapole fields by a sufficient angle so that the extra-axial third order coma is corrected.

Abstract translation: 一种使用圆形透镜和六极场消除三次孔径像差和三次超外差彗差的粒子光学校正器包括三个同轴布置的六极场，至少一个圆形透镜双曲线布置在相邻的六极场之间 并调整为使六边形中心六极场成像。 在六极场之间，以中间平面为准，中间平面彼此共轭。 三个六极场在拉莫尔参考系中相同取向，选择三个场的强度，使得具有三重对称性的像散的像差系数变为0.校正包含两个六极场，其中场 六极场对被彼此反对称地激励，并且在每种情况下这些对围绕两个中间平面布置。 六极场对的取向相对于由六极场确定的取向旋转足够的角度，以便校正异轴三阶彗差。

公开(公告)号：US06995378B2

公开(公告)日：2006-02-07

申请号：US10499165

申请日：2002-11-26

Applicant: Stephan Uhlemann ,  Maximilan Haider ,  Heiko Müller

Inventor： Stephan Uhlemann ,  Maximilan Haider ,  Heiko Müller

IPC: H01J37/145 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J2237/3175

Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields. The first field lies between the object and the first slit diaphragm, and the second field lies between the first slit diaphragm and the second slit diaphragm. Both fields can be focused independently from each other. The potential difference between the object and the first diaphragm is comparatively small in relation to the potential difference between the first diaphragm and the second diaphragm, and the potential course between the object and the first diaphragm has to be approximately linear. The combined lens is brought into/out of focus by superposing the immersion field, the cylinder lens field, and the quadrupole field. Alternatively, the lens array can be used as a cathode lens for a photocathode with several homogenous adjacent emission areas.

Abstract translation: 公开了一种透镜阵列，其具有用于粒子束的横向可移动轴，特别是用于通过电子从物体表面到焦平面上的区域的透射。 本发明的阵列由包括柱面透镜和四极透镜的组合透镜组成，该四极透镜设置有可被电场和/或磁场撞击的狭缝光阑。 四极透镜的光轴定向为平行于柱面透镜的轴线并且限定投影的光轴，其位置可以相对于柱面透镜的轴线改变。 四极透镜在柱面透镜未聚焦的区域中聚焦，并且在柱面透镜聚焦的部分中不对焦。 本发明的组合透镜可以用作投影二次电子的浸没透镜。 浸入场由至少两个相邻的轴向排列的场组成。 第一场位于物体和第一狭缝光阑之间，第二场位于第一狭缝光阑和第二狭缝光阑之间。 这两个领域可以彼此独立地集中。 物体与第一膜片之间的电位差相对于第一膜片和第二膜片之间的电位差相对较小，并且物体与第一膜片之间的电位过程必须近似线性。 组合透镜通过叠加浸没场，气缸透镜场和四极场进入/离开焦点。 或者，透镜阵列可以用作具有几个均匀的相邻发射区域的用于光电阴极的阴极透镜。

公开(公告)号：US06888145B2

公开(公告)日：2005-05-03

申请号：US10478820

申请日：2002-12-03

Applicant: Heiko Müller ,  Harald Rose

Inventor： Heiko Müller ,  Harald Rose

IPC: G01Q30/00 ,  H01J37/153 ,  H01L21/027

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group. The structure and refractive powers of the multipole elements that correspond to each other are mirror-symmetrically configured relative to the corresponding symmetrical plane between the groups. At least two of the quadrupole elements generate electric-magnetic quadrupole fields, in which the quadrupole element are, preferably, arranged in a mirror-symmetrical manner relative to the second, or to all, symmetrical planes. An additional octupole element is arranged in the first and third symmetrical planes. The corrector enables the transmission of extremely large image fields, while the optical quality remains the same due to the fact image aberrations outside the axis can be corrected.

Abstract translation: 具有用于消除光学粒子透镜中的颜色和孔径像差的具有直线光轴的光学粒子校正器包括电和/或四极和八极元件形式的多极元件。 有至少十二个四极元件和十个八极元件，其中三个四极元件和两个八极元件组装成一组。 这些组沿着直线光轴连续布置，其中在第一和第二组之间限定第一对称平面，在第二组和第三组之间限定第二对称平面，并且在第三和第四组之间限定第三对称平面 团体 从一组到另一组的多极元件成对地相对应，其中相应的后续组的多极元件与前一组的相应多极元件相比沿着直线光轴以相反的顺序定位。 对应于多个元件的多极元件的结构和折射能力相对于组之间的相应的对称平面被镜对称地构造。 四极元件中的至少两个产生电磁四极场，其中四极元件优选地相对于第二或全部对称平面以镜像对称的方式布置。 在第一和第三对称平面中设置一个额外的八极元件。 校正器使得能够传输极大的图像场，同时光学质量保持相同，这是由于可以校正轴外的图像像差。

公开(公告)号：US09949665B2

公开(公告)日：2018-04-24

申请号：US14125722

申请日：2011-06-17

Applicant: Heiko Müller ,  Mario Schubert ,  Martin Haimerl

Inventor： Heiko Müller ,  Mario Schubert ,  Martin Haimerl

IPC: A61B5/00 ,  A61B5/06 ,  A61B17/00 ,  A61F2/46 ,  A61B90/00 ,  A61B34/20 ,  A61B34/10

CPC classification number: A61B5/067 ,  A61B34/20 ,  A61B2017/00477 ,  A61B2034/105 ,  A61B2034/2048 ,  A61B2034/2055 ,  A61B2034/2068 ,  A61B2090/0818 ,  A61F2/4603 ,  A61F2/4609

Abstract: The present invention relates to a method for measuring or verifying the position of a medical implant located in an anatomical body part(s) and/or structure(s) relative to the body part(s) and/or structure(s) or specific points, landmarks or planes of the same, wherein a device is provided which has an at least partially known or previously determined geometry or at least partially known dimensions and is connected to the medical implant; positional or landmark information regarding the anatomical body part(s) and/or structure(s) is acquired; the position of the medical implant is calculated using a navigation system and a reference structure which is or can be connected to the device; and the calculated position of the medical implant is related to or compared with the acquired positional or landmark information regarding the anatomical body part(s) and/or structure(s) in order to measure or verify the position of the medical implant within or relative to the anatomical body part(s) and/or structure(s).

公开(公告)号：US06866621B1

公开(公告)日：2005-03-15

申请号：US10031468

申请日：2000-06-26

Applicant: Heiko Müller ,  Horst Kache

Inventor： Heiko Müller ,  Horst Kache

IPC: F25B1/00 ,  B04B9/10 ,  B04B15/02 ,  F25B49/00 ,  B04B13/00

CPC classification number: B04B15/02 ,  B04B9/10

Abstract: A laboratory with a rotor driven by a centrifuge electric motor and a cooling unit driven by an electrical cooling motor, wherein the centrifuge motor is formed as a frequency-controlled induction motor fed from a frequency converter controlled by a control unit and having a centrifuge inverted rectifier that feeds the centrifuge motor and is connected to a d.c. source fed from a mains power rectifier, characterized in that the cooling motor is formed as a frequency-controlled induction motor, and that the frequency converter has a further cooling inverted rectifier connected to the d.c. source parallel to the centrifuge inverted rectifier for feeding the cooling motor.

Abstract translation: 具有由离心机电动机驱动的转子和由电冷却电动机驱动的冷却单元的实验室，其中所述离心机电动机形成为由控制单元控制的变频器馈送的频率控制的感应电动机，并且具有倒置的离心机 整流器馈送离心机电机并连接到直流电 源自电力整流器的源，其特征在于，所述冷却电动机形成为频率控制的感应电动机，并且所述变频器具有连接到所述直流电路的另外的冷却反向整流器。 源平行于离心机反向整流器供给冷却电机。

公开(公告)号：US08733574B2

公开(公告)日：2014-05-27

申请号：US13131164

申请日：2009-10-24

Applicant: Benjamin Heidrich ,  Heiko Müller ,  Joachim Neef ,  Arnold Thelen

Inventor： Benjamin Heidrich ,  Heiko Müller ,  Joachim Neef ,  Arnold Thelen

IPC: B65D51/16

CPC classification number: A47J27/09 ,  Y10T137/8326

Abstract: The invention relates to a valve unit for a pressure vessel, the latter consisting of a receptacle and a lid which can be placed on said receptacle in such a way as to make it pressure-tight and said valve unit including: a safety function, pressure-relief function and pressure indicator function; adjustable indicator levels and pressure levels; an indicator pin (4) or indicator piston (10) which is supported against an indicator spring (7), can move in axial direction and bears on its portion becoming visible upon pressurization, due to its emergence from a valve housing (12), indicator rings, for example, for indicating the pressure inside the vessel; and comprising a valve body (5) which is movable in axial direction against the action of an exhaust steam spring (6) and, in the closed position, rests against a seal seat (19), lifting off from this, when a given pressure inside the vessel is exceeded, to uncover a pressure-relief aperture (20), in which case both the indicator spring (7) and the exhaust steam spring (6) are braced in the same direction against a common, axially adjustable pressure member (8).

Abstract translation: 本发明涉及一种用于压力容器的阀门单元，后者包括一个容器和一个盖子，该容器和盖子可以放置在所述容器上，以便使其成为压力，并且所述阀门单元包括：安全功能，压力 减压功能和压力指示功能; 可调指标水平和压力水平; 支撑在指示弹簧（7）上的指示器销（4）或指示器活塞（10）由于从阀壳体（12）的出现而能够在轴向方向上移动并且在加压时在其部分变得可见， 指示器环，例如用于指示容器内部的压力; 并且包括阀体（5），所述阀体（5）克服所述排气蒸汽弹簧（6）的作用在轴向方向上移动，并且在所述关闭位置中，所述阀体（5）抵靠密封座（19）放置，当所述密封座 超过容器内部以露出减压孔（20），在这种情况下，指示弹簧（7）和排气蒸汽弹簧（6）都以相同的方向相对于共同的可轴向调节的压力构件（ 8）。

公开(公告)号：US07989776B2

公开(公告)日：2011-08-02

申请号：US12096579

申请日：2005-12-06

Applicant: Heiko Müller ,  Harald Rose

Inventor： Heiko Müller ,  Harald Rose

IPC: H01J1/50

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S′) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic. The quadrupole fields of the two correction pieces are antisymmetrical and a transfer lens system is arranged such that it is symmetrical with respect to the central plane of the corrective between the correction pieces. The transfer lens system has two round lenses and the setting of the transfer lens system takes place so that the two round lenses image the central plane of the two correction pieces anamorphically onto one another, in which the enlargement in one main section is the reciprocal of the enlargement in the other main section and with an octupole field superimposed on the central quadrupole field.

Abstract translation: 用于消除三次孔径像差和一级一级轴向色差的校正方法包括两个校正片，其在光轴方向上一个接一个布置，其中每个校正片具有多个 四极场（QP）和至少一个八极场（OP）。每个校正片被构造成使得它相对于其中心平面（S，S'）是对称的，每个校正片具有不均匀数量的至少五个 四极场（QP）和至少一个八极场（OP）。 每个校正件进一步构造成使得它相对于其中心平面是对称的。 中心四极场被布置为使得其相对于校正件的中心平面居中并且是电磁的。 两个校正块的四极场是反对称的，并且转印透镜系统被布置成使得其相对于校正片之间的校正的中心平面对称。 转印透镜系统具有两个圆形透镜，并且传送透镜系统的设置发生，使得两个圆形透镜彼此变形地将两个校正片的中心平面成像，其中一个主要部分的放大是 另一个主要部分的放大和一个叠加在中心四极场上的八极场。

公开(公告)号：US06903337B2

公开(公告)日：2005-06-07

申请号：US10185729

申请日：2002-07-01

Applicant: Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

Inventor： Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

IPC: G03F7/20 ,  H01J31/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/28 ,  H01J2237/082 ,  H01J2237/2446

Abstract: An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

Abstract translation: 一种用于对物体平面中定位的物体进行成像的检查系统，包括用于向物体的界定场提供能量的照明装置，使得带电粒子从场的位置出现，该场可在物体的平面中移动， 第一偏转器，用于提供可变偏转场，用于引导通过固定的预定光束横截面从物体的可选择区域的位置出射的带电粒子，以及设置在光束路径中的位置敏感检测器，使得带电粒子在 已经穿过第一偏转器，撞击位置敏感检测器，其中从该区域的不同位置出现的颗粒被成像在位置敏感检测器的分配到出现位置的不同位置上。

公开(公告)号：US20140114179A1

公开(公告)日：2014-04-24

申请号：US14125722

申请日：2011-06-17

Applicant: Heiko Müller ,  Mario Schubert ,  Martin Haimerl

Inventor： Heiko Müller ,  Mario Schubert ,  Martin Haimerl

IPC: A61B5/06 ,  A61F2/46

CPC classification number: A61B5/067 ,  A61B34/20 ,  A61B2017/00477 ,  A61B2034/105 ,  A61B2034/2048 ,  A61B2034/2055 ,  A61B2034/2068 ,  A61B2090/0818 ,  A61F2/4603 ,  A61F2/4609

Abstract: The present invention relates to a method for measuring or verifying the position of a medical implant located in an anatomical body part(s) and/or structure(s) relative to the body part(s) and/or structure(s) or specific points, landmarks or planes of the same, wherein a device is provided which has an at least partially known or previously determined geometry or at least partially known dimensions and is connected to the medical implant; positional or landmark information regarding the anatomical body part(s) and/or structure(s) is acquired; the position of the medical implant is calculated using a navigation system and a reference structure which is or can be connected to the device; and the calculated position of the medical implant is related to or compared with the acquired positional or landmark information regarding the anatomical body part(s) and/or structure(s) in order to measure or verify the position of the medical implant within or relative to the anatomical body part(s) and/or structure(s).

Abstract translation: 本发明涉及一种用于测量或验证位于相对于身体部位和/或结构或具体的身体部位和/或结构的解剖体部分和/或结构中的医疗植入物的位置的方法 点，地标或平面，其中提供具有至少部分已知或预先确定的几何形状或至少部分已知尺寸并且连接到医疗植入物的装置; 获取关于解剖体部分和/或结构的位置或地标信息; 使用导航系统和可以连接到该装置的参考结构来计算医疗植入物的位置; 并且医学植入物的计算位置与所获取的关于解剖体部分和/或结构的位置或标志性信息相关或与之相比较，以便测量或验证医疗植入物在或相对内部的位置 到解剖体部分和/或结构。